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Dissertations / Theses on the topic 'Sputter Magnetron'

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Published: 4 June 2021
Last updated: 1 February 2022

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1

Chiu, K. F. "Ionised magnetron sputter deposition." Thesis, University of Cambridge, 2000. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.597619.

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The goal of this research work was to establish the Ionised Magnetron Sputter Deposition (IMSD) system and apply it to thin film fabrication. Using magnetron sputter deposition, with an additional built-in rf coil generating a rf coupled plasma to ionise sputtered atoms, the process provides a high level of control over the energy input to a growing film. The controllable parameters include ion flux, ion incident energy and the ratio of ions to neutrals of the depositing species. The possibility of depositing films and coatings with up to 85% of the depositing species as ions with energies con
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2

Schoff, Michael Elliott. "Sputter target erosion and its effects on long duration DC magnetron sputter coating." Diss., [La Jolla] : University of California, San Diego, 2009. http://wwwlib.umi.com/cr/ucsd/fullcit?p1464930.

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Thesis (M.S.)--University of California, San Diego, 2009.<br>Title from first page of PDF file (viewed July 14, 2009). Available via ProQuest Digital Dissertations. Includes bibliographical references (p. 54-55).
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3

Junaid, Muhammad. "Magnetron Sputter Epitaxy of GaN Epilayers and Nanorods." Doctoral thesis, Linköpings universitet, Tunnfilmsfysik, 2012. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-84655.

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In this research, electronic-grade GaN(0001) epilayers and nanorods have been grown onto Al2O3(0001) and Si(111) substrates, respectively, by reactive magnetron sputter epitaxy (MSE) using liquid Ga as a sputtering target. MSE, employing ultra high vacuum conditions, high-purity source materials, and lowenergy ion assisted deposition from substrate biasing, is a scalable method, lending itself to large area GaN synthesis. For the growth of epitaxial GaN films two types of sputtering techniques, direct current (DC) magnetron sputtering and high power impulse magnetron sputtering (HiPIMS) were s
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4

Serban, Alexandra. "Magnetron Sputter Epitaxy of Group III-Nitride Semiconductor Nanorods." Licentiate thesis, Linköpings universitet, Tunnfilmsfysik, 2017. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-141595.

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The III-nitride semiconductors family includes gallium nitride (GaN), aluminum nitride (AlN), indium nitride (InN), and related ternary and quaternary alloys. The research interest on this group of materials is sparked by the direct bandgaps, and excellent physical and chemical properties. Moreover, the ternary alloys (InGaN, InAlN and AlGaN) present the advantage of bandgap tuning, giving access to the whole visible spectrum, from near infrared into deep ultraviolet wavelengths. The intrinsic properties of III-nitride materials can be combined with characteristical features of nanodimension a
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5

Long, Yi. "Hardness of nitride thin films made by ionised magnetron sputter deposition." Thesis, University of Cambridge, 2005. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.614990.

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6

O'Kane, Chris. "Optimisation of RF magnetron sputter deposited calcium phosphate (Ca-P) thin films." Thesis, University of Ulster, 2010. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.535139.

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7

Perry, Duncan. "Optimisation of a closed-field unbalanced magnetron sputter process : titanium aluminium nitride." Thesis, University of Salford, 1995. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.308219.

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8

Žukauskaitė, Agnė. "Metastable ScAlN and YAlN Thin Films Grown by Reactive Magnetron Sputter Epitaxy." Doctoral thesis, Linköpings universitet, Tunnfilmsfysik, 2014. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-103832.

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Metastable ScxAl1-xN and YxAl1-xN thin films were deposited in an ultra high vacuum system using reactive magnetron sputter epitaxy from elemental Al, Sc, and Y targets in Ar/N2 gas mixture. Their structural, electrical, optical, mechanical, and piezoelectrical properties were investigated by using the transmission electron microscopy, x-ray diffraction, spectroscopic ellipsometry, I-V and C-V measurements, nanoindentation, and two different techniques for piezoelectric characterization: piezoresponse force microscopy and double beam interferometry. Compared to AlN, improved electromechanical
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9

Ratova, Marina. "Enhanced properties of photocatalytic titania thin films via doping during magnetron sputter deposition." Thesis, Manchester Metropolitan University, 2013. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.603487.

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10

Güttler, D. "Echtzeit-in-situ-Messung der Oberflächenbelegung einer Magnetron-Kathode bei der reaktiven Sputter-Abscheidung." Forschungszentrum Dresden, 2010. http://nbn-resolving.de/urn:nbn:de:bsz:d120-qucosa-61184.

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Reactive Sputtering is a widely used technique in processing of thin compound films. Such films can be sputtered from metal targets, which are comparatively cost efficient. Also the fact that sputtering from metal targets can ccur in the dc mode reduces the cost of the sputtering equipment. To keep the deposition process stable, its necessary to know the effects of target poisoning including its hyteresis behavior. The aim of this work was to nvestigate the evolution of reactive gas coverage on a titanium magnetron target surface, by real time, in-situ ion beam analysis during magnetron sputte
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11

Güttler, D. "Echtzeit-in-situ-Messung der Oberflächenbelegung einer Magnetron-Kathode bei der reaktiven Sputter-Abscheidung." Forschungszentrum Dresden-Rossendorf, 2004. https://hzdr.qucosa.de/id/qucosa%3A22122.

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Reactive Sputtering is a widely used technique in processing of thin compound films. Such films can be sputtered from metal targets, which are comparatively cost efficient. Also the fact that sputtering from metal targets can ccur in the dc mode reduces the cost of the sputtering equipment. To keep the deposition process stable, its necessary to know the effects of target poisoning including its hyteresis behavior. The aim of this work was to nvestigate the evolution of reactive gas coverage on a titanium magnetron target surface, by real time, in-situ ion beam analysis during magnetron sputte
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12

Wright, Jason. "Design and Implementation of DC Magnetron Sputter Deposition System and Hall Effect System Via LabView." Ohio University / OhioLINK, 2015. http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1417605695.

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13

Piascik, Jeffrey Robert Thompson Jeffrey Y. "Evaluation of structure and material properties of RF magnetron sputter-deposited yttria-stabilized zirconia thin films." Chapel Hill, N.C. : University of North Carolina at Chapel Hill, 2007. http://dc.lib.unc.edu/u?/etd,767.

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Thesis (Ph. D.)--University of North Carolina at Chapel Hill, 2007.<br>Title from electronic title page (viewed Dec. 18, 2007). "... in partial fulfillment of the requirements for the degree of Doctor of Philosophy in the Curriculum in Applied and Materials Sciences." Discipline: Applied and Materials Sciences; Department/School: Applied and Materials Sciences.
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14

Tungasmita, Sukkaneste. "Growth of wide-band gap AIN and (SiC)x(AIN)₁₋x thin films by reactive magnetron sputter deposition /." Linköping : Univ, 2001. http://www.bibl.liu.se/liupubl/disp/disp2001/tek711s.pdf.

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15

Höglund, Carina. "Reactive Magnetron Sputter Deposition and Characterization of Thin Films from the Ti-Al-N and Sc-Al-N Systems." Licentiate thesis, Linköping University, Linköping University, Thin Film Physics, 2009. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-17683.

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<p>This Thesis treats the growth and characterization of ternary transition metal nitride thin films. The aim is to probe deeper into the Ti-Al-N system and to explore the novel Sc-Al-N system. Thin films were epitaxially grown by reactive magnetron sputtering from elemental targets onto single-crystal substrates covered with a seed layer. Elastic recoil detection analysis and Rutherford backscattering spectroscopy were used for compositional analysis and depth profiling. Different x-ray diffraction techniques were employed, ex situ using Cu radiation and in situ during deposition using synchr
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16

Braun, Stefan. "Gefüge- und Grenzflächenbeschaffenheit von Mo/Si-Multischichten, synthetisiert mittels Puls-Laser- und Magnetron-Sputter-Deposition : Spiegel für extrem ultraviolette Strahlung." LF, 2004. http://deposit.ddb.de/cgi-bin/dokserv?idn=971281130.

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17

Sohail, Hafiz Muhammad. "Growth of Pt/Mg Multilayer X-ray Mirrors : Effects of Sputter Yield Amplification." Thesis, Linköping University, Department of Physics, Chemistry and Biology, 2009. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-17392.

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<p>This thesis report is focused on the growth of Pt/Mg multilayers and the studies of the sputter yield amplification effect in these. The main application is to use the multilayers as X-ray mirrors reflecting an X-ray wavelength of 17 Å. This wavelength is important for astronomical applications in general, and solar imaging applications in particular.</p><p>For periodic X-ray multilayer mirrors only a certain specific wavelength of X-rays can be reflected. What wavelength that is reflected depends on the individual layer thicknesses of the materials that are constituting the multilayer. The
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18

Le, Coz Thomas. "Fonctionnalisation d'un fil métallique par croissance de films minces dans un magnétron cylindrique inversé." Thesis, Université Grenoble Alpes (ComUE), 2018. http://www.theses.fr/2018GREAI016.

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Les travaux présentés dans ce manuscrit traitent de l’optimisation du procédé de dépôt de couches minces sur un fil d’acier inoxydable en mouvement. Deux magnétrons cylindriques inversés (ICM) sont utilisés pour étudier différents aspects de la pulvérisation cathodique. Dans un premier temps, un modèle analytique permettant l’évaluation des contributions thermiques à l’échauffement du substrat est confronté à des séries de mesures. Les résultats obtenus sont concluants mais souffrent de l’inhomogénéité du champ magnétique, lequel est à l’origine de pertes localisées d’électrons secondaires de
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19

Weichsel, Tim. "Entwicklung und Charakterisierung einer Elektron-Zyklotron-Resonanz-Ionenquelle mit integriertem Sputtermagnetron für die Erzeugung intensiver Ströme einfach geladener Aluminiumionen." Doctoral thesis, Saechsische Landesbibliothek- Staats- und Universitaetsbibliothek Dresden, 2016. http://nbn-resolving.de/urn:nbn:de:bsz:14-qucosa-206003.

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Es wurde eine Elektron-Zyklotron-Resonanz-Ionenquelle mit einer Mikrowellenfrequenz von2,45 GHz für die Produktion intensiver Ströme einfach geladener Metallionen entwickelt. Deren Beladung mit Metalldampf erfolgt über ein integriertes zylindrisches Sputtermagnetron, welches speziell für diese Aufgabe entworfen wurde. Die entstandene MECRIS, engl. Magnetron Electron Cyclotron Resonance Ion Source, vereinigt die ECR-Ionenquellentechnologie mit der Magnetron-Sputtertechnologie auf bisher einzigartige Weise und verkörpert so ein neues Metallionen-Quellenkonzept. Unter Verwendung eines Al-Sputtert
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20

Bräuer, Jörg. "Erarbeitung eines Raumtemperatur-Waferbondverfahrens basierend auf integrierten und reaktiven nanoskaligen Multilagensystemen." Doctoral thesis, Universitätsbibliothek Chemnitz, 2014. http://nbn-resolving.de/urn:nbn:de:bsz:ch1-qucosa-132820.

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Die vorliegende Arbeit beschreibt einen neuartigen Fügeprozess, das sogenannte reaktive Fügen bzw. Bonden. Hierbei werden sich selbsterhaltene exotherme Reaktionen in nanoskaligen Schichtsystemen als lokale Wärmequelle für das Fügen unterschiedlichster Substrate der Mikrosystemtechnik verwendet. Das Bonden mit den reaktiven Systemen unterscheidet sich von herkömmlichen Verfahren der Aufbau- und Verbindungstechnik primär dadurch, dass durch die rasche Reaktionsausbreitung bei gleichzeitig kleinem Reaktionsvolumen die Fügetemperaturen unmittelbar auf die Fügefläche beschränkt bleiben. Entgegen d
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21

Pflug, Andreas. "Simulation des reaktiven Magnetron-Sputterns /." Stuttgart : Fraunhofer-IRB-Verl, 2007. http://deposit.d-nb.de/cgi-bin/dokserv?id=2938746&prov=M&dok_var=1&dok_ext=htm.

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22

Ulucan, Savaş Özyüzer Lütfi. "Growth of magnetron sputtered superconductor MgB2 thin films/." [s.l.]: [s.n.], 2006. http://library.iyte.edu.tr/tezlerengelli/master/fizik/T000550.pdf.

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23

Maniate, Janet. "Fabrication and characterization of DC magnetron sputtered ZnO films." Thesis, McGill University, 2003. http://digitool.Library.McGill.CA:80/R/?func=dbin-jump-full&object_id=19737.

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In order to examine and improve conditions for the fabrication of ZnO thin films by dc magnetron sputtering for solar cell applications, film deposition time, Ar-02 gas inflow and concentration of O? in the Ar-02 gas admitted into the evacuated chamber, line flushing time, voltage at the cathode and the quantity of dopant added to the target were adjusted. Effectiveness of treatment was assessed by characterization of the films produced. When O2 gas incoming to the chamber was 0.1%, the optimum conditions for deposition of thin film ZnO were two hours of line flushing prior to sputtering, depo
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24

Zhou, Wei. "Oblique Angle Deposition Effects on Magnetron-Sputtered Metal Films." Miami University / OhioLINK, 2017. http://rave.ohiolink.edu/etdc/view?acc_num=miami1501067883261477.

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25

Weber, Jörn Christian [Verfasser]. "Reaktive Abscheidung von SiOxNy-Schichten durch Puls-Magnetron-Sputtern / Jörn Christian Weber." München : Verlag Dr. Hut, 2010. http://d-nb.info/1222187760/34.

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26

Danson, Nigel. "Novel techniques for the control of the properties of reactively-sputtered thin films." Thesis, Loughborough University, 1996. https://dspace.lboro.ac.uk/2134/32871.

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Precise control techniques are of fundamental importance in the accurate deposition of optical, mechanical, electrical and magnetic thin films. The objective of this work was twofold: to devise and evaluate novel control systems for reactive sputtering primarily oxide films, and investigate the effects of these processes on resultant film properties.
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27

Trinh, David Huy. "Synthesis and Characterisation of Magnetron Sputtered Alumina-Zirconia Thin Films." Licentiate thesis, Linköping : Linköping University, 2006. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-7513.

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28

Gerbig, Yvonne B. "Control of the nanostructure and microtribology of magnetron sputtered surfaces." Thesis, University of Warwick, 2006. http://wrap.warwick.ac.uk/66300/.

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The technological importance of hard thin films is well established. There is growing recognition that nanometre-scale surface structures can be controlled to the benefit of function. In-process structuring brings these ideas together. This study explores how the morphology, especially the surface topography, and microtribological behaviour of Cr-N films can be controlled during unbalanced magnetron (UBM) sputtering. Experiments varying the sputter power, bias voltage, temperature, total pressure and Ar/N2 ratio during UBM sputtering generated different compositions, crystallite orientations a
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Mei-ChingHuang and 黃美靜. "RF magnetron sputter deposition of BiCuSeO epitaxial films." Thesis, 2018. http://ndltd.ncl.edu.tw/handle/sxa5ep.

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碩士<br>國立成功大學<br>材料科學及工程學系<br>106<br>In this study, we attempted to grow epitaxial BiCuSeO (BCSO) films on (110) and (001) SrTiO3 (STO) substrates as the bottom electrode for the growth of multiferroic BiFeO3 (BFO) films. In our previous attempts, BCSO films of two in-plane orientations were obtained owing to the rapid deposition rate. So, in this work, we used two methods to reduce the rate. One was placing a stainless steel mesh above the substrate in order to scatter the sputtered atoms. Another one was controlling shutter opening time to adjust deposition rate. The films grown with the mesh
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30

Huang, Jun-Hang, and 黃俊翰. "Fabrication of ZnO nanostructure with RF magnetron sputter." Thesis, 2005. http://ndltd.ncl.edu.tw/handle/64294241028491148655.

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碩士<br>國立成功大學<br>材料科學及工程學系碩博士班<br>93<br>ZnO is a wide band-gap semiconductor(~3.4ev) and has many application based on its piezoelectric, optical, electric properties. In recent years, nano-technology has been attached and many processes were reported for producing ZnO nano-structure. There are many reports focus on manufacturing ZnO nano-structure with chemical vapor deposition(CVD) and metal-organic chemical vapor deposition(MOCVD). However, the method for physical vapor deposition(PVD) is still deficient. We report a new method for fabricating ZnO nano structure only use RF magnetron sputter
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31

Hsia, Chen-Hsien, and 夏承賢. "Radio frequency magnetron sputter deposited TiOxNy thin film anodes." Thesis, 2013. http://ndltd.ncl.edu.tw/handle/08587496808884144931.

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碩士<br>逢甲大學<br>材料科學與工程學系<br>101<br>Lithium ion secondary batteries have been the power supplies of varies portable electronic devices, such as digital cameras, smart phones, notebooks, and computers. However, the battery miniaturization of batteries has also been the trend for the development of new generation batteries.Smaller, lighter, thinner, and higher energy density batteries are always demanded by the industries. In this research, Titanium dioxide thin films are chosen as the anode materials. Nitrogen doped TiO2 thin films were deposited by introduced nitrogen gas during deposition. The
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32

Lin, Bo-Shun, and 林柏勳. "Rf magnetron sputter deposition of LiFePO4/C thin films." Thesis, 2006. http://ndltd.ncl.edu.tw/handle/83944845425040391200.

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碩士<br>逢甲大學<br>材料科學所<br>94<br>Secondary lithium batteries have been the primary power supply components for various portable electronic devices, such as cell phones and notebook computers. However, as the weight and volume of the portable devices continuously decrease, the search for smaller, lighter, and higher power density power sources has never stopped. In order to meet these requirements, the concept of Thin Film Batteries (TFB), or all solid state micro-batteries, has therefore been of great interest. With only a few micron meters of thickness or less, thin film batteries are compatible
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33

XU, YI-JIE, and 許奕傑. "Growth and Characterzation of ZnGa2O4 Film by Magnetron Sputter." Thesis, 2019. http://ndltd.ncl.edu.tw/handle/a5k6g7.

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碩士<br>大葉大學<br>醫療器材設計與材料碩士學位學程<br>107<br>In this study, transparent conductive oxide Zinc gallate (ZnGa2O4) thin films were grown on Sapphire substrate by a radio frequency (RF) magnetron using a commercial ceramic target in a vacuum chamber. The structure, composition, and photoluminescence properties of the films were systematically investigated. The ZnGa2O4 film was deposited at a working pressure of 7×10-3 torr, RF power of 150 W and the process temperature at room temperature for 1 hours. After thin film deposition process, the ZnGa2O4 were annealed at temperature range from 600 to 1000℃ i
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YANG, JHIH-REN, and 楊智仁. "Zinc oxide thin film devices prepared by magnetron sputter." Thesis, 2019. http://ndltd.ncl.edu.tw/handle/248kpf.

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碩士<br>明志科技大學<br>電子工程系碩士班<br>107<br>In this research, devices of aluminum-doped zinc oxide (AZO) were prepared by suitable thin film process. The technology of magnetron sputter was used to fabricate thin films of AZO and hafnium dioxide (HfO2). The characteristics of films were modulated by sputtering process parameters. Rapid thermal process (RTP) was used to improve the electrical properties of AZO film. There are three sections in this study. First, the design of device structure and process will be discussed. The second section addresses the characteristics of AZO films process parameter o
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35

Hsu, Chih-Sheng, and 徐智聖. "Synthesis and Characterization of Pulse Magnetron Sputter WTiOx Films." Thesis, 2008. http://ndltd.ncl.edu.tw/handle/29825838236699558361.

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碩士<br>明道大學<br>材料暨系統工程研究所<br>96<br>Tungsten oxide films were used popularly for electrochromic films, but it was easy to form tungsten oxide films impure when deposited. Tungsten would be existence at low price（W+4、W+5）. This study is in order to get high price tungsten ions （W+6） so dope titanium ions into WTiOx films. Titanium ions will be integrated with oxide in WTiOx films by interstitial. Tungsten can be existed in WTiOx films at the high price, it is better to make the electrochromic properties. In this study uses a pulsed sputtering deposition system, tungsten-titanium alloy target and
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Liang, Yu-Han, and 梁譽瀚. "Fabrication and characteristics of ZnO nanodots by RF magnetron sputter." Thesis, 2007. http://ndltd.ncl.edu.tw/handle/67944819264936879661.

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碩士<br>國立成功大學<br>材料科學及工程學系碩博士班<br>95<br>Low dimensional ZnO materials have been popularly investigated in the recent years because of remarkable quantum confinement effects and optoelectrical properties than the bulk counterpart. Until now, ZnO nanostructures are almost fabricated by chemical vapor deposition, and a simple and reliable process for fabricating ZnO nanostructures by physical vapor deposition is still lacking. In this study, we report on the fabrication of Zn/ZnO nanodots and ZnO hexagonal pyramids directly on silicon substrates only by RF magnetron sputtering. In this process
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37

Chang, ChiaWen, and 張嘉文. "Electrochromism in Infrared of R.F Magnetron Sputter Deposited Tungsten Oxide." Thesis, 2001. http://ndltd.ncl.edu.tw/handle/16129854281264457815.

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碩士<br>逢甲大學<br>材料科學學系<br>89<br>Electrochromic tungsten oxide possessing very high coloring-efficiency makes it to be the most promising EC materials whose electrochromic behavior is highly dependent on its O2/Ar. In this study, a survey on the effect of oxygen concentration by manipulating oxygen to argon flow rate ratio in an rf magnetron sputter deposition to the microstructure of the deposited tungsten oxide film was carried to reveal their electrochromic properties in UV-VIS and IR range. SEM, AFM, XRD and ESCA were used to identify the film surface, roughness, crystal structure,
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Lee, Mong Ying, and 李孟螢. "Photocatalytic activity of bipolar pulsed magnetron sputter deposited TiO2 thin films." Thesis, 2014. http://ndltd.ncl.edu.tw/handle/95138230501963154662.

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碩士<br>國立金門大學<br>電子工程學系碩士班<br>102<br>TiO2 films were deposited by bipolar pulse DC magnetron sputtering system.The effects of Ar -O2 ratios,on the films crystal structure, surface microstructure and phtotcatalytic properties of the TiO2 thin films have been investigated .The crystal structure composition of the films were characterized by grazing-incidence X-ray diffraction . The surface morphology of the films was characterized by flied emission scanning electron microscopy(SEM). The phorocatalytic properties of the films were analyzed by the de-colorization of Methylene blue with visible lig
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Tai, Cheng-Chi, and 戴成奇. "Characterization of R.F Magnetron Sputter Deposited Ni/Al2O3 Cermet Thin Films." Thesis, 2004. http://ndltd.ncl.edu.tw/handle/95375150283348601970.

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碩士<br>逢甲大學<br>材料與製造工程所<br>92<br>Ni/Al2O3 cermet thin films have been fabricated by rf magnetron sputter deposition, and characterized under self-heating. A composite target, consist of small Ni sheets (1×1×0.1cm3) attached on Al2O3 plate (dia. 5cm) was used. The sputtering was carried out in Ar atmosphere. The Ni/Al2O3 cermet thin films with different Ni atomic percents were prepared on SiO2/Si substrates. By changing the number of nickel sheets, the Ni /Al2O3 mole ratios of the films can be controlled. Resistivity for the films with different Ni/Al2O3 mole ratios was measured within a period
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40

Ko, Yi-jung, and 柯懿容. "Preparation of Photocatalytic Tantalum Oxide Films by RF Magnetron Sputter Deposition." Thesis, 2008. http://ndltd.ncl.edu.tw/handle/22774430152656387749.

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碩士<br>國立成功大學<br>材料科學及工程學系碩博士班<br>96<br>Abstract Tantalum oxide is a photocatalytic semiconductor. It can decompose the organic pollutants by under UV light irradiation. In this research, we fabricated the Ta2O5 films by using radio frequency magnetron sputtering. The properties of the deposited films were controlled by various working power and working pressure while keeping at constant substrate temperature and sputter time. The crystal structures and composition of the films were characterized by X-ray powder diffraction (XRD),glancing incident angle X-ray Diffraction (GIXRD), and X-ray phot
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Li, Chih-Hung, and 李至弘. "The Study of Highly Defective ZnO/Mg0.4Zn0.6O SuperlatticeMade by RF Magnetron Sputter." Thesis, 2010. http://ndltd.ncl.edu.tw/handle/42749575539850514052.

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碩士<br>臺灣大學<br>應用力學研究所<br>98<br>We studied ZnO, Mg0.4Zn0.6O, Mg0.2Zn0.8O thin films, as well as Mg0.4Zn0.6O/ZnO superlattice deposited on silicon wafer and quartz glass substrates at room temperature using radio frequency magnetron sputtering technique. The material properties were characterized by SIMS, SEM, TEM, transmission spectrum, XRD and PL. From the results of SIMS measurement, the content of Mg0.4Zn0.6O thin film was close to that of the target. After annealing at 600 oC and 800 oC in N2, the cubic MgZnO precipitates in Mg0.4Zn0.6O films. The cubic precipitates were observed by t
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Wu, Che-Wei, and 吳哲維. "optical properties of the Zinc Oxide nanocolumn deposited by RF magnetron sputter." Thesis, 2012. http://ndltd.ncl.edu.tw/handle/91718300132715831366.

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碩士<br>中原大學<br>電子工程研究所<br>100<br>In this paper, ZnO nanocolumns structure optical resonance cavity was deposited by RF magnetron sputtering system in four different concentrations of O2 . (20%,40%,60% and 80%) The crystal structure and optical properties of four conditions of ZnO thin films are presented and discussed. First, the crystal structure of the ZnO thin films are definited by XRD and SEM measurement. The XRD spectra show that the four kinds of ZnO samples have (002) preferred orientation and there are no other ZnO crystal phase. The thickness and the cross-sectional view were measured
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Cho, Yi-Cheng, and 卓逸誠. "Investigation of the Flexible Electrochromic Thin Film by Pulse Magnetron Sputter Process." Thesis, 2013. http://ndltd.ncl.edu.tw/handle/03358956800307524066.

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碩士<br>明道大學<br>材料科學與工程學系碩士班<br>101<br>Electrochromic films were used popularly for building window, optical goods, conveyance and liquid crystal displays. These productions were used the glass substrate mostly. Glass substrate has most high transmittance, heat-resistant and chemical resistance. But its disadvantages are easily broken, heavy and not easy to bend. Therefore, it limits its applications. The flexible substrate can overcome the problem of the glass. In this study, tungsten titanium oxide film was deposited on ITO /PET substrate by using pulse magnetron sputter deposition. The optimu
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Chung, Yi-Chine, and 陳怡蒨. "Thermionic Enhanced DC-magnetron Sputter Deposited Tungsten Oxide and Its Electrochromic Behavior." Thesis, 2006. http://ndltd.ncl.edu.tw/handle/63012829465992359869.

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碩士<br>逢甲大學<br>材料科學所<br>94<br>Due to its non- toxicity, reversibility, high coloration efficiency and durability, tungsten oxide has been widely used as electrochromic material in form of thin films. In this study, tungsten oxide was deposited by thermionic enhanced reactive DC magnetron sputtering at different oxygen partial pressures. After solving service durability of the filament, a variety of plasma diagnostics are used to correlate discharge parameters with microstructure and electrochromic properties of the deposited films. The experimental result shows that electroplated platinum gives
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LIN, YI-HAN, and 林易翰. "Electrochromic Properties of Metallic Oxide Film With Bipolar Pulsed Magnetron Sputter System." Thesis, 2015. http://ndltd.ncl.edu.tw/handle/q7cx72.

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碩士<br>國立金門大學<br>電子工程學系碩士班<br>103<br>Recently, electrochromism receives worldwide attention as an emerging technology. In all of the electrochromic materials, tungsten oxide has a lot of advantages, such as chemical stability, reversibility, opacity, inexpensiveness, and nontoxicity. It has, however, the defects of color leftover and filterability of short-wavelength visible light. In all of the methods of making thin films, sputtering has the advantages of the control of grain growth, the steady crystallization phase and the great thin film homogeneity. In addition, with the application of mag
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Zhang, Hong-Bin, and 張宏濱. "High-Reflectance Multilayer Mirrors for Extreme Ultraviolet Lithography Using Magnetron Sputter-deposition." Thesis, 2015. http://ndltd.ncl.edu.tw/handle/63901264893913926240.

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碩士<br>明新科技大學<br>電子工程系碩士班<br>103<br>In this study, we designed and simulated EUV multilayer mirrors for high reflectance. We fabricated the multilayer mirrors and a capping layer on the top of the multilayer mirrors. The commercial Essential Macleod software was used for our designs and simulations. A Mo/Si multilayer was fabricated by the magnetic sputter system with low and room temperature at Instrument Technology Research Center (ITRC), and their reflectance was measured by the Mega reflector at National Synchrotron Radiation Center (NSRRC). Base on simulations, the reflectance of our desig
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Hsu, Wei-Cheng, and 徐瑋成. "Study of Barium Strontium Titanate Dielectric Thin Films by RF Magnetron Sputter." Thesis, 2014. http://ndltd.ncl.edu.tw/handle/97411486479262370205.

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碩士<br>龍華科技大學<br>電子工程系碩士班<br>102<br>BST thin films were deposited using Ba0.6Sr0.4TiO3 ceramic target by RF magnetron sputter. The effects of both deposition temperature and annealing temperature on BST dielectric property have been evaluated. BST films were deposited at 200, 250 and 300 ℃ and annealed at 600, 650, 700 and 750 ℃ for 120 minutes. The results show that the BST film deposited at 300 ℃ and subsequently annealed at 650 ℃ exhibits the largest dielectric constant, which is 344, 286, and 113 at 1K, 10K, and 100KHz, respectively. Moreover, leakage current will decrease as annealing temp
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LIU, YEN-CHUN, and 劉彥淳. "High Power Impulse Magnetron Sputter Deposited Chromium-Based Coatings for Corrosion Protection." Thesis, 2019. http://ndltd.ncl.edu.tw/handle/vbtmm7.

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碩士<br>逢甲大學<br>材料科學與工程學系<br>107<br>High power impulse magnetron sputtering (HIPIMS) is a relatively recent advance in sputtering technology used for the physical vapor deposition of thin film coatings, which enable to deposit high adhesion, high quality and dense films due to its high level of ionization degree, high plasma density and high ion energy. This study employs HIPIMS to deposit Cr-N coatings on copper alloy substrates to improve the corrosion resistance. The changes of peak voltage, peak current and peak power of chromium target were observed by controlled HIPIMS process parameters s
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Hsueh, Shun-Jen, and 薛舜仁. "The Study of Solar Selective Multilayer Absorber Prepared by Reactive Magnetron Sputter." Thesis, 2012. http://ndltd.ncl.edu.tw/handle/33spv9.

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碩士<br>國立虎尾科技大學<br>材料科學與綠色能源工程研究所<br>100<br>The solar selective multilayer absorber has been used extensively in flat plate solar collector due to its excellent photothermal conversion. Compared with traditional methods, such as electrodeposition and spray, the sputtering can reduce the environmental pollution. The solar selective multilayer absorbers were prepared by reactive magnetron sputtering to study the effects of sputtering power and oxygen flux on the surface morphology, structure, and optical properties of aluminum oxide and nickel oxide films. The influences of the thickness of oxide
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TSAI, YAO-SHENG, and 蔡耀陞. "Thermoelectric Properties of Ag25Sb25Se5Te45 Thin Films Deposited by RF Magnetron Sputter Method." Thesis, 2016. http://ndltd.ncl.edu.tw/handle/59750900746268586293.

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碩士<br>南臺科技大學<br>電子工程系<br>104<br>Due to rapid economic and industrial development, high usage of non-renewable resources (petroleum, coal, natural gas…etc.) deplete those limited resources on Earth, and the resource used in this research is thermoelectric material, which is a kind of renewable resources. Thermoelectric material is a type of material which can help electrical and thermal energy transform with each other. Apart from being renewable resource material and used in thermoelectric generation, it can also be used to make cooling wafer. In recent years, as semiconductor industry grows r
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