Books on the topic 'Silicon Surfaces'

Lifshits, V. G. Surface phases on silicon: Preparation, structures, and properties. Chichester [England]: J.Wiley, 1994.

Nissim, Yves I. Heterostructures on Silicon: One Step Further with Silicon. Dordrecht: Springer Netherlands, 1989.

Levy, R. A. Novel Silicon Based Technologies. Dordrecht: Springer Netherlands, 1991.

International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface (3rd 1996 Los Angeles, Calif.). The physics and chemistry of SiO₂ and the Si-SiO₂ interface-3, 1996: Proceedings of the Third International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface. Edited by Massoud Hisham Z, Poindexter Edward H, and Helms C. Robert. Pennington, NJ: Electrochemical Society, 1996.

Angeles, CA) International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface (5th 2005 Los. The physics and chemistry of SiO₂ and the Si-SiO₂ interface--5. Pennington, NJ: Electrochemical Society, 2005.

Choyke, W. J. Silicon Carbide: Recent Major Advances. Berlin, Heidelberg: Springer Berlin Heidelberg, 2004.

Chabal, Yves J. Fundamental Aspects of Silicon Oxidation. Berlin, Heidelberg: Springer Berlin Heidelberg, 2001.

Treitinger, Ludwig. Ultra-Fast Silicon Bipolar Technology. Berlin, Heidelberg: Springer Berlin Heidelberg, 1988.

Graff, Klaus. Metal Impurities in Silicon-Device Fabrication. Berlin, Heidelberg: Springer Berlin Heidelberg, 2000.

Graff, Klaus. Metal Impurities in Silicon-Device Fabrication. Berlin, Heidelberg: Springer Berlin Heidelberg, 1995.

Siffert, P. Silicon: Evolution and Future of a Technology. Berlin, Heidelberg: Springer Berlin Heidelberg, 2004.

International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface (4th 2000 Toronto, Ont.). The physics and chemistry of SiO₂ and the Si-SiO₂ interface--4, 2000: Proceedings of the Fourth International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface, Toronto, Canada, May 15-18, 2000. Edited by Massoud Hisham Z, Electrochemical Society Electronics Division, and Electrochemical Society. Dielectric Science and Technology Division. Pennington, NJ: Electrochemical Society, 2000.

Bensahel, Daniel C. Optical Properties of Low Dimensional Silicon Structures. Dordrecht: Springer Netherlands, 1993.

M, Repinskiĭ S., ed. Ėlektronnai͡a spektroskopii͡a i atomnye prot͡sessy na poverkhnosti kremnii͡a. Moskva: "Nauka", 1985.

Hattori, Takeshi. Ultraclean Surface Processing of Silicon Wafers: Secrets of VLSI Manufacturing. Berlin, Heidelberg: Springer Berlin Heidelberg, 1998.

Kamins, Ted. Polycrystalline Silicon for Integrated Circuits and Displays. Boston, MA: Springer US, 1998.

Cerofolini, Gianfranco. Physical Chemistry of, in and on Silicon. Berlin, Heidelberg: Springer Berlin Heidelberg, 1989.

Baraban, A. P. Ėlektronika sloev SiO₂ na kremnii. Leningrad: Izd-vo Leningradskogo universiteta, 1988.

Electrochemistry of silicon and its oxide. New York: Kluwer Academic/Plenum Publishers, 2001.

Horn, Andrew B. Vibrational spectroscopic studies of adsorbates on metal and silicon single crystal surfaces. Norwich: University of East Anglia, 1989.

International Symposium on Ultra Clean Processing of Silicon Surfaces (3rd 1996 Antwerp, Belgium). Proceedings of the Third International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS '96). Edited by Heyns Marc, Meuris Marc, and Mertens Paul. Leuven: Acco, 1996.

Borisenko, V. E. Semiconducting Silicides. Berlin, Heidelberg: Springer Berlin Heidelberg, 2000.

Rahman, Mahmud M. Amorphous and Crystalline Silicon Carbide II: Recent Developments Proceedings of the 2nd International Conference, Santa Clara, CA, December 15-16, 1988. Berlin, Heidelberg: Springer Berlin Heidelberg, 1989.

Wilfried G. J. H. M. Sark. Physics and Technology of Amorphous-Crystalline Heterostructure Silicon Solar Cells. Berlin, Heidelberg: Springer-Verlag Berlin Heidelberg, 2011.

Latyshev, A. V. Monoatomnye stupeni na poverkhnosti kremnii︠a︡. Novosibirsk: Izd-vo Sibirskogo otd-nii︠a︡ Rossiĭskoĭ akademii nauk, 2006.

Steger, Michael. Transition-Metal Defects in Silicon: New Insights from Photoluminescence Studies of Highly Enriched 28Si. Berlin, Heidelberg: Springer Berlin Heidelberg, 2013.

Lifshit︠s︡, V. G. Spektry KhPĖĖ poverkhnostnykh faz na kremnii. Vladivostok: Dalʹnauka, 2004.

Senoussaoui, Nadia. Einfluss der Oberflächenstrukturierung auf die optischen Eigenschaften der Dünnschichtsolarzellen auf der Basis von a-Si : H und [mu]c-Si: H. Jülich: Forschungszentrum Jülich, Zentralbibliothek, 2004.

A, Mottola Horacio, and Steinmetz James R, eds. Chemically modified surfaces: Proceedings of the Fourth Symposium on Chemically Modified Surfaces, Chadds Ford, Pennsylvania, USA, July 31-August 2, 1991. Amsterdam: Elsevier, 1992.

NATO Advanced Research Workshop on Progress in SOI Structures and Devices Operating at Extreme Conditions (2000 Kiev, Ukraine). Progress in SOI structures and devices operating at extreme conditions. Dordrecht: Kluwer Academic, 2002.

Devine, Roderick A. B. The Physics and Technology of Amorphous SiO2. Boston, MA: Springer US, 1988.

J, Owen Michael, and SpringerLink (Online service), eds. Silicone Surface Science. Dordrecht: Springer Netherlands, 2012.

Owen, Michael J., and Petar R. Dvornic, eds. Silicone Surface Science. Dordrecht: Springer Netherlands, 2012. http://dx.doi.org/10.1007/978-94-007-3876-8.

B, Devine Roderick A., ed. The physics and technology of amorphous SiO₂. New York: Plenum Press, 1988.

Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface (1st 1988 Atlanta, Ga.). The physics and chemistry of SiO₂ and the Si-SiO₂ interface. New York: Plenum Press, 1988.

Hydrogenated amorphous silicon. Cambridge: Cambridge University Press, 1991.

Hattori, Takeshi, ed. Ultraclean Surface Processing of Silicon Wafers. Berlin, Heidelberg: Springer Berlin Heidelberg, 1998. http://dx.doi.org/10.1007/978-3-662-03535-1.

Kanno, Yoshinori. Method for measuring surface activity of silicon nitride powder. Washington DC: National Aeronautics and Space Administration, 1985.

Vansant, E. F. Characterization and chemical modification of the silica surface. Amsterdam: Elsevier, 1995.

Sohi, Mahmoud Heydarzadeh. Duplex surface engineering of aluminium-silicon based alloys. Birmingham: University of Birmingham, 1991.

Sutcliffe, P. J. SIMS surface studies of silicon substrates for low temperature chemical vapour deposition. Manchester: UMIST, 1992.

Carlos Ignacio De la Cruz. Infrared spectroscopic studies of adsorption on platinum/silica surfaces. Norwich: University of East Anglia, 1987.

Friedrich-Schiller-Universität Jena. Sektion Chemie. Tagung. Oberflächenchemie fester Körper: 3. Tagung der Sektion Chemie der Friedrich-Schiller-Universität Jena zum Thema, "Struktur, Eigenschaften und Einsatzmöglichkeiten silikatischer Festkörper" : 4. bis 6. Juli 1984 in Jena. Jena: Friedrich-Schiller-Universität, 1985.

Friedrich-Schiller-Universität Jena. Sektion Chemie. Tagung. Oberflächenchemie fester Körper: "Herstellung, Struktur und Eigenschaften oberflächenreicher Silicate und Oxide" : 4. Tagung der Sektion Chemie der Friedrich-Schiller-Universität Jena zum Thema "Herstellung, Struktur und Eigenschaften oberflächenreicher Silikate und Oxide", 5. bis 7. Juli 1988 in Jena. Jena: Die Universität, 1989.

Bansal, Narottam P. Microstructural, chemical and mechanical characterization of polymer-derived Hi-Nicalon fibers with surface coatings. [Cleveland, Ohio]: National Aeronautics and Space Administration, Lewis Research Center, 1998.

Silicone Surface Science Advances in Silicon Science. Springer, 2012.

1935-, Papirer Eugène, ed. Adsorption on silica surfaces. New York: Marcek Dekker, 2000.

Silicon Surfaces and Formation of Interfaces: Basic Science in the Industrial World. World Scientific Publishing Company, 2000.

Papirer, Eugene. Adsorption on Silica Surfaces (Surfactant Science). CRC, 2000.

(Editor), H. Z. Massoud, C. R. Helms (Editor), and Edward H. Poindexter (Editor), eds. Physics & Chemistry of Si02 & the Si-Si02 Interface: 3rd International Symposium (Proceedings Series Volume 96-1). Electrochemical Society, 1996.