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Journal articles on the topic 'Vacuum technology'

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1

OSHIMA, Chuhei. "Vacuum technology." Hyomen Kagaku 10, no. 10 (1989): 884–90. http://dx.doi.org/10.1380/jsssj.10.884.

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2

Steckelmacher, W. "Vacuum technology." Vacuum 42, no. 12 (1991): 779. http://dx.doi.org/10.1016/0042-207x(91)90178-l.

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3

Steckelmacher, W. "Basic vacuum technology." Vacuum 42, no. 7 (1991): 505. http://dx.doi.org/10.1016/0042-207x(91)90026-f.

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4

Fitch, RK. "Vacuum 86: Vacuum science, technology and applications." Vacuum 37, no. 3-4 (1987): 251. http://dx.doi.org/10.1016/0042-207x(87)90002-9.

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5

Hong, S. S., Y. H. Shin, J. T. Kim, et al. "International Standards Activities for ISO/TC 112 Vacuum Technology." Journal of the Korean Vacuum Society 16, no. 6 (2007): 397–404. http://dx.doi.org/10.5757/jkvs.2007.16.6.397.

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6

Fox, Maurice R., Brian N. Parsons, and Timothy L. Dawson. "Possibilities Of Vacuum Technology I-Vacuum Impregnation II-Vacuum Transfer Printing." Journal of the Society of Dyers and Colourists 89, no. 12 (2008): 474–85. http://dx.doi.org/10.1111/j.1478-4408.1973.tb03118.x.

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7

FUKUTANI, Katsuyuki. "Surfaces in Vacuum Technology." Journal of the Vacuum Society of Japan 56, no. 6 (2013): 204–9. http://dx.doi.org/10.3131/jvsj2.56.204.

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8

Rubin, Lawrence G. "Focus on Vacuum Technology." Physics Today 52, no. 10 (1999): 99–101. http://dx.doi.org/10.1063/1.2802827.

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9

RUBIN, LAWRENCE G. "Focus on Vacuum Technology." Physics Today 51, no. 6 (1998): 77–79. http://dx.doi.org/10.1063/1.2805860.

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10

Rubin, Lawrence G. "Focus on Vacuum Technology." Physics Today 53, no. 7 (2000): 65–67. http://dx.doi.org/10.1063/1.2405481.

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11

Rubin, Lawrence G. "Focus on Vacuum Technology." Physics Today 54, no. 7 (2001): 65–67. http://dx.doi.org/10.1063/1.2405652.

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12

Murdoch, D., A. Antipenkov, C. Caldwell-Nichols, et al. "Vacuum technology for ITER." Journal of Physics: Conference Series 100, no. 6 (2008): 062002. http://dx.doi.org/10.1088/1742-6596/100/6/062002.

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13

Waits, Robert K. "Edison’s vacuum technology patents." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 21, no. 4 (2003): 881–91. http://dx.doi.org/10.1116/1.1575230.

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14

KAMOHARA, Hideaki, Yuuichi ISHIKAWA, and Shinjiroo UEDA. "Ultra High Vacuum Technology." Journal of the Society of Mechanical Engineers 88, no. 799 (1985): 609–15. http://dx.doi.org/10.1299/jsmemag.88.799_609.

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15

MACHIDA, Kazuo. "Space Technology and Vacuum." Journal of the Society of Mechanical Engineers 92, no. 848 (1989): 640–42. http://dx.doi.org/10.1299/jsmemag.92.848_640.

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16

Steckelmacher, W. "Vacuum technology and applications." Vacuum 44, no. 2 (1993): 161. http://dx.doi.org/10.1016/0042-207x(93)90367-j.

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17

ODA, Zenjiro. "Special Issue on Vacuum Technology. Development of Industrial Vacuum Technology in Japan." Journal of the Japan Society for Precision Engineering 57, no. 9 (1991): 1526–30. http://dx.doi.org/10.2493/jjspe.57.1526.

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18

SAITO, Kazuya. "Vacuum Technology: Keys and Applications. Outgassing from Vacuum Materials." SHINKU 40, no. 11 (1997): 835–40. http://dx.doi.org/10.3131/jvsj.40.835.

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19

Wen, Hua Bin, Yong Duan Song, and Rui Li. "A Study on Virtual Prototyping Technology for Vacuum Switch." Advanced Materials Research 187 (February 2011): 528–34. http://dx.doi.org/10.4028/www.scientific.net/amr.187.528.

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The optimal design of vacuum switch is becoming an important research topic with the extensive application and increasing demands of vacuum switches. This paper analyzes the main elements of the vacuum switch design, and gives the design process of the vacuum switch. An optimal design method is proposed for the vacuum switch based on the concept and characteristics of virtual prototyping (VP) technology. By using computer aided design and the related software, we propose a method for vacuum switch modeling VP, the stress field VP of parts, the thermal field VP of electric heat, the electric fi
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20

MIZUNO, Hazime. "Lecture on vacuum technology. For ultra high vacuum technology. 18. Practice of vacuum exhaust and flange. 2. Exhaust in ultra high vacuum system." SHINKU 32, no. 8 (1989): 669–72. http://dx.doi.org/10.3131/jvsj.32.669.

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21

SHIOIRI, Tetsu, and Mitsutaka HOMMA. "Insulation Technology of Vacuum Interrupter." SHINKU 43, no. 1 (2000): 18–23. http://dx.doi.org/10.3131/jvsj.43.18.

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22

KOBAYASHI, Haruhiro. "Electron tubes and vacuum technology." SHINKU 30, no. 12 (1987): 1019–21. http://dx.doi.org/10.3131/jvsj.30.1019.

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23

NARITA, Shigemi. "Vacuum technology and optical devices." SHINKU 30, no. 12 (1987): 1022–23. http://dx.doi.org/10.3131/jvsj.30.1022.

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24

ONO, Masatoshi. "Vacuum technology for surface study." SHINKU 30, no. 12 (1987): 982–84. http://dx.doi.org/10.3131/jvsj.30.982.

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25

Joo, Jang Hun. "Vacuum Technology for EUV Lithography." Vacuum Magazine 1, no. 3 (2014): 14–20. http://dx.doi.org/10.5757/vacmag.1.3.14.

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26

Hansen, Stephen P. "An introduction ot vacuum technology." Physics Teacher 35, no. 1 (1997): 8–14. http://dx.doi.org/10.1119/1.2344578.

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27

Matsumura, Takeshi, Takayuki Tokuda, Akinobu Tsutinaga, Masafumi Kimata, Hideyuki Abe, and Naotaka Tokashiki. "Vacuum-Packaging Technology for IRFPAs." IEEJ Transactions on Sensors and Micromachines 130, no. 6 (2010): 212–18. http://dx.doi.org/10.1541/ieejsmas.130.212.

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28

Varandas, CAF. "Vacuum technology on fusion devices." Vacuum 45, no. 10-11 (1994): 1063–66. http://dx.doi.org/10.1016/0042-207x(94)90023-x.

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29

Ferrario, B. "Chemical pumping in vacuum technology." Vacuum 47, no. 4 (1996): 363–70. http://dx.doi.org/10.1016/0042-207x(95)00252-9.

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30

Al-Dmour, Eshraq, Jonny Ahlback, Dieter Einfeld, Pedro Fernandes Tavares, and Marek Grabski. "Diffraction-limited storage-ring vacuum technology." Journal of Synchrotron Radiation 21, no. 5 (2014): 878–83. http://dx.doi.org/10.1107/s1600577514010480.

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Some of the characteristics of recent ultralow-emittance storage-ring designs and possibly future diffraction-limited storage rings are a compact lattice combined with small magnet apertures. Such requirements present a challenge for the design and performance of the vacuum system. The vacuum system should provide the required vacuum pressure for machine operation and be able to handle the heat load from synchrotron radiation. Small magnet apertures result in the conductance of the chamber being low, and lumped pumps are ineffective. One way to provide the required vacuum level is by distribut
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31

IDE, Shigeo. "Special Issue on Vacuum Technology. Trends in Dry Vacuum Pump." Journal of the Japan Society for Precision Engineering 57, no. 9 (1991): 1555–60. http://dx.doi.org/10.2493/jjspe.57.1555.

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32

NOMA, Hiroshi. "Special Issue on Vacuum Technology. Technical Status of Vacuum Valves." Journal of the Japan Society for Precision Engineering 57, no. 9 (1991): 1561–67. http://dx.doi.org/10.2493/jjspe.57.1561.

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33

Mosiyuk, V. N., S. V. Vorvul, and O. V. Tomchani. "Differential vacuum molding as an advanced technology of vacuum molding." «Aviation Materials and Technologies», no. 4 (October 2017): 37–41. http://dx.doi.org/10.18577/2071-9140-2017-0-4-37-41.

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34

Fu, Chunyu, and Yize Dong. "Research on Near Space Plasma Vacuum Environmental Simulation Technology." MATEC Web of Conferences 198 (2018): 05009. http://dx.doi.org/10.1051/matecconf/201819805009.

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The operation reliability of spacecraft in orbitis affected by the interaction with space plasma, research on the space enviroment by advanced testing method is important. It is costly to carry out research and analysis with space flight. Therefore, tests using ground vacuum environment simulation system are of significance. This paper proposed the structure design, simulation analysis and numerical calculation methods for the three subsystems of plasma environment simulation system, including vacuum vessel, vacuum acquisition and vacuum measurement and control. The simulation results show tha
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35

WATANABE, KAZUHIRO. "Vacuum as a Basis of Science and Technology. Development of Fusion Energy with Vacuum Technology." Journal of the Institute of Electrical Engineers of Japan 121, no. 6 (2001): 384–86. http://dx.doi.org/10.1541/ieejjournal.121.384.

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36

Chen, Xiao Li, Hong Wei Shi, Xiao Guang Song, Hong Chao Wang, and Hao Gong. "Casting Transformers APG Manufacturing Technology." Advanced Materials Research 1002 (August 2014): 65–68. http://dx.doi.org/10.4028/www.scientific.net/amr.1002.65.

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The APG (Automatic Pressure Gelation) process of epoxy resin casting transformer had been studied in this paper, which was developed toward epoxy resin vacuum casting process. The raw materials, mold, the differences with vacuum casting process,casting process with its parameters were introduced. Also the factors that influences the partial discharge experiment of transformer were analyzed,especially the body making and casting processes.
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37

Sari, Rodiah Nurbaya, Diah L. Iah L. Ayudiarti, and G. Gunawan. "THE USE OF VACUUM IMPREGNATION TECHNOLOGY TO IMPROVE SMOKING PROCESS." KnE Life Sciences 2, no. 1 (2015): 45. http://dx.doi.org/10.18502/kls.v1i0.85.

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One of the new technologies contributing to preserve of the original properties of food (as fruit or vegetables or fish) is vacuum impregnation. Vacuum impregnation is one method to preserve foods using vacuum and pressure to fill the porous with osmotic solution. The application of vacuum impregnation had been conducted on smoked processing using liquid smoke for catfish fillet (Pangasius sp) and tilapia fillet (Oreochomis sp). Vacuum impregnation tool was used having 5 kg capacity of fillet product, vacuum pressure at 0.71 kg/cm2 and range of 0-6 kg/cm2 impregnation pressure. The research ha
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38

Hruszowiec, Mariusz, Wojciech Czarczyński, Edward F. Pliński, and Tadeusz Więckowski. "Gyrotron Technology." Journal of Telecommunications and Information Technology, no. 1 (March 30, 2014): 68–76. http://dx.doi.org/10.26636/jtit.2014.1.1011.

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The article presents a microwave vacuum tube called gyrotron. Its applications, construction and principle of operation are briefly described. It is also discussed the issue of an appropriate electron beam generation and formation.
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39

Barth, K. L., and W. S. Sampath. "Environmentally benign vacuum deposition with air-to-vacuum-to-air technology." Journal of Materials Research 10, no. 3 (1995): 493–96. http://dx.doi.org/10.1557/jmr.1995.0493.

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The deposition of thin films and coatings frequently results in the generation of toxic waste, volatile organic compounds, or large amounts of waste water and sludge. Vapor deposition in vacuum offers a more environmentally benign alternative, but is not prevalent outside of the microelectronics industry due to economic reasons. However, vacuum coating could be more widely accepted, and could potentially replace nonvacuum deposition methods, if either the cycle time or costs associated with vacuum coating were reduced. In order to reduce the cycle time for vacuum deposition, a robust system fo
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40

KOBAYASHI, Masanori. "Vacuum Technology: Keys and Applications. Before You Select a Vacuum Pump." SHINKU 40, no. 11 (1997): 828–34. http://dx.doi.org/10.3131/jvsj.40.828.

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41

Cherenshchykov, S. A. "A low-voltage Penning cell for vacuum measurement and vacuum technology." Vacuum 73, no. 2 (2004): 285–89. http://dx.doi.org/10.1016/j.vacuum.2003.12.003.

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42

Mazzolini, F. "Emerging applications for vacuum technology. (IUVSTA highlights seminar-vacuum science division)." Vacuum 65, no. 2 (2002): 239–40. http://dx.doi.org/10.1016/s0042-207x(01)00397-9.

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43

Clark, L. A., D. L. Jones, and W. J. Clark. "Technology Innovation and the Policy Vacuum." International Journal of Technoethics 3, no. 1 (2012): 1–13. http://dx.doi.org/10.4018/jte.2012010101.

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New technologies and innovation open the door to exciting products and practices. As companies explore the possibilities of what can be, they often fail to consider what should be. Advancement often occurs rapidly and legal and policy guidance lags behind leaving a void of clear direction. Companies often interpret this void as giving permission to proceed with the new technology or practice. In some situations, strong customer or public reaction indicates that the technology or practice crosses the line of what is acceptable. This paper explores how the most innovative firms are navigating th
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44

Edenhofer, B., F. Bless, and W. Peter. "Progress in Vacuum- and Plasma-Technology." Materials Science Forum 102-104 (January 1992): 849–58. http://dx.doi.org/10.4028/www.scientific.net/msf.102-104.849.

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45

AKAISHI, Kenya. "Science and technology for vacuum production." SHINKU 30, no. 12 (1987): 949–51. http://dx.doi.org/10.3131/jvsj.30.949.

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46

Gorobey, V. N., S. A. Konakov, R. E. Kuvandykov, I. V. Popova, and R. A. Teteruk. "Production technology of micromechanical vacuum gauge." IOP Conference Series: Materials Science and Engineering 387 (July 2018): 012024. http://dx.doi.org/10.1088/1757-899x/387/1/012024.

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47

Abbott, Patrick J., and Zeina J. Jabour. "Vacuum technology considerations for mass metrology." Journal of Research of the National Institute of Standards and Technology 116, no. 4 (2011): 689. http://dx.doi.org/10.6028/jres.116.014.

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48

Esterson, M. "Total Pressure Measurements in Vacuum Technology." Electronics and Power 32, no. 3 (1986): 233. http://dx.doi.org/10.1049/ep.1986.0149.

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49

Shea, J. J. "Foundations of Vacuum Science and Technology." IEEE Electrical Insulation Magazine 14, no. 4 (1998): 42. http://dx.doi.org/10.1109/mei.1998.689278.

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50

DeYoung, Russell. "High-Vacuum Technology: A Practical Guide." Fusion Technology 19, no. 4 (1991): 2144. http://dx.doi.org/10.13182/fst91-a29355.

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