Relevant bibliographies by topics / Ti(N

Contents

  1. Journal articles
  2. Dissertations / Theses
  3. Books
  4. Book chapters
  5. Conference papers
  6. Reports

Academic literature on the topic 'Ti(N'

Author: Grafiati
Published: 4 June 2021
Last updated: 1 February 2022

Create a spot-on reference in APA, MLA, Chicago, Harvard, and other styles

Select a source type:

Consult the lists of relevant articles, books, theses, conference reports, and other scholarly sources on the topic 'Ti(N.'

Next to every source in the list of references, there is an 'Add to bibliography' button. Press on it, and we will generate automatically the bibliographic reference to the chosen work in the citation style you need: APA, MLA, Harvard, Chicago, Vancouver, etc.

You can also download the full text of the academic publication as pdf and read online its abstract whenever available in the metadata.

Journal articles on the topic "Ti(N"

1

Hasegawa, Hiroyuki, Ayako Kimura, and Tetsuya Suzuki. "Microhardness and structural analysis of (Ti,Al)N, (Ti,Cr)N, (Ti,Zr)N and (Ti,V)N films." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 18, no. 3 (May 2000): 1038–40. http://dx.doi.org/10.1116/1.582296.

Full text
APA, Harvard, Vancouver, ISO, and other styles
2

Shtansky, D. V., A. N. Sheveiko, M. I. Petrzhik, F. V. Kiryukhantsev-Korneev, E. A. Levashov, A. Leyland, A. L. Yerokhin, and A. Matthews. "Hard tribological Ti–B–N, Ti–Cr–B–N, Ti–Si–B–N and Ti–Al–Si–B–N coatings." Surface and Coatings Technology 200, no. 1-4 (October 2005): 208–12. http://dx.doi.org/10.1016/j.surfcoat.2005.02.126.

Full text
APA, Harvard, Vancouver, ISO, and other styles
3

Ipaz, L., H. Ruiz-Luna, F. J. Espinoza-Beltrán, and G. Zambrano. "Correlation Between Mechanical Properties and Nanofriction of [Ti–Cr/Ti–Cr–N] n and [Ti–Al/Ti–Al–N] n Multilayers." Tribology Letters 49, no. 2 (December 5, 2012): 403–12. http://dx.doi.org/10.1007/s11249-012-0081-y.

Full text
APA, Harvard, Vancouver, ISO, and other styles
4

Kuo, Dong-Hau, and Wen-Chieh Liao. "Ti–N, Ti–C–N, Ti–Si–N coatings obtained by APCVD at 650–800 °C." Applied Surface Science 199, no. 1-4 (October 2002): 278–86. http://dx.doi.org/10.1016/s0169-4332(02)00869-3.

Full text
APA, Harvard, Vancouver, ISO, and other styles
5

Kiryukhantsev-Korneev, Ph V., D. V. Shtansky, M. I. Petrzhik, E. A. Levashov, and B. N. Mavrin. "Thermal stability and oxidation resistance of Ti–B–N, Ti–Cr–B–N, Ti–Si–B–N and Ti–Al–Si–B–N films." Surface and Coatings Technology 201, no. 13 (March 2007): 6143–47. http://dx.doi.org/10.1016/j.surfcoat.2006.08.133.

Full text
APA, Harvard, Vancouver, ISO, and other styles
6

Sun, Tao, Lang-Ping Wang, Min Wang, Ho-Wang Tong, and William W. Lu. "PIIID-formed (Ti, O)/Ti, (Ti, N)/Ti and (Ti, O, N)/Ti coatings on NiTi shape memory alloy for medical applications." Materials Science and Engineering: C 32, no. 6 (August 2012): 1469–79. http://dx.doi.org/10.1016/j.msec.2012.04.027.

Full text
APA, Harvard, Vancouver, ISO, and other styles
7

Knotek, O., M. Böhmer, T. Leyendecker, and F. Jungblut. "The structure and composition of TiZrN, TiAlZrN and TiAlVN coatings." Materials Science and Engineering: A 105-106 (December 1988): 481–88. http://dx.doi.org/10.1016/0025-5416(88)90732-x.

Full text
APA, Harvard, Vancouver, ISO, and other styles
8

Hоvоrun, Т. P., O. V. Pylypenko, M. V. Hovorun, and K. O. Dyadyura. "Methods of Obtaining and Properties of Wear-resistant Coatings Ti and N and Ti, Al and N." Journal of Nano- and Electronic Physics 9, no. 2 (2017): 02026–1. http://dx.doi.org/10.21272/jnep.9(2).02026.

Full text
APA, Harvard, Vancouver, ISO, and other styles
9

Kim, Seong-Won, Jung-Min Chae, Shin-Hoo Kang, Sung-Soo Ryu, and Hyung-Tae Kim. "Characterization of Ti(C,N) Solid Solutions in Densified Ti(C,N) and TiC-TiN-Ni Cermet." Journal of Korean Powder Metallurgy Institute 15, no. 6 (December 28, 2008): 503–8. http://dx.doi.org/10.4150/kpmi.2008.15.6.503.

Full text
APA, Harvard, Vancouver, ISO, and other styles
10

Okamoto, H. "N-Ti (Nitrogen-Titanium)." Journal of Phase Equilibria 14, no. 4 (August 1993): 536. http://dx.doi.org/10.1007/bf02671982.

Full text
APA, Harvard, Vancouver, ISO, and other styles
More sources

Dissertations / Theses on the topic "Ti(N"

1

Schramm, Benítez Isabella Citlalli. "Defect-engineered (Ti,Al)N thin films." Doctoral thesis, Linköpings universitet, Nanostrukturerade material, 2017. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-142116.

Full text
Abstract:
This thesis investigates the effect of point defects (nitrogen vacancies and interstitials) and multilayering ((Ti,Al)N/TiN) on the phase transformations in cathodic arc-evaporated cubic (Ti,Al)N thin films at elevated temperatures. Special attention is paid to the evolution of the beneficial spinodal decomposition into c-TiN and c-AlN, the detrimental formation of wurtzite AlN and the potential application as hard coating in cutting tools. c-(Ti1-xAlx)Ny thin films with varying Al fractions and N content (y = 0.93 to 0.75) show a delay in the spinodal decomposition when increasing the amount of N vacancies. This results in a 300 °C upshift in the age hardening and a delay in the w-AlN formation, while additions of self-interstitials enhance phase separation. High temperature interaction between hard metal substrates and thin films is more pronounced when increasing N deficiency through diffusion of substrate elements into the film. Low N content films (y = 0.58 to 0.40) showed formation of additional phases such as Ti4AlN3, Ti2AlN, Al5Ti2 and Al3Ti during annealing and a transformation from Ti2AlN to Ti4AlN3 via intercalation. The multilayer structure of TiN/TiAlN results in surfacedirected spinodal decomposition that affects the decomposition behavior. Careful use of these effects appears as a promising method to improve cutting tool performance.
Diese Arbeit untersucht den Effekt von Punktdefekten (Stickstoffleerstellen und Zwischengitteratome) und Multilagen ((Ti,Al)N/TiN) auf die Phasenumwandlung in lichtbogenverdampften kubischen (Ti,Al)N-Dünnschichten bei erhöhten Temperaturen. Besonderes Augenmerk liegt auf der Entwicklung der vorteilhaften spinodalen Entmischung in c-TiN und c-AlN und der nachteiligen Bildung von Wurtzit-AlN, sowie der möglichen Anwendung als Hartstoffbeschichtung von Schneidwerkzeugen. c-(Ti1-xAlx)Ny mit unterschiedlichem Al-Anteil und N-Gehalten von y = 0,93 bis 0,75 zeigt mit zunehmenden Stickstoffleerstellen eine Verzögerung der spinodalen Entmischung. Dadurch verschiebt sich die Ausscheidungshärtung um 300 °C zu höheren Temperaturen und die w-AlN-Bildung wird verzögert, während der Einbau von Eigenzwischengitteratomen die Entmischung beschleunigt. Die Hochtemperaturwechselwirkung zwischen Hartmetallsubstrat und Dünnschicht durch Diffusion von Substratelementen in die Schicht nimmt mit steigendem Stickstoffdefizit zu. Stickstoffarme Schichten (y = 0,58 bis 0,40) zeigen während der Wärmebehandlung zusätzliche Phasen wie Ti4AlN3, Ti2AlN, Al5Ti2 und Al3Ti und eine Umwandlung von Ti2AlN in Ti4AlN3 durch Interkalation. Die Multischichtstruktur von TiN/TiAlN führt zu einer oberflächengerichteten spinodalen Entmischung, die das Entmischungsverhalten beeinflusst. Ein gezielter Einsatz dieser Effekte erscheint als ein vielsprechender Weg, um die Leistungsfähigkeit von Schneidwerkzeugen zu verbessern.
I denna avhandling behandlas inverkan av punktdefekter (kvävevakanser och interstitialer) och multilagring ((Ti,Al)N/TiN) på högtemperaturfasomvandlingar i tunna arcförångade skikt av kubiska (Ti,Al)N. Störst vikt har lagts på utvecklingen av det fördelaktiga spinodala sönderfallet till c-TiN och c-AlN, den ofördelaktiga omvandlingen till w-AlN och potentialen som hårda skikt i verktygstillämpningar. Tunna c-(Ti1-xAlx)Ny skikt med olika Al-andel och en N-halt mellan (y = 0.93 och 0.75) uppvisar ökad undertryckning av det spinodala sönderfallet med ökat kvävevakanshalt. Detta resulterar i bildandet av w-AlN skiftas upp i temperatur vilket gör att åldershärdningen höjs med 300 °C. Däremot medför närvaron av självinterstitialer ett snabbare sönderfall. Växelverkan mellan hårdmetallsubstraten och de tunna skikten vid hög temperatur ökar med minskad kvävehalt i skiten genom diffusion av atomer från substratet in i filmen. Filmer med låg kvävehalt (y = 0.58 till 0.40) bildar även andra faser så som Ti4AlN3, Ti2AlN, Al5Ti2 och Al3Ti under värmebehandling och fasomvandlingen från Ti2AlN till Ti4AlN3 sker via en mekanism kallad intercalation. Multilagring av TiN/TiAlN resulterar i ett ytriktad spinodalt sönderfall vilket påverkar det totala sönderfallsförloppet. Nyttjande av dessa resultat syns som lovande vägar till förbättrade verktygsegenskaper.
APA, Harvard, Vancouver, ISO, and other styles
2

Qangule, Lusanda Lungelwa. "Investigation of the ⁵¹V(n,d)⁵⁰Ti reaction." Master's thesis, University of Cape Town, 1992. http://hdl.handle.net/11427/18346.

Full text
Abstract:
Includes bibliography.
The ⁵¹V(n,d) ⁵⁰Ti reaction has been studied with neutrons of energy of 21.6 MeV. The measurement of the angular distribution of the differential cross section was made with the aid of a spectrometer designed by Dr. McMurray and Prof K. Bharuth - Ram. The spectrometer consists of three multiwire proportional counters followed by a curved plastic scintillator. The proportional counters act as ΔE detectors and the scintillator acts as an energy detector. The ΔE - E method based on the Bethe - Bloch formula was used for particle identification. The spectrometer allows accumulation of data over an angle range of ≥ 70°, has angular resolution (FWHM) ≈ 5° and energy resolution (FWHM) ≈ 0.8 MeV. A review of the optical model and the reaction mechanism is presented. Theoretical DWBA cross sections are performed by using the Distorted Waves code DWUCK4. Spectroscopic factors for transitions to the 0⁺, 2⁺ and (4⁺ , 6⁺ ) states in ⁵⁰Ti have been determined from the comparison of experimental differential cross sections to theoretical DWBA differential cross sections. These have a mean value of 0.42, 0.30 and 0.38 respectively. The spectroscopic factors are compared with the results from (e,e' p) and (d,³He) measurements and shell model calculations.
APA, Harvard, Vancouver, ISO, and other styles
3

Basilio, Bartolo Juan Carlos, and Prada Renzo Jos? Mendoza. "Gesti?n de requerimientos del ?rea de TI." Bachelor's thesis, Universidad Peruana de Ciencias Aplicadas (UPC), 2012. http://hdl.handle.net/10757/300089.

Full text
Abstract:
La gesti?n de requerimientos del ?rea de TI en la empresa Laboratorios Elifarma es el tema principal de la presente tesis. El presente documento ha sido dividido en tres cap?tulos, modelado de procesos, aplicaci?n de m?todos agiles y CMMi. El modelado de procesos, comprende el an?lisis de la situaci?n actual de la empresa e implementaci?n de mejoras a los procesos, para poder medirlas se establecen indicadores que faciliten su gesti?n. En la segunda parte, se incorporan practicas agiles al proceso actual con la finalidad de optimizarlos en tiempo y costo. Como ?ltimo punto se incorporan pr?cticas espec?ficas y gen?ricas de CMMi, alineando los procesos al marco establecido con la finalidad de conseguir resultados de calidad que aporten valor a la empresa.
Tesis
APA, Harvard, Vancouver, ISO, and other styles
4

Krüger, Kathrin [Verfasser], and Dr S. [Akademischer Betreuer] Ulrich. "Funktionelle PVD-Viellagenschichten aus den Systemen Fe-Co-Hf-N, Ti-N und Ti-Al-N für die Hochfrequenz-Sensorik / Kathrin Krüger. Betreuer: Dr. S. Ulrich." Karlsruhe : KIT-Bibliothek, 2015. http://d-nb.info/1070635707/34.

Full text
APA, Harvard, Vancouver, ISO, and other styles
5

Salamat, N. "High pressure solid state chemistry of C-N-H and Ti-N systems." Thesis, University College London (University of London), 2010. http://discovery.ucl.ac.uk/20191/.

Full text
Abstract:
This thesis presents the use of molecular precursors for the synthesis of solid-state materials through the application of extreme conditions. The main tool for the exploration of these materials was the diamond anvil cell which generated static pressures of up to 85 GPa. Combined with the use of highpower lasers, it provides a powerful and efficient technique for high-pressurehigh- temperature synthesis of solid-state materials. The work presented here is an investigation into the synthesis and recovery of new materials within two solid-state systems, C-N-H and Ti-N-O. Crystallographic analysis of these systems is a challenging process, made more difficult by their relatively light elemental composition and the use of the diamond anvil cell. In both cases a systematic experimental and analytical strategy was adopted to enable the extraction of the best data possible, both qualitatively and statistically. Two C-N-H systems were investigated: C2N3H and C6N9H3.HCl. Synchrotron X-ray diffraction and Raman scattering data are reported for the new dense tetrahedrally bonded phase C2N3H with a defective wurtzite structure. This is synthesised by laser heating from an organic precursor, dicyandiamide, C2N4H4 at high-pressure in a diamond anvil cell. This work confirms the structure deduced in previous work from electron diffraction experiments on samples recovered to ambient conditions. The graphitic layered compound C6N9H3.HCl was subjected to pressures up to 70 GPa in a diamond anvil cell and its structural behaviour was examined using synchrotron X-ray diffraction. The use of laser heating experiments revealed the synthesis of a new carbon nitride phase which is recoverable to ambient conditions. The second group of systems explored was those based on Ti-O-N. Amorphous or nano-crystalline precursors were used to attempt the synthesis of Ti3N4. The high-pressure and temperature behaviour of these materials was examined using synchrotron X-ray diffraction and Raman spectroscopy, in a laser-heated diamond anvil cell. In addition, the high-pressure studies of Ti2.85O4N, a recently discovered titanium oxynitride phase, are reported here up to 70 GPa. Using synchrotron angle dispersive techniques two high-pressure phases are observed and an attempt to elucidate these structures are reported.
APA, Harvard, Vancouver, ISO, and other styles
6

Flink, Axel. "Growth and Characterization of Ti-Si-N Hard Coatings." Licentiate thesis, Linköping : Department of Physics, Chemistry and Biology, Linköping University, 2006. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-7741.

Full text
APA, Harvard, Vancouver, ISO, and other styles
7

Flink, Axel. "Growth and Characterization of Ti-Si-N Thin Films." Doctoral thesis, Linköpings universitet, Tunnfilmsfysik, 2008. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-11929.

Full text
Abstract:
Utvecklingen inom materialforskningen går mot att framställa avancerade material vilka är skräddarsydda för olika tillämpningar. Detta har medfört att det blir allt mer populärt att belägga ytor med ett eller flera tunna lager med syfte att förbättra materialegenskaperna. Användningsområden för ytbeläggningar går att hitta inom allt från vardagliga produkter såsom teflonbeläggningar av stekpannor, förgyllning av smycken till avancerad halvledarteknik för att åstadkomma energieffektiva lysdioder. Det enskilt största tillämpningsområdet för tunna filmer är dock som skyddande skikt för verktyg inom skärande bearbetning. Utvecklingen går stadigt mot högre skärhastigheter och därmed ökade temperaturer, idagsläget kan området där verktyget och arbetsmaterialet är i kontakt nå temperaturer på mellan 800-1000 °C utan att förlora nämnvärt i styrka. Detta har gjorts möjligt genom att belägga skären med någon eller några μm (tusendels mm) av lämpligt keramiskt material i avseende att öka motståndskraften för nötning vid bearbetning vid höga temperaturer. I den här avhandlingen har tunna filmer studerats med det övergripande målet att förbättra egenskaper hos verktyg för skärande metallbearbetning genom att öka motståndskraften hos materialen mot mekanisk och kemisk nötning vid höga temperaturer. Materialsystemet som undersökts är Ti-Si-N, där tunna filmer av både legeringar och tvåfassystem har syntetiserats och egenskapskarakteriserats. Legeringarna är belagda med varierande Si-halt från 0 till 10 atomprocent och avsedda för att studera strukturella, termiska och mekaniska egenskaper. De framställdes med en teknik som kallas arcförångning, där man i ett vakuumsystem frigör högenergetiskt material i det här fallet av Ti och Si som förångas från en solid yta kallad target. Atomerna joniseras genom kollisioner med elektroner och reagerar på sin väg mot substratet med kvävgas. Väl framme vid substratet, kondenserar jonerna och bilder den tunna filmen. Filmerna består av två strukturtyper, den första är en fast lösning där Si atomer upp till 5 at.% ersätter Ti atomer i TiN. I det andra fallet så segregerar Si till korngränserna. Värmebehandlingsexperiment visar att Si bildar SiNx som kapslar in TiN-korn vid temperaturer upp till 1000 °C. Hårdhetstester visar att filmerna bibehåller sin hårdhet upp till 1000 °C tack vare fasomvandlingen. Även vid 1100 °C är hårdheten hög. Dessa skikt besitter alltså egenskaper som gör dem väldigt användbara inom tillämpningar för skärande bearbetning. Nanostrukturerade materials egenskaper beror på dess mikrostruktur snarare än på de grundämnen som ingår, detta exemplifieras av TiN-SiNx-nanokompositer bestående av nanokristallina TiN-korn inbäddade i några få atomlager SiNx, där materialegenskaperna helt och hållet beror på kornstorleken på TiN-kornen och tjockleken på SiNx-lagren. Ökas tjockleken på SiNx minskar hårdheten. Dessa filmer har mycket goda mekaniska egenskaper och är ett av de hårdaste materialen som finns. Nyckeln till den höga hårdheten hos skikten ligger i att bilda starka bindningar mellan TiN och SiNx. Hur dessa ser ut vet man dock inte eftersom strukturen på SiNx gränsytan inte är känd. Anledningen är att den är svår att avbilda på grund av dess krökta form och begränsade volym. I denna avhandling har TiN/SiNx multilager belagts, dvs. en lagrad struktur TiN alternerad med SiNx. Dessa filmer framställdes med sputtring, en teknik som liknar arcförångning men där man istället accelerera positivt laddade joner mot Ti och Si targets med en hög negativ potential som frigör Ti och Si. I multilagren varierades SiNx-lagrets tjocklek mellan endast några få atomlager för att göra en förenklad modell av gränsytan hos nanokompositen och med atomupplöst transmissionselektronmikroskopi samt hårdhetsmätningar konstateras sedan att de hårdaste filmerna var de där kristallin SiNx stabiliseras mellan TiNkorn. Vidare studerar jag SiNx/TiN ytor med sveptunnelmikroskopi och täthetsfunktionalteori (en kvantmekanisk simuleringsmetod). Mina resultat visar SiNx och bindningarna till TiN är mycket mer komplicerade än vad man tidigare trott, då de kan vara kristallina och anta komplexa rekonstruktioner. Detta bidrar till den starka bindningen mellan TiN och SiNx vilket i sin tur förklarar varför materialen blir så hårda.
Ti-Si-N and Ti-Al-Si-N thin solid films have been studied by analytical electron microscopy, X-ray diffraction, scanning tunneling microscopy, X-ray photoelectron spectroscopy, elastic recoil detection analysis, nanoindentation, and ab initio calculations. I find that arc evaporated (Ti1-xSix)Ny films can be grown as cubic solid solutions up to x = 0.09 with a dense columnar microstructure. Films with higher Si content up to x = 0.20 assumes an extremely defect-rich, feather-like structure consisting of cubic TiN:Si nanocrystallite bundles with low-angle grain boundaries caused by thermodynamically driven Si segregation. Correspondingly, the N content in the films increases close to linear with the Si content from y = 1.00 (x = 0) to y = 1.13 (x = 0.20). Annealing of the films at 1000 °C yields a metastable crystalline SiNz (1.0 ≤ z ≤ 1.33) tissue phase in 0.04 ≤ x ≤ 0.20 films which is (semi)-coherent to TiN. These films are compositionally stable and exhibit retained hardness between 31-42 GPa up to 1000 °C. At 1100-1200 °C, the tissue phase amorphizes and all SiNz diffuse out of the films, followed by recrystallization of the cubic phase. Hard turning testing was performed on (Ti0.83Si0.17)N1.09. Analysis of the tool-chip interface prepared by focused ion beam revealed shear deformation in the film and an adhering layer consisting of the work-piece material and Si and N from the film. For (Ti0.33Al0.67)1-xSix)N (0 ≤ x ≤ 0.29) films the NaCl structure cubic (Ti,Al)N solid solution phase is predominant at low Si contents, which gradually changes to a dominating hexagonal wurtzite (Al,Ti,Si)N solid solution for 0.04 ≤ x ≤ 0.17. Additional Si results in amorphization. Annealing experiments at 600-1000 °C yields spinodal decomposition of c-(Al,Ti)N into c-AlN and c-TiN, with corresponding age hardening. The h-(Al,Ti,Si)N films exhibit precipitation of c- TiN with smaller volume than the host lattice, which results in tensile cracks formations and age hardening. Films with c-(Ti,Al)N perform best in turning applications, while films with h- (Al,Ti,Si)N form cracks and fail. Finally, I have characterized the nature of metastable crystalline SiNz phases and the interface between TiN(001) and SiNz. Magnetron sputtering was used to deposit TiN/SiNz(001) nanolaminate films with varying SiNz and TiN layer thicknesses. Maximum hardness is obtained when SiNz forms coherent interfaces with TiN. In addition, in situ surface analyses in combination with ab-initio calculations reveal that SiNz sub-monolayers grow epitaxially and form crystalline reconstructions on TiN(001) and TiN(111) surfaces. Phonon calculations predict that stoichiometric c-SiN is dynamically instable when the atoms are arranged in the NaCl and ZnS forms. However, c-Si3N4 can be stabilized with D022 or L12 ordered ZnS-like structures. These results have impact for the design of superhard nanocomposites and multilayer thin films.
APA, Harvard, Vancouver, ISO, and other styles
8

Rahil, Issam. "Elaboration et caractérisation de revêtements à base de nitrure de chrome, carbonitrure et carbure de titane élaborés par pulvérisation magnétron." Phd thesis, Ecole nationale supérieure d'arts et métiers - ENSAM, 2013. http://pastel.archives-ouvertes.fr/pastel-00967251.

Full text
Abstract:
Le but de ce travail est d'élaborer de nouveaux revêtements anti-usure à base de nitrure de chrome, de carbure et de carbonitrure de titane par dépôt physique en phase vapeur afin d'améliorer la résistance à l'usure à sec des outils de coupe du bois.Des revêtements binaires de CrN et de MoN, ternaires de Cr-Mo-N et de Ti-W-C et quaternaires de Ti-W-C-N ont été déposés sur des outils de coupe en carbure de tungstène et en acier et sur des substrats de silicium par pulvérisation magnétron RF en utilisant différentes cibles (Cr, Mo, Ti et WC) sous différentes atmosphères (Ar, Ar + N2, Ar + CH4 et Ar + N2 + CH4).L'influence de la pression de travail, des ratios des gaz plasmagènes, des tensions d'auto-polarisation des cibles, de la température des substrats et de celle du recuit sur les propriétés des revêtements ont été étudiées, en utilisant l'EDS, la WDS, l'XPS, la DRX, le MEB, le MET, l'AFM, la microscopie optique, l'interférométrie optique (2D et 3D), le Scratch test, l'essai Daimler, la nanoindentation et la tribométrie alternative et rotative. L'objectif est d'établir une corrélation entre le comportement tribologique des revêtements étudiés et leurs propriétés physico-chimiques et mécaniques.Les revêtements optimaux présentant la meilleure résistance à l'usure à sec ont été testés en usinage de l'épinette noire à l'échelle industrielle dans des conditions sévères (-20/-25 °C). Les résultats montrent que grâce à l'emploi des revêtements de Cr-Mo-N, Ti-W-C et de Ti-W-C-N, la durée de vie des outils coupants a été augmentée de 47 à 77 % par rapport à l'outil non revêtu.Mots clés: revêtement, (Cr-Mo)N, (Ti-W)(C,N), propriétés physico-chimiques, propriétés mécaniques, comportement tribologique, usinage bois
APA, Harvard, Vancouver, ISO, and other styles
9

Dümmler, Wolfram. "Étude par spectrométrie de masse d'ions secondaires des interfaces Ti/Si₃N₄, Ag/Si₃N₄ et Cu/Si₃N₄." Vandoeuvre-les-Nancy, INPL, 1998. http://www.theses.fr/1998INPL046N.

Full text
Abstract:
Les interfaces céramique/métal et leur évolution au cours de traitements thermiques ont été étudiées. Les constituants majeurs des brasures, titane, argent et cuivre, ont été déposés par évaporation et pulvérisation cathodique sur Si₃N₄ poli. Les zones de réactions étant à l'échelle nanométrique, la spectrométrie de masse des ions secondaires (SIMS) est une technique bien adaptée permettant d'obtenir les profils des concentrations des éléments en fonction de la profondeur. Ce travail est centré sur l'étude des possibilités du SIMS utilisant une source de césium pour le bombardement ionique avec détection des molécules MCs+. Nous avons étayé les résultats SIMS par l'emploi de façon complémentaire de SNMS, AES, MEB, DRX et AFM. Contrairement à l'argent et le cuivre, le titane mouille bien la céramique et une couche intermédiaire se forme à l'interface Ti/Si₃N₄. Après des discussions sur les phénomènes qui altèrent la résolution en profondeur d'une analyse SIMS, les calculs de correction sur les coefficients de diffusion D obtenus donnent D ≈ 0,8. . . 2. 10-²⁰ m²/s entre 600°C et 700°C. La pénétration du titane dans la céramique étant très faible, ce sont plutôt des réactions chimiques dans la région interfaciale qui assurent la bonne liaison. Lors des traitements thermiques des échantillons Ag/Ti/ Si₃N₄ et Cu/Ti/ Si₃N₄, on constate un mélange complet des phases avec des réactions complexes dans le cas de Cu/Ti/ Si₃N₄. Pour Ag/Ti/ Si₃N₄, les réactions sont beaucoup moins nombreuses et les phases restent plus pures et bien séparées les unes des autres.
APA, Harvard, Vancouver, ISO, and other styles
10

Höglund, Carina. "Growth and Phase Stability Studies of Epitaxial Sc-Al-N and Ti-Al-N Thin Films." Doctoral thesis, Linköpings universitet, Tunnfilmsfysik, 2010. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-56274.

Full text
Abstract:
¨This Thesis treats the growth and characterization of ternary transition metal nitride thin films. The aim is to probe deep into the Ti-Al-N system and to explore novel Sc-Al-N compounds. Thin films were epitaxially grown by reactive dual magnetron sputtering from elemental targets onto single-crystal substrates. Ion beam analyses were used for compositional analysis and depth profiling. Different X-ray diffraction techniques were employed, ex situ using Cu radiation and in situ during deposition using synchrotron radiation, to achieve information about phases, texture, and thickness of films, and to follow roughness evolution of layers during and after growth. Transmission electron microscopy was used for overview and lattice imaging, and to obtain lattice structure information by electron diffraction. In the Sc-Al-N system, the perovskite Sc3AlN was for the first time synthesized as a thin film and in single phase, with a unit cell of 4.40 Å. The hardness was found to be 14.2 GPa, the elastic modulus 21 GPa, and the room temperature resistivity 41.2 μΩcm. Cubic solid solutions of Sc1-xAlxN can be synthesized with AlN molar fraction up to ~60%. Higher AlN contents yield three different epitaxial relations to ScN(111), namely, #1 Sc1-xAlxN(0001) || ScN(111) with Sc1-xAlxN[11210] || ScN[110], #2 Sc1-xAlxN(1011) || ScN(110) with Sc1-xAlxN[1210] || ScN[110], and #3 Sc1-xAlxN(1011) || ScN(113). An in situ deposition and annealing study of cubic Sc0.57Al0.43N films showed volume induced phase separation into ScN and wurtzite structure AlN, via nucleation and growth at the domain boundaries. The first indications for phase separation are visible at 1000 °C, and the topotaxial relationship between the binaries after phase separation is AlN(0001) || ScN(001) and AlN<01ɸ10> || ScN <1ɸ10>. This is compared with Ti1-xAlxN, for which an electronic structure driving force leads to spinodal decomposition into isostructural TiN and AlN already at 800 °C. First principles calculations explain the results on a fundamental physics level. Up to ~22% ScN can under the employed deposition conditions be dissolved into wurtzite Sc1-xAlxN films, while retaining a single-crystal structure and with lattice parameters matching calculated values. In the Ti-Al-N system, the Ti2AlN phase was synthesized epitaxially by solid state reaction during interdiffusion between sequentially deposited layers of AlN(0001) and Ti(0001). When annealing the sample, N and Al diffused into the Ti layer, forming Ti3AlN(111) at 400 ºC and Ti2AlN(0001) at 500 ºC. The Ti2AlN formation temperature is 175 ºC lower than earlier reported results. Another way of forming Ti2AlN phase is by depositing understoichiometric TiNx at 800 °C onto Al2O3(0001). An epitaxial Ti2Al(O,N) (0001) oxynitride forms close to the interface between film and substrate through a solid state reaction. Ti4AlN3 was, however, not possible to synthesize when depositing films with a Ti:Al:N ratio of 4:1:3 due to competing reactions. A substrate temperature of 600 ºC yielded an irregularly stacked Tin+1AlNn layered structure because of the low mobility of Al ad-atoms. An increased temperature led to Al deficiency due to outdiffusion of Al atoms, and formation of the Ti2AlN phase and a Ti1-xAlxN cubic solid solution.
APA, Harvard, Vancouver, ISO, and other styles
More sources

Books on the topic "Ti(N"

1

Adeosun, Kola A. Ọrọ ti obi n sọ. Osogbo: Ademola Printing Press, 1998.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
2

Nguyẽ̂n, Mông Giac. Bão n?ôi: Truong thiên ti?êu thuyêt. Westminster, CA: Van Nghê, 1990.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
3

Ackerman, Jennifer. Shen ti li de N ge mi mi. Taibei Shi: Tian xia yuan jian chu ban gu fen you xian gong si, 2008.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
4

Nguyen, Mong Giac. Mua bi'e n tho ng: Truong thie n ti?e u thuye t. Westminster, Calif: Van Nghe, 1988.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
5

Nguyen, Mong Giac. Ba o n?o i: Truong thie n ti?e u thuye t. Westminster, CA: Van Nghe, 1990.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
6

Trost, Franz L. Das Monument von Abalessa und Ti-n-hinan (Sahara). Wien: Selbstverl. F.L. Trost, 1988.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
7

Nguyen, Mong Giac. Beo giat: Truong thie n ti?e u thuye t. Westminster, Calif: Van Nghe, 1988.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
8

Price, Marilyn. Los ti teres. [Glenview, IL]: Celebration Press, 1996.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
9

Mosto, Alvise Cà da. Questa e una opera necessaria a tutti li naviga[n]ti (1490). Delmar, N.Y: Published for the John Carter Brown Library by Scholars' Facsimiles & Reprints, 1992.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
10

Blakeborough, Richard. An n Waddleton's visit ti Scarborough: And, Hoo juries finnd the'r vardict. 2nd ed. Stockton-on-Tees: Yorkshire Publishing Press, 1990.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
More sources

Book chapters on the topic "Ti(N"

1

Pogrebnjak, A. D., V. M. Beresnev, M. V. Il'yashenko, D. A. Kolesnikov, A. P. Shypylenko, A. Sh Kaverina, N. K. Erdybaeva, et al. "Structure and Properties Multilayered Micro- and Nanocomposite Coatings of Ti-N-Al/Ti-N/Al2O3." In Ceramic Engineering and Science Proceedings, 69–77. Hoboken, NJ, USA: John Wiley & Sons, Inc., 2011. http://dx.doi.org/10.1002/9781118095362.ch7.

Full text
APA, Harvard, Vancouver, ISO, and other styles
2

Kim, Jung Wook, Sudeep Abraham, Kwang Ho Kim, Jang Hyun Sung, and John J. Moore. "Comparative Study on the Oxidation Resistance between Ti-Al-Si-N and Ti-Al-N Coatings." In Solid State Phenomena, 317–22. Stafa: Trans Tech Publications Ltd., 2006. http://dx.doi.org/10.4028/3-908451-25-6.317.

Full text
APA, Harvard, Vancouver, ISO, and other styles
3

Wang, Yan An, Ke Xin Chen, and He Ping Zhou. "Combustion Synthesis of Ti(C,N) Powder." In High-Performance Ceramics III, 1421–24. Stafa: Trans Tech Publications Ltd., 2007. http://dx.doi.org/10.4028/0-87849-959-8.1421.

Full text
APA, Harvard, Vancouver, ISO, and other styles
4

Quan, Wang She, Chen Li, Yin Fei, and Li Jia. "Research on Microstructure and Properties of TiN, (Ti, Al)N and TiN/(Ti, Al)N Multilayer Coatings." In Progress in Powder Metallurgy, 1225–28. Stafa: Trans Tech Publications Ltd., 2007. http://dx.doi.org/10.4028/0-87849-419-7.1225.

Full text
APA, Harvard, Vancouver, ISO, and other styles
5

Predel, F. "Crystal structure of Ti-N (titanium-nitride) system." In Phase Equilibria, Crystallographic and Thermodynamic Data of Binary Alloys, 90. Berlin, Heidelberg: Springer Berlin Heidelberg, 2016. http://dx.doi.org/10.1007/978-3-642-24977-8_46.

Full text
APA, Harvard, Vancouver, ISO, and other styles
6

Gissler, W., T. P. Mollart, and R. Gilmore. "Tribological coatings within the Ti-B-N system." In Protective Coatings and Thin Films, 357–66. Dordrecht: Springer Netherlands, 1997. http://dx.doi.org/10.1007/978-94-011-5644-8_28.

Full text
APA, Harvard, Vancouver, ISO, and other styles
7

Balart, M. J., C. L. Davis, Martin Strangwood, and J. F. Knott. "Cleavage Initiation in Ti-V-N and V-N Microalloyed Forging Steels." In Materials Science Forum, 729–36. Stafa: Trans Tech Publications Ltd., 2005. http://dx.doi.org/10.4028/0-87849-981-4.729.

Full text
APA, Harvard, Vancouver, ISO, and other styles
8

Shi, Zhongran, Ruizhen Wang, Qingfeng Wang, Hang Su, Feng Chai, and Caifu Yang. "Microstructures and Continuous Cooling Transformation of Cghaz in E36 Class V-N-Ti, V-Ti and Nb-Ti Shipbuilding Steels." In HSLA Steels 2015, Microalloying 2015 & Offshore Engineering Steels 2015, 517–23. Hoboken, NJ, USA: John Wiley & Sons, Inc., 2015. http://dx.doi.org/10.1002/9781119223399.ch62.

Full text
APA, Harvard, Vancouver, ISO, and other styles
9

Shi, Zhongran, Ruizhen Wang, Qingfeng Wang, Hang Su, Feng Chai, and Caifu Yang. "Microstructures and Continuous Cooling Transformation of CGHAZ in E36 Class V-N-Ti, V-Ti and Nb-Ti Shipbuilding Steels." In HSLA Steels 2015, Microalloying 2015 & Offshore Engineering Steels 2015, 517–23. Cham: Springer International Publishing, 2016. http://dx.doi.org/10.1007/978-3-319-48767-0_62.

Full text
APA, Harvard, Vancouver, ISO, and other styles
10

Holmes, M. B., G. J. Kipouros, Z. N. Farhat, and K. P. Plucknett. "Electrochemical Behavior of Ti(C,N)-Ni3 Al Cermets." In Processing and Properties of Advanced Ceramics and Composites VII, 295–308. Hoboken, NJ, USA: John Wiley & Sons, Inc., 2015. http://dx.doi.org/10.1002/9781119183860.ch29.

Full text
APA, Harvard, Vancouver, ISO, and other styles

Conference papers on the topic "Ti(N"

1

Dazhun, Tian, Yin Zhigiang, Yan Zhanggen, Wang Guoqing, and Xu Zhiqian. "MAEIP Ti-N Thin Films." In 1988 International Congress on Optical Science and Engineering, edited by Karl H. Guenther and Hans K. Pulker. SPIE, 1989. http://dx.doi.org/10.1117/12.950018.

Full text
APA, Harvard, Vancouver, ISO, and other styles
2

Takenaka, Hisataka. "Soft x-ray reflectivity and structure evaluation of Ni/Ti and Ni-N/Ti-N multilayers." In Sixth international conference on x-ray microscopy (XRM99). AIP, 2000. http://dx.doi.org/10.1063/1.1291238.

Full text
APA, Harvard, Vancouver, ISO, and other styles
3

Tayal, Akhil, Mukul Gupta, Ajay Gupta, Jochen Stahn, and M. Horisberger. "Optimization of Ti addition in Fe for Fe-Ti-N thin films." In SOLID STATE PHYSICS: Proceedings of the 56th DAE Solid State Physics Symposium 2011. AIP, 2012. http://dx.doi.org/10.1063/1.4710212.

Full text
APA, Harvard, Vancouver, ISO, and other styles
4

Srinivasan, K., J. Das, and C. E. Patton. "Intergranular Interactions in Fe-Ti-N Thin Films." In INTERMAG 2006 - IEEE International Magnetics Conference. IEEE, 2006. http://dx.doi.org/10.1109/intmag.2006.375545.

Full text
APA, Harvard, Vancouver, ISO, and other styles
5

Shugurov, Artur, Alexandr Akulinkin, and Andrey Voronov. "Investigation of adhesive behavior of Ti-Al-N/Ti-Al multilayers by scratch testing." In PROCEEDINGS OF THE ADVANCED MATERIALS WITH HIERARCHICAL STRUCTURE FOR NEW TECHNOLOGIES AND RELIABLE STRUCTURES. Author(s), 2018. http://dx.doi.org/10.1063/1.5083525.

Full text
APA, Harvard, Vancouver, ISO, and other styles
6

Dinca, D. C. "Neutron-Rich Ti Isotopes And Possible N = 32 And N = 34 Shell Gaps." In NUCLEI AT THE LIMITS. AIP, 2005. http://dx.doi.org/10.1063/1.1905301.

Full text
APA, Harvard, Vancouver, ISO, and other styles
7

Nikitin, D., A. Sivkov, D. Gerasimov, and A. Evdokimov. "On synthesis of nanocrystalline Ti-B/Ti-B-N phases in a hypersonic plasma jet." In 2016 11th International Forum on Strategic Technology (IFOST). IEEE, 2016. http://dx.doi.org/10.1109/ifost.2016.7884075.

Full text
APA, Harvard, Vancouver, ISO, and other styles
8

Bondar, O. V., B. O. Postolnyi, O. V. Sobol, and V. M. Beresnev. "Properties of superhard (Zr-Ti-Cr-Nb)N nanocoatings." In 2014 24th International Crimean Conference "Microwave & Telecommunication Technology" (CriMiCo). IEEE, 2014. http://dx.doi.org/10.1109/crmico.2014.6959624.

Full text
APA, Harvard, Vancouver, ISO, and other styles
9

Dobrovodský, Jozef, Dušan Vaňa, Matúš Beňo, Martin Sahul, and Ľubomír Čaplovič. "IBA characterization of Ti-Si-C-N nanocomposite coatings." In 1ST INTERNATIONAL CONFERENCE ON RADIATIONS AND APPLICATIONS (ICRA-2017). Author(s), 2018. http://dx.doi.org/10.1063/1.5048859.

Full text
APA, Harvard, Vancouver, ISO, and other styles
10

Cojocaru, Vasile-Danut, Doina Raducanu, Nicu Doinel Scarisoreanu, and Ion Cinca. "Characterization of Ti-O-N films deposited on Ti-Ta-Nb substrate by plasma laser deposition." In 2011 International Semiconductor Conference (CAS 2011). IEEE, 2011. http://dx.doi.org/10.1109/smicnd.2011.6095787.

Full text
APA, Harvard, Vancouver, ISO, and other styles

Reports on the topic "Ti(N"

1

Dashdorj, Dugersuren. Spin distribution in preequilibrium reactions for 48Ti + n. Office of Scientific and Technical Information (OSTI), April 2005. http://dx.doi.org/10.2172/15016021.

Full text
APA, Harvard, Vancouver, ISO, and other styles
2

Park, J. H., D. Kupperman, E. T. Park, and G. Dragel. Physical properites of O- and N-containing V-Cr-Ti alloys. Office of Scientific and Technical Information (OSTI), April 1996. http://dx.doi.org/10.2172/270416.

Full text
APA, Harvard, Vancouver, ISO, and other styles
3

Smith, P. M., J. S. Custer, and R. V. Jones. Chemical vapor deposition of Ti-Si-N films for diffusion barrier applications. Office of Scientific and Technical Information (OSTI), November 1995. http://dx.doi.org/10.2172/125078.

Full text
APA, Harvard, Vancouver, ISO, and other styles
4

Dashdorj, D., G. Mitchell, P. Garrett, U. Agvaanluvsan, J. Becker, L. Bernstein, J. Cooper, et al. {sup 48}Ti(n,xnpa{gamma}) reaction cross sections using spallation neutrons for E{sub n} = 1 to 20 MeV. Office of Scientific and Technical Information (OSTI), January 2005. http://dx.doi.org/10.2172/15015860.

Full text
APA, Harvard, Vancouver, ISO, and other styles
5

Custer, J. S., P. M. Smith, R. V. Jones, A. W. Maverick, D. A. Roberts, J. A. T. Norman, and A. K. Hochberg. Thermal metalorganic chemical vapor deposition of Ti-Si-N films for diffusion barrier applications. Office of Scientific and Technical Information (OSTI), April 1996. http://dx.doi.org/10.2172/219352.

Full text
APA, Harvard, Vancouver, ISO, and other styles
6

Christe, Karl O., Ralf Haiges, Stefan Schneider, Thorsten Schroer, and Jerry A. Boatz. Preparation and Characterization of the First Binary Titanium Azides, Ti(N3)4, P(C6H5)4Ti(N3)5 and P(C6H5)42Ti(N3)6 and on Linear Ti-N-NN Coordination. Fort Belvoir, VA: Defense Technical Information Center, March 2004. http://dx.doi.org/10.21236/ada422680.

Full text
APA, Harvard, Vancouver, ISO, and other styles
7

T.T., Pham, Brockhaus M., Wong G., Le N.D., Tjajadi J.S., Loft L., Luttrell C., and Assembe Mvondo S. Các phương án tiếp cận chia sẻ lợi ích: Kết quả so sánh sơ bộ tại 13 nước đang thực hiện REDD+. Center for International Forestry Research (CIFOR), 2014. http://dx.doi.org/10.17528/cifor/005451.

Full text
APA, Harvard, Vancouver, ISO, and other styles
8

Luc, Brunet. Systematic Equations Handbook : Book 1-Energy. R&D Médiation, May 2015. http://dx.doi.org/10.17601/rd_mediation2015:1.

Full text
Abstract:
The energy equation handbook is the complete collection of physically coherent expression of energy computed using from 2 to 7 physical units among: density(ML-3) energy (ML2T-2) time (T) force (MLT-2) power (ML2T-3) current (I) temperature (Th) quantity (N) mass (M) length (L) candela (J) surface (L2) volume (L3) concentration (ML-3) frequency (T-1) acceleration (LT- 2) speed (LT-1) pressure (ML-1T-2) viscosity (ML-1T-1) luminance (L- 2J) MolarMass (MN-1) MassicEnergy (L2T-2) resistance (ML2T-3I-2) voltage (ML2T-3I-1) Farad (M-1L-2T4I2) Thermal- Conductivity (MLT-3Th-1) SpecificHeat (L2T-2Th-1) MassFlux (MT-1) SurfaceTension (MT-2) Charge (TI) Resistivity (ML3T-3I-2) The complete list of 4196 equations is sorted by number of variable required to obtain an energy in Joules. All the units are in MKSA.
APA, Harvard, Vancouver, ISO, and other styles
You might also be interested in the extended bibliographies on the topic 'Ti(N' for particular source types:
Journal articles Dissertations / Theses Books
We offer discounts on all premium plans for authors whose works are included in thematic literature selections. Contact us to get a unique promo code!

To the bibliography