Dissertations / Theses on the topic 'Silicon Surfaces'
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Knight, Patrick J. "Nitride formation at silicon surfaces." Thesis, University of Southampton, 1992. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.238903.
Full textKlaes, Stefan. "Photo-switching of organic monolayers on silicon surfaces." Thesis, Université Paris-Saclay (ComUE), 2017. http://www.theses.fr/2017SACLX071/document.
Full textThe design of “smart” surfaces responsive to external stimuli (light, electromagnetic field, chemical environment…) is attracting considerable interest because of their potential for a wide range of applications. Within this context we are studying the photoswitching properties of a monolayer of organic photochromes immobilized onto silicon surfaces.Fulgimide groups are anchored through covalent linkage atop of functionalized alkyl monolayers grafted on oxide free Si(111) surfaces. The monolayers composition at the photo stationary states PSS-UV and PSS-Vis is determined from quantitative analysis of the infrared band intensity characteristic of open (E,Z) and closed (C) isomers. The UV-Vis surface photocommutation is monitored by in-situ real time FTIR measurements during UV-Vis illumination. Time dependence studies of photocommutation evidence decreasing quantum efficiency during the commutation. This decrease in quantum efficiency only weakly depends on fulgimide density and is not observed in solution. However, PC measurements as a function of photon flux enabled determining a PC cross section (σ) of the majority of switching molecules. Polarization dependent photocommutation studies show the strong dependence of σ with respect to the local electric field of the isomerization-exciting light.Analytical models and Monte Carlo simulations based on nearest neighbor interactions are performed to gain deeper insight in the experimental observations. These simulations qualitatively explain the temperature dependence of the commutation kinetics, decreasing quantum efficiency and weak surface density dependence of the photocommutation.It has been shown in this thesis that σ depends on the local electric field. Similar to the Surface Enhanced Raman Spectroscopy the local electric field at surfaces is increased due to the plasmon of gold nanoparticles. The plasmon of the gold nanoparticle monolayer and thereby the enhancement of the electric field depends on the wavelength of the external irradiation. Exploitation of this effect improves the photo switching kinetics significantly depending on the wavelength of the irradiation. This wavelength dependent amplification of the switching kinetics is explained by the same wavelength dependent enhancement of the electric field
Gibbons, Brian J. "Electromigration induced step instabilities on silicon surfaces." Columbus, Ohio : Ohio State University, 2006. http://rave.ohiolink.edu/etdc/view?acc%5Fnum=osu1143235175.
Full textThirtle, P. N. "Neutron reflection from modified silicon surfaces." Thesis, University of Oxford, 1999. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.301731.
Full textKing, David J. "Modelling of fullerenes on silicon surfaces." Thesis, Loughborough University, 2008. https://dspace.lboro.ac.uk/2134/4644.
Full textFrangou, Paul Christopher. "Modelling of fullerenes on silicon surfaces." Thesis, Loughborough University, 2008. https://dspace.lboro.ac.uk/2134/13499.
Full textWilson, Jon H. "Silicon surfaces : STM, theory and experiment." Thesis, University of Oxford, 1991. http://ora.ox.ac.uk/objects/uuid:64998ae3-9316-42b5-967f-da93ff2bfd6c.
Full textLindsay, Robert. "Structure of adsorbates on silicon surfaces." Thesis, University of Liverpool, 1993. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.385261.
Full textRamstad, Monte Jerome. "Instabilities of vicinal silicon (111) surfaces." Thesis, Massachusetts Institute of Technology, 1996. http://hdl.handle.net/1721.1/42571.
Full textHarte, Sean Paul. "Surface EXAFS studies of chromium and titanium upon #alpha#-quartz (0001) surfaces." Thesis, University of Liverpool, 1997. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.263901.
Full textHui, I. Pui, and 許貽培. "Positron re-emission from silicon carbide surfaces." Thesis, The University of Hong Kong (Pokfulam, Hong Kong), 2002. http://hub.hku.hk/bib/B31227387.
Full textNolan, John William. "Contacting and imaging nanostructures on silicon surfaces." Thesis, University of Nottingham, 2002. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.275970.
Full textLuginbühl, Reto. "Photobonding of biomacromolecules to Silicon Nitride surfaces /." [S.l.] : [s.n.], 1997. http://www.ub.unibe.ch/content/bibliotheken_sammlungen/sondersammlungen/dissen_bestellformular/index_ger.html.
Full textLawing, Andrew S. (Andrew Scott). "Gas-phase cleaning of silicon wafer surfaces." Thesis, Massachusetts Institute of Technology, 1997. http://hdl.handle.net/1721.1/38852.
Full textBurr, Tracey Alexandra 1967. "Electrical properties of silicon surfaces and interfaces." Thesis, Massachusetts Institute of Technology, 1998. http://hdl.handle.net/1721.1/9689.
Full textIncludes bibliographical references (p. 159-168).
This work addresses two scientific challenges associated with diminishing device size. First, alternative surface passivation chemistries are investigated to meet the narrowing process tolerances for high quality silicon surfaces. Second, Si-based light emitting devices are studied to address a longer-term move towards photons instead of electrons for data transfer. A concerted effort is made to engineer environmentally benign solutions to these challenges. Highly effective Si( 100) surface passivation is achieved by immersing wafers in very dilute solutions of methanolic iodine. The electrical quality of Si surfaces is monitored in terms of surface recombination lifetime, employing radio frequency photo conductance decay (rfPCD) measurements. J/methanol treated surfaces are shown to have higher lifetimes and greater air stability than hydrogen terminated surfaces, while retaining comparable planarity and smoothness. Using XPS, UPS, and ATR-FTIR, the identity of the primary passivating surface species is ascertained to be a methoxysilane (Si-OCH3), and the most plausible passivation mechanism is deduced. Our results clearly illustrate the relationship between chemical passivation and electrical passivation. Thin films of visibly emitting silicon nanoparticles are fabricated using a pulsed laser ablation supersonic expansion technique. The electrical and electroluminescence characteristics of devices containing these films are shown to be controlled by carrier transport through the nanoparticulate silicon layer. A conduction mechanism encompassing both geometric and electronic effects most effectively relates the high resistivity with structural properties of the films. The observed temperature dependent PL, EL, and I-V characteristics of the devices are consistent with a model in which carrier transport is controlled by space-charge-limited currents or tunneling through potential barriers on a percolating lattice.
by Tracey Alexandra Burr.
Ph.D.
Gibbons, Brian J. Jr. "Electromigration induced step instabilities on silicon surfaces." The Ohio State University, 2006. http://rave.ohiolink.edu/etdc/view?acc_num=osu1143235175.
Full textLiu, Yong. "Desorption kinetics of surface species on Si(100)2X1 and Si(111)7X7 surfaces : theoretical and digital TPD studies." Thesis, University of Southampton, 1994. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.239634.
Full textSilaghi, Simona Dorina. "Optical Characterisation of DNA Bases on Silicon Surfaces." Doctoral thesis, Universitätsbibliothek Chemnitz, 2005. http://nbn-resolving.de/urn:nbn:de:swb:ch1-200500776.
Full textXie, Bo. "Supercritical Carbon Dioxide Processing of Silicon Wafer Surfaces." Diss., Tucson, Arizona : University of Arizona, 2005. http://etd.library.arizona.edu/etd/GetFileServlet?file=file:///data1/pdf/etd/azu%5Fetd%5F1207%5F1%5Fm.pdf&type=application/pdf.
Full textTaylor, Michael Dennis Robert. "A study of nanoscale clusters on silicon surfaces." Thesis, University of Nottingham, 2002. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.288104.
Full textNasir, Mazhar Ejaz. "Fabrication and spectroscopy of nanostructured surfaces on silicon." Thesis, University of Manchester, 2008. https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.677177.
Full textWillis, Mary L. "STM Studies of Oxygen Etching of Silicon Surfaces." VCU Scholars Compass, 2005. http://scholarscompass.vcu.edu/etd/1008.
Full textButcher, Matthew James. "Adsorption and manipulation of doped fullerenes on silicon surfaces." Thesis, University of Nottingham, 2000. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.325717.
Full textGold, Scott Alan. "Nitrogen incorporation in thin silicon oxide films for passivation of silicon solar cell surfaces." Thesis, Georgia Institute of Technology, 1999. http://hdl.handle.net/1853/11101.
Full textNgan, Mei Lun. "Photoluminescence excitation of porous silicon." HKBU Institutional Repository, 1998. http://repository.hkbu.edu.hk/etd_ra/139.
Full textJiang, Guilin. "Characterization, Functionalization and Applications of Alkyl Monolayers on Silicon Surfaces." BYU ScholarsArchive, 2006. https://scholarsarchive.byu.edu/etd/1073.
Full textPavlovic, Elisabeth. "Spatially Controlled Covalent Immobilization of Biomolecules on Silicon Surfaces." Doctoral thesis, Uppsala : Acta Universitatis Upsaliensis, 2003. http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-3523.
Full textRömhildt, Lotta. "Biochemical functionalization of silicon dioxide surfaces for sensing applications." Doctoral thesis, Saechsische Landesbibliothek- Staats- und Universitaetsbibliothek Dresden, 2014. http://nbn-resolving.de/urn:nbn:de:bsz:14-qucosa-148666.
Full textZiel dieser Arbeit war es Siliziumdioxidoberflächen so mit biochemischen Molekülen zu funktional- isieren, dass die biologisch spezifische Erkennung von Zielmolekülen in Lösung möglich wird. Hier wird eine Auswahl an geeigneten Molekülen und Charakterisierungsmethoden für einen vielseitigen Ansatz gezeigt, der auf verschiedene Biosensorsysteme anwendbar ist. Das beinhaltet zum Einen die Präparation der Biosensoroberflächen, so dass die Moleküle über reaktive funktionelle Gruppen angebunden werden können. Als zweites ist die Auswahl der chemischen Moleküle wichtig, da diese die passenden Gegenstücke zu potentiellen funktionellen Gruppen der Rezeptoren darstellen. Zwei verschiedene Detektionsvarianten werden eingeführt – Antikörper gegen das Antibiotikum Amoxicillin und Aptamere gegen Thrombin. Der Antikörper wurde in einen inversen Wettbewerbsassay integriert um einen solch kleinen Ana- lyten detektieren zu können. Rückstände von Antibiotika sind häufig in Abwässern zu finden. Ap- tamere, sogenannte künstliche Antikörper, weisen gegenüber Antikörpern viele Vorteile auf. Als ein Modellsystem wurden zwei unterschiedliche Thrombin bindende Aptamere verwendet, was auch die Durchführung von Sandwich Assays ermöglichte. Das Protein Thrombin spielt eine wichtige Rolle bei der Blutgerinnung. Um die einzelnen Modifikationsschritte zu untersuchen, wurden verschiedene Charakterisierungsmethoden angewendet. Die Mikrostrukturierung der Funktionalisierung erleichterte die Erkennung der modifizierten Flächen und verbesserte das Fluoreszenz-zu-Hintergrund Verhältnis. Das führte zu einer Detektionsgrenze von 20 pM für Thrombin. Ein wichtiges Ziel dieser Arbeit war die Integration der Funktionalisierung in einen ionen-sensitiven Feldeffekttransistor. Die kleinen Aptamere könnten dabei aufgrund der geringen Debye-Schichtdicke bei diesen Sensoren eine höhere Sensitivität als mit Antikörpern ermöglichen. Zuletzt wurden erste Messungen hin zu Silizium Nanodraht basierten Feldeffekttransistor Biosen- soren mit beiden untersuchten Rezeptor-Analyt-Kombinationen durchgeführt. Sowohl die Chips mit bottom-up als auch mit top-down gewachsenen Nanodrähten zeigen dabei ihr Potential als handliche Sensoren zur markerfreien Detektion in Echtzeit
Upward, Martin David. "Fullerenes, transition metal clusters and organometallics on silicon surfaces." Thesis, University of Nottingham, 1998. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.267153.
Full textLee, Michael V. "Development of chemomechanical functionalization and nanografting on silicon surfaces /." Diss., CLICK HERE for online access, 2007. http://contentdm.lib.byu.edu/ETD/image/etd2023.pdf.
Full textLee, Michael Vernon. "Development of Chemomechanical Functionalization and Nanografting on Silicon Surfaces." BYU ScholarsArchive, 2007. https://scholarsarchive.byu.edu/etd/1435.
Full textHan, Yong-Pil 1962. "HF vapor etching and cleaning of silicon wafer surfaces." Thesis, Massachusetts Institute of Technology, 1999. http://hdl.handle.net/1721.1/32698.
Full textIncludes bibliographical references.
The objectives of this project are to understand the reaction mechanisms for oxide etching by both HF/H2 0 and HF/alcohol processes and to develop a vapor phase HF cleaning process to remove metallic contamination and native oxide on a silicon surface. Although the HF vapor process has been studied intensively for past several decades, the commercial application has not been very successful due to the unknown nature of the process. This study, performed at MIT, has emphasized on finding possible applications to the semiconductor industry as a replacement to the aqueous phase cleaning processes. The ultimate purpose of this project is to demonstrate feasibility of the HF vapor process for a vacuum compatible and clustered cleaning process. In this study, the etching experiments were carried out in a stainless steel vacuum chamber connected to a vacuum wafer transfer system. Samples were introduced through a load lock chamber and transferred to the HF vapor reaction chamber. The base pressure of the system was maintained under 10-7 Torr. The system can handle sample sizes between 1 cm square and 10 cm diameter silicon wafers. The etching rates were measured by an in situ ellipsometer installed on the HF vapor reactor. Ellipsometric measurements suggest that oxide etching can occur without a condensed layer or with a condensed layer on the oxide surface. The etching rates of oxide in the condensed regime were very high (3,000-12,000 A/min) compared to the gas phase regime (0-300 A/min). The etching regime in which a condensed layer is formed is a function of not only the partial pressures of HF and H 20 in the feed gas, but also a function of the mass transport of the products from the sample in the gas phase. We have categorized two different etching regimes: the gas phase regime and the condensed phase regime. In the gas phase etching regime, reactant molecules are adsorbed on the oxide surface in sub-monolayer, monolayer, or multilayer films. In the multilayer adsorption regime, the etching rate is usually low (typically 0-400 A/min) and is linearly proportional to the partial pressure of HF and H20. The etching rate in this regime is greatly affected by the temperature of the substrate. The mass transfer rate limits the etch rate of oxide in the multilayer adsorption regime. In the submonolayer or monolayer adsorption regime the etching rate is described by Langmuir- Hinshelwood kinetics. The etching rate is governed by surface kinetics in this regime. Advantages of this etching regime are: 1) smoother etched surface, 2) low selectivity to TEOS, 3) haze-free etched surface, 4) no metal attack, 5) perfect removal of native oxide, and 6) vacuum compatible process. The HF vapor process in this regime is an ideal process for contact cleaning and polymer removal after metal or via etching. Electrostatic charge on the wafer surface affects the etching reaction significantly in the non-condensed regimes. A positively charged surface enhanced the etching reaction in the submonolayer and monolayer etching regimes. Direct ionization of HF on the oxide surface is responsible for the enhancement in this regime. A negatively charged surface mainly enhanced the etching in the multilayer regime. A thicker multilayer, induced by the formation of fluorosilicate, is responsible for the etching enhancement in this regime. We have demonstrated a successful removal of sodium from both oxide and silicon surfaces using HF/H2 0, HF/IPA, and HF/H20/SiF4 processes in reduced pressure operation. All experiments were performed in a vacuum environment and in-situ XPS was used to measure the surface concentration of sodium. The sodium contamination on oxide surface was successfully removed by both HF/H 20 and HF/IPA processes. The HF/H 20 process could not remove all of sodium contamination on a silicon surface. The addition of SiF4 in the HF/H 20 process greatly enhances the cleaning effect, reducing Na contamination below the detection limit of our XPS, even on a silicon surface. Based on our study, we have reported a true gas phase and vacuum compatible HF vapor process, operated in the monolayer adsorption regime at elevated temperature. A successful removal of RIE residue was performed with a combined cleaning procedure of HF vapor and ashing process. This combined process is a perfect dry cleaning process for contact cleaning method. This process sequence is ideal for a vacuum cluster configuration in which a single wafer is processed at a time and is not exposed in the ambient.
by Yong-Pil Han.
Ph.D.
Abdualla, Mufida. "Sythesis and characterisation of ferrocenyl monolayers on silicon surfaces." Thesis, University of Newcastle upon Tyne, 2014. http://hdl.handle.net/10443/2445.
Full textViswanathan, Kalpana. "Synthesis and Characterization of Novel Polymers for Functional and Stimuli Responsive Silicon Surfaces." Diss., Virginia Tech, 2006. http://hdl.handle.net/10919/27052.
Full textPh. D.
Prayongpan, Pornpimol. "Adsorption and reaction of amines on silicon and germanium surfaces/." free to MU campus, to others for purchase, 2004. http://wwwlib.umi.com/cr/mo/fullcit?p3164538.
Full textVoelkmann, Carsten. "Five wave mixing investigation of electron dynamics at silicon surfaces." [S.l. : s.n.], 2001. http://deposit.ddb.de/cgi-bin/dokserv?idn=96279175X.
Full textSharp, Peter. "Passivated silicon and diamond surfaces : mapping, modification and molecular adsorption." Thesis, University of Nottingham, 2013. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.604336.
Full textMa, Yuan-Ron. "Adsorption and manipulation of Câ†6â†0 on silicon surfaces." Thesis, University of Nottingham, 1998. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.262962.
Full textNorga, Gerd Johan Maria. "Chemistry and physics of metallic contaminants on crystalline silicon surfaces." Thesis, Massachusetts Institute of Technology, 1996. http://hdl.handle.net/1721.1/10904.
Full textIncludes bibliographical references (leaves 202-210).
by Gerd Johan Maria Norga.
Sc.D.
Barritt, Elizabeth. "The silver, copper and silicon (110) surfaces in ambient environments." Thesis, University of Liverpool, 2013. http://livrepository.liverpool.ac.uk/12795/.
Full textNielsen, Jon-Fredrik. "Energetically and kinetically driven step formation and evolution on Silicon surfaces /." The Ohio State University, 2002. http://rave.ohiolink.edu/etdc/view?acc_num=osu1486402957194989.
Full textArmstrong, Jeffrey Lee. "Reaction of carbonyl-and nitrogen-containing molecules on Si(100) and fluxless solder re-flow on polycrystalline Cu surfaces /." Digital version accessible at:, 1998. http://wwwlib.umi.com/cr/utexas/main.
Full textSong, Feng. "Water Droplet Movements on Methyl-terminated Organosilane Modified Silicon Wafer Surfaces." University of Akron / OhioLINK, 2008. http://rave.ohiolink.edu/etdc/view?acc_num=akron1208379295.
Full textChamberlain, Jeffrey P. "The adsorption of carbon monoxide on silicon and gallium arsenide surfaces." Diss., Georgia Institute of Technology, 1993. http://hdl.handle.net/1853/29799.
Full textZhu, Qunzhi. "Modeling and Measurements of the Bidirectional Reflectance of Microrough Silicon Surfaces." Diss., Georgia Institute of Technology, 2004. http://hdl.handle.net/1853/5062.
Full textMaraghechi, Pouya, and University of Lethbridge Faculty of Arts and Science. "Dissociation of molecules on silicon surfaces studied by scanning tunneling microscopy." Thesis, Lethbridge, Alta. : University of Lethbridge, Faculty of Arts and Science, 2007, 2007. http://hdl.handle.net/10133/634.
Full textxviii, 175 leaves : ill. (some col.) ; 29 cm
Keshavarzi, Shervin [Verfasser], Holger [Akademischer Betreuer] Reinecke, and Ulrich [Akademischer Betreuer] Mescheder. "Silicon needle-like surfaces for room temperature si-si bonding applications." Freiburg : Universität, 2019. http://d-nb.info/1202010865/34.
Full textBurkinshaw, Michael Stephen. "The lubrication of aluminium-silicon surfaces with a novel antiwear additive." Thesis, University of Leeds, 2010. http://etheses.whiterose.ac.uk/21110/.
Full textIyer, Nandini 1974. "Material transfer associated with the contact between polymer and silicon surfaces." Thesis, Massachusetts Institute of Technology, 1998. http://hdl.handle.net/1721.1/51564.
Full textIncludes bibliographical references (leaves 126-129).
Material transfer due to the contact of surfaces is encountered in a wide variety of engineering applications. One of these is the backside contamination of silicon wafers due to contact with polymer vacuum chucks during spin coating. The present research investigates material transfer associated with this contact. The contact between the silicon wafer and the vacuum chuck was idealized as pin-on-flat interaction and an experimental apparatus was fabricated based on this model. Material transfer from a variety of solid polymers (UHMWPE, Teflon, KEL-F, PMMA, PEEK, and Nylon 66) was studied and characterized by Scanning Electron Microscopy, Atomic Force Microscopy, Optical Microscopy and computer image analysis. This was augmented with studies of material transfer from polymeric films (Polyethylene, Teflon, and Kapton) and ceramics (quartz, sapphire and ruby). The variables of interest for the material transfer phenomenon were identified using analysis of elastic contacts (Hertzian) and adhesion. Experimental results suggest that the material transfer was affected by the contact area that forms between the polymer and the silicon substrate and by the contact pressure at the surface asperities. At low loads, contact area and pressure decreases causing less transfer. There is a linear relationship between the total particle area and the Hertzian contact area. For elastic contacts, the effect of surface roughness is not pronounced. Friction and surface energy also appear to be weak variables in the material transfer phenomenon. The Young's moduli of the polymers also affect material transfer. The number of particles transferred and the total particle area decreased with an increase in Young's modulus. No material transfer was observed with Kapton, quartz, sapphire and ruby. Material transfer was also inhibited with the use of a small amount of lubricant.
by Nandini Iyer.
S.M.
Nielsen, Jon F. "Energetically and Kinetically Driven Step Formation and Evolution on Silicon Surfaces." The Ohio State University, 2001. http://rave.ohiolink.edu/etdc/view?acc_num=osu998579834.
Full text