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Journal articles on the topic 'Trichlorosilanes'

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1

Ackerhans, Carsten, Bodo Räke, Ralph Krätzner, Peter Müller, Herbert W. Roesky, and Isabel Usón. "Ammonolysis of Trichlorosilanes." European Journal of Inorganic Chemistry 2000, no. 5 (2000): 827–30. http://dx.doi.org/10.1002/(sici)1099-0682(200005)2000:5<827::aid-ejic827>3.0.co;2-j.

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2

Sasaki, Manabu, and Krzysztof Matyjaszewski. "Synthesis of branched copolysilanes from trichlorosilanes." Journal of Polymer Science Part A: Polymer Chemistry 33, no. 5 (1995): 771–78. http://dx.doi.org/10.1002/pola.1995.080330503.

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3

Hshieh, Fu-Yu, David B. Hirsch, and James H. Williams. "Short communication: Autoignition temperature of trichlorosilanes." Fire and Materials 26, no. 6 (2002): 289–90. http://dx.doi.org/10.1002/fam.804.

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4

Oyola-Reynoso, Stephanie, Jiahao Chen, Boyce S. Chang, Jean-Francis Bloch, and Martin M. Thuo. "Surface polymerization of perfluorosilane treatments on paper mitigates HF production upon incineration." RSC Advances 6, no. 85 (2016): 82233–37. http://dx.doi.org/10.1039/c6ra20582h.

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Burning perfluoro trichlorosilanes (R<sup>F</sup>) treated paper leads to depolymerization of the crosslinked polysilane, distilling off liquid R<sup>F</sup> and emitting CO<sub>2</sub> and H<sub>2</sub>O as the only gaseous products.
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5

SOGA, Mamoru, Kazufumi Ogawa, Shinji OZAKI, Yasushi MASUDA, and Kunio GOTO. "Hydrophobic Treatment of Glass Plates with Perfluoroalkyl Trichlorosilanes." Hyomen Kagaku 14, no. 10 (1993): 630–35. http://dx.doi.org/10.1380/jsssj.14.630.

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6

St. John, Pamela M., and H. G. Craighead. "Microcontact printing and pattern transfer using trichlorosilanes on oxide substrates." Applied Physics Letters 68, no. 7 (1996): 1022–24. http://dx.doi.org/10.1063/1.116216.

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7

Booth, Brandon D., Nathaniel J. Martin, Edward A. Buehler, Clare McCabe, and G. Kane Jennings. "Tribological characterization of gradient monolayer films from trichlorosilanes on silicon." Colloids and Surfaces A: Physicochemical and Engineering Aspects 412 (October 2012): 57–63. http://dx.doi.org/10.1016/j.colsurfa.2012.07.015.

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8

Fairbank, R. W. Peter, and Mary J. Wirth. "Role of surface-adsorbed water in the horizontal polymerization of trichlorosilanes." Journal of Chromatography A 830, no. 2 (1999): 285–91. http://dx.doi.org/10.1016/s0021-9673(98)00908-x.

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9

Wang, Jiandong, Xuan Xiang, Xiang Yao, Wen-Jing Xiao, Jian Lin, and Wei-Shi Li. "Efficient perovskite solar cells using trichlorosilanes as perovskite/PCBM interface modifiers." Organic Electronics 39 (December 2016): 1–9. http://dx.doi.org/10.1016/j.orgel.2016.09.018.

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10

Okamoto, Hidenori, and Shozo Kato. "A Facile Reduction of Certain Schiff Bases with Di- and Trichlorosilanes." Bulletin of the Chemical Society of Japan 64, no. 11 (1991): 3466–67. http://dx.doi.org/10.1246/bcsj.64.3466.

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11

Bennès, Jonathan, Sylvain Ballandras, and Frédéric Chérioux. "Easy and versatile functionalization of lithium niobate wafers by hydrophobic trichlorosilanes." Applied Surface Science 255, no. 5 (2008): 1796–800. http://dx.doi.org/10.1016/j.apsusc.2008.06.031.

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12

Bassindale, Alan R., Iain A. MacKinnon, Maria G. Maesano, and Peter G. Taylor. "The preparation of hexasilsesquioxane (T6) cages by “non aqueous” hydrolysis of trichlorosilanes." Chem. Commun., no. 12 (2003): 1382–83. http://dx.doi.org/10.1039/b302556j.

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13

Turgman-Cohen, Salomon, Matthew B. Smith, Daniel A. Fischer, Peter K. Kilpatrick, and Jan Genzer. "Asphaltene Adsorption onto Self-Assembled Monolayers of Mixed Aromatic and Aliphatic Trichlorosilanes." Langmuir 25, no. 11 (2009): 6260–69. http://dx.doi.org/10.1021/la9000895.

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14

Parry, Adam V. S., Kexin Lu, Daniel J. Tate, et al. "Trichlorosilanes as Anchoring Groups for Phenylene-Thiophene Molecular Monolayer Field Effect Transistors." Advanced Functional Materials 24, no. 42 (2014): 6677–83. http://dx.doi.org/10.1002/adfm.201401392.

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15

De Sio, Vincenzo, Antonio Massa, and Arrigo Scettri. "Chiral sulfoxides as activators of allyl trichlorosilanes in the stereoselective allylation of aldehydes." Organic & Biomolecular Chemistry 8, no. 13 (2010): 3055. http://dx.doi.org/10.1039/c002988b.

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16

De Palma, Randy, Wim Laureyn, Filip Frederix, et al. "Formation of Dense Self-assembled Monolayers of (n-Decyl)trichlorosilanes on Ta/Ta2O5." Langmuir 23, no. 2 (2007): 443–51. http://dx.doi.org/10.1021/la061951e.

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17

OKAMOTO, H., and S. KATO. "ChemInform Abstract: A Facile Reduction of Certain Schiff Bases with Di- and Trichlorosilanes." ChemInform 23, no. 8 (2010): no. http://dx.doi.org/10.1002/chin.199208113.

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18

Yanker, Dawn M., and Joshua A. Maurer. "Direct printing of trichlorosilanes on glass for selective protein adsorption and cell growth." Molecular BioSystems 4, no. 6 (2008): 502. http://dx.doi.org/10.1039/b801161c.

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19

Booth, Brandon D., Steven G. Vilt, Clare McCabe, and G. Kane Jennings. "Tribology of Monolayer Films: Comparison betweenn-Alkanethiols on Gold andn-Alkyl Trichlorosilanes on Silicon." Langmuir 25, no. 17 (2009): 9995–10001. http://dx.doi.org/10.1021/la901165j.

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20

Baruwa, Akinsanya Damilare, Esther Titilayo Akinlabi, Oluseyi Philip Oladijo, Stephen Akinwale Akinlabi, and Jeff Chinn. "Physicochemical Characteristics of an Ultra-Thin Hydrophobic Trichlorosilanes Using SiO2 as Adhesion." Key Engineering Materials 796 (March 2019): 80–87. http://dx.doi.org/10.4028/www.scientific.net/kem.796.80.

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The aim of the research is to subject the three different silanes to chemical and electrochemical investigations in other to determine the most efficient organic compound. Three types of hydrophobic silanes [Tris (Trimethylsiloxy) silyethyl] dimethylchlorosilane (Alkyl); Tridecafloro-1,1,2,2-tetrahydrooctyltrichlorosilane (FOTS) and Henicosyl-1,1,2,2-tetrahydrododecyltricholrosilane (FDDTS) are presented and investigated. The three silanes are of different composition but are deposited at the same parameters and conditions. The chemical investigation was studied through (attenuated total refle
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21

Denmark, Scott E., and Jiping Fu. "Catalytic, Enantioselective Addition of Substituted Allylic Trichlorosilanes Using a Rationally-Designed 2,2‘-Bispyrrolidine-Based Bisphosphoramide." Journal of the American Chemical Society 123, no. 38 (2001): 9488–89. http://dx.doi.org/10.1021/ja016552e.

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22

De Sio, Vincenzo, Antonio Massa, and Arrigo Scettri. "ChemInform Abstract: Chiral Sulfoxides as Activators of Allyl Trichlorosilanes in the Stereoselective Allylation of Aldehydes." ChemInform 41, no. 49 (2010): no. http://dx.doi.org/10.1002/chin.201049038.

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23

Sadri, Behnam, Debkalpa Goswami, and Ramses Martinez. "Rapid Fabrication of Epidermal Paper-Based Electronic Devices Using Razor Printing." Micromachines 9, no. 9 (2018): 420. http://dx.doi.org/10.3390/mi9090420.

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This work describes the use of a benchtop razor printer to fabricate epidermal paper-based electronic devices (EPEDs). This fabrication technique is simple, low-cost, and compatible with scalable manufacturing processes. EPEDs are fabricated using paper substrates rendered omniphobic by their cost-effective silanization with fluoroalkyl trichlorosilanes, making them inexpensive, water-resistant, and mechanically compliant with human skin. The highly conductive inks or thin films attached to one of the sides of the omniphobic paper makes EPEDs compatible with wearable applications involving wir
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24

Linnemannstöns, Marvin, Beate Neumann, Hans-Georg Stammler, and Norbert W. Mitzel. "Synthesis and Structural Diversity of Triaryl(phenylethyl)silanes." Synthesis 52, no. 07 (2020): 1025–34. http://dx.doi.org/10.1055/s-0039-1690785.

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Starting from trichloro(phenylethyl)silane, six differently fluorinated triaryl(phenylethyl)silanes were synthesized by salt elimination reactions and their structures were determined by X-ray diffraction analysis. Tris(pentafluorophenyl)(phenylethyl)silane reveals a folded structure due to intramolecular π-stacking interactions, while those with a lower degree of fluorination show either intermolecular π-stacking or no interplay between the aryl groups. A similar folded structure was observed for (4-methylphenethyl)tris(pentafluorophenyl)silane and [2-(naphth-2-yl)ethyl]tris(pentafluorophenyl
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25

Murugavel, Ramaswamy, Peter Böttcher, Andreas Voigt, et al. "An efficient synthetic route to primary and secondary condensation products of silanetriols starting from (arylamino)trichlorosilanes." Chem. Commun., no. 21 (1996): 2417–18. http://dx.doi.org/10.1039/cc9960002417.

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26

Banga, Reena, Jack Yarwood, Anthony M. Morgan, Brian Evans, and Jacqueline Kells. "In-situ FTIR studies of the kinetics and self assembly of alkyl and perfluoroalkyl trichlorosilanes on silicon." Thin Solid Films 284-285 (September 1996): 261–66. http://dx.doi.org/10.1016/s0040-6090(95)08319-7.

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27

Löbau, J., A. Rumphorst, K. Galla, S. Seeger, and K. Wolfrum. "Adsorption of alkyl-trichlorosilanes on glass and silicon: a comparative study using sum-frequency spectroscopy and XPS." Thin Solid Films 289, no. 1-2 (1996): 272–81. http://dx.doi.org/10.1016/s0040-6090(96)08925-0.

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28

Fujimoto, Yasuhiro, Masaru Heishi, Atsushi Shimojima, and Kazuyuki Kuroda. "Layered assembly of alkoxy-substituted bis(trichlorosilanes) containing various organic bridges via hydrolysis of Si–Cl groups." Journal of Materials Chemistry 15, no. 48 (2005): 5151. http://dx.doi.org/10.1039/b512482d.

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29

Denmark, Scott E., and Jiping Fu. "ChemInform Abstract: Catalytic, Enantioselective Addition of Substituted Allylic Trichlorosilanes Using a Rationally-Designed 2,2′-Bispyrrolidine-Based Bisphosphoramide." ChemInform 33, no. 4 (2010): no. http://dx.doi.org/10.1002/chin.200204079.

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30

Denmark, Scott E., Jiping Fu, and Michael J. Lawler. "Chiral Phosphoramide-Catalyzed Enantioselective Addition of Allylic Trichlorosilanes to Aldehydes. Preparative Studies with Bidentate Phosphorus-Based Amides." Journal of Organic Chemistry 71, no. 4 (2006): 1523–36. http://dx.doi.org/10.1021/jo052203h.

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31

MURUGAVEL, R., P. BOETTCHER, A. VOIGT, et al. "ChemInform Abstract: An Efficient Synthetic Route to Primary and Secondary Condensation Products of Silanetriols Starting from (Arylamino)trichlorosilanes." ChemInform 28, no. 10 (2010): no. http://dx.doi.org/10.1002/chin.199710145.

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32

Marshall, James A., and Nicholas D. Adams. "Diastereoselective and Enantioselective Synthesis of Homopropargyl and Allenylcarbinols from Nonracemic Propargyl Mesylates via the Derived Allenyl and Propargyl Trichlorosilanes." Journal of Organic Chemistry 62, no. 26 (1997): 8976–77. http://dx.doi.org/10.1021/jo971853l.

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33

Denmark, Scott E., Jiping Fu, Diane M. Coe, Xiping Su, Norman E. Pratt, and Brian D. Griedel. "Chiral Phosphoramide-Catalyzed Enantioselective Addition of Allylic Trichlorosilanes to Aldehydes. Preparative and Mechanistic Studies with Monodentate Phosphorus-Based Amides." Journal of Organic Chemistry 71, no. 4 (2006): 1513–22. http://dx.doi.org/10.1021/jo052202p.

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34

Banga, Reena, Jack Yarwood, Anthony M. Morgan, Brian Evans, and Jaqueline Kells. "FTIR and AFM Studies of the Kinetics and Self-Assembly of Alkyltrichlorosilanes and (Perfluoroalkyl)trichlorosilanes onto Glass and Silicon." Langmuir 11, no. 11 (1995): 4393–99. http://dx.doi.org/10.1021/la00011a036.

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35

Ulman, Abraham. "Surface Absorption of Monolayers." MRS Bulletin 20, no. 6 (1995): 46–51. http://dx.doi.org/10.1557/s0883769400036976.

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When the first paper describing the formation of self-assembled monolayers (SAMs) of octadecyltrichlorosilane [CH3(CH2)17SCl3, or OTS] by adsorption on SiO2 was published, it could not have been predicted that this area of research would become so important in only one decade. Although Zisman was the first to discover that monolayers can be prepared by adsorption of a surfactant onto a clean metal surface, the real revolution in the field occurred when Nuzzo and Allara showed that SAMs of alkanethiolates on gold can be prepared by adsorption of di-n-alkyl disulfides from dilute solutions. A de
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36

MARSHALL, J. A., and N. D. ADAMS. "ChemInform Abstract: Diastereoselective and Enantioselective Synthesis of Homopropargyl and Allenylcarbinols from Nonracemic Propargyl Mesylates via the Derived Allenyl and Propargyl Trichlorosilanes." ChemInform 29, no. 18 (2010): no. http://dx.doi.org/10.1002/chin.199818083.

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37

Psarski, Maciej, Grzegorz Celichowski, Ewelina Bystrzycka, Daniel Pawlak, Jarosław Grobelny, and Michał Cichomski. "Vapor phase deposition of fluoroalkyl trichlorosilanes on silicon and glass: Influence of deposition conditions and chain length on wettability and adhesion forces." Materials Chemistry and Physics 204 (January 2018): 305–14. http://dx.doi.org/10.1016/j.matchemphys.2017.10.037.

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38

Käppler, K., U. Scheim, and K. Rühlmann. "ON THE SYNTHESIS OF SILOXANES XXIV. VERIFICATION OF INDUCTIVE AND STERIC SUBSTITUENT CONSTANTS FOR SILOXY GROUPS BY REACTION OF DI- AND TRICHLOROSILANES AND -SILOXANES WITH LITHIUMT-BUTOXIDE." Phosphorus, Sulfur, and Silicon and the Related Elements 106, no. 1-4 (1995): 203–9. http://dx.doi.org/10.1080/10426509508027908.

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39

Zhang, Guang Xia, Qiao Yun Zhang, and Ze Min Chen. "Methyl Trichlorosilane Prepared Methyl Sodium Silicate." Applied Mechanics and Materials 184-185 (June 2012): 1064–67. http://dx.doi.org/10.4028/www.scientific.net/amm.184-185.1064.

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This paper studied how to prepare Methyl Sodium Silicate from Methyl Trichlorosilane. Methyl trichlorosilane hydrolyzed on the interface of cyclohexane and water, then hydrolysate and sodium hydroxide prepared methyl sodium silicate at molten state. Manufactrue was characterised by XRD, IR, and differential thermal analysis. The experimental results indicate that the best hydrolyze condition was the proportion of methyl trichlorosilane and water was 10~12:100 , at 5°C, lasting for 45min; the best condition of prepared methyl sodium silicate was the proportion of sodium hydroxide and hydrolysat
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40

Chauhan, Moni, and Philip Boudjouk. "Reduction of conjugate double bonds with trichlorosilane." Canadian Journal of Chemistry 78, no. 11 (2000): 1396–98. http://dx.doi.org/10.1139/v99-238.

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A variety of α,β-unsaturated esters and cyclic ketones underwent smooth reduction of the carbon–carbon double bond with a combination of inexpensive and readily available trichlorosilane and CoCl2. The reactions are performed under very mild conditions and products are obtained in high yields.Key words: reduction, carbonyl compounds, trichlorosilane, ketones, chemoselectivity.
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41

Schaefer, Ted, Rudy Sebastian, and Glenn H. Penner. "Theoretical and experimental approaches to the barrier to rotation about the Csp2—Csp3 bond in benzyl silane. Hyperconjugative stabilization of the perpendicular conformation." Canadian Journal of Chemistry 69, no. 3 (1991): 496–502. http://dx.doi.org/10.1139/v91-074.

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The 1H nuclear magnetic resonance spectra of benzyl silane and benzyl trichlorosilane, obtained in CS2 and benzene-d6 solutions, are analyzed. The long-range coupling constants between the methylene and para ring protons are used to derive apparent twofold barriers about the Csp2—Csp3 bonds of 7.4 ± 1.6 and 8.1 ± 1.1 kJ/mol for the silane and the trichlorosilane, respectively. These are higher than that for ethylbenzene and are attributed mainly to the stabilization of the perpendicular conformer, that with the C—Si bond in a plane perpendicular to the phenyl plane, by σ–π conjugation (hyperco
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42

Jarkin, V. N., O. A. Kisarin, and T. V. Kritskaya. "Methods of trichlorosilane synthesis for polycrystalline silicon production." Izvestiya Vysshikh Uchebnykh Zavedenii. Materialy Elektronnoi Tekhniki = Materials of Electronics Engineering 24, no. 1 (2021): 5–26. http://dx.doi.org/10.17073/1609-3577-2021-1-5-26.

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Novel technical solutions and ideas for increasing the yield of solar and semiconductor grade polycrystalline silicon processes have been analyzed. The predominant polycrystalline silicon technology is currently still the Siemens process including the conversion of technical grade silicon (synthesized by carbon-thermal reduction of quartzites) to trichlorosilane followed by rectification and hydrogen reduction. The cost of product silicon can be cut down by reducing the trichlorosilane synthesis costs through process and equipment improvement. Advantages, drawbacks and production cost reductio
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43

Sun, Shiyu, Changgong Xu, Jamielyn Jarvis, et al. "Evaluation of 3,3′-Triazolyl Biisoquinoline N,N′-Dioxide Catalysts for Asymmetric Hydrosilylation of Hydrazones with Trichlorosilane." Catalysts 11, no. 9 (2021): 1103. http://dx.doi.org/10.3390/catal11091103.

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A new class of axial-chiral biisoquinoline N,N′-dioxides was evaluated as catalysts for the enantioselective hydrosilylation of acyl hydrazones with trichlorosilane. While these catalysts provided poor to moderate reactivity and enantioselectivity, this study represents the first example of the organocatalytic asymmetric reduction of acyl hydrazones. In addition, the structures and energies of two possible diastereomeric catalyst–trichlorosilane complexes (2a–HSiCl3) were analyzed using density functional theory calculations.
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44

La Via, Francesco, Gaetano Izzo, Marco Mauceri, et al. "SiC-4H Epitaxial Layer Growth by Trichlorosilane (TCS) as Silicon Precursor at Very High Growth Rate." Materials Science Forum 600-603 (September 2008): 123–26. http://dx.doi.org/10.4028/www.scientific.net/msf.600-603.123.

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The growth rate of 4H-SiC epi layers has been increased up to 100 µm/h with the use of trichlorosilane instead of silane as silicon precursor. The epitaxial layers grown with this process have been characterized by electrical, optical and structural characterization methods. Schottky diodes, manufactured on the epitaxial layer grown with trichlorosilane at 1600 °C, have higher yield and lower defect density in comparison to diodes realized on epilayers grown with the standard epitaxial process.
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45

Wang, Zheng Shun, and Zhao Hui Zhen. "Study on the Silicone Coating with Heat Insulation and Resistance." Advanced Materials Research 680 (April 2013): 35–38. http://dx.doi.org/10.4028/www.scientific.net/amr.680.35.

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Experimental choose methyl-trichlorosilane, di-methyl-dichlorosilane and phenyl trichlorosilane synthetic organic silicon resin, add white mica powder, aluminum silicate, titanium pigment, zinc phosphate as packing, system high temperature insulation coating. For after high temperature resistant coating surface coating of tin model coating physical mechanical properties and high temperature resistant, heat insulation temperature difference of performance test, the results indicate that the system of high temperature resistant coating resistant to 400 ~ 500 °C high temperature, and has good hig
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46

Wagner, Christian, Andreas F. Kotthaus, and Stefan F. Kirsch. "The asymmetric reduction of imidazolinones with trichlorosilane." Chemical Communications 53, no. 32 (2017): 4513–16. http://dx.doi.org/10.1039/c7cc01561e.

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47

Zhang, Yuan Di, Gang Xie, and Yan Qing Hou. "Simulation and Optimization of Energy Saving Distillation Process for High-Purity Trichlorosilane with Material Properties." Advanced Materials Research 675 (March 2013): 379–82. http://dx.doi.org/10.4028/www.scientific.net/amr.675.379.

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In order to reduce the production cost of polysilicon, the raw material of the photovoltaic industry, applying heat integrated distillation technology of two towers in trichlorosilane distillation process consisting of removal of light components after removing heavy components. By assistant of a chemical process software, the new energy-saving process is simulated, the main parameters of two towers are optimized and the best implementation solution are provided. The optimum parameters for the first tower are the operation pressure of 500 kPa, the number of theoretical plates of 32, the positi
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48

Fester, Gerrit W., Jörg Wagler, Erica Brendler, and Edwin Kroke. "Stable Trichlorosilane-Pyridine Adducts." European Journal of Inorganic Chemistry 2008, no. 32 (2008): 5020–23. http://dx.doi.org/10.1002/ejic.200800844.

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49

Ran, Xiaoyun, Yan Long, Sheng Yang, et al. "A novel route to unsymmetrical disubstituted ureas and thioureas by HMPA catalyzed reductive alkylation with trichlorosilane." Organic Chemistry Frontiers 7, no. 3 (2020): 472–81. http://dx.doi.org/10.1039/c9qo01321k.

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50

Ganesh, V. Anand, Saman Safari Dinachali, Sundaramurthy Jayaraman, et al. "One-step fabrication of robust and optically transparent slippery coatings." RSC Adv. 4, no. 98 (2014): 55263–70. http://dx.doi.org/10.1039/c4ra08655d.

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An optically transparent slippery surface was fabricated from a blend of Perfluoropolyether and (tridecafluoro-1,1,2,2-tetrahydrooctyl)-1-trichlorosilane by electrospraying and subsequent low temperature curing.
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