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Journal articles on the topic 'Vacuum technology'

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Published: 4 June 2021
Last updated: 30 July 2024

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1

OSHIMA, Chuhei. "Vacuum technology." Hyomen Kagaku 10, no. 10 (1989): 884–90. http://dx.doi.org/10.1380/jsssj.10.884.

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2

Steckelmacher, W. "Vacuum technology." Vacuum 42, no. 12 (January 1991): 779. http://dx.doi.org/10.1016/0042-207x(91)90178-l.

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3

Steckelmacher, W. "Basic vacuum technology." Vacuum 42, no. 7 (January 1991): 505. http://dx.doi.org/10.1016/0042-207x(91)90026-f.

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4

Fitch, RK. "Vacuum 86: Vacuum science, technology and applications." Vacuum 37, no. 3-4 (January 1987): 251. http://dx.doi.org/10.1016/0042-207x(87)90002-9.

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5

Hong, S. S., Y. H. Shin, J. T. Kim, K. H. Chung, H. K. Choi, I. S. Kim, and W. Y. Park. "International Standards Activities for ISO/TC 112 Vacuum Technology." Journal of the Korean Vacuum Society 16, no. 6 (November 30, 2007): 397–404. http://dx.doi.org/10.5757/jkvs.2007.16.6.397.

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6

FUKUTANI, Katsuyuki. "Surfaces in Vacuum Technology." Journal of the Vacuum Society of Japan 56, no. 6 (2013): 204–9. http://dx.doi.org/10.3131/jvsj2.56.204.

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7

Rubin, Lawrence G. "Focus on Vacuum Technology." Physics Today 52, no. 10 (October 1999): 99–101. http://dx.doi.org/10.1063/1.2802827.

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8

RUBIN, LAWRENCE G. "Focus on Vacuum Technology." Physics Today 51, no. 6 (June 1998): 77–79. http://dx.doi.org/10.1063/1.2805860.

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9

Rubin, Lawrence G. "Focus on Vacuum Technology." Physics Today 53, no. 7 (July 2000): 65–67. http://dx.doi.org/10.1063/1.2405481.

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10

Rubin, Lawrence G. "Focus on Vacuum Technology." Physics Today 54, no. 7 (July 2001): 65–67. http://dx.doi.org/10.1063/1.2405652.

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11

Murdoch, D., A. Antipenkov, C. Caldwell-Nichols, C. Day, M. Dremel, H. Haas, V. Hauer, and H. Jensen. "Vacuum technology for ITER." Journal of Physics: Conference Series 100, no. 6 (March 1, 2008): 062002. http://dx.doi.org/10.1088/1742-6596/100/6/062002.

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12

Waits, Robert K. "Edison’s vacuum technology patents." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 21, no. 4 (July 2003): 881–91. http://dx.doi.org/10.1116/1.1575230.

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13

KAMOHARA, Hideaki, Yuuichi ISHIKAWA, and Shinjiroo UEDA. "Ultra High Vacuum Technology." Journal of the Society of Mechanical Engineers 88, no. 799 (1985): 609–15. http://dx.doi.org/10.1299/jsmemag.88.799_609.

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14

MACHIDA, Kazuo. "Space Technology and Vacuum." Journal of the Society of Mechanical Engineers 92, no. 848 (1989): 640–42. http://dx.doi.org/10.1299/jsmemag.92.848_640.

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15

Steckelmacher, W. "Vacuum technology and applications." Vacuum 44, no. 2 (February 1993): 161. http://dx.doi.org/10.1016/0042-207x(93)90367-j.

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16

Fox, Maurice R., Brian N. Parsons, and Timothy L. Dawson. "Possibilities Of Vacuum Technology I-Vacuum Impregnation II-Vacuum Transfer Printing." Journal of the Society of Dyers and Colourists 89, no. 12 (October 22, 2008): 474–85. http://dx.doi.org/10.1111/j.1478-4408.1973.tb03118.x.

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17

ODA, Zenjiro. "Special Issue on Vacuum Technology. Development of Industrial Vacuum Technology in Japan." Journal of the Japan Society for Precision Engineering 57, no. 9 (1991): 1526–30. http://dx.doi.org/10.2493/jjspe.57.1526.

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18

SAITO, Kazuya. "Vacuum Technology: Keys and Applications. Outgassing from Vacuum Materials." SHINKU 40, no. 11 (1997): 835–40. http://dx.doi.org/10.3131/jvsj.40.835.

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19

SHIOIRI, Tetsu, and Mitsutaka HOMMA. "Insulation Technology of Vacuum Interrupter." SHINKU 43, no. 1 (2000): 18–23. http://dx.doi.org/10.3131/jvsj.43.18.

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20

KOBAYASHI, Haruhiro. "Electron tubes and vacuum technology." SHINKU 30, no. 12 (1987): 1019–21. http://dx.doi.org/10.3131/jvsj.30.1019.

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21

NARITA, Shigemi. "Vacuum technology and optical devices." SHINKU 30, no. 12 (1987): 1022–23. http://dx.doi.org/10.3131/jvsj.30.1022.

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22

ONO, Masatoshi. "Vacuum technology for surface study." SHINKU 30, no. 12 (1987): 982–84. http://dx.doi.org/10.3131/jvsj.30.982.

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23

Joo, Jang Hun. "Vacuum Technology for EUV Lithography." Vacuum Magazine 1, no. 3 (September 30, 2014): 14–20. http://dx.doi.org/10.5757/vacmag.1.3.14.

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24

Hansen, Stephen P. "An introduction ot vacuum technology." Physics Teacher 35, no. 1 (January 1997): 8–14. http://dx.doi.org/10.1119/1.2344578.

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25

Matsumura, Takeshi, Takayuki Tokuda, Akinobu Tsutinaga, Masafumi Kimata, Hideyuki Abe, and Naotaka Tokashiki. "Vacuum-Packaging Technology for IRFPAs." IEEJ Transactions on Sensors and Micromachines 130, no. 6 (2010): 212–18. http://dx.doi.org/10.1541/ieejsmas.130.212.

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26

Varandas, CAF. "Vacuum technology on fusion devices." Vacuum 45, no. 10-11 (October 1994): 1063–66. http://dx.doi.org/10.1016/0042-207x(94)90023-x.

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27

Ferrario, B. "Chemical pumping in vacuum technology." Vacuum 47, no. 4 (April 1996): 363–70. http://dx.doi.org/10.1016/0042-207x(95)00252-9.

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28

MIZUNO, Hazime. "Lecture on vacuum technology. For ultra high vacuum technology. 18. Practice of vacuum exhaust and flange. 2. Exhaust in ultra high vacuum system." SHINKU 32, no. 8 (1989): 669–72. http://dx.doi.org/10.3131/jvsj.32.669.

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29

Wen, Hua Bin, Yong Duan Song, and Rui Li. "A Study on Virtual Prototyping Technology for Vacuum Switch." Advanced Materials Research 187 (February 2011): 528–34. http://dx.doi.org/10.4028/www.scientific.net/amr.187.528.

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The optimal design of vacuum switch is becoming an important research topic with the extensive application and increasing demands of vacuum switches. This paper analyzes the main elements of the vacuum switch design, and gives the design process of the vacuum switch. An optimal design method is proposed for the vacuum switch based on the concept and characteristics of virtual prototyping (VP) technology. By using computer aided design and the related software, we propose a method for vacuum switch modeling VP, the stress field VP of parts, the thermal field VP of electric heat, the electric field VP of insulation parts and the mechanical dynamic VP of kinematics system, which are integrated for optimization design for vacuum switches. This work is expected to provide a new idea for optimal and rapid design of vacuum switches.
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30

IDE, Shigeo. "Special Issue on Vacuum Technology. Trends in Dry Vacuum Pump." Journal of the Japan Society for Precision Engineering 57, no. 9 (1991): 1555–60. http://dx.doi.org/10.2493/jjspe.57.1555.

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31

NOMA, Hiroshi. "Special Issue on Vacuum Technology. Technical Status of Vacuum Valves." Journal of the Japan Society for Precision Engineering 57, no. 9 (1991): 1561–67. http://dx.doi.org/10.2493/jjspe.57.1561.

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32

Mosiyuk, V. N., S. V. Vorvul, and O. V. Tomchani. "Differential vacuum molding as an advanced technology of vacuum molding." «Aviation Materials and Technologies», no. 4 (October 2017): 37–41. http://dx.doi.org/10.18577/2071-9140-2017-0-4-37-41.

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33

Al-Dmour, Eshraq, Jonny Ahlback, Dieter Einfeld, Pedro Fernandes Tavares, and Marek Grabski. "Diffraction-limited storage-ring vacuum technology." Journal of Synchrotron Radiation 21, no. 5 (August 27, 2014): 878–83. http://dx.doi.org/10.1107/s1600577514010480.

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Some of the characteristics of recent ultralow-emittance storage-ring designs and possibly future diffraction-limited storage rings are a compact lattice combined with small magnet apertures. Such requirements present a challenge for the design and performance of the vacuum system. The vacuum system should provide the required vacuum pressure for machine operation and be able to handle the heat load from synchrotron radiation. Small magnet apertures result in the conductance of the chamber being low, and lumped pumps are ineffective. One way to provide the required vacuum level is by distributed pumping, which can be realised by the use of a non-evaporable getter (NEG) coating of the chamber walls. It may not be possible to use crotch absorbers to absorb the heat from the synchrotron radiation because an antechamber is difficult to realise with such a compact lattice. To solve this, the chamber walls can work as distributed absorbers if they are made of a material with good thermal conductivity, and distributed cooling is used at the location where the synchrotron radiation hits the wall. The vacuum system of the 3 GeV storage ring of MAX IV is used as an example of possible solutions for vacuum technologies for diffraction-limited storage rings.
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34

WATANABE, KAZUHIRO. "Vacuum as a Basis of Science and Technology. Development of Fusion Energy with Vacuum Technology." Journal of the Institute of Electrical Engineers of Japan 121, no. 6 (2001): 384–86. http://dx.doi.org/10.1541/ieejjournal.121.384.

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35

Fu, Chunyu, and Yize Dong. "Research on Near Space Plasma Vacuum Environmental Simulation Technology." MATEC Web of Conferences 198 (2018): 05009. http://dx.doi.org/10.1051/matecconf/201819805009.

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The operation reliability of spacecraft in orbitis affected by the interaction with space plasma, research on the space enviroment by advanced testing method is important. It is costly to carry out research and analysis with space flight. Therefore, tests using ground vacuum environment simulation system are of significance. This paper proposed the structure design, simulation analysis and numerical calculation methods for the three subsystems of plasma environment simulation system, including vacuum vessel, vacuum acquisition and vacuum measurement and control. The simulation results show that the maximum stress of the vacuum vessel is 113.2MPa , and the maximum deformation is 0.59mm , at the same time, vacuum technology index, structural stability and human-machine interaction performance of the system can meet the experimental research requirement.
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36

Barth, K. L., and W. S. Sampath. "Environmentally benign vacuum deposition with air-to-vacuum-to-air technology." Journal of Materials Research 10, no. 3 (March 1995): 493–96. http://dx.doi.org/10.1557/jmr.1995.0493.

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The deposition of thin films and coatings frequently results in the generation of toxic waste, volatile organic compounds, or large amounts of waste water and sludge. Vapor deposition in vacuum offers a more environmentally benign alternative, but is not prevalent outside of the microelectronics industry due to economic reasons. However, vacuum coating could be more widely accepted, and could potentially replace nonvacuum deposition methods, if either the cycle time or costs associated with vacuum coating were reduced. In order to reduce the cycle time for vacuum deposition, a robust system for continuous air-to-vacuum-to-air (AVA) transportation of discreet substrates has been developed and constructed in this study. This technology allows the insertion of discrete components into vacuum at high rates, without the need for venting the deposition chamber. Substrates have been repeatedly transported from atmosphere to 10−5 Torr in under a second. The capability of the AVA technology was studied through the deposition and characterization of CdS and CdTe films and photovoltaic devices. With the AVA technology, the need for venting the vacuum chamber to insert the substrates and subsequent pumping of the system for deposition is eliminated. The AVA technology could be applied to the processing of silicon wafers, compact disks, optical components, solar cells, cutting tools, and fasteners.
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37

Chen, Xiao Li, Hong Wei Shi, Xiao Guang Song, Hong Chao Wang, and Hao Gong. "Casting Transformers APG Manufacturing Technology." Advanced Materials Research 1002 (August 2014): 65–68. http://dx.doi.org/10.4028/www.scientific.net/amr.1002.65.

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The APG (Automatic Pressure Gelation) process of epoxy resin casting transformer had been studied in this paper, which was developed toward epoxy resin vacuum casting process. The raw materials, mold, the differences with vacuum casting process,casting process with its parameters were introduced. Also the factors that influences the partial discharge experiment of transformer were analyzed,especially the body making and casting processes.
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38

Hruszowiec, Mariusz, Wojciech Czarczyński, Edward F. Pliński, and Tadeusz Więckowski. "Gyrotron Technology." Journal of Telecommunications and Information Technology, no. 1 (March 30, 2014): 68–76. http://dx.doi.org/10.26636/jtit.2014.1.1011.

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The article presents a microwave vacuum tube called gyrotron. Its applications, construction and principle of operation are briefly described. It is also discussed the issue of an appropriate electron beam generation and formation.
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39

KOBAYASHI, Masanori. "Vacuum Technology: Keys and Applications. Before You Select a Vacuum Pump." SHINKU 40, no. 11 (1997): 828–34. http://dx.doi.org/10.3131/jvsj.40.828.

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40

Cherenshchykov, S. A. "A low-voltage Penning cell for vacuum measurement and vacuum technology." Vacuum 73, no. 2 (March 2004): 285–89. http://dx.doi.org/10.1016/j.vacuum.2003.12.003.

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41

Mazzolini, F. "Emerging applications for vacuum technology. (IUVSTA highlights seminar-vacuum science division)." Vacuum 65, no. 2 (April 2002): 239–40. http://dx.doi.org/10.1016/s0042-207x(01)00397-9.

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42

Sari, Rodiah Nurbaya, Diah L. Iah L. Ayudiarti, and G. Gunawan. "THE USE OF VACUUM IMPREGNATION TECHNOLOGY TO IMPROVE SMOKING PROCESS." KnE Life Sciences 2, no. 1 (February 1, 2015): 45. http://dx.doi.org/10.18502/kls.v1i0.85.

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One of the new technologies contributing to preserve of the original properties of food (as fruit or vegetables or fish) is vacuum impregnation. Vacuum impregnation is one method to preserve foods using vacuum and pressure to fill the porous with osmotic solution. The application of vacuum impregnation had been conducted on smoked processing using liquid smoke for catfish fillet (Pangasius sp) and tilapia fillet (Oreochomis sp). Vacuum impregnation tool was used having 5 kg capacity of fillet product, vacuum pressure at 0.71 kg/cm2 and range of 0-6 kg/cm2 impregnation pressure. The research had done using osmotic solution with liquid smoke 1.5% and 17.4 g of salt/liter of water and the tool was set at condition of 0.71 kg/cm2 vacuum pressure and variations treatment such of vacuum process time (5 and 10 min), impregnation pressure (1 and 2 kg/cm2), and impregnation process time (5, 15, and 25 min). Each treatment was done in two replications. Analysis of these fillets before smoking process such of water content, protein content, fat content, color measurement, and hardness (cutting force). After smoking process these fillets are also analyzed for phenols content. Results showed that based on several parameters of the treatment, smoked fillet of catfish needed 35 minutes with phenol content 0.34 mg/kg and tilapia 25 minutes with 16.40 mg/kg phenol content. Thus by using vacuum impregnation tool could be shortening the smoking process for both of fillet. Keywords: fillet, liquid smoke, original properties, vacuum impregnation
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43

Clark, L. A., D. L. Jones, and W. J. Clark. "Technology Innovation and the Policy Vacuum." International Journal of Technoethics 3, no. 1 (January 2012): 1–13. http://dx.doi.org/10.4018/jte.2012010101.

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New technologies and innovation open the door to exciting products and practices. As companies explore the possibilities of what can be, they often fail to consider what should be. Advancement often occurs rapidly and legal and policy guidance lags behind leaving a void of clear direction. Companies often interpret this void as giving permission to proceed with the new technology or practice. In some situations, strong customer or public reaction indicates that the technology or practice crosses the line of what is acceptable. This paper explores how the most innovative firms are navigating through an inconsistent, even conflicting, ethical and legal global landscape and calls for the intentional identification of relevant social norms and development of laws to fill the policy vacuum.
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44

Edenhofer, B., F. Bless, and W. Peter. "Progress in Vacuum- and Plasma-Technology." Materials Science Forum 102-104 (January 1992): 849–58. http://dx.doi.org/10.4028/www.scientific.net/msf.102-104.849.

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45

AKAISHI, Kenya. "Science and technology for vacuum production." SHINKU 30, no. 12 (1987): 949–51. http://dx.doi.org/10.3131/jvsj.30.949.

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46

Gorobey, V. N., S. A. Konakov, R. E. Kuvandykov, I. V. Popova, and R. A. Teteruk. "Production technology of micromechanical vacuum gauge." IOP Conference Series: Materials Science and Engineering 387 (July 2018): 012024. http://dx.doi.org/10.1088/1757-899x/387/1/012024.

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47

Abbott, Patrick J., and Zeina J. Jabour. "Vacuum technology considerations for mass metrology." Journal of Research of the National Institute of Standards and Technology 116, no. 4 (July 2011): 689. http://dx.doi.org/10.6028/jres.116.014.

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48

Esterson, M. "Total Pressure Measurements in Vacuum Technology." Electronics and Power 32, no. 3 (1986): 233. http://dx.doi.org/10.1049/ep.1986.0149.

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49

Shea, J. J. "Foundations of Vacuum Science and Technology." IEEE Electrical Insulation Magazine 14, no. 4 (July 1998): 42. http://dx.doi.org/10.1109/mei.1998.689278.

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50

DeYoung, Russell. "High-Vacuum Technology: A Practical Guide." Fusion Technology 19, no. 4 (July 1991): 2144. http://dx.doi.org/10.13182/fst91-a29355.

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