Log in

Relevant bibliographies by topics / Secondary electron yield / Journal articles

To see the other types of publications on this topic, follow the link: Secondary electron yield.

Journal articles on the topic 'Secondary electron yield'

Author: Grafiati

Published: 4 June 2021

Last updated: 3 February 2022

Create a spot-on reference in APA, MLA, Chicago, Harvard, and other styles

Select a source type:

Consult the top 50 journal articles for your research on the topic 'Secondary electron yield.'

Next to every source in the list of references, there is an 'Add to bibliography' button. Press on it, and we will generate automatically the bibliographic reference to the chosen work in the citation style you need: APA, MLA, Harvard, Chicago, Vancouver, etc.

You can also download the full text of the academic publication as pdf and read online its abstract whenever available in the metadata.

Browse journal articles on a wide variety of disciplines and organise your bibliography correctly.

1

XIE, AI-GEN, HAN-SUP UHM, YUN-YUN CHEN, and EUN-HA CHOI. "MAXIMUM SECONDARY ELECTRON YIELD AND PARAMETERS OF SECONDARY ELECTRON YIELD OF METALS." Surface Review and Letters 23, no. 05 (2016): 1650039. http://dx.doi.org/10.1142/s0218625x16500396.

Full text

Abstract:

On the basis of the free-electron model, the energy range of internal secondary electrons, the energy band of a metal, the formula for inelastic mean escape depth, the processes and characteristics of secondary electron emission, the probability of internal secondary electrons reaching surface and passing over the surface barrier into vacuum B as a function of original work function [Formula: see text] and the distance from Fermi energy to the bottom of the conduction band [Formula: see text] was deduced. According to the characteristics of creation of an excited electron, the definition of av

APA, Harvard, Vancouver, ISO, and other styles

2

XIE, AI-GEN, LING WANG, and LIU-HUA MU. "FORMULA FOR MAXIMUM SECONDARY ELECTRON YIELD FROM METALS." Surface Review and Letters 22, no. 02 (2015): 1550019. http://dx.doi.org/10.1142/s0218625x15500195.

Full text

Abstract:

Based on free-electron model, the calculated inelastic mean escape depth of secondary electrons, experimental one, the energy band of metal, the characteristics and processes of secondary electron emission, maximum number of secondary electrons released per primary electron δ(Φ,EF)PEm as a function of parameter Km, work function Φ and Fermi energy EF was deduced, where Km is a constant for a given metal in the energy range 100–800 eV. According to the relationship between maximum secondary electron yield from metal δ(Φ,EF)m and δ(Φ,EF)PEm, the formula for δ(Φ,EF)m as a function of atomic numbe

APA, Harvard, Vancouver, ISO, and other styles

3

XIE, A. G., Z. H. LIU, Y. Q. XIA, and M. M. ZHU. "MAXIMUM SECONDARY ELECTRON YIELDS FROM SEMICONDUCTORS AND INSULATORS." Surface Review and Letters 24, no. 04 (2016): 1750045. http://dx.doi.org/10.1142/s0218625x17500457.

Full text

Abstract:

Based on the processes and characteristics of secondary electron emission and the formula for the yield due to primary electrons hitting on semiconductors and insulators, the universal formula for maximum yield [Formula: see text] due to primary electrons hitting on semiconductors and insulators was deduced, where [Formula: see text] is the maximum ratio of the number of secondary electrons produced by primary electrons to the number of primary electrons. On the basis of the formulae for primary range in different energy ranges of [Formula: see text], characteristics of secondary electron emis

APA, Harvard, Vancouver, ISO, and other styles

4

Russ, John C. "Monte Carlo Modelling of Secondary Electron Yield from Rough Surfaces." Proceedings, annual meeting, Electron Microscopy Society of America 48, no. 1 (1990): 422–23. http://dx.doi.org/10.1017/s0424820100180860.

Full text

Abstract:

Monte-Carlo programs are well recognized for their ability to model electron beam interactions with samples, and to incorporate boundary conditions such as compositional or surface variations which are difficult to handle analytically. This success has been especially powerful for modelling X-ray emission and the backscattering of high energy electrons. Secondary electron emission has proven to be somewhat more difficult, since the diffusion of the generated secondaries to the surface is strongly geometry dependent, and requires analytical calculations as well as material parameters. Modelling

APA, Harvard, Vancouver, ISO, and other styles

5

Xie Aigen, 谢爱根, 张健 Zhang Jian, 刘斌 Liu Bin, and 王铁邦 Wang Tiebang. "Formula for secondary electron yield from metals." High Power Laser and Particle Beams 24, no. 2 (2012): 481–85. http://dx.doi.org/10.3788/hplpb20122402.0481.

Full text

APA, Harvard, Vancouver, ISO, and other styles

6

Costa Pinto, P., S. Calatroni, H. Neupert, et al. "Carbon coatings with low secondary electron yield." Vacuum 98 (December 2013): 29–36. http://dx.doi.org/10.1016/j.vacuum.2013.03.001.

Full text

APA, Harvard, Vancouver, ISO, and other styles

7

Thiel, B. L., D. J. Stokes, and D. Phifer. "Secondary Electron Yield Curve for Liquid Water." Microscopy and Microanalysis 5, S2 (1999): 282–83. http://dx.doi.org/10.1017/s1431927600014732.

Full text

Abstract:

We have measured the secondary electron yield curve for liquid water using an Environmental SEM. The secondary electron emission coefficient, measured as a function of incident electron energy, is important for interpreting contrast in hydrated biological and inorganic specimens. This information is even more critical for water than other materials, as it is a factor of prime importance in understanding radiation damage in biological tissues.[1]These measurements were taken using a Philips XL-30 field emission ,ESEM, and repeated on an Electroscan E3 ESEM, equipped with a CeB6 filament. A spec

APA, Harvard, Vancouver, ISO, and other styles

8

Alam, M. K., P. Yaghoobi, M. Chang, and A. Nojeh. "Secondary electron yield of multiwalled carbon nanotubes." Applied Physics Letters 97, no. 26 (2010): 261902. http://dx.doi.org/10.1063/1.3532851.

Full text

APA, Harvard, Vancouver, ISO, and other styles

9

Valizadeh, Reza, Oleg B. Malyshev, Sihui Wang, Svetlana A. Zolotovskaya, W. Allan Gillespie, and Amin Abdolvand. "Low secondary electron yield engineered surface for electron cloud mitigation." Applied Physics Letters 105, no. 23 (2014): 231605. http://dx.doi.org/10.1063/1.4902993.

Full text

APA, Harvard, Vancouver, ISO, and other styles

10

Susczynsky, D. M., and F. I. Klavetter. "Secondary-electron yield measurements of conducting polymers in the Scanning electron microscope." Proceedings, annual meeting, Electron Microscopy Society of America 49 (August 1991): 1066–67. http://dx.doi.org/10.1017/s0424820100089640.

Full text

Abstract:

In recent years, research on conducting polymers has been motivated to a large extent by the prospect of developing low-cost, light-weight conducting polymeric materials for commercial use. Conducting polymers have potential uses as electrodes and/or electrolytes for rechargeable batteries, as power conductors andpowercable sheathing and as material for space photovoltaics and spacecraft-charging applications.The utilization of conducting polymers for spacecraft construction and instrumentation requires an understanding of how such materials respond to the spacecraft environment. Of particular

APA, Harvard, Vancouver, ISO, and other styles

11

Xie, Ai-Gen, Hong-Yan Wu, and Jia Xu. "Parameters of the secondary electron yield from metal." Journal of the Korean Physical Society 62, no. 5 (2013): 725–30. http://dx.doi.org/10.3938/jkps.62.725.

Full text

APA, Harvard, Vancouver, ISO, and other styles

12

Altieri, S., M. Finazzi, H. H. Hsieh, et al. "Secondary electron yield enhancement by MgO capping layers." Surface Science 604, no. 2 (2010): 181–85. http://dx.doi.org/10.1016/j.susc.2009.11.004.

Full text

APA, Harvard, Vancouver, ISO, and other styles

13

Gonzalez, L. A., M. Angelucci, R. Larciprete, and R. Cimino. "The secondary electron yield of noble metal surfaces." AIP Advances 7, no. 11 (2017): 115203. http://dx.doi.org/10.1063/1.5000118.

Full text

APA, Harvard, Vancouver, ISO, and other styles

14

Lin, Yinghong, and David C. Joy. "A new examination of secondary electron yield data." Surface and Interface Analysis 37, no. 11 (2005): 895–900. http://dx.doi.org/10.1002/sia.2107.

Full text

APA, Harvard, Vancouver, ISO, and other styles

15

Seifert, H. L., D. J. Vieira, H. Wollnik, and J. M. Wouters. "Increased secondary electron yield from thin CsI coatings." Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment 292, no. 2 (1990): 533–34. http://dx.doi.org/10.1016/0168-9002(90)90411-x.

Full text

APA, Harvard, Vancouver, ISO, and other styles

16

Xie, Ai-Gen, Hong-Jie Dong, and Zheng Pan. "Electron-insulator interaction and secondary electron yield at any Kelvin temperature." Results in Physics 28 (September 2021): 104554. http://dx.doi.org/10.1016/j.rinp.2021.104554.

Full text

APA, Harvard, Vancouver, ISO, and other styles

17

Castaldo, Vincenzo, Josephus Withagen, Cornelius Hagen, Pieter Kruit, and Emile van Veldhoven. "Angular Dependence of the Ion-Induced Secondary Electron Emission for He+ and Ga+ Beams." Microscopy and Microanalysis 17, no. 4 (2011): 624–36. http://dx.doi.org/10.1017/s1431927611000225.

Full text

Abstract:

AbstractIn recent years, novel ion sources have been designed and developed that have enabled focused ion beam machines to go beyond their use as nano-fabrication tools. Secondary electrons are usually taken to form images, for their yield is high and strongly dependent on the surface characteristics, in terms of chemical composition and topography. In particular, the secondary electron yield varies characteristically with the angle formed by the beam and the direction normal to the sample surface in the point of impact. Knowledge of this dependence, for different ion/atom pairs, is thus the f

APA, Harvard, Vancouver, ISO, and other styles

18

Xie, Ai-Gen, Yi-Jun Yao, Jing Su, and Jian Zhang. "A universal formula for secondary electron yield from metals." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 268, no. 17-18 (2010): 2565–70. http://dx.doi.org/10.1016/j.nimb.2010.06.012.

Full text

APA, Harvard, Vancouver, ISO, and other styles

19

Gelfort, St, H. Kerkow, R. Stolle, V. P. Petukhov, and E. A. Romanovskii. "Secondary electron yield induced by slowly moving heavy ions." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 125, no. 1-4 (1997): 49–52. http://dx.doi.org/10.1016/s0168-583x(96)00909-3.

Full text

APA, Harvard, Vancouver, ISO, and other styles

20

Cazaux, J. "Secondary electron emission yield: graphite and some aromatic hydrocarbons." Journal of Physics D: Applied Physics 38, no. 14 (2005): 2442–45. http://dx.doi.org/10.1088/0022-3727/38/14/021.

Full text

APA, Harvard, Vancouver, ISO, and other styles

21

Frank, Luděk. "Noise in secondary electron emission: the low yield case." Microscopy 54, no. 4 (2005): 361–65. http://dx.doi.org/10.1093/jmicro/dfi044.

Full text

APA, Harvard, Vancouver, ISO, and other styles

22

Hiro, Sanju, Haruhisa Fujii, and Alexandre Palov. "Theoretical Investigation of Total Secondary Electron Yield for Teflon." Japanese Journal of Applied Physics 37, Part 1, No. 7A (1998): 4162–63. http://dx.doi.org/10.1143/jjap.37.4162.

Full text

APA, Harvard, Vancouver, ISO, and other styles

23

Inoue, M., T. Miyagawa, T. Iyasu, et al. "Measurement of Secondary Electron Yield by Charge Amplification Method." Journal of Surface Analysis 18, no. 2 (2011): 110–13. http://dx.doi.org/10.1384/jsa.18.110.

Full text

APA, Harvard, Vancouver, ISO, and other styles

24

Chen, Juequan, Eric Louis, Jan Verhoeven, et al. "Secondary electron yield measurements of carbon covered multilayer optics." Applied Surface Science 257, no. 2 (2010): 354–61. http://dx.doi.org/10.1016/j.apsusc.2010.06.075.

Full text

APA, Harvard, Vancouver, ISO, and other styles

25

Hilleret, N., C. Scheuerlein, and M. Taborelli. "The secondary-electron yield of air-exposed metal surfaces." Applied Physics A: Materials Science & Processing 76, no. 7 (2003): 1085–91. http://dx.doi.org/10.1007/s00339-002-1667-2.

Full text

APA, Harvard, Vancouver, ISO, and other styles

26

HIROKI, Seiji, Yoshitaka IKEDA, Tetsuya ABE, and Yoshio MURAKAMI. "Measurement of secondary electron yield of wall materials using Auger Electron Spectrometer." SHINKU 30, no. 1 (1987): 14–21. http://dx.doi.org/10.3131/jvsj.30.14.

Full text

APA, Harvard, Vancouver, ISO, and other styles

27

Weng Ming, Hu Tian-Cun, Cao Meng, and Xu Wei-Jun. "Effects of electron incident angle on the secondary electron yield for polyimide." Acta Physica Sinica 64, no. 15 (2015): 157901. http://dx.doi.org/10.7498/aps.64.157901.

Full text

APA, Harvard, Vancouver, ISO, and other styles

28

Ghorbel, N., A. Kallel, and G. Damamme. "Analytical model of secondary electron emission yield in electron beam irradiated insulators." Micron 112 (September 2018): 35–41. http://dx.doi.org/10.1016/j.micron.2018.06.002.

Full text

APA, Harvard, Vancouver, ISO, and other styles

29

Le Pimpec, F., R. E. Kirby, F. K. King, and M. Pivi. "Electron conditioning of technical aluminium surfaces: Effect on the secondary electron yield." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 23, no. 6 (2005): 1610–18. http://dx.doi.org/10.1116/1.2049306.

Full text

APA, Harvard, Vancouver, ISO, and other styles

30

GAO, XINGYU, DONGCHEN QI, SHI CHEN, et al. "Fe-INDUCED CHANGE OF ELECTRON AFFINITY AND SECONDARY ELECTRON YIELD ON DIAMOND." Advances in Synchrotron Radiation 01, no. 01 (2008): 59–65. http://dx.doi.org/10.1142/s1793617908000045.

Full text

APA, Harvard, Vancouver, ISO, and other styles

31

BEN-ZVI, I., T. RAO, A. BURRILL, et al. "DIAMOND SECONDARY EMITTER." International Journal of Modern Physics A 22, no. 22 (2007): 3759–75. http://dx.doi.org/10.1142/s0217751x07037408.

Full text

Abstract:

We present the design and experimental progress on the diamond secondary emitter as an electron source for high average power injectors. The design criteria for average currents up to 1 A and charge up to 20 nC are established. Secondary Electron yield (SEY) exceeding 200 in transmission mode and 50 in emission mode have been measured. Preliminary results on the design and fabrication of the self contained capsule with primary electron source and secondary electron emitter will also be presented.

APA, Harvard, Vancouver, ISO, and other styles

32

XIE, AI-GEN, QING-FANG LI, YUN-YUN CHEN, and HONG-YAN WU. "THE FORMULAE FOR PARAMETERS OF THE SECONDARY ELECTRON YIELD OF INSULATORS FROM 10 keV TO 30 keV." Modern Physics Letters B 27, no. 32 (2013): 1350238. http://dx.doi.org/10.1142/s0217984913502382.

Full text

Abstract:

Based on the formula for the average energy required to produce an internal secondary electron (ε) in emitter, the energy band of insulator and the assumption that the maximum exit energy of secondary electron in insulator is reverse to the width of forbidden band, the formula for ε in insulator is deduced. On the basis of the formula for the number of internal secondary electrons produced in the direction of the velocity of primary electrons per unit path length, the energy band of insulator and the characteristic of secondary electron emission, the formula for the probability of secondary el

APA, Harvard, Vancouver, ISO, and other styles

33

JEON, D., S. W. LEE, and Y. J. BAIK. "HIGH DENSITY DIAMOND WHISKER FABRICATION AND SUPPRESSION OF SECONDARY ELECTRON EMISSION BY WHISKERS." International Journal of Nanoscience 01, no. 05n06 (2002): 431–36. http://dx.doi.org/10.1142/s0219581x02000450.

Full text

Abstract:

Diamond whiskers were formed by etching diamond thin films using metal clusters as a shadow mask, which were deposited on the diamond film before or during etching. The whiskers were as thin as 100 nm and the density was as high as 1010/ cm 2. The secondary electron emission yield of the diamond whiskers was significantly reduced as compared to the initial diamond film. The decrease in the yield was more significant if the primary electrons were impinged in parallel direction with the whiskers. We suggest that absorption of the secondary electrons in the narrow gap between the whiskers was the

APA, Harvard, Vancouver, ISO, and other styles

34

Wang, Jie, Yong Gao, Zhiming You, et al. "Laser Processed Oxygen-Free High-Conductivity Copper with Ti and Ti–Zr–V–Hf Films Applied in Neutron Tube." Applied Sciences 9, no. 22 (2019): 4940. http://dx.doi.org/10.3390/app9224940.

Full text

Abstract:

The laser processing method has proven to produce surfaces while ensuring a low secondary electron yield of oxygen-free high-conductivity copper (OFHC) samples, making it attractive for electron cloud mitigation in next-generation particle accelerators and neutron tubes. In this work, the laser processing method is proposed to OFHC targets for the first time, aiming to reduce the secondary electrons in the neutron tube. The secondary electron yields (SEYs) and the thermal conductivities of Ti film and quaternary Ti–Zr–V–Hf films with unprocessed and laser processed OFHC substrates are investig

APA, Harvard, Vancouver, ISO, and other styles

35

Radmilovic-Radjenovic, Marija, Petar Belicev, and Branislav Radjenovic. "Study of multipactor effect with applications to superconductive radiofrequency cavities." Nuclear Technology and Radiation Protection 32, no. 2 (2017): 115–19. http://dx.doi.org/10.2298/ntrp1702115r.

Full text

Abstract:

In this paper a one-dimensional Particle-in-Cell/Monte Carlo collision code has been used in order to study characteristics of multipactors. For multipactor to occur each electron striking the surface must generate more than one secondary on average. The ratio of primary to secondary electrons is given by the secondary emission yield. For this study, calculations were carried out by using Sternglass model that includes energy dependence of the secondary emission yield. The obtained simulation results for the pressure dependence of the breakdown time follow the scaling law. Number of electrons

APA, Harvard, Vancouver, ISO, and other styles

36

Balcon, N., D. Payan, M. Belhaj, T. Tondu, and V. Inguimbert. "Secondary Electron Emission on Space Materials: Evaluation of the Total Secondary Electron Yield From Surface Potential Measurements." IEEE Transactions on Plasma Science 40, no. 2 (2012): 282–90. http://dx.doi.org/10.1109/tps.2011.2172636.

Full text

APA, Harvard, Vancouver, ISO, and other styles

37

Howe, Jane, David Hoyle, Kota Ueda, et al. "Secondary Electron Yield at High Voltages up to 300 keV." Microscopy and Microanalysis 21, S3 (2015): 1705–6. http://dx.doi.org/10.1017/s1431927615009307.

Full text

APA, Harvard, Vancouver, ISO, and other styles

38

Ludwick, Jonathan, Asif Iqbal, Daniel Gortat, et al. "Angular dependence of secondary electron yield from microporous gold surfaces." Journal of Vacuum Science & Technology B 38, no. 5 (2020): 054001. http://dx.doi.org/10.1116/6.0000346.

Full text

APA, Harvard, Vancouver, ISO, and other styles

39

Nagatomi, T., K. Goto, and R. Shimizu. "Working group report of database construction of secondary electron yield." Surface and Interface Analysis 42, no. 10-11 (2010): 1541–43. http://dx.doi.org/10.1002/sia.3569.

Full text

APA, Harvard, Vancouver, ISO, and other styles

40

Braga, D., B. Poumellec, V. Cannas, G. Blaise, Y. Ren, and M. Kristensen. "Secondary electron emission yield on poled silica based thick films." Journal of Applied Physics 96, no. 1 (2004): 885–94. http://dx.doi.org/10.1063/1.1758315.

Full text

APA, Harvard, Vancouver, ISO, and other styles

41

Ding, Z. J., H. M. Li, X. D. Tang, and R. Shimizu. "Monte Carlo simulation of absolute secondary electron yield of Cu." Applied Physics A: Materials Science & Processing 78, no. 4 (2004): 585–87. http://dx.doi.org/10.1007/s00339-002-1994-3.

Full text

APA, Harvard, Vancouver, ISO, and other styles

42

XIE, AI-GEN, CHUAN-QI LI, TIE-BANG WANG, and YUAN-JI PEI. "THE FORMULAS FOR THE SECONDARY ELECTRON YIELD AT HIGH INCIDENT ELECTRON ENERGY FROM GOLD AND ALUMINUM." Modern Physics Letters B 23, no. 19 (2009): 2331–38. http://dx.doi.org/10.1142/s0217984909020503.

Full text

Abstract:

Based on the main physical processes of secondary electron emission from metals, the relation that the product of the number of secondary electron released per primary electron at high incident electron energy and the (n-1)th power of incident energy of primary electron is equal to constant C was deduced, where n is the energy exponent, based on the relation between the number of secondary electron released per primary electron at high incident electron energy and secondary electron yield. The relation that the product of the secondary electron yield at high incident electron energy and the (n

APA, Harvard, Vancouver, ISO, and other styles

43

Malta, D. P., J. B. Posthill, T. P. Humphreys, and R. J. Markunas. "Interpretation of secondary electron contrast from negative electron affinity diamond surfaces." Proceedings, annual meeting, Electron Microscopy Society of America 53 (August 13, 1995): 120–21. http://dx.doi.org/10.1017/s0424820100136970.

Full text

Abstract:

Diamond is a wide band-gap semiconductor with many unique physical properties that make it an attractive technological material. One such property is the negative electron affinity (NEA) behavior of the surface when properly terminated with hydrogen or a thin metal layer. The NEA diamond surface exhibits an unusually large secondary electron (SE) yield which is desirable for applications in cold cathode electron emitters of flat panel displays. Examination of NEA diamond surfaces by scanning electron microscopy (SEM) has indicated that a unique mechanism appears to be responsible for the SE co

APA, Harvard, Vancouver, ISO, and other styles

44

ROY, SUBRATA, and B. P. PANDEY. "Plasma–wall interaction inside a Hall thruster." Journal of Plasma Physics 68, no. 4 (2002): 305–19. http://dx.doi.org/10.1017/s0022377802002027.

Full text

Abstract:

The dynamics of a Hall thruster is investigated numerically in the presence of a plasma–wall interaction. The plasma–wall interaction is a function of the wall potential, which in turn is determined by the secondary electron emission and sputtering yield. In the present work, the effect of secondary electron emission and sputter yield have been considered simultaneously. Owing to disparate temporal scales, ions and neutrals have been described by a set of time-dependent equations while electrons are considered in a steady state. Based on the experimental observations, a third-order polynomial

APA, Harvard, Vancouver, ISO, and other styles

45

Ebel, Horst, Robert Svagera, Maria F. Ebel, and Norbert Zagler. "Total Electron Yield (TEY) A New Approach for Quantitative X-ray Analysis." Advances in X-ray Analysis 38 (1994): 325–35. http://dx.doi.org/10.1154/s0376030800017961.

Full text

Abstract:

An irradiation of solid samples with x-rays causes an electron emission from the sample surface, owing to photoabsorption. These electrons can be detected under vacuum conditions and are photo, Auger and secondary electrons. Due to inelastic collisions most of these electrons have lost some of their original kinetic energy along the path from the atom of origin to the surface. With nondispersive electron detection the total electron yield (TEY) is observed. For measurements performed with a tunable x-ray monochromator information on the qualitative composition can be obtained by the following

APA, Harvard, Vancouver, ISO, and other styles

46

Fijol, J. J., A. M. Then, G. W. Tasker, and R. J. Soave. "Secondary electron yield of SiO2 and Si3N4 thin films for continuous dynode electron multipliers." Applied Surface Science 48-49 (January 1991): 464–71. http://dx.doi.org/10.1016/0169-4332(91)90376-u.

Full text

APA, Harvard, Vancouver, ISO, and other styles

47

Yong, Y. C., J. T. L. Thong, and J. C. H. Phang. "Determination of secondary electron yield from insulators due to a low-kV electron beam." Journal of Applied Physics 84, no. 8 (1998): 4543–48. http://dx.doi.org/10.1063/1.368700.

Full text

APA, Harvard, Vancouver, ISO, and other styles

48

Cazaux, J. "About the secondary electron yield and the sign of charging of electron irradiated insulators." European Physical Journal Applied Physics 15, no. 3 (2001): 167–72. http://dx.doi.org/10.1051/epjap:2001178.

Full text

APA, Harvard, Vancouver, ISO, and other styles

49

Zhang, Feng, Henry I. Smith, and Jianfeng Dai. "Fabrication of high-secondary-electron-yield grids for spatial-phase-locked electron-beam lithography." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 23, no. 6 (2005): 3061. http://dx.doi.org/10.1116/1.2110341.

Full text

APA, Harvard, Vancouver, ISO, and other styles

50

XIE, AI-GEN, YANG YU, YA-YI CHEN, YU-QING XIA, and HAO-YU LIU. "THEORETICAL RESEARCH OF SECONDARY ELECTRON EMISSION FROM NEGATIVE ELECTRON AFFINITY SEMICONDUCTORS." Surface Review and Letters 26, no. 04 (2019): 1850181. http://dx.doi.org/10.1142/s0218625x18501810.

Full text

Abstract:

Based on primary range [Formula: see text], relationships among parameters of secondary electron yield [Formula: see text] and the processes and characteristics of secondary electron emission (SEE) from negative electron affinity (NEA) semiconductors, the universal formulas for [Formula: see text] at [Formula: see text] and at [Formula: see text] for NEA semiconductors were deduced, respectively; where [Formula: see text] is incident energy of primary electron. According to the characteristics of SEE from NEA semiconductors with [Formula: see text], [Formula: see text], deduced universal formu

APA, Harvard, Vancouver, ISO, and other styles

We offer discounts on all premium plans for authors whose works are included in thematic literature selections. Contact us to get a unique promo code!