Books on the topic 'Semiconductors : Etching : Plasma etching'
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Sugawara, M. Plasma etching: Fundamentals and applications. Oxford University Press, 1998.
Find full textNATO Advanced Study Institute on Plasma Processing of Semiconductors (1996 Bonas, France). Plasma processing of semiconductors. Kluwer Academic Publishers, 1997.
Find full textSymposium on Plasma Processing (13th 2000 Toronto, Ont.). Plasma processing XIII: Proceedings of the International Symposium. Edited by Mathad G. S, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division, and Electrochemical Society Meeting. Electrochemical Society., 2000.
Find full textSymposium, on Plasma Processing (5th 1984 New Orleans La ). Proceedings of the Fifth Symposium on Plasma Processing. Dielectrics and Insulation and Electronics Divisions, Electrochemical Society, 1985.
Find full textInternational Symposium on Plasma Processing (14th 2002 Philadelphia, Pa.). Plasma processing XIV: Proceedings of the International Symposium. Edited by Mathad G. S, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division, and Electrochemical Society Meeting. Electrochemical Society, 2002.
Find full textSymposium on Highly Selective Dry Etching and Damage Control (1993 Honolulu, Hawaii). Proceedings of the Symposium on Highly Selective Dry Etching and Damage Control. Electrochemical Society, 1993.
Find full textInternational Symposium on Plasma Process-Induced Damage (3rd 1998 Honolulu, Hawaii). 1998 3rd International Symposium on Plasma Process-Induced Damage: June 4-5, 1998, Honolulu, Hawaii, USA. Edited by Nakamura Moritaka, Dao, Leanne Thuy Lien, 1953-, Hook Terence, IEEE Electron Devices Society, American Vacuum Society, and Ōyō Butsuri Gakkai. Northern California Chapter of the American Vacuum Society, 1998.
Find full textS, Grabowski Kenneth, ed. Materials modification by energetic atoms and ions: Symposium held April 28-30, 1992, San Francisco, California, USA. Materials Research Society, 1992.
Find full textInternational Symposium on Plasma Process-Induced Damage (2nd 1997 Monterey, Calif.). 1997 2nd International Symposium on Plasma Process-Induced Damage: 13-14 May 1997, Monterey, California, USA. Edited by Cheung Kin P, Nakamura Moritaka, Gabriel Calvin T, IEEE Electron Devices Society, American Vacuum Society, and Ōyō Butsuri Gakkai. Northern California Chapter of the American Vacuum Society, 1997.
Find full textSymposium on Dry Process (9th 1987 Honolulu, Hawaii). Proceedings of the Symposium on Dry Process. Electrochemical Society, 1988.
Find full textHull, David R. Plasma etching a ceramic composite. National Aeronautics and Space Administration, 1992.
Find full textNojiri, Kazuo. Dry Etching Technology for Semiconductors. Springer International Publishing, 2015. http://dx.doi.org/10.1007/978-3-319-10295-5.
Full textRangelow, Ivo W. Deep etching of silocon. Oficyna Wydawnicza Politekchniki Wrocławskiej, 1996.
Find full textChen, Hsin-Yi. Inductively coupled plasma etching of InP. National Library of Canada, 2000.
Find full textPerevoshchikov, V. A. Osobennosti abrazivnoĭ i khimicheskoĭ obrabotki poverkhnosti poluprovodnikov: Monografii͡a︡. Izd-vo Nizhegorodskogo universiteta, 1992.
Find full textRizvi, Syed Shabbar Abbas. Inductively coupled Ar/Cl2 plasma etching of GaN. The Author], 2003.
Find full textSamukawa, Seiji. Feature profile evolution in plasma processing using on-wafer monitoring system. Springer, 2014.
Find full textParkhutik, V. P. Plazmennoe anodirovanie: Fizika, tekhnika, primenenie v mikroėlektronike. "Navuka i tėkhnika", 1990.
Find full textNotten, P. H. L. Etching of III-V semiconductors: An electrochemical approach. Elsevier Advanced Technology, 1991.
Find full textHaigh, J. Photo-initiated deposition and etching of materials relevant to semiconductor devices. Pergamon Press, 1987.
Find full textZhang, Ying, Qinghuang Lin, and G. S. Oehrlein. Advanced etch technology for nanopatterning: 13-14 February 2012, San Jose, California, United States. Edited by SPIE (Society). SPIE, 2012.
Find full textSociety of Photo-optical Instrumentation Engineers, ed. Chemistry and lithography. SPIE Press, 2010.
Find full textAmorphous silicon carbide thin films: Deposition, characterization, etching, and piezoresistive sensors applications. Nova Science Publishers, 2011.
Find full textOkpalugo, Osmund A. Characteristics of argon-chlorine inductively coupled plasmas for plasma surface modification and etching. The author], 2003.
Find full textCui, Naiyi. The evolution of sub-micron surface topography during the plasma etching of selected materials. The Author], 1998.
Find full textGerhard, Franz. Kalte Plasmen: Grundlagen, Erscheinungen, Anwendungen. Springer-Verlag, 1990.
Find full textGerhard, Franz. Oberflächentechnologie mit Niederdruckplasmen: Beschichten und Strukturieren in der Mikrotechnik. 2nd ed. Springer-Verlag, 1994.
Find full textJ, Lichtenberg Allan, ed. Principles of plasma discharges and materials processing. 2nd ed. Wiley-Interscience, 2005.
Find full textLieberman, M. A. Principles of plasma discharges and materials processing. 2nd ed. Wiley-Interscience, 2004.
Find full textJ, Lichtenberg Allan, ed. Principles of plasma discharges and materials processing. Wiley, 1994.
Find full textMicromachining using electrochemical discharge phenomenon: Fundamentals and application of spark assisted chemical engraving. W. Andrew, 2009.
Find full text1945-, Auciello Orlando, ed. Plasma-surface interactions and processing of materials: [proceedings of the NATO Advanced Study Institute on Plasma-Surface Interactions and Processing of Materials, Alicante, Spain, September 4-16, 1988]. Kluwer Academic Publishers, 1990.
Find full textSelected papers on resolution enhancement techniques in optical lithography. SPIE Press, 2004.
Find full textL, Brainard Robert, ed. Advanced processes for 193-nm immersion lithography. SPIE, 2009.
Find full textInternational Colloquium on Plasmas and Sputtering (6th 1987 Antibes, France). Comptes rendus des travaux du CIP G87. Société française du vide, 1987.
Find full textM, Stuke, Marinero Ernesto E, and Nishiyama Isao, eds. Materials surface processing: Proceedings of Symposium B on Laser, Lamp and Synchrotron Assisted Materials Surface Processing of the 1992 E-MRS Spring Conference, Strasbourg, France, June 2-5 1992. North-Holland, 1993.
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