Academic literature on the topic 'Thin film layer analysis'

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Journal articles on the topic "Thin film layer analysis"

1

Huang, T. C., and W. Parrish. "X-Ray Fluorescence Analysis of Multi-Layer Thin Films." Advances in X-ray Analysis 29 (1985): 395–402. http://dx.doi.org/10.1154/s0376030800010508.

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AbstractThe characterization of multi-layer thin films by X-ray fluorescence using the fundamental parameter method and the LAMA-III program is described. Analyses of a double-layer FeMn/NiFe and two triple-layer NiFe/Cu/Cr and Cr/Cu/NiFe specimens show that the complex inter-layer absorption and secondary fluorescence effects were properly corrected. The compositions and thicknesses of all layers agreed to ±2% with corresponding single-layer films, a precisian comparable with bulk and single-layer thin film analyses.
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2

Lamovec, J., V. Jovic, M. Vorkapic, B. Popovic, V. Radojevic, and R. Aleksic. "Microhardness analysis of thin metallic multilayer composite films on copper substrates." Journal of Mining and Metallurgy, Section B: Metallurgy 47, no. 1 (2011): 53–61. http://dx.doi.org/10.2298/jmmb1101053l.

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Composite systems of alternately electrodeposited nanocrystalline Ni and Cu films on cold-rolled polycrystalline copper substrates were fabricated. Highly-densified parallel interfaces which can give rise to high strength of composites are obtained by depositing layers at a very narrow spacing. The hardness properties of the composite systems were characterized using Vickers microhardness testing with loads ranging from 1.96 N down to 0.049 N. Above a certain critical penetration depth, a measured hardness value is not the hardness of the electrodeposited film, but the so-called ?composite hardness?, because the substrate also participates in the plastic deformations during the indentation process. Dependence of microhardness on layer thickness, Ni/Cu layer thickness ratio and total thickness of the film was investigated. Model of Korsunsky was applied to the experimental data in order to determine the composite film hardness. The microhardness increased with decreasing the layer thickness down to 30 nm and it is consistent with the Hall-Petch relation. Layer thickness and layer thickness ratio are the important parameters which are responsible for making decision of the total film thickness.
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3

Kaufmann, M., M. Mantler, and F. Weber. "Analysis of Multi-Layer Thin Films by XRF." Advances in X-ray Analysis 37 (1993): 205–12. http://dx.doi.org/10.1154/s0376030800015706.

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AbstractThe characterization of multi-layer thin film properties, such as thicknesses of layers or concentrations of elements, using the fundamental parameter method is discussed. Experimental results are shown for repetitive multi-layers of up to 80 layers. Furthermore the impact of using different characteristic lines on the information depth and the resolving power is discussed for single layers and repetitive multi-layers. Finally, thin films containing light elements are presented; in this case the conventional fundamental parameter theory fails to provide accurate results, perhaps due to the neglect of the impact of the secondary excitation by photoelectrons.
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4

Sasi, Krishnaprasad, Sebastian Mailadil, Fredy Rojas, Aldrin Antony, and Jayaraj Madambi. "Buffer Assisted Epitaxial Growth of Bi1.5Zn1Nb1.5O7 Thin Films by Pulsed Laser Deposition for Optoelectronic Applications." MRS Proceedings 1454 (2012): 183–88. http://dx.doi.org/10.1557/opl.2012.1264.

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ABSTRACTBi1.5Zn1Nb1.5O7 (BZN) epitaxial thin films were prepared on Al2O3with a double ZnO buffer layer by pulsed laser deposition. The pole figure analysis and reciprocal space mapping revealed the single crystalline nature of the thin film. The sharp intense spots in the SAED pattern also indicates the highly crystalline nature of BZN thin film. The electrical properties of the as deposited thin films were investigated by patterning an inter digital capacitor (IDC) structure on BZN. A high tunability was observed in this epitaxially grown thin films.
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5

Kim, Ig-Hyeon, Changmo Sung, and Sang-Ro Lee. "TEM Observation of Delamination Behavior of c-BN Thin Film." Microscopy and Microanalysis 3, S2 (1997): 483–84. http://dx.doi.org/10.1017/s1431927600009302.

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Cubic boron nitride films were prepared by helicon wave plasma CVD process on (100) Si. The film deposited under the intense impact of energetic ions is usually delaminated from the substrate after deposition. The delamination behavior of c-BN film was investigated with transmission electron microscopy. It is found that moisture in the air, surface roughness of the film and substrate, as well as severe compressive stresses in the film are the primary contributors to film delamination. An aqueous oxidation was verified by EDXS analysis, which generate local stress by volume expansion at the crack region in the c-BN layer.The cross-sectional TEM micrograph of c-BN film in Fig. 1 shows that a very thin layer of h-BN is deposited before the c-BN layer starts to grow at an early stage of film growth. A columnar structured thin h-BN layer about 20 nm thickness at the interface is clearly separated from the c-BN layer in an aspect of microstructure.
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6

Kong, G., M. O. Jones, J. S. Abell, et al. "Microstructure of laser-ablated superconducting La2CuO4Fx thin films on SrTiO3." Journal of Materials Research 16, no. 11 (2001): 3309–16. http://dx.doi.org/10.1557/jmr.2001.0455.

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Thin films of lanthanum cuprate were grown on SrTiO3 substrates by pulsed laser deposition and made superconducting (Tc ∼ 38 K) through the process of post-deposition fluorination using elemental fluorine. A microstructural analysis showed that the [110] zone of the film grows parallel to the [100] zone of the SrTiO3 substrate, reducing the lattice mismatch from 37.5% to 2.4%. At the film–substrate interface there is an intermediate layer 3–4 nm thick and twin-related grains emanate from this region. Stacking faults are present in the bulk of the film, with misoriented subgrains present at the deposit surface.
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7

Lee, Sang Hyuk, Bo Hyun Seo, and Jong Hyun Seo. "Micro-Scratch Analysis on Adhesion between Thin Films and PES Substrate." Advanced Materials Research 26-28 (October 2007): 1153–56. http://dx.doi.org/10.4028/www.scientific.net/amr.26-28.1153.

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In flexible display, reliability of the thin film/polymer interface is an important issue because adhesion strength dissimilar materials is often inherently poor, and residual stresses arising from thermal mismatches or pressure exerted by vaporized moisture often lead to delaminations of interfaces. In the present study we deposited various thin films such as silicon nitride (SiNx), aluminum metal layer, and indium tin oxide on polyether sulphone (PES) substrate. The film adhesion was determined by micro-scratch test. The adhesion strength, presented by the critical load, Lc, when the film starts to delaminate, was determined as a function of plasma pretreated on PES substrate.
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8

Mutlu, Zafer, Yasar G. Mutlu, Mucahit Yilmaz, Oguz Dogan, Mihrimah Ozkan, and Cengiz S. Ozkan. "Fabrication and Surface Morphology of YBCO Superconducting Thin films on STO Buffered Si Substrates." MRS Proceedings 1454 (2012): 129–34. http://dx.doi.org/10.1557/opl.2012.1069.

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ABSTRACTPulsed Electron Deposition (PED) is an attractive alternative to Pulsed Laser Deposition (PLD) for growing high temperature superconductor thin films because of its relatively low cost. In this study, YBa2Cu3O7-δ(YBCO) thin film has been fabricated on silicon substrates by Pulsed Electron Deposition technique. SrTiO3 (STO) as a buffer layer has been grown between Si substrate and YBCO superconducting layer. The crystalline structures of STO/Si and YBCO/STO/Si films have been investigated by x-ray diffraction (XRD). The surface morphology and microstructure of YBCO/STO/Si thin film have been characterized with atomic force microscope (AFM) and scanning electron microscope (SEM). From the θ-2θ XRD analysis of YBCO thin films, (00l) diffraction peaks are obtained indicating they have a poor c-axis oriented structure. SEM analysis shows that the surfaces of films are crack-free, but they have some particulates. On AFM images, the droplets are clearly observed leading to a roughly surface.
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9

Chu, H. M., R. T. Lee, S. Y. Hu, and Y. P. Chang. "Rheological Characteristics for Thin Film Elastohydrodynamic Lubrication." Journal of Mechanics 21, no. 2 (2005): 77–84. http://dx.doi.org/10.1017/s172771910000455x.

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ABSTRACTThis paper uses three lubrication models to explore the differential phenomenon in the status of thin film lubrication (TFL). According to the viscous adsorption theory, the modified Reynolds equation for thin film elastohydrodynamic lubrication (TFEHL) is derived. In this theory, the film thickness between lubricated surfaces is simplified as three fixed layers across the film, and the viscosity and density of the lubricant vary with pressure in each layer. Under certain conditions, such as a rough or concentrated contact of a nominally flat surface, films may be of nanometer scale. The thin film elastohydrodynamic lubrication (EHL) analysis is performed on a surface forces (SF) model which includes van der waals and solvation forces. The results show that the proposed TFEHL model can reasonably calculate the film thickness and the average relative viscosity under thin film EHL. The adsorption layer thickness and the viscosity influence significantly the lubrication characteristics of the contact conjunction. The differences in pressure distribution and film shape between surface forces model and classical EHL model were obvious, especially in the Hertzian contact area. The solvation force has the greatest influence on pressure distribution.
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10

Soni, Sandeep, and D. P. Vakharia. "Performance Analysis of Short Journal Bearing under Thin Film Lubrication." ISRN Mechanical Engineering 2014 (April 24, 2014): 1–8. http://dx.doi.org/10.1155/2014/281021.

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The steady state performance analysis of short circular journal bearing is conducted using the viscosity correction model under thin film lubrication conditions. The thickness of adsorbed molecular layers is the most critical factor in studying thin film lubrication, and is the most essential parameter that distinguishes thin film from thick film lubrication analysis. The interaction between the lubricant and the surface within a very narrow gap has been considered. The general Reynolds equation has been derived for calculating thin film lubrication parameters affecting the performance of short circular journal bearing. Investigation for the load carrying capacity, friction force, torque, and power loss for the short circular journal bearing under the consideration of adsorbed layer thickness (2δ) has been carried out. The analysis is carried out for the short bearing approximation (L/D=0.5) using Gumbel’s boundary condition. It has been found that the steady state performance parameters are comparatively higher for short circular journal bearing under the consideration of adsorbed layer thickness than for plain circular journal bearing. The load carrying capability of adsorbed layer thickness considered bearing is observed to be high for the specified operating conditions. This work could promote the understanding and research for the mechanism of the nanoscale thin film lubrication.
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