Relevant bibliographies by topics / SU-8 resist

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  1. Journal articles
  2. Dissertations / Theses
  3. Conference papers

Academic literature on the topic 'SU-8 resist'

Author: Grafiati
Published: 4 June 2021
Last updated: 1 February 2022

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Journal articles on the topic "SU-8 resist"

1

Yoshihisa, Sensu, Sekiguchi Atsushi, Kondo Yoshiyuki, Mori Satoshi, Honda Nao, and Weber William D. "Profile Simulation of SU-8 Thick Film Resist." Journal of Photopolymer Science and Technology 18, no. 1 (2005): 125–32. http://dx.doi.org/10.2494/photopolymer.18.125.

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Jordan, A., and S. Büttgenbach. "Micromechanical force sensors based on SU-8 resist." Microsystem Technologies 18, no. 7-8 (2012): 1095–101. http://dx.doi.org/10.1007/s00542-012-1447-7.

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Lorenz, H., M. Despont, N. Fahrni, N. LaBianca, P. Renaud, and P. Vettiger. "SU-8: a low-cost negative resist for MEMS." Journal of Micromechanics and Microengineering 7, no. 3 (1997): 121–24. http://dx.doi.org/10.1088/0960-1317/7/3/010.

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Shew, Bor-Yuan, Jui-Tang Hung, Tai-Yuan Huang, Kun-Pei Liu, and Chang-Pin Chou. "High resolution x-ray micromachining using SU-8 resist." Journal of Micromechanics and Microengineering 13, no. 5 (2003): 708–13. http://dx.doi.org/10.1088/0960-1317/13/5/324.

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Lawes, Ronald A. "Manufacturing tolerances for UV LIGA using SU-8 resist." Journal of Micromechanics and Microengineering 15, no. 11 (2005): 2198–203. http://dx.doi.org/10.1088/0960-1317/15/11/029.

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Takamura, Makoto, Hiroki Hibino, and Hideki Yamamoto. "Applying strain into graphene by SU-8 resist shrinkage." Journal of Physics D: Applied Physics 49, no. 28 (2016): 285303. http://dx.doi.org/10.1088/0022-3727/49/28/285303.

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Reznikova, E. F., J. Mohr, and H. Hein. "Deep photo-lithography characterization of SU-8 resist layers." Microsystem Technologies 11, no. 4-5 (2005): 282–91. http://dx.doi.org/10.1007/s00542-004-0432-1.

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Kawai, Akira, and Shogo Ohtani. "Frequency Dispersion of Permittivity of SU-8 Resist Thin Film." Journal of Photopolymer Science and Technology 27, no. 6 (2014): 711–12. http://dx.doi.org/10.2494/photopolymer.27.711.

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Dey, P. K., B. Pramanick, A. RaviShankar, P. Ganguly, and S. Das. "MICROSTRUCTURING OF SU-8 RESIST FOR MEMS AND BIO-APPLICATIONS." International Journal on Smart Sensing and Intelligent Systems 3, no. 1 (2010): 118–29. http://dx.doi.org/10.21307/ijssis-2017-384.

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Agarwal, M., R. A. Gunasekaran, P. Coane, and K. Varahramyan. "Scum-free patterning of SU-8 resist for electroforming applications." Journal of Micromechanics and Microengineering 15, no. 1 (2004): 130–35. http://dx.doi.org/10.1088/0960-1317/15/1/020.

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Dissertations / Theses on the topic "SU-8 resist"

1

Catelli, Ricardo Tardelli. "Desenvolvimento de processo litográfico tri-dimensional para aplicação em microóptica integrada." Universidade de São Paulo, 2010. http://www.teses.usp.br/teses/disponiveis/3/3140/tde-21102010-112508/.

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O presente trabalho tem como objetivo desenvolver um processo de fabricação de elementos micro-ópticos utilizando-se litografia por feixe de elétrons, empregando o resiste SU-8, negativo e amplificado quimicamente, sobre substrato de Si. Para tanto, é realizado o estudo dos parâmetros do efeito de proximidade a, b e h para se modelar e controlar os efeitos do espalhamento dos elétrons no resiste e no substrato, e se altera o processamento convencional do SU-8 para se obter um processo com baixo contraste. A determinação dos parâmetros do efeito de proximidade para o sistema de escrita direta e
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Chaplan, Cory A. "Stabilization of Horseradish Peroxidase Using Epoxy Novolac Resins for Applications with Microfluidic Paper-Based Analytical Devices." DigitalCommons@CalPoly, 2014. https://digitalcommons.calpoly.edu/theses/1252.

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Microfluidic paper-based analytical devices (microPADs) are an emerging platform for point-of-care diagnostic tests for use by untrained users with potential applications in healthcare, environmental monitoring, and food safety. These devices can be developed for a multitude of different tests, many of which employ enzymes as catalysts. Without specialized treatment, some enzymes tend to lose their activity when stored on microPADs within 48 hours, which is a major hurdle for taking these types of devices out of the laboratory and into the real world. This work focused on the development of si
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TROUSSIER, Ghislain. "Integration de bobines sur silicium pour la conversion d'energie." Phd thesis, INSA de Toulouse, 2004. http://tel.archives-ouvertes.fr/tel-00009239.

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Dans un contexte d'integration des dispositifs de conversion d'energie de petite puissance, le travail de these presente porte sur la realisation de micro-bobines integrees sur silicium. Les contraintes liees a ce type d'integration resident dans la mise au point, la compatibilite des procedes technologiques contribuant a la fabrication du systeme complet et le cout de fabrication. Dans un premier temps, une etude bibliographique nous a permis de faire une synthese sur les structures integrables de micro-bobines ainsi que sur les materiaux conducteurs et magnetiques et leurs techniques de depo
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陳信傑. "ArF excimer laser micromachining of SU-8 and PMMA resist." Thesis, 2003. http://ndltd.ncl.edu.tw/handle/10357079285020408335.

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Liu, Kun-Pei, and 劉昆沛. "A Study on Ultra-Deep X-ray Lithography Technique with Highly-Sensitive SU-8 Resist." Thesis, 2003. http://ndltd.ncl.edu.tw/handle/93638389674511533095.

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碩士<br>國立交通大學<br>機械工程系<br>91<br>This study investigates the feasibility of using SU-8 as a highly sensitive X-ray resist. An ultra-deep X-ray lithography (UDXL) technique will be developed to give a high- efficiency and high-precision micromachining process. This technique will be used to fabricate a deep (~1.5mm) and precise (＜2μm) resonant cavity of an mm-wave power supply in the future. Via chemical amplification mechanism, the SU-8 resist revealed very high sensitivity under X-ray irradiating. The result showed that its sensitivity is about 160 times higher than that of the tradi
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Conference papers on the topic "SU-8 resist"

1

Sensu, Yoshihisa, Atsushi Sekiguchi, Satoshi Mori, and Nao Honda. "Profile simulation of SU-8 thick film resist." In Microlithography 2005, edited by John L. Sturtevant. SPIE, 2005. http://dx.doi.org/10.1117/12.596856.

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Zhu, Jun, Xiaolin Zhao, and Zhiping Ni. "High-aspect-ratio microstructure fabrication using SU-8 resist." In Micromachining and Microfabrication, edited by Jean Michel Karam and John A. Yasaitis. SPIE, 2000. http://dx.doi.org/10.1117/12.396472.

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Singleton, Laurence, Alexei L. Bogdanov, Serguei Peredkov, et al. "Deep x-ray lithography with the SU-8 resist." In 26th Annual International Symposium on Microlithography, edited by Elizabeth A. Dobisz. SPIE, 2001. http://dx.doi.org/10.1117/12.436647.

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Vora, Kaushal D., Anthony S. Holland, Muralidhar K. Ghantasala, and Arnan Mitchell. "Patterning of SU-8 resist structures using CF 4." In Microelectronics, MEMS, and Nanotechnology, edited by Jung-Chih Chiao, Alex J. Hariz, David N. Jamieson, Giacinta Parish, and Vijay K. Varadan. SPIE, 2004. http://dx.doi.org/10.1117/12.523903.

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Liu, Jingquan, Jun Zhu, Guipu Ding, Xiaolin Zhao, and Bingchu Cai. "Orthogonal method for processing of SU-8 resist in UV-LIGA." In Micromachining and Microfabrication, edited by Jean Michel Karam and John A. Yasaitis. SPIE, 2001. http://dx.doi.org/10.1117/12.442980.

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Wang, Tao, Marzia Quaglio, Fabrizio Pirri, Yang-Chun Cheng, David Busacker, and Franco Cerrina. "Patterning of SU-8 resist with digital micromirror device (DMD) maskless lithography." In SPIE Advanced Lithography, edited by Harry J. Levinson and Mircea V. Dusa. SPIE, 2009. http://dx.doi.org/10.1117/12.814831.

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Jordan, A., and S. Büttgenbach. "Fabrication process and characterization of micromechanical sensors based on SU-8 resist." In SPIE Microtechnologies, edited by Ulrich Schmid, José Luis Sánchez-Rojas, and Monika Leester-Schaedel. SPIE, 2011. http://dx.doi.org/10.1117/12.886467.

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Shuli Li, Shani Lu, and M. J. Lancaster. "WR-3 band butler matrix design using SU-8 photo-resist technology." In 3rd Annual Seminar on Passive RF and Microwave Components. IET, 2012. http://dx.doi.org/10.1049/ic.2012.0061.

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Takamura, Makoto, and Hiroki Hibino. "Applying a large strain into graphene using thermal shrinkage of SU-8 resist." In 2015 IEEE 15th International Conference on Nanotechnology (IEEE-NANO). IEEE, 2015. http://dx.doi.org/10.1109/nano.2015.7389011.

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Wang, Xudi, Liangjin Ge, Jingjing Lu, and Shaojun Fu. "High aspect ratio grating fabrication in SU-8 resist by UV-Curing nanoimprint." In International Conference of Optical Instrument and Technology, edited by Zhaoying Zhou, Shanhong Xia, Chih-Ming Ho, and Helmut Seidel. SPIE, 2008. http://dx.doi.org/10.1117/12.807006.

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You might also be interested in the extended bibliographies on the topic 'SU-8 resist' for particular source types:
Journal articles
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