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1

Eljali, Ahmed, Irwana Nainggolan, Shahrir Hashim, and Tulus Ikhsan Nasution. "Highly Response and Sensitive Copper Sensors Based on Chitosan Films." Advanced Materials Research 1125 (October 2015): 255–59. http://dx.doi.org/10.4028/www.scientific.net/amr.1125.255.

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Discharge of metal containing effluents into water has been a major concern. Traditional detecting methods were proven to be ineffective and expensive. This paper proposes the use of chitosan film as a highly response and sensitive film sensor towards Cu ion due to its positive charge and electrical characteristic. Chitosan film was deposited by using electrochemical deposition technique. Different deposition times were applied to study the effect of deposition time on sensing properties of chitosan films, in which the best performance time of 90 seconds was recorded. This study was carried ou
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2

Constantinoiu, Izabela, Dana Miu, and Cristian Viespe. "SAW Hydrogen Sensors with Pd/SnO2 Layers." Materials 15, no. 22 (2022): 8012. http://dx.doi.org/10.3390/ma15228012.

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Pd/SnO2 bilayers for surface acoustic wave (SAW) sensors were obtained using pulsed laser deposition (PLD). Bilayers were made at several deposition pressures in order to observe the influence of the morphology of the sensitive films on the response of the sensors. The morphological properties were analyzed by scanning electron microscopy (SEM). The SnO2 monolayers were initially deposited on quartz substrates at 100, 400 and 700 mTorr, to observe their morphology at these pressures. The Pd/SnO2 bilayer depositions were made at 100 and 700 mTorr. The sensors realized with these sensitive films
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3

Toma, Fatema Tuz Zohora, Md Sharifur Rahman, Kazi Md Amjad Hussain, and Syed Ahmed. "Thin Film Deposition Techniques: A Comprehensive Review." Journal of Modern Nanotechnology 4 (November 21, 2024): 6. http://dx.doi.org/10.53964/jmn.2024006.

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Objective: This article presents a comprehensive review of thin film preparation techniques, focusing on their theoretical foundations, practical applications, and recent advancements in the field of materials science. Methods: The review begins with thermal evaporation, a widely used method praised for its simplicity and effectiveness in producing high - purity films. This technique relies on the principle of thermal vaporization, where materials are heated to evaporate and subsequently condense on a substrate. Next, sputtering is discussed for its versatility in depositing various materials,
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4

Eljali, Ahmed, Irwana Nainggolan, Shahrir Hashim, Tulus Ikhsan Nasution, and Nur Zurihan Abd Wahab. "Fabrication of Chitosan-Polyethylene Oxide Polymeric Thin Film Using Electrochemical Deposition for Detection of Volatile Organic Compounds." Key Engineering Materials 744 (July 2017): 359–63. http://dx.doi.org/10.4028/www.scientific.net/kem.744.359.

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This study focused on the fabrication of chitosan-polyethylene oxide sensitive thin film. The polyethylene oxide was used as an additive to enhance the electrical properties of chitosan towards ethanol and methanol gases. The chitosan-polyethylene oxide sensitive film was fabricated using electrochemical deposition technique to deposit a thin film of the sensitive blend on the printed circuit board surface. The sensitive blend electrical (I-V) properties were tested using a specific developed test chamber. Ethanol and methanol volatile organic compound gases were chosen in this work to study t
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5

Yunus, Yusniza, Nurul Adlin Mahadzir, Mohamed Nainar Mohamed Ansari, et al. "Review of the Common Deposition Methods of Thin-Film Pentacene, Its Derivatives, and Their Performance." Polymers 14, no. 6 (2022): 1112. http://dx.doi.org/10.3390/polym14061112.

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Pentacene is a well-known conjugated organic molecule with high mobility and a sensitive photo response. It is widely used in electronic devices, such as in organic thin-film transistors (OTFTs), organic light-emitting diodes (OLEDs), photodetectors, and smart sensors. With the development of flexible and wearable electronics, the deposition of good-quality pentacene films in large-scale organic electronics at the industrial level has drawn more research attention. Several methods are used to deposit pentacene thin films. The thermal evaporation technique is the most frequently used method for
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6

Kuk, Seoung Woo, Seok Hwan Bang, In Hoe Kim, et al. "Chemical and Electrical Properties of ZnS Deposited with DEZ and H2S by Atomic Layer Deposition Method." Materials Science Forum 544-545 (May 2007): 689–92. http://dx.doi.org/10.4028/www.scientific.net/msf.544-545.689.

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ZnS thin films were grown by Atomic Layer Deposition (ALD) method with Diethyl- Zinc (DEZ) and hydrogen sulfide (H2S) for the application of a channel layer of OITFT (Organic-Inorganic Thin-Film Transistor). ZnS has many advantages such as high channel mobility, high deposition rate, transparency at room temperature due to the broad band gap (bandgap of ZnS : 3.7 eV), nontoxic characteristic, low resistivity, and less sensitive about oxidation than ZnO. The deposition rate of the ZnS films in our system was about 1.6 Å/cycle. ZnS film was characterized by AES, XRD, Hall-effect measurement.
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7

Liu, Huan, Shan Shan Wang, Chang Long Cai та Shun Zhou. "Uncooled Infrared Bolometer Arrays with α-Si and Metal Films". Materials Science Forum 663-665 (листопад 2010): 421–24. http://dx.doi.org/10.4028/www.scientific.net/msf.663-665.421.

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A bolometer with stress equilibrium based on α-Si and metal films is proposed in this paper. The sensitive and support material α-Si films are prepared by plasma enhanced chemical vapor deposition(PECVD), their stress and deposition rate are studied, and the technological parameter of the low stress and higher temperature coefficient of resistance (TCR) α-Si film are obtained. The result shows that the stress of the α-Si films can be adjusted between positive and negative. Pt films are deposited by electron-beam evaporating equipment. Their square resistance, TCR and stress are tested by four
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8

Ryu, Hyun Wook, Yong Joo Park, Hyo Sup Noh, and Jin Seong Park. "Characteristics of SnO2 Thin Films Deposited by RF Magnetron Sputtering." Materials Science Forum 449-452 (March 2004): 993–96. http://dx.doi.org/10.4028/www.scientific.net/msf.449-452.993.

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SnO2 thin films were prepared on SiO2/Si substrate by RF-Magentron Sputtering method, varying the deposition time and Ar-to-O2 flow ratio. The post-annealing was conducted at 500 oC and 700 oC in Ar and O2 atmosphere, respectively. Film characteristics were very sensitive to the gas flow ratio during the deposition and the conditions of post-annealing. The Film thickness decreased with decreasing of Ar flow ratio at a constant amount (50 sccm) of total gas flow. Especially, the film deposited under Ar-O2 mixture gas (Ar-to-O2 ratio of 50%) showed clearly aggregated morphology of small particle
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9

Messier, Russell. "Deposition Processes." MRS Bulletin 13, no. 12 (1988): 29–32. http://dx.doi.org/10.1557/s0883769400063661.

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My introduction in the November MRS BULLETIN to this two-part series on deposition processes discussed the extensive use of thin films in science and technology. That it takes two issues and nine articles to cover this topic — and by no means exhaustively — is testimony to the manifold ways thin films are prepared.If all deposition processes resulted in the same product, then such extensive coverage would be redundant and unnecessary. Thin films, however, cover a virtual infinity of free energy states — and related crystal structures, micro-structures, defects, defect densities, impurities, co
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10

Yoshida, Kentaro, Yu Kashimura, Toshio Kamijo, et al. "Decomposition of Glucose-Sensitive Layer-by-Layer Films Using Hemin, DNA, and Glucose Oxidase." Polymers 12, no. 2 (2020): 319. http://dx.doi.org/10.3390/polym12020319.

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Glucose-sensitive films were prepared through the layer-by-layer (LbL) deposition of hemin-modified poly(ethyleneimine) (H-PEI) solution and DNA solution (containing glucose oxidase (GOx)). H-PEI/DNA + GOx multilayer films were constructed using electrostatic interactions. The (H-PEI/DNA + GOx)5 film was then partially decomposed by hydrogen peroxide (H2O2). The mechanism for the decomposition of the LbL film was considered to involve more reactive oxygen species (ROS) that were formed by the reaction of hemin and H2O2, which then caused nonspecific DNA cleavage. In addition, GOx present in th
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11

Constantinoiu, Izabela, Dana Miu, and Cristian Viespe. "Surface Acoustic Wave Sensors for Ammonia Detection at Room Temperature Based on SnO2/Co3O4 Bilayers." Journal of Sensors 2019 (May 19, 2019): 1–6. http://dx.doi.org/10.1155/2019/8203810.

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The selectivity of a SAW (surface acoustic wave) sensor, with a Co3O4 sensitive thin film for NH3 (ammonia) and the influence of SnO2 on its sensitivity, was studied. Thin films were deposited by pulsed laser deposition (PLD) on quartz SAW sensor substrates. Two sensors with different types of sensitive films were developed: a Co3O4 thin film sensor (S1) and a SnO2/Co3O4 thin film sensor (S2). The sensitive films were deposited in conditions which ensured a porous structure. The sensors were tested in the presence of three gases: NH3, methanol, and toluene. The selectivity of Co3O4 for NH3 was
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12

Lima, Roberto R., Leonardo F. Hernandez, Edsion Pecoraro, Estevão Rosim-Fachini, and Maria L. P. da Silva. "Composite Material Sensitive to Volatile Organic Compounds." Materials Science Forum 730-732 (November 2012): 289–94. http://dx.doi.org/10.4028/www.scientific.net/msf.730-732.289.

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This work evaluates fluorinated thin films and their composites for sensor development. Composites were produced using 5 µm starch particles and plasma films obtained from organic fluorinated and silicon compounds reactants. Silicon wafers and aluminum trenches were used as substrates. Film thickness, refractive index and chemical structure were also determined. Scanning electron microscopy shows conformal deposition on aluminum trenches. Films deposited on silicon were exposed to vapor of volatile organic compounds and CV curves were obtained. A qualitative model (FemLab 3.2® program) was pro
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13

Fernandes, Jessica C., and Marcelo Mulato. "Synthesis and electrical characterization of ZnO and TiO2 thin films and their use as sensitive layer of pH field effect transistor sensors." MRS Proceedings 1675 (2014): 53–58. http://dx.doi.org/10.1557/opl.2014.831.

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ABSTRACTOxide thin films of zinc and titanium materials were deposited by different deposition techniques, to be applied as sensitive layers of pH sensor – EGFET device. The deposition techniques tested were dip-coat, spin-coat, electrodeposition and spray-pyrolysis. The routine and the parameters of each technique were changed aiming optimized the procedures. The pHs buffer solutions tested ranged from 2 to 12. ZnO thin film shows sensitivity about 23 mV/pH, while TiO2 thin films shows only 13.8 mV/pH. The final purpose of this study is to optimize the parameters for each deposition technique
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14

Hanft, Dominik, Murat Bektas, and Ralf Moos. "Powder Pre-Treatment for Aerosol Deposition of Tin Dioxide Coatings for Gas Sensors." Materials 11, no. 8 (2018): 1342. http://dx.doi.org/10.3390/ma11081342.

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The Aerosol Deposition (AD) method has the unique property to allow for manufacturing dense ceramic films at room temperature. As found in many publications, the deposition process is very sensitive to powder properties. In particular, powders of nano-sized particles and grains, e.g., from precipitation, are usually beyond the conventional size range of AD processability, yielding chalk-like films of low mechanical stability. Thus, the conventional AD process is limited in applicability. In this study, we try to overcome this problem by adapting the standard milling treatment of powders for im
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15

Li, Jin Hua, Meng Zhao, Jiang Bin Su, and Mei Ping Jiang. "Hydrogen Sensing Properties of WO3/Pd Composite Films." Advanced Materials Research 287-290 (July 2011): 2343–46. http://dx.doi.org/10.4028/www.scientific.net/amr.287-290.2343.

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WO3/Pd layered composite films were prepared by magnetron Sputtering on glass substrate. After deposition, samples were annealed with different condition. The hydrogen sensitive response of the composite film was measured by home-made measurement system. The results indicated that suitable annealing could increase the response sensitivity of the layered composite film to hydrogen detect, Exorbitant annealing temperature will damage Pd layer on the WO3 suface, then decrease the hydrogen detect sinsitivity badly.
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16

Floro, Jerrold A., Eric Chason, Robert C. Cammarata, and David J. Srolovitz. "Physical Origins of Intrinsic Stresses in Volmer–Weber Thin Films." MRS Bulletin 27, no. 1 (2002): 19–25. http://dx.doi.org/10.1557/mrs2002.15.

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AbstractAs-deposited thin films grown by vapor deposition often exhibit large intrinsic stresses that can lead to film failure. While this is an “old” materials problem, our understanding has only recently begun to evolve in a more sophisticated fashion. Sensitive real-time measurements of stress evolution during thin-film deposition reveal a generic compressive–tensile–compressive behavior that correlates with island nucleation and growth, island coalescence, and postcoalescence film growth. In this article, we review the fundamental mechanisms that can generate stresses during the growth of
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17

Kim, Young, Nina Baule, Maheshwar Shrestha, Bocong Zheng, Thomas Schuelke, and Qi Hua Fan. "Single-beam plasma source deposition of carbon thin films." Review of Scientific Instruments 93, no. 11 (2022): 113908. http://dx.doi.org/10.1063/5.0102605.

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A single-beam plasma source was developed and used to deposit hydrogenated amorphous carbon ( a-C:H) thin films at room temperature. The plasma source was excited by a combined radio frequency and direct current power, which resulted in tunable ion energy over a wide range. The plasma source could effectively dissociate the source hydrocarbon gas and simultaneously emit an ion beam to interact with the deposited film. Using this plasma source and a mixture of argon and C2H2 gas, a-C:H films were deposited at a rate of ∼26 nm/min. The resulting a-C:H film of 1.2 µm thick was still highly transp
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18

Watanabe, Junji, and Mitsugu Hanabusa. "Photochemical vapor deposition of silicon oxynitride films by deuterium lamp." Journal of Materials Research 4, no. 4 (1989): 882–85. http://dx.doi.org/10.1557/jmr.1989.0882.

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Silicon oxynitride films have been grown by a photochemical vapor deposition process utilizing VUV light of a deuterium lamp from a gas mixture of Si2H6, NH3, and NO2 at the substrate temperature of about 330 °C. The deposition rate of the film varied with NO2 flow rate and also with the excitation light spectrum which was varied by a low-pass filter of a synthetic or fused silica plate. The composition of the films was sensitive to the NO2 flow rate which was smaller than that of NH3 by a factor of 103.
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19

Constantinoiu, Izabela, and Cristian Viespe. "Development of Pd/TiO2 Porous Layers by Pulsed Laser Deposition for Surface Acoustic Wave H2 Gas Sensor." Nanomaterials 10, no. 4 (2020): 760. http://dx.doi.org/10.3390/nano10040760.

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The influence of sensitive porous films obtained by pulsed laser deposition (PLD) on the response of surface acoustic wave (SAW) sensors on hydrogen at room temperature (RT) was studied. Monolayer films of TiO2 and bilayer films of Pd/TiO2 were deposited on the quartz substrates of SAW sensors. By varying the oxygen and argon pressure in the PLD deposition chamber, different morphologies of the sensitive films were obtained, which were analyzed based on scanning electron microscopy (SEM) images. SAW sensors were realized with different porosity degrees, and these were tested at different hydro
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20

Chi, Ning, Hou Qingrun, J. Gao, K. Y. Chan, and D. L. Phillips. "Surface Morphologies of Pulsed Laser Deposited Ultra-Thin Diamond-like Carbon Films." Modern Physics Letters B 11, no. 11 (1997): 471–76. http://dx.doi.org/10.1142/s0217984997000578.

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The surface morphologies of pulsed laser deposited ultra-thin diamond-like carbon films were studied by optical microscopy and atomic force microscopy. Off-axis deposited films had a larger size of particulates than on-axis deposited films. The root-mean-squared surface roughness was sensitive to deposition temperature. As a protective coating, the film was deposited on porous silicon. The surface morphology of the porous silicon changed considerably after carbon coating.
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21

RAKOV, NIKIFOR, ARSHAD MAHMOOD, and MUFEI XIAO. "DEPOSITION-AND-SUBSTRATE TUNABLE PHOTONIC BANDGAP IN OPTICAL RESPONSES OF HYDROGENATED AMORPHOUS SILICON CARBIDE THIN FILMS." Modern Physics Letters B 17, no. 09 (2003): 387–92. http://dx.doi.org/10.1142/s0217984903005305.

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Amorphous hydrogenated silicon carbide (a-SiC:H) thin films have been prepared by the RF reactive magnetron sputtering technique. The optical properties of the films have been studied by optical spectroscopy with an incoherent light source. The material is commonly regarded as a dielectric. We have discovered however that some films that were prepared under certain deposition conditions and on certain substrates may respond to external light as a metallic thin film, i.e. there are strongly enhanced reflection peaks in the optical spectrum. We have further discovered that some films may have a
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22

Sorokin, Boris, Nikita Asafiev, Dmitry Yashin, Nikolay Luparev, Anton Golovanov, and Konstantin Kravchuk. "Microwave Diamond-Based HBAR as a Highly Sensitive Sensor for Multiple Applications: Acoustic Attenuation in the Mo Film." Sensors 23, no. 9 (2023): 4502. http://dx.doi.org/10.3390/s23094502.

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The application of microwave diamond-based HBAR as a sensor of microwave acoustic attenuation α was considered, using the Mo film as an object of research. A multilayered piezoelectric structure, as the Al/Al0.73Sc0.27N/Mo/(100) diamond/Mo, was produced using aluminum–scandium nitride composition, and was studied in detail for a number of the Mo films with different thicknesses obtained by magnetron deposition. The operational frequency band of 3.3 … 18 GHz was used. It was found that the dependence of the resonant frequency shift vs. the h(Mo) thickness for all the overtones to be investigate
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23

Kim, Du-Yun, Ji-Hye Kwon, Gil-Su Jang, and Nong-Moon Hwang. "Effect of Pressure on the Film Deposition during RF Magnetron Sputtering Considering Charged Nanoparticles." Coatings 11, no. 2 (2021): 132. http://dx.doi.org/10.3390/coatings11020132.

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Non-classical crystallization, in which charged nanoparticles (NPs) are the building blocks of film growth, has been extensively studied in chemical vapor deposition (CVD). Recently, a similar mechanism of film growth has been reported during radio frequency (RF) sputtering with a Ti target and DC magnetron sputtering using an Ag target. In this study, the effect of pressure on the generation of Ti NPs and on the film deposition was studied during RF sputtering with a Ti target. Ti NPs were captured on transmission electron microscopy (TEM) membranes with the electric biases of −30, 0, and +50
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24

Guermat, N., A. Bellel, Salah Sahli, Y. Segui, and Patrice Raynaud. "Water Molecule Sensitive Layers Deposited from Hexamethyldisiloxane/Oxygen Mixture at Low Temperature." Materials Science Forum 609 (January 2009): 69–73. http://dx.doi.org/10.4028/www.scientific.net/msf.609.69.

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Humidity sensors are widely used in industry production, process control, environment monitoring, medical and electrical applications. In this study, water molecule sensitive layers have been elaborated by plasma enhanced chemical vapor deposition PECVD technique, from a mixture of hexamethyldisiloxane (HMDSO) and oxygen (O2) in different proportions. The films were deposited on a comb-shape aluminum electrode evaporated on glass substrate. Electrical and structural characteristics of the elaborated humidity sensors were evaluated by humidity-impedance characteristics, infrared spectroscopy FT
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25

Muralter, Fabian, Alberto Perrotta, and Anna Maria Coclite. "Thickness-Dependent Swelling Behavior of Vapor-Deposited Hydrogel Thin Films." Proceedings 2, no. 13 (2018): 757. http://dx.doi.org/10.3390/proceedings2130757.

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Hydrogel thin films containing temperature sensitive chemical functionalities (such as N-isopropylacrylamide, NIPAAm) are particularly interesting for sensor and actuator setups. Complex 3D structures can be conformally coated by the solvent free technique initiated Chemical Vapor Deposition, with precise control over chemical composition and film thickness. In this study, NIPAAm-based thin films with film thicknesses ranging from tens to several hundreds of nanometers and with different amounts of cross-linking were deposited. Above the lower critical solution temperature (LCST), these films
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26

ASHRAFI, M. MOLLA ALI, H. REZAGHOLIPOUR DIZAJI, M. H. EHSANI, and R. ZAREI MOGHADAM. "ZnS FILM PROPERTIES MODIFICATION USING OBLIQUE ANGLE DEPOSITION TECHNIQUE." Surface Review and Letters 25, no. 06 (2018): 1850119. http://dx.doi.org/10.1142/s0218625x18501196.

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In this study, zinc sulfide thin films were deposited on glass substrates at room temperature by vacuum thermal evaporation using oblique angle deposition technique. The samples were prepared at different incident vapor flow angles 0∘, 65∘, and 85∘. The samples were studied using various characterization techniques. The film crystallinity was found very sensitive to the growth angle. Atomic force microscope images of the samples were used to investigate their morphology and surface roughness. The images of samples obtained by the field emission scanning electron microscopy technique showed tha
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27

Yoshida, Kentaro, Tetsuya Ono, Takenori Dairaku, Yoshitomo Kashiwagi, and Katsuhiko Sato. "Preparation of Hydrogen Peroxide Sensitive Nanofilms by a Layer-by-Layer Technique." Nanomaterials 8, no. 11 (2018): 941. http://dx.doi.org/10.3390/nano8110941.

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H2O2-sensitive nanofilms composed of DNA and hemin-appended poly(ethyleneimine) (H-PEI) were prepared by a layer-by-layer deposition of DNA and H-PEI through an electrostatic interaction. The (H-PEI/DNA)5 film was decomposed by addition of 10 mM H2O2. H2O2-induced decomposition was also confirmed in the hemin-containing (PEI/DNA)5 in which hemin molecules were adsorbed by a noncovalent bond to the nanofilm. On the other hand, the (PEI/DNA)5 film containing no hemin and the (H-PEI/PSS)5 film using PSS instead of DNA did not decompose even with 100 mM H2O2. The mechanism of nanofilm decompositio
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28

Haruta, Yuki, Takumi Ikenoue, Masao Miyake, and Tetsuji Hirato. "Fabrication of CsPbBr3 Thick Films by Using a Mist Deposition Method for Highly Sensitive X-ray Detection." MRS Advances 5, no. 8-9 (2020): 395–401. http://dx.doi.org/10.1557/adv.2020.8.

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AbstractX-ray imaging is a valuable technique used for medical imaging and non-destructive inspection of industrial products. However, the radiation may put humans at risk of developing cancer. Consequently, highly sensitive X-ray detectors, which enable X-ray imaging at a low dose rate, are required. Metal halide perovskite materials have demonstrated excellent X-ray detection performance including a high sensitivity owing to their high absorption coefficient, high carrier mobility, and long carrier lifetime. However, perovskite thick films with a large area, which is essential to realize the
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Pratap Deshmukh, Sachin Shendokar, and Jag Sankar. "Fabrication of Mg/Al2O3 Nanolaminates using DC/PDC Magnetron Sputtering to Evaluate the Effect of Oxygen Content and Total Pressure for Deposition of Thin-Films." Global Journal of Engineering and Technology Advances 15, no. 1 (2023): 102–9. http://dx.doi.org/10.30574/gjeta.2023.15.1.0074.

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Thin films have always shown high sensitivity to its deposition parameters and surface morphology. Magnetron sputtering is known for its high level of consistency in deposition and repeatability. In this study Mg/Al2O3 nanolaminates in a range of 10 to 40 nm were synthesized using Direct current and Pulsed DC sputtering techniques at room temperature on glass substrates and silicon substrate using different oxygen flow rates and varying total pressure conditions to understand its effect on deposition rates and roughness of thin films. It is observed that more power and resources consumed for h
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Pratap, Deshmukh, Shendokar Sachin, and Sankar Jag. "Fabrication of Mg/Al2O3 Nanolaminates using DC/PDC Magnetron Sputtering to Evaluate the Effect of Oxygen Content and Total Pressure for Deposition of Thin-Films." Global Journal of Engineering and Technology Advances 15, no. 1 (2023): 102–9. https://doi.org/10.5281/zenodo.7932216.

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Thin films have always shown high sensitivity to its deposition parameters and surface morphology. Magnetron sputtering is known for its high level of consistency in deposition and repeatability. In this study Mg/Al<sub>2</sub>O<sub>3</sub>&nbsp;nanolaminates in a range of 10 to 40 nm were synthesized using Direct current and Pulsed DC sputtering techniques at room temperature on glass substrates and silicon substrate using different oxygen flow rates and varying total pressure conditions to understand its effect on deposition rates and roughness of thin films. It is observed that more power a
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31

Zheng, Yiran, Min Li, Xiaoyan Wen, Ho-Pui Ho, and Haifei Lu. "Nanostructured ZnO/Ag Film Prepared by Magnetron Sputtering Method for Fast Response of Ammonia Gas Detection." Molecules 25, no. 8 (2020): 1899. http://dx.doi.org/10.3390/molecules25081899.

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Possessing a large surface-to-volume ratio is significant to the sensitive gas detection of semiconductor nanostructures. Here, we propose a fast-response ammonia gas sensor based on porous nanostructured zinc oxide (ZnO) film, which is fabricated through physical vapor deposition and subsequent thermal annealing. In general, an extremely thin silver (Ag) layer (1, 3, 5 nm) and a 100 nm ZnO film are sequentially deposited on the SiO2/Si substrate by a magnetron sputtering method. The porous nanostructure of ZnO film is formed after thermal annealing contributed by the diffusion of Ag among ZnO
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32

Mustata, Ion, Cristian Lungu, Ionut Jepu, and Corneliu Porosnicu. "Thermionic Vacuum Discharges for Thin Film Depositions." Coatings 13, no. 9 (2023): 1500. http://dx.doi.org/10.3390/coatings13091500.

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The thermionic vacuum discharge method is very effective in that the films obtained using this technology are characterised by a very high degree of adhesion, density and purity because the deposition technique is carried out in high, very high or, if possible, in ultra-very high vacuum conditions with no gas present. When the substrate is placed in vacuum, no heat transfer particles are present, the substrate being heated only by the ion incident on the surface. This advantage recommends the TVD method for deposits on plastics or other thermally sensitive materials. Additionally, this slow he
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33

Perraudeau, Amélie, Christelle Dublanche-Tixier, Pascal Tristant, Christophe Chazelas, Sylvain Vedraine, and Bernard Ratier. "Low-temperature deposition of TiO2 by atmospheric pressure PECVD towards photoanode elaboration for perovskite and solid-state dye-sensitized solar cells." EPJ Photovoltaics 10 (2019): 5. http://dx.doi.org/10.1051/epjpv/2019006.

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An original low-temperature atmospheric pressure plasma-enhanced chemical vapor deposition process was used to deposit titanium dioxide thin films. The parametric study in dynamic mode deposition aimed at growing an ideal columnar film composed of aligned anatase monocrystals as solar cell photoanode, previously obtained on silicon wafers in static mode deposition. A process parameters optimization was necessary to deposit onto thermally sensitive glass/FTO substrates. In this paper, the morphology, crystallinity and optical transmission of the coatings have been studied. The coatings display
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34

Pour, Ghobad Behzadi, Leila Fekri Aval, and Shahnaz Eslami. "Sensitive Capacitive-type Hydrogen Sensor Based on Ni Thin Film in Different Hydrogen Concentrations." Current Nanoscience 14, no. 2 (2018): 136–42. http://dx.doi.org/10.2174/1573413713666171002124909.

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Background: Hydrogen sensors are micro/nano-structure that are used to locate hydrogen leaks. They are considered to have fast response/recovery time and long lifetime as compared to conventional gas sensors. In this paper, fabrication of sensitive capacitive-type hydrogen gas sensor based on Ni thin film has been investigated. The C-V curves of the sensor in different hydrogen concentrations have been reported. Method: Dry oxidation was done in thermal chemical vapor deposition furnace (TCVD). For oxidation time of 5 min, the oxide thickness was 15 nm and for oxidation time 10 min, it was 20
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Zhao, Min, Hongyi Tang, Ziwei Liu, Zhaoyang Tong, and Zhimei Qi. "A Surface-Scattering-Based Composite Optical Waveguide Sensor for Aerosol Deposition Detection." Chemosensors 10, no. 12 (2022): 535. http://dx.doi.org/10.3390/chemosensors10120535.

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Aerosol is a suspension of fine chemical or biological particles in the air, and it is harmful, easily causing air pollution, respiratory diseases, infrastructure corrosion, and poor visibility. Therefore, the development of advanced optical sensors for real-time detection of aerosol deposition is of great significance. In this work, a prism-coupled composite optical waveguide (COWG) sensor for aerosol deposition detection based on surface scattering is proposed and demonstrated theoretically and experimentally. The COWG consists of a single-mode slab glass waveguide locally covered with a tap
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Shendage, Sambhaji S., Vithoba L. Patil, Sharadrao A. Vanalakar, et al. "Characterization and Gas Sensing Properties of Spin Coated WO3 Thin Films." Zeitschrift für Physikalische Chemie 234, no. 11-12 (2020): 1819–34. http://dx.doi.org/10.1515/zpch-2018-1293.

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AbstractThe WO3 thin films have been synthesized on to the glass substrates by a simple and easy spin coating method at different deposition cycles and their sensor responses towards various concentrations of NO2 gas were investigated. The WO3 films were spin coated at a spinning rate of 2500–3000 rpm for 5, 10 and 15 deposition cycles, respectively. Then the films were annealed at 400 °C for 1 h in a furnace. The structural, morphological, optical and electrical properties of WO3 films were studied by different characterization techniques such as X-ray diffraction (XRD), Scanning Electron Mic
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37

Myasoedova, Tatiana N., Mikhail N. Grigoryev, Nina K. Plugotarenko, and Tatiana S. Mikhailova. "Fabrication of Gas-Sensor Chips Based on Silicon–Carbon Films Obtained by Electrochemical Deposition." Chemosensors 7, no. 4 (2019): 52. http://dx.doi.org/10.3390/chemosensors7040052.

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In this study, we designed two types of gas-sensor chips with silicon–carbon film, doped with CuO, as the sensitive layer. The first type of gas-sensor chip consists of an Al2O3 substrate with a conductive chromium sublayer of ~10 nm thickness and 200 Ω/□ surface resistance, deposited by magnetron sputtering. The second type was fabricated via the electrochemical deposition of a silicon–carbon film onto a dielectric substrate with copper electrodes formed by photoelectrochemical etching. The gas sensors are sensitive to the presence of CO and CH4 impurities in the air at operating temperatures
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38

Rahman, Rohanieza Abdul, Muhammad Al Hadi Zulkefle, Wan Fazlida Hanim Abdullah, and Sukreen Hana Herman. "Effect of Post Deposition Annealing Process on the pH Sensitivity of Spin-Coated Titanium Dioxide Thin Film." Applied Mechanics and Materials 749 (April 2015): 197–201. http://dx.doi.org/10.4028/www.scientific.net/amm.749.197.

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This paper presents an investigation on titanium dioxide (TiO2) thin film, which is used as sensing membrane for Extended-Gate Field Effect Transistor (EGFET) for pH sensing application. TiO2 thin films were deposited using sol-gel spin coating method on indium tin oxide (ITO) substrates. After the deposition, the thin films were annealed at 300 °C for 10 and 15 min, while another sample was annealed at 400 °C for 15 min. The sensitivity measurement was taken using the EGFET setup equipment with constant-current (100 μA) and constant-voltage (0.5 V) biasing interfacing circuit. TiO2 thin film
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Tedzhetov, Valentin A., Elena N. Sheftel, Eugene V. Harin, and Philipp V. Kiryukhantsev-Korneev. "Residual Stresses in Soft Magnetic FeTiB and FeZrN Films Obtained by Magnetron Deposition." Coatings 11, no. 1 (2020): 34. http://dx.doi.org/10.3390/coatings11010034.

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The coercive field of soft magnetic ferromagnets is a structure-sensitive property and, in particular, is substantially affected by residual stresses. In the present study, the phase and structural states and residual stresses of the FeTiB and FeZrN films of various compositions, which were prepared by magnetron deposition on glass substrates and subsequent 1-h annealing at temperatures of 200–600 °C, were investigated by X-ray diffraction. The formation of a nanocrystalline structure is observed. It comprises different phases having different lattice parameters and unit-cell volumes and is ch
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Lőrinczi, Adam, Eugenia Fagadar-Cosma, Gabriel Socol, et al. "SnSe2-Zn-Porphyrin Nanocomposite Thin Films for Threshold Methane Concentration Detection at Room Temperature." Chemosensors 8, no. 4 (2020): 134. http://dx.doi.org/10.3390/chemosensors8040134.

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Nanocomposite thin films, sensitive to methane at the room temperature (25–30 °C), have been prepared, starting from SnSe2 powder and Zn(II)-5,10,15,20-tetrakis-(4-aminophenyl)- -porphyrin (ZnTAPP) powder, that were fully characterized by XRD, UV-VIS, FT-IR, Nuclear Magnetic Resonance (1H-NMR and 13C-NMR), Atomic Force Microscopy (AFM), SEM and Electron Paramagnetic Resonance (EPR) techniques. Film deposition was made by drop casting from a suitable solvent for the two starting materials, after mixing them in an ultrasonic bath. The thickness of these films were estimated from SEM images, and
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Gao, Qun, Hao Yang, Cuichen Hu, et al. "Physical vapor deposition of large-scale PbSe films and its applications in pulsed fiber lasers." Nanophotonics 9, no. 8 (2019): 2367–75. http://dx.doi.org/10.1515/nanoph-2019-0380.

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AbstractLead selenide (PbSe) is a new emerging semiconductor with layer-dependent bandgap that has attracted much interest due to its high infrared response and good environmental stability. We have prepared large-scale PbSe films with the area of 7 cm2 and thickness of 25 nm based on physical vapor deposition approach at 160°C. The PbSe films exhibit saturable absorption property at 1.55 μm and a polarization-sensitive saturable absorber is obtained by growing PbSe on D-shaped fiber. Single-pulse with the duration of 490 fs is generated at the pump of 12 mW and the mode-locking operation is m
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42

Kovalchuk, A. A. "Structure and oxygen-sensitive properties of thin films of natural carbon." Journal of Physics: Conference Series 2316, no. 1 (2022): 012014. http://dx.doi.org/10.1088/1742-6596/2316/1/012014.

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Abstract Thin film carbon nanomaterials are widely studied and used as functional, conductive, reflective, and sensor coatings. In this work, films of natural graphene-based carbon are studied as a sensitive material for a gas sensor operating close to room temperature. The structural features of the films were studied by scanning electron microscopy and Raman spectroscopy. It has been found that the deposition of natural carbon on substrates with a conductive coatings of indium oxide and of indium tin oxide allows to obtain a thin films, represented by homogeneous carbon nets, in the nodes of
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Shu, Lin, Xuemin Wang, Dawei Yan, Long Fan, and Weidong Wu. "The Investigation of High-Temperature SAW Oxygen Sensor Based on ZnO Films." Materials 12, no. 8 (2019): 1235. http://dx.doi.org/10.3390/ma12081235.

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In this paper, a wireless oxygen sensor based on a surface acoustic wave (SAW) was reported. For high-temperature applications, novel Al2O3/ZnO/Pt multilayered conductive film was deposited on langasite substrate as the electrodes, and ZnO film obtained by the pulse laser deposition (PLD) method was used as the sensitive film. The measurements of X-ray diffraction (XRD) and a scanning electron microscope (SEM) showed that the c-axis orientation of the ZnO grains and the surface morphology of the films were regulated by the deposition temperature. Meanwhile, the gas response of the sensor was s
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Mazur, Piotr, Agata Sabik, Rafał Lewandków, Artur Trembułowicz, and Miłosz Grodzicki. "Obtaining Niobium Nitride on n-GaN by Surface Mediated Nitridation Technique." Crystals 12, no. 12 (2022): 1847. http://dx.doi.org/10.3390/cryst12121847.

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In this work the n-GaN(1000) surface is used as a source of nitrogen atoms in order to obtain niobium nitride film by a surface-mediated nitridation technique. To this end, the physical vapor deposition of the niobium film on GaN is followed by sample annealing at 1123 K. A thermally induced decomposition of GaN and interfacial mixing phenomena lead to the formation of a niobium nitride compound, which contains Nb from thin film and N atoms from the substrate. The processes allowed the obtaining of ordered NbNx films on GaN. Structural and chemical properties of both the GaN substrate and NbNx
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Cougnon, Florian, Mathias Kersemans, Wim Van Paepegem, and Diederik Depla. "Sputter Deposited Metal Layers Embedded in Composites—From Fundamentals to Applications." Coatings 11, no. 2 (2021): 190. http://dx.doi.org/10.3390/coatings11020190.

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Due to the low heat flux towards the substrate, magnetron sputter deposition offers the possibility to deposit thin films on heat sensitive materials such as fiber-reinforced polymers, also known as composite materials. Passive thermal probe measurements during the sputter deposition of metal layers show indeed that the temperature increase remains well below 25 °C for film thicknesses up to 600 nm. The latter thickness threshold is based on the influence of embedded metal films on the adhesion of the composite plies. Films thicker than this threshold deteriorate the mechanical integrity of th
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Dai, Xingze, Jing Guo, Tongbin Huang, Dong Ding, and Chao Wang. "Magnetic Sensing Properties of PVD Carbon Films Containing Vertically Aligned Crystallites." Sensors 19, no. 19 (2019): 4248. http://dx.doi.org/10.3390/s19194248.

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The demands for magnetic sensors are uprising due to the rapid development of smart equipments and internet of things. Exploring magnetic sensitive materials which are easily obtainable and of low cost thereby become of great significance. Carbon film with crystallized features was recently reported with room-temperature ferro-magnetism and magnetoresistance, owing to its spin–orbital interactions at the graphene edges and temperature-depending carrier transport properties. Such phenomena indicate that the film can serve as a novel magnetic sensitive material. In this study, carbon films with
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Hsu, Cheng Hsing, His Wen Yang, and Jenn Sen Lin. "Electrical and Optical Properties of ZnO-Doped Zr0.8Sn0.2TiO4 Thin Films on ITO/Glass Substrates by RF Magnetron Sputtering." Materials Science Forum 687 (June 2011): 70–74. http://dx.doi.org/10.4028/www.scientific.net/msf.687.70.

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Electrical and optical properties of 1wt% ZnO-doped (Zr0.8Sn0.2)TiO4thin films prepared by rf magnetron sputtering on ITO/Glass substrates at different rf power and substrate temperature were investigated. The surface structural and morphological characteristics analyzed by X-ray diffraction (XRD) and atomic force microscope (AFM) were found to be sensitive to the deposition conditions, such as rf power and substrate temperature. The selected-area diffraction pattern showed that the deposited films exhibited a polycrystalline microstructure. All films exhibited ZST (111) orientation perpendicu
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Goff, Jonathan, Chad Brick, Barry Arkles, and Alain Kaloyeros. "Near-Room-Temperature Soft Plasma Pulsed Deposition of SiCxNy from 1,3,5-tri(isopropyl)cyclotrisilazane." Electrochemical Society Transactions 98, no. 3 (2020): 121–35. https://doi.org/10.1149/09803.0121ecst.

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Results are presented from an exploratory study of near-room- temperature pulsed deposition of SiCxNy&nbsp;thin films using 1,3,5- tri(isopropyl)cyclotrisilazane (TICZ, C9H27N3Si3) and soft remote ammonia (NH3) plasma co-reactants. The process involved four pulses: thermal adsorption of TICZ to the substrate at very low temperature, nitrogen (N2) purge, soft NH3&nbsp;remote plasma step, and N2&nbsp;purge. These steps were repeated until the desired film thickness was reached. The ratio of C to N in the films was modulated by controlling the substrate temperature in the range of 30 to 200&nbsp;
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Sujarwata, Fiant, Handayani Langlang, Purwinarko Aji, and Susilo. "OFET Preparation by Lithography and Thin Film Depositions Process." TELKOMNIKA Telecommunication, Computing, Electronics and Control 16, no. 1 (2018): 77–83. https://doi.org/10.12928/TELKOMNIKA.v16i1.6544.

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The length of the channel OFET based thin film is determined during preparation takes place using the technique of lithography and mask during the metal deposition process. The lithography technique is the basic process steps in the manufacture of semiconductor devices. Lithography is the process of moving geometric shapes mask pattern to a thin film of material that is sensitive to light. The pattern of geometric shapes on a mask has specifications, as follows: long-distance source and drain channels varied, i.e. 100 &mu;m, the width of the source and drain are made permanent. Bottom contact
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Chung, In Young, Keun Woo Kim, Ju Won Yoon, et al. "14‐1: A Study on Flexibility Improvement of AMOLED Back Plane and Mask Reduction Process Architecture Using Photo‐sensitive Organic Insulation Films." SID Symposium Digest of Technical Papers 55, no. 1 (2024): 150–53. http://dx.doi.org/10.1002/sdtp.17476.

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In this work, the method of patterning inter‐layer deposition (ILD) and passivation layer (PVX) of the AMOLED back plane structure with an organic film was studied. By replacing the inorganic film of SiNx + SiO2 with an organic film Poly‐imide, back plane suitable for flexible AMOLED was secured. It was possible to secure equivalent TFT transfer characteristics of device compared to inorganic inter layer structure by applying low‐temperature buffer and 2nd gate insulator SiNx to the organic inter layer TFT device. Also, VIA + passivation layer 2 mask photo process was replaced with 1 mask phot
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