Relevant bibliographies by topics / UHV magnetron sputtering

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  1. Journal articles
  2. Dissertations / Theses
  3. Conference papers

Academic literature on the topic 'UHV magnetron sputtering'

Author: Grafiati
Published: 4 June 2021
Last updated: 1 February 2022

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Journal articles on the topic "UHV magnetron sputtering"

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Lee, G. R., J. J. Lee, C. S. Shin, I. Petrov, and J. E. Greene. "Self-organized lamellar structured tantalum–nitride by UHV unbalanced-magnetron sputtering." Thin Solid Films 475, no. 1-2 (2005): 45–48. http://dx.doi.org/10.1016/j.tsf.2004.07.070.

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NASEEM, SHAHZAD. "AFM STUDIES OF VARIOUS NIOBIUM AND ALUMINIUM THIN FILMS FOR THEIR USE IN JOSEPHSON JUNCTIONS." Surface Review and Letters 08, no. 06 (2001): 689–92. http://dx.doi.org/10.1142/s0218625x01001646.

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Nb thin films have been prepared with e-beam evaporation under UHV conditions, and by RF magnetron sputtering. Al thin films were deposited by resistive heating in the UHV chamber. The preparation of these films and the trilayers of Nb/AlO x /Nb are intended for their use in Josephson junctions. Surface studies of these films are undertaken by using an atomic force microscope in the noncontact mode. These studies have revealed that the sputter-deposited Nb film surface is smoother than that of the UHV e-beam evaporated with R rms values of 3.5 and 4.0 nm respectively. Al thin films have a very
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Kot, Anna, Marta Radecka, Dominik Dorosz, and Katarzyna Zakrzewska. "Optically Active TiO2:Er Thin Films Deposited by Magnetron Sputtering." Materials 14, no. 15 (2021): 4085. http://dx.doi.org/10.3390/ma14154085.

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Titanium dioxide photoanodes for hydrogen generation suffer from a profound mismatch between the optical absorption of TiO2 and the solar spectrum. To solve the problem of low solar-to-chemical efficiency, optically active materials are proposed. In this work, TiO2 thin films containing erbium were deposited by radio frequency RF magnetron sputtering under ultrahigh vacuum conditions UHV. Morphology, structural, optical and electronic properties were studied. TiO2:Er thin films are homogenous, with uniform distribution of Er ions and high transparency over the visible VIS range of the light sp
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Jeong, Eunkang, Juyun Park, Sujin Choi, Jisoo Kang, and Yong-Cheol Kang. "Surface Characteristics of MoNxThin Films Obtained by Reactive rf Magnetron Sputtering in UHV System." Bulletin of the Korean Chemical Society 36, no. 10 (2015): 2446–50. http://dx.doi.org/10.1002/bkcs.10470.

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Rudder, R. A., J. W. Cook, and G. Lucovsky. "Thin films of a‐Si1−xGex:H alloys by dual magnetron sputtering in a UHV chamber." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 3, no. 3 (1985): 567–71. http://dx.doi.org/10.1116/1.572995.

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MAGLIONE, M. G., F. CHIARELLA, R. DI CAPUA, et al. "HIGH QUALITY FULLY IN-SITU MgB2 THIN FILMS OBTAINED BY DC MAGNETRON SPUTTERING." International Journal of Modern Physics B 17, no. 04n06 (2003): 779–84. http://dx.doi.org/10.1142/s0217979203016601.

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MgB 2 thin films were grown in-situ at INFM- University of Naples by a magnetron sputtering technique in a UHV system (10-7 Pa) equipped with 3 focused 2′′ magnetron sources (a stoichiometric MgB 2 and metallic Mg and B targets by Superconducting Components Inc.). The substrates (sapphire or MgO) were placed "on axis" at 7 cm from the target surface on the surface of a molybdenum heater that could be operated up to 1000°C under vacuum. Best results were obtained codepositing MgB 2 and Mg at equal sputtering power (500W) for 10 min on cold substrates, resulting in a Mg rich Mg-B precursor film.
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Sakamoto, Y., S. Kuramochi, T. Uchiyama, M. Shimada, and H. Kokai. "Surface modification of uhv wall by a combination of magnetron sputtering of chromium and oxygen plasma." Vacuum 43, no. 11 (1992): 1095–96. http://dx.doi.org/10.1016/0042-207x(92)90341-s.

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Nakano, Takeo, Ken'ichiroh Hoshi, and Shigeru Baba. "Effect of background gas environment on oxygen incorporation in TiN films deposited using UHV reactive magnetron sputtering." Vacuum 83, no. 3 (2008): 467–69. http://dx.doi.org/10.1016/j.vacuum.2008.04.014.

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Bøttiger, J., N. Karpe, J. P. Krog, and A. V. Ruban. "Measured and calculated thermoelastic properties of supersaturated fcc Ni(Al) and Ni(Zr) solid solutions." Journal of Materials Research 13, no. 6 (1998): 1717–23. http://dx.doi.org/10.1557/jmr.1998.0238.

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Metastable face-centered cubic (fcc) solid solutions of Ni1–xAlx and Ni1–xZrx have been prepared in thin-film form using dc planar magnetron sputtering in a UHV system. In both these alloy systems, extended solubilities in the fcc phase and a pronounced (111) texture are observed after sputter deposition. An amorphous phase is found to form in Ni1–xAlx for x ≥ 0.30 and in Ni1–xZrx for x ≥ 0.05. Lattice constants, thermal expansion coefficients, and Debye temperatures were derived from x-ray diffraction measurements. These parameters were also calculated by using ab initio methods in the framew
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Horprathum, M., P. Chindaudom, V. Patthanasettakul, S. Rotbuathong, P. Eiamchai, and Pichet Limsuwan. "Photo-Induced Superhydrophilic TiO2 Films Deposited by DC Reactive Magnetron Sputtering at Room Temperature." Advanced Materials Research 55-57 (August 2008): 441–44. http://dx.doi.org/10.4028/www.scientific.net/amr.55-57.441.

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Titanium dioxide (TiO2) thin films, 80-170 nm thick were deposited on unheated silicon wafers (100) and glass slides with controlled operating pressure in UHV dc sputtering system with a pressure control gate valve. The dependence of hydrophilic property of the films on the total sputtering pressure of mixed Ar and O2 gases (1-10 mTorr) was investigated. We found that hydrophilic activity as well as the structural and optical properties of the films were strongly related to the pressure maintained during the deposition. The TiO2 film structure and surface morphology were studied by X-ray diffr
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Dissertations / Theses on the topic "UHV magnetron sputtering"

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Combettes, Ségolène. "Croissance et morphologie de nanoparticules coeur-coquille Fe@Au facettées : une étude expérimentale et théorique." Thesis, Toulouse 3, 2020. http://www.theses.fr/2020TOU30162.

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L'association de deux métaux dans les nanoparticules (NPs) bimétalliques permet de combiner les propriétés physiques des deux métaux ou d'exalter l'une d'entre elles. De plus, la configuration chimique qu'adoptent les NPs bimétalliques joue un rôle déterminant quant au comportement des deux métaux l'un par rapport à l'autre, et des nanoparticules face au milieu extérieur. De ce fait, il est primordial de pouvoir contrôler la croissance ainsi que la morphologie finale de ces NPs. Le travail présenté ici concerne les NPs cœur-coquille Fe@Au. Dans cette configuration, la coquille d'or protège le
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LI, CHENG-XUN, and 李承勳. "UV detection and photocatalytic properties of ZnO thin film deposited on Si by RF magnetron sputtering." Thesis, 2018. http://ndltd.ncl.edu.tw/handle/5hu5ft.

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碩士<br>國立虎尾科技大學<br>電子工程系碩士班<br>106<br>ZnO/electrode/SiO2/Si and electrode/ZnO/SiO2/Si structures of devices were applied in my research. The sputtering environment to zinc oxide film is 60% argon and 40% nitrogen, pressure is 20m torr, power is 150W, zinc oxide film thickness is 3um and 5um. Analysis of Crystal Structure and Surface Morphology of zinc oxide Thin Films by FE-SEM Analysis. XRD to observe the crystal orientation of zinc oxide, PL to see the luminescence of zinc oxide detection, EDS for photometric analysis. First, Effects of ZnO thickness and device structure on photocatalytic d
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Han, Xie Zong, and 謝忠翰. "Materials analysis of zinc oxide nanowires grown by glancing-angle RF magnetron sputtering system and its application on UV light-emitting diodes." Thesis, 2014. http://ndltd.ncl.edu.tw/handle/60517774570560738098.

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碩士<br>國立臺灣師範大學<br>光電科技研究所<br>102<br>Both of oblique angle deposition and conventional deposition techniques were used by a RF sputtering system to grown the slanted and planar n-ZnO films on p-GaN, respectively. These two kinds of n-ZnO/p-GaN heterojunctions were then fabricated the light-emitting diodes (LEDs). The electrical and optical properties of these two kinds of LEDs were investigated systematically. The results show that the slanted n-ZnO/p-GaN LEDs have a lower turn-on voltage and less leakage current than that of planar n-ZnO/p-GaN LEDs. Moreover, different from the planar n-ZnO/p-
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Conference papers on the topic "UHV magnetron sputtering"

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Shukla, S. K., B. K. Sindal, Tripti Bansod, and Kvanps Kumar. "Development of UHV compatible, cylindrical magnetron sputtering system for NEG coating." In INDIAN VACUUM SOCIETY SYMPOSIUM ON THIN FILMS: SCIENCE AND TECHNOLOGY. AIP, 2012. http://dx.doi.org/10.1063/1.4732420.

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Scherer, M., J. Pistner, and W. Lehnert. "UV- and VIS Filter Coatings by Plasma Assisted Reactive Magnetron Sputtering (PARMS)." In Optical Interference Coatings. OSA, 2010. http://dx.doi.org/10.1364/oic.2010.ma7.

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Minami, Tadatsugu, Hideki Tanaka, Takahiro Shimakawa, and Toshihiro Miyata. "Diode UV detectors using oxide semiconductor thin films deposited by magnetron sputtering." In Microelectronics, MEMS, and Nanotechnology, edited by Derek Abbott, Kamran Eshraghian, Charles A. Musca, Dimitris Pavlidis, and Neil Weste. SPIE, 2004. http://dx.doi.org/10.1117/12.521590.

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Douti, Dam-Bé L., Christophe Hecquet, Thomas Bégou, Mireille Commandré, and Laurent Gallais. "UV to IR laser damage of Magnetron Sputtering films submitted to multiple sub-picosecond pulses." In SPIE Laser Damage, edited by Gregory J. Exarhos, Vitaly E. Gruzdev, Joseph A. Menapace, Detlev Ristau, and MJ Soileau. SPIE, 2014. http://dx.doi.org/10.1117/12.2068176.

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Vidal, B., and P. Dhez. "First Results Obtained On A Magnetron Sputtering Device Designed To Produce High Reflectivity X-UV Mirrors." In 30th Annual Technical Symposium, edited by Natale M. Ceglio and Pierre Dhez. SPIE, 1987. http://dx.doi.org/10.1117/12.964830.

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Varma, Tarun, C. Periasamy, and Dharmendar Boolchandani. "Electrical and UV detection properties of ZnO thin film based schottky contacts deposited by RF magnetron sputtering." In 2017 Conference on Emerging Devices and Smart Systems (ICEDSS). IEEE, 2017. http://dx.doi.org/10.1109/icedss.2017.8073656.

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Journal articles
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