Books on the topic 'Semiconductor metrology'

Diebold, A. C. Handbook of silicon semiconductor metrology. New York: Marcel Dekker, 2001.

Gupta, DC, ed. Semiconductor Fabrication: Technology and Metrology. 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959: ASTM International, 1989. http://dx.doi.org/10.1520/stp990-eb.

K, Tanner B., ed. X-ray metrology in semiconductor manufacturing. Boca Raton, FL: Taylor & Francis, 2006.

Bowen, D. Keith. X-ray metrology in semiconductor manufacturing. Boca Raton, FL: Taylor & Francis/CRC Press, 2006.

institut, Moskovskiĭ ėnergeticheskiĭ. Shumovye i degradat︠s︡ionnye prot︠s︡essy v poluprovodnikovykh priborakh: Metrologii︠a︡, diagnostika, tekhnologii︠a︡, uchebnyĭ prot︠s︡ess : materialy dokladov Mezhdunarodnogo nauchno-metodicheskogo seminara, Moskva, 1-5 dekabri︠a︡ 2003 g. = Noise and degradation processes in semiconductor devices : metrology, diagnostic, technology, cirriculum [i.e., curriculum]. Moskva: Moskovskiĭ ėnerg. in-t (tekhn. universitet), 2004.

International Workshop on Statistical Metrology (4th 1999 Kyoto, Japan). 1999 4th International Workshop on Statistical Metrology. Piscataway, NJ, USA: Purchased from: IEEE Service Center Single Publication Sales Unit, 1999.

International Workshop on Statistical Metrology (2nd 1997 Kyoto, Japan). 1997 2nd International Workshop on Statistical Metrology, June 8, 1997, Kyoto. [New York]: Institute of Electrical and Electronics Engineers, 1997.

International, Workshop on Statistical Metrology (2nd 1997 Kyoto Japan). 1997 2nd International Workshop on Statistical Metrology: IWSM, June 8, 1997, Kyoto. Piscataway, NJ: IEEE, 1997.

International Workshop on Statistical Metrology (5th 2000 Honolulu, Hawaii). 2000 5th International Workshop on Statistical Metrology: IWSM : June 11, 2000/Hawaii. Piscataway, N.J: IEEE, 2000.

Europe, SPIE, European Optical Society, Wissenschaftliche Gesellschaft Lasertechnik, and SPIE (Society), eds. Modeling aspects in optical metrology II: 15-16 June 2009, Munich, Germany. Bellingham, Wash: SPIE, 2009.

Society, IEEE Electron Devices, ed. IWSM: 1999 4th International Workshop on Statistical Metrology : June 12, 1999, Kyoto. Piscataway, N.J: IEEE, 1999.

International Workshop on Statistical Metrology (3rd 1998 Honolulu, Hawaii). IWSM: 1998 3rd International Workshop on Statistical Metrology : June 7, 1998, Honolulu. Piscataway, New Jersey: IEEE, 1998.

Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors (Conference) (7th 2013 San Diego, Calif.). Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VII: 28 August, San Diego, California, United States. Edited by Postek Michael T. editor, Orji Ndubuisi George editor, and SPIE (Society). Bellingham, Washington, USA: SPIE, 2013.

Postek, Michael T., and Victoria Anne Coleman. Instrumentation, metrology, and standards for nanomanufacturing, optics, and semiconductors V: 24-25 August 2011, San Diego, California, United States. Bellingham, Wash: SPIE, 2011.

Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors (Conference) (6th 2012 San Diego, Calif.). Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI: 13-14 August 2012, San Diego, California, United States. Edited by Postek Michael T. editor, Coleman, Victoria Anne, 1981- editor, Orji Ndubuisi George editor, and SPIE (Society). Bellingham, Washington, USA: SPIE, 2012.

Handbook of Silicon Semiconductor Metrology. New York: Marcel Dekker, Inc., 2003.

C, Diebold A., ed. Handbook of silicon semiconductor metrology. New York: Marcel Dekker, 2001.

Diebold, Alain C. Handbook of Silicon Semiconductor Metrology. CRC, 2001.

C, Gupta D., ASTM Committee F-1 on Electronics., Semiconductor Equipment and Materials Institute., and Symposium on Semiconductor Processing (5th : 1988 : Santa Clara, Calif.), eds. Semiconductor fabrication: Technology and metrology. Philadelphia, PA: ASTM, 1989.

Diebold, Alain C., ed. Handbook of Silicon Semiconductor Metrology. CRC Press, 2001. http://dx.doi.org/10.1201/9780203904541.

K.S. Wong, Terence, ed. Semiconductor Strain Metrology: Principles and Applications. BENTHAM SCIENCE PUBLISHERS, 2012. http://dx.doi.org/10.2174/97816080535991120101.

Scace, Robert. Metrology for the Semiconductor Industry (Pb 91240739). Natl Bureau of Standards, 1991.

Pinillos, Joaquin V. Martinez de., Knight Stephen, Settle-Raskin Alice, and National Institute of Standards and Technology (U.S.), eds. Silicon microelectronics programs at the National Institute of Standards and Technology: Programs, activities, and accomplishments. [Gaithersburg, MD.]: U.S. Dept. of Commerce, National Institute of Standards and Technology, Technology Administration, 2000.

National Institute of Standards and Technology (U.S.), ed. National Semiconductor Metrology Program, Semiconductor Electronics Division, NIST List Of Publications, LP 103, March 1999. [S.l: s.n., 1999.

Gupta, Dinesh C. Semiconductor Fabrication: Technology and Metrology (Astm Special Technical Publication// Stp). Astm Intl, 1989.

National Institute of Standards and Technology (U.S.), ed. National Semiconductor Metrology Program, NIST List OF Publications, LP 103, May 2000. [S.l: s.n., 2000.

National Institute of Standards and Technology (U.S.), ed. THE NATIONAL SEMICONDUCTOR METROLOGY PROGRAM... PROJECT PORTFOLIO FY 1999... NISTIR 5851... U.S. DEPARTMENT OF COMMERCE. [S.l: s.n., 1999.

Angela, Duparré, Singh Bhanwar, Society of Photo-optical Instrumentation Engineers., and Boeing Company, eds. Advanced characterization techniques for optical, semiconductor, and data storage components: 9-11 July 2002, Seattle, Washington, USA. Bellingham, Washington: SPIE, 2002.

A, Al-Jumaily Ghanim, Duparré Angela, Singh Bhanwar, and Society of Photo-optical Instrumentation Engineers., eds. Optical metrology roadmap for the semiconductor, optical, and data storage industries: 30-31 July 2000, San Diego, USA. Bellingham, Wash., USA: SPIE, 2000.

National Institute of Standards and Technology (U.S.), ed. The National Semiconductor Metrology Program... Project Portfolio FY 1998... NISTIR 5851... U.S. Department Of Commerce... Revised March 1998. [S.l: s.n., 1998.

Angela, Duparré, Singh Bhanwar, and Society of Photo-optical Instrumentation Engineers., eds. Optical metrology roadmap for the semiconductor, optical, and data storage industries II: 2-3 August, 2001, San Diego, USA. Bellingham, Wash., USA: SPIE, 2001.

Bodermann, Bernd. Modeling Aspects in Optical Metrology III. SPIE, 2011.

International Workshop on Statistical Metrology (5th : 2000 : Hawaii). Statistical Metrology 2000 4th International Workshop. Institute of Electrical & Electronics Enginee, 2001.

Postek, Michael. Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VIII. SPIE, 2014.

Institute Of Electrical and Electronics Engineers and IEEE Electron Devices Society. Statistical Metrology, 1998 3rd Workshop. Institute of Electrical & Electronics Enginee, 1998.

M, Monahan Kevin, and Society of Photo-optical Instrumentation Engineers., eds. Handbook of critical dimension metrology and process control. Bellingham, Wash: SPIE Optical Engineering Press, 1994.

Harald, Bosse, Bodermann Bernd, Silver Richard M, Wissenschaftliche Gesellschaft Lasertechnik, SPIE Europe, European Optical Society, and Society of Photo-optical Instrumentation Engineers., eds. Modeling aspects in optical metrology: 18-19 June 2007, Munich, Germany. Bellingham, Wash: SPIE, 2007.

Institute Of Electrical and Electronics Engineers and IEEE Electron Devices Society. Iwsm 1999 International Workshop on Statistical Metrology: June 12, 1999/Kyoto. Institute of Electrical & Electronics Enginee, 1999.

IWSM: 1998 3rd International Workshop on Statistical Metrology : June 7, 1998, Honolulu. Widerkehr and Associates, 1998.