Books on the topic 'Sputtering'
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Ray, P. K. Low-energy sputtering research. National Aeronautics and Space Administration, Glenn Research Center, 1999.
Find full textRay, P. K. Low-energy sputtering research. National Aeronautics and Space Administration, Glenn Research Center, 1999.
Find full textV, Shutthanandan, and NASA Glenn Research Center, eds. Low-energy sputtering research. National Aeronautics and Space Administration, Glenn Research Center, 1999.
Find full textV, Shutthanandan, and NASA Glenn Research Center, eds. Low-energy sputtering research. National Aeronautics and Space Administration, Glenn Research Center, 1999.
Find full textBarnat, Edward V., and Toh-Ming Lu. Pulsed and Pulsed Bias Sputtering. Springer US, 2003. http://dx.doi.org/10.1007/978-1-4615-0411-5.
Full textBehrisch, Rainer, and Klaus Wittmaack, eds. Sputtering by Particle Bombardment III. Springer Berlin Heidelberg, 1991. http://dx.doi.org/10.1007/3-540-53428-8.
Full textMantenieks, Maris A. Sputtering threshold energies of heavy ions. National Aeronautics and Space Administration, Glenn Research Center, 1999.
Find full textK, Ray Pradosh, and United States. National Aeronautics and Space Administration., eds. Modeling of life limiting phenomena in the discharge chamber of an electron bombardment ion thruster: Final report. Mechanical Engineering Dept., Tuskegee University, 1991.
Find full text1955-, Patterson Michael J., and United States. National Aeronautics and Space Administration., eds. Ion beam sputtering in electric propulsion facilities. National Aeronautics and Space Administration, 1991.
Find full textA, Teichman Louis, and Langley Research Center, eds. Optical properties of sputtered aluminum on graphite/epoxy composite material. National Aeronautics and Space Administration, Langley Research Center, 1989.
Find full textHaasz, A. A. Angle of incidence dependence of light ion physical sputtering of carbon. [s.n.], 1989.
Find full textUnited States. National Aeronautics and Space Administration., ed. Deposition of adherent Ag-Ti duplex films on ceramics in a multiple-cathode sputter deposition system. National Aeronautics and Space Administration, 1992.
Find full textRittner, Mindy N. Sputtering targets and sputtered films: Technology and markets. Business Communications Co., 2002.
Find full textWasa, Kiyotaka. Thin film materials technology: Sputtering of compound materials. William Andrew Pub., 2004.
Find full text1943-, Lu T. M., ed. Pulsed and pulsed bias sputtering: Principles and applications. Kluwer Academic, 2003.
Find full textPosadowski, Witold Michał. Niekonwencjonalne układy magnetronowe do próżniowego nanoszenia cienkich warstw. Oficyna Wydawnicza Politechniki Wrocławskiej, 2001.
Find full textSemenov, A. P. Puchki raspyli︠a︡i︠u︡shchikh ionov: Poluchenie i primenenie. Izd-vo BNT︠S︡ SO RAN, 1999.
Find full textJ, Mirtich Michael, Curren Arthur N, and United States. National Aeronautics and Space Administration., eds. Ion beam treatment of potential space materials at the NASA Lewis Research Center. National Aeronautics and Space Administration, 1991.
Find full textWasa, Kiyotaka. Handbook of sputter deposition technology: Principles, technology, and applications. Noyes Publications, 1992.
Find full textEllegard, Ole. Sputtering of condensed gases by keV-electrons and ions. Riso National Laboratory, 1986.
Find full textWolfgang, Eckstein. Sputtering, reflection and range values for plasma edge codes. Max-Planck-Institut für Plasmaphysik, 1998.
Find full textUnited States. National Aeronautics and Space Administration., ed. Lubrication with sputtered MoS films: Principles, operation, limitations. National Aeronautics and Space Administration, 1991.
Find full textRay, P. K. Low-energy sputtering studies of boron nitride with xenon ions. National Aeronautics and Space Administration, Lewis Research Center, 1999.
Find full textRay, P. K. Low-energy sputtering studies of boron nitride with xenon ions. National Aeronautics and Space Administration, Lewis Research Center, 1999.
Find full textRay, P. K. Low-energy sputtering studies of boron nitride with xenon ions. National Aeronautics and Space Administration, Lewis Research Center, 1999.
Find full textRay, P. K. Low-energy sputtering studies of boron nitride with xenon ions. National Aeronautics and Space Administration, Lewis Research Center, 1999.
Find full textPostawa, Zbigniew. Sputtering of ground state and excited atoms from single crystals. Nakładem Uniwersytetu Jagiellońskiego, 1995.
Find full textUnited States. National Aeronautics and Space Administration., ed. Plasma assisted surface coating/modification processes: An emerging technology. National Aeronautics and Space Administration, 1987.
Find full textNATO Advanced Study Institute on Physics, Fabrication, and Applications of Multilayered Structures (1987 Bandol, France). Physics, fabrication, and applications of multilayered structures. Plenum Press, 1988.
Find full textInternational Colloquium on Plasmas and Sputtering (5th 1985 Antibes, France). CIP 85: 5ème Colloque international sur les plasmas et la pulvérisation cathodique, Palais des Congrès d'Antibes, 10 au 14 juin 1985 = 5th International Colloquium on Plasmas and Sputtering. SFV, 1985.
Find full textĖlʹtekov, V. A. Vzaimodeĭstvie atomnykh chastit͡s︡ s tverdym telom: Kompʹi͡u︡ternoe modelirovanie. Izd-vo Moskovskogo universiteta, 1993.
Find full textZaka, Yasin. Properties of intrinsic and doped amorphous silicon produced by R.F. Sputtering. University of Aston.Department of Physics, 1985.
Find full textPampillón Arce, María Ángela. Growth of High Permittivity Dielectrics by High Pressure Sputtering from Metallic Targets. Springer International Publishing, 2017. http://dx.doi.org/10.1007/978-3-319-66607-5.
Full textWolf, Andrew Robert. The electrochemistry of amorphous iron bismuth oxide thin films prepared by sputtering. National Library of Canada, 1992.
Find full textCheuk, Roger. Sputtering nickel and nickel-molybdenum as electrocatalysts for the hydrogen evolution reaction. National Library of Canada, 1995.
Find full textH, Arenz, ed. The deposition of amorphous silicon films by the technique of magnetron sputtering. Commissionof the European Communities, 1988.
Find full textHayes, John Richard. Validation of a plasma sheath model for use in RF sputtering systems. The Author], 2003.
Find full textBehrisch, R. Sputtering by Particle Bombardment II: Sputtering of Alloys and Compounds, Electron and Neutron Sputtering, Surface Topography. Springer, 2014.
Find full textNational Aeronautics and Space Administration (NASA) Staff. Low-Energy Sputtering Research. Independently Published, 2018.
Find full textSputtering by Particle Bombardment. Springer Berlin Heidelberg, 2007. http://dx.doi.org/10.1007/978-3-540-44502-9.
Full textHandbook of Sputtering Technology. Elsevier, 2012. http://dx.doi.org/10.1016/c2010-0-67037-4.
Full textMagnetron Sputtering [Working Title]. IntechOpen, 2018. http://dx.doi.org/10.5772/intechopen.74092.
Full textBehrisch, R. Sputtering by Particle Bombardment I: Physical Sputtering of Single-Element Solids. Springer, 2013.
Find full textEckstein, Wolfgang, and Rainer Behrisch. Sputtering by Particle Bombardment: Experiments and Computer Calculations from Threshold to MeV Energies. Springer London, Limited, 2007.
Find full textHigh Power Impulse Magnetron Sputtering. Elsevier, 2020. http://dx.doi.org/10.1016/c2016-0-02463-4.
Full textDepla, Diederik. Magnetrons, Reactive Gases and Sputtering. Lulu Press, Inc., 2013.
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