Relevant bibliographies by topics / Films de silice

Contents

  1. Journal articles
  2. Dissertations / Theses
  3. Books
  4. Book chapters
  5. Conference papers
  6. Reports

Academic literature on the topic 'Films de silice'

Author: Grafiati
Published: 8 June 2024
Last updated: 31 July 2025

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Journal articles on the topic "Films de silice"

1

Bouchard, H., A. Azelmad, J. F. Currie, and M. Meunier. "Variation de la contrainte des verres de silice sous cycle thermique." Canadian Journal of Physics 70, no. 10-11 (1992): 830–33. http://dx.doi.org/10.1139/p92-131.

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Using an in situ technique, stress was measured as a function of annealing temperature to investigate the effect of phosphorous and boron doping of silicon dioxide glass films deposited by low-pressure chemical vapor deposition (LPCVD). It was found that the initial stress of phosphosilicate glass is independent of the amount of phosphorus present, while the boron content influences the initial stress in borophosphosilicate glass. The stress increases to a maximum, σm, corresponding to a temperature Tm, above which the onset of viscous flow reduces the stress to zero at a temperature T0. All t
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Bahlawane, N., M. Charbonnier, and M. Romand. "Apport des techniques XRFS et LEEIXS à l'étude de la formation de films de silice sur acier par PACVD." Le Journal de Physique IV 08, PR5 (1998): Pr5–271—Pr5–278. http://dx.doi.org/10.1051/jp4:1998534.

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Balan, Poovarasi, Aaron Ng, Chee Beng Siang, R. K. Singh Raman, and Eng Seng Chan. "Effect of Nanoparticle Addition in Hybrid Sol-Gel Silane Coating on Corrosion Resistance of Low Carbon Steel." Advanced Materials Research 686 (April 2013): 244–49. http://dx.doi.org/10.4028/www.scientific.net/amr.686.244.

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Chromium pre-treatments of metal have been replaced by silane pre-treatments as more environmental friendly option. Nanoparticles can be added in the silane sol-gel network have been reported to improve corrosion resistance. In this work, the electrochemical corrosion resistance of low carbon steel coated with hybrid organic-inorganic sol-gel film filled with nanoparticles was evaluated. The sol-gel films have been synthesized from 3-glycidoxy-propyl-trimethoxy-silane (3-GPTMS) and tetra-ethyl-ortho-silicate (TEOS) precursors. These films have been impregnated with 300 ppm of silica or alumina
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Park, Hoy Yul, Dong Pil Kang, In Hye Myung, and Seog Young Yoon. "Properties of Coating Films Synthesized from Nano Colloidal Silica and Alkoxy Silanes." Materials Science Forum 510-511 (March 2006): 222–25. http://dx.doi.org/10.4028/www.scientific.net/msf.510-511.222.

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Colloidal silica/silane sol solutions were prepared in variation with the ratio of silane to colloidal silica. Such sol solutions were synthesized from colloidal silica/tetramethoxysilane (TMOS)/methyltrimethoxysilane(MTMS). Sol solutions were prepared by sol-gel reaction through two step reactions. To understand their physical and chemical properties, dip coating of sol solutions was performed on the glass substrates. Contact angle and thickness of coating films increased with increasing the amount of MTMS. The surface free energy of coating films decreased with increasing amount of MTMS. Coa
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Tao, Yao, Feng Zheng, Zhao Chen, Shuangshuang Chen, Xuemin Lu, and Qinghua Lu. "Comparison of hybrid polyimide films with silica and organosilica obtained via sol–gel process." High Performance Polymers 29, no. 9 (2016): 1049–57. http://dx.doi.org/10.1177/0954008316668242.

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A series of polyimide/silica (PI–S) and polyimide/organosilica (PI–OS) hybrid films were prepared via a sol–gel process from mixtures of poly(amic acid) (PAA) and tetraethoxysilane or a silane coupling agent in solution. The PAA was synthesized from bis-(3-phthalyl anhydride) ether and 1,4-bis (4-aminophenoxy) benzene. The hybrid films were produced via an imidization reaction to form silica particles or a silica network in a polymer matrix through a programmed heating process. The derived films were characterized and compared by Fourier transform infrared spectroscopy, field emission scanning
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Jiang, Pei-Cheng, Yu-Ting Chow, Chi-Wei Chien, Cheng-Hsun-Tony Chang, and Chii-Ruey Lin. "Silica Layer Used in Sensor Fabrication from a Low-Temperature Silane-Free Procedure." Chemosensors 9, no. 2 (2021): 32. http://dx.doi.org/10.3390/chemosensors9020032.

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Silica (SiO2, silicon dioxide—a dielectric layer commonly used in electronic devices) is widely used in many types of sensors, such as gas, molecular, and biogenic polyamines. To form silica films, core shell or an encapsulated layer, silane has been used as a precursor in recent decades. However, there are many hazards caused by using silane, such as its being extremely flammable, the explosive air, and skin and eye pain. To avoid these hazards, it is necessary to spend many resources on industrial safety design. Thus, the silica synthesized without silane gas which can be determined as a sil
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Zhou, Yingyu, and Hongling Chen. "Robust Super-Repellent Anisotropic Silica Films by Emulsion-Based Sol–Gel Growth." Nano 13, no. 01 (2018): 1850005. http://dx.doi.org/10.1142/s1793292018500054.

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In this paper, anisotropic SiO2 with different morphologies were synthesized through an emulsion-based one-pot method by adding various silane coupling agents. Silane coupling agents affected the growth of silica nanostructures at the oil/water interfaces. Robust super-repellent film that showed great durability under different harsh conditions were obtained by bonding the self-assembled anisotropic silica nanostructures (ASN) film to substrate by the commercial acrylic adhesive. The film switched from superhydrophobic (157.1[Formula: see text] to superhydrophilic (0[Formula: see text] after b
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Na, Moon Kyong, Dong Pil Kang, Hoy Yul Park, Myeong Sang Ahn, and In Hye Myung. "Properties of Nano-Hybrid Sol-Gel Materials Synthesized from Colloidal Silica-Silane Containing Epoxy Silane." Key Engineering Materials 336-338 (April 2007): 2278–81. http://dx.doi.org/10.4028/www.scientific.net/kem.336-338.2278.

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Three kinds of colloidal silica (CS)/silane sol solutions were synthesized in variation with parameters such as different acidity and reaction time. Sol solutions were prepared from HSA CS/ methyltrimethoxysilane (MTMS), LS CS/MTMS and LS CS/MTMS/γ -Glycidoxypropyltri methoxysilane (ES) solutions. In order to understand their physical and chemical properties, sol-gel coating films were fabricated on glass. Coating films on glass, obtained from LS/MTMS sol, had high contact angle, also, much enhanced flat surface in the case of LS/MTMS sol was observed in comparison with HSA/ MTMS sol. From all
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Kurniasih, Yeti, Hasan Basri, and Baiq Asma Nufida. "The Effect of Type and Concentration of Receiving Phase on Silver Separation Efficiency by Supported Liquid Membrane Technique." Jurnal Ilmiah Mandala Education 10, no. 1 (2024): 53. http://dx.doi.org/10.58258/jime.v10i1.6504.

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The Effect of The Type and Concentration of The Receiving Phase on The Efficiency Of Silver Separation with Liquid Supported Membrane Techniques. The process of making negative x-ray films in a radiology laboratory produces liquid wastes containing various chemical compounds with the main content being Ag metal (in the form of Ag+ cations). This waste is categorized as a dangerous and toxic material. Therefore it is necessary to separate the Ag metal before it is discharged into the environment so as not to be harmful to life and the environment. One of the separation techniques that can be us
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Mahdi, Billal, and Farid Rouabah. "Effect of Titanium Dioxide Nanoparticles on the Properties of Poly(Vinyl Alcohol)/Silica Hybrid Films Prepared by the Sol-Gel Method." Nano Hybrids and Composites 38 (February 3, 2023): 63–79. http://dx.doi.org/10.4028/p-381bv9.

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This work is focused on the preparation and characterization of poly (vinyl alcohol)/silica gel/Nano-TiO2, and the study of titanium dioxide (TiO2) nanoparticles (from 1 to 5%) on the properties of poly (vinyl alcohol) (PVA)/silica films. This new material was prepared by the sol-gel method using poly (vinyl alcohol) powder with Tetraethyl Orthosilicate (TEOS) as a precursor source of silica. TEOS was hydrolyzed and condensed in water and ethanol in the presence of hydrochloric acid (HCl) used as a catalyst. Fourier transform infrared (FT-IR), water absorption, water contact angle, ultraviolet
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Dissertations / Theses on the topic "Films de silice"

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Basnig, Deomila. "Élaboration de films minces de silice pour des applications en chimie analytique." Electronic Thesis or Diss., Université de Lorraine, 2021. http://www.theses.fr/2021LORR0102.

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Un film orienté à base de silice mésoporeuse sur une électrode FTO a été préparé par une approche d'auto-assemblage assistée par électrochimie (EASA). Un potentiel de -1,5 V a été appliqué à l'électrode FTO contenant un précurseur de silice préhydrolysée (par exemple, l'orthosilicate de tétraéthyle), en présence d'un modèle (par exemple, le bromure de cétrimonium) et d'un électrolyte. Cette approche permet de générer des nanocanaux de silice alignés verticalement avec des tailles de pores ajustables entre 2 et 3 nm, selon le modèle. Ce travail a montré le comportement voltammétrique et la séle
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Wora, Adeola Ganye Vergnat Michel Rinnert Hervé. "Propriétés de luminescence de films d'oxyde de silcium dopés à l'erbium." S. l. : S. n, 2007.

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CABOT, BENJAMIN. "Etudes pour l'elaboration par electrophorese de films anticorrosion a base de silice." Besançon, 1997. http://www.theses.fr/1997BESA2055.

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L'objectif de ce travail est de realiser des couches a base d'oxydes mineraux sur des pieces d'acier et d'acier zingue-chromate destinees a la protection contre la corrosion (basse et haute temperature). Pour cela nous utilisons une technique de depot par electrophorese, qui est basee sur la migration des particules, dans un champ electrique, vers l'une des electrodes. La presence de couches intermediaires sur l'acier necessite d'inverser tout d'abord la charge de surface des particules de silice. Pour cela nous adoptons trois systemes : silice-cation divalent, silice-polymere cationique, sili
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Sikolenko, Taisiia. "Films minces de silice mésoporeuse électrogénérée : contrôle de l’épaisseur et applications analytiques." Electronic Thesis or Diss., Université de Lorraine, 2020. http://www.theses.fr/2020LORR0242.

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La modification d’électrodes par des films de silice mésoporeuse (FSM) ouvre des perspectives intéressantes dans le développement de capteurs électrochimiques. En particulier, la combinaison de la méthode électrochimique EASA (electrochemically-assisted self-assembly) permet d’obtenir des films fins et réguliers de silice mésoporeuse, de structure hexagonale et des pores perpendiculaire à la surface du support. Ces caractéristiques singulières contribuent à des transports de matière extrêmement rapides et indispensables aux applications type capteurs. La première partie du projet est centrée s
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Motos, Blanca. "Silices fonctionnalisées contenant des espèces ioniques pour la catalyse hétérogène." Thesis, Montpellier, Ecole nationale supérieure de chimie, 2011. http://www.theses.fr/2011ENCM0015.

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La catalyse hétérogène est en plein développement pour des raisons économiques, de santé et de protection environnementale. Les travaux de cette thèse s'intéressent à la préparation des silices fonctionnalisées par des sous-structures ioniques pour leur application en catalyse hétérogène. D'abord, des matériaux mésoporeux fonctionnalisés par des entités di-aryl imidazoliums ont été préparés par des réactions de post-greffage. En plus, films de type PMO contenant des entités di-aryl imidazoliums ont été synthétisés en présence d'un surfactant anionique. Ensuite, complexes carbéniques N-hétérocy
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JIANG, NAN. "Etude de films minces de silice deposes a basse temperature par pecvd rcer." Paris 11, 1993. http://www.theses.fr/1993PA112340.

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Les films minces dielectriques deposes a basse temperature presentent actuellement et presenteront dans le futur de multiples applications dans le domaine de l'industrie micro-electronique: les transistors tft (thin film transistor) pour les ecrans plats a matrice active, les dispositifs sur semi-conducteurs iii. V (gaas, inp, ingaas,. . . ) pour les circuits integres. Ces differentes applications necessitent, pour leur realisation, des dielectriques deposes a basse temperature. Nous presentons dans ce memoire, l'etude de l'optimisation de films minces de silice deposes, a partir d'un nouveau
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Cagnol, Florence. "Films minces mesostructures minéraux ou hybrides à base de silice : élaboration, caractérisation, mécanismes." Paris 6, 2004. http://www.theses.fr/2004PA066443.

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Sibottier, Emilie Walcarius Alain. "Génération électro-assistée de films à base de silice fonctionnalisation, mésostructuration et applications analytiques /." S. l. : S. n, 2007. http://www.scd.uhp-nancy.fr/docnum/SCD_T_2007_0101_SIBOTTIER.pdf.

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Kusz, Jakub. "Role of the molecular interactions in the self-assembly of organosilanes during the sol-gel synthesis of hybrid mesoporous films." Electronic Thesis or Diss., Lyon, École normale supérieure, 2024. http://www.theses.fr/2024ENSL0052.

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L'objectif de cette thèse est d'évaluer l'auto-assemblage moléculaire dans des films de silice mésoporeux hybrides et fins obtenus par trempage. Diverses espèces fonctionnelles organiques ont été introduites dans les films mésostructurés afin d’observer leur distribution et influence sur le processus d’auto-assemblage moléculaire. Trois types de précurseurs hybrides à structures modèles ont été étudiés : I. Ceux avec une chaîne alkyle (de différentes longueurs et hydrophobicité) II. Ceux modifiés avec un motif uréido (auto-assemblage via liaisons hydrogène et/ou interactions [dollard]\pi-\pi[d
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Dourdain, Sandrine. "Caractérisation structurale, poreuse et mécanique de films minces de silice mésoporeuse.Influence de la fonctionnalisation." Phd thesis, Université du Maine, 2006. http://tel.archives-ouvertes.fr/tel-00201895.

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Ce travail de thèse a porté sur la synthèse et la caractérisation de films minces de silice mésoporeuse. La synthèse de ces matériaux est basée sur l'auto-organisation de tensioactifs qui permettent de structurer à l'échelle nanométrique un squelette, constitué ici d'un gel de silice.<br />Les paramètres pertinents influençant la structuration des films minces ont été appréhendés. En particulier, des études in situ par réflectivité des rayons X et par Diffusion en incidence rasante des rayons X (Grazing Incidence Small Angle X-ray Scattering, GISAXS), ont permis de mettre en évidence le rôle p
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Books on the topic "Films de silice"

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Symposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Emerging Dielectrics (9th 2007 Chicago, Ill.). Silicon nitride, silicon dioxide, and emerging dielectrics 9. Edited by Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., and Electrochemical Society Meeting. Electrochemical Society, 2007.

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Symposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Emerging Dielectrics (9th 2007 Chicago, Ill.). Silicon nitride, silicon dioxide, and emerging dielectrics 9. Edited by Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., and Electrochemical Society Meeting. Electrochemical Society, 2007.

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Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (8th 2005 Québec, Québec). Silicon nitride, silicon dioxide thin insulating films, and other emerging diele[c]trics VIII: Proceedings of the international symposium. Edited by Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division, and Electrochemical Society Meeting. Electrochemical Society, 2005.

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Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (8th 2005 Québec, Québec). Silicon nitride, silicon dioxide thin insulating films, and other emerging diele[c]trics VIII: Proceedings of the international symposium. Edited by Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division, and Electrochemical Society Meeting. Electrochemical Society, 2005.

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B, Bergmann Ralf, and Research Signpost (Trivandrum India), eds. Growth, characterization, and electronic applications of si-based thin films. Research Signpost, 2002.

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Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (5th 1999 Seattle, Wash.). Silicon nitride and silicon dioxide thin insulating films: Proceedings of the fifth international symposium. Electrochemical Society), 1999.

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Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (7th 2003 Paris, France). Silicon nitride and silicon dioxide thin insulating films VII: Proceedings of the international symposium. Edited by Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division, and Electrochemical Society Meeting. Electrochemical Society, 2003.

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Innocenzi, Plinio. Mesoporous Ordered Silica Films. Springer International Publishing, 2022. http://dx.doi.org/10.1007/978-3-030-89536-5.

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P, Jennings J., and Hefter G. T, eds. Amorphous silicon thin films and devices: Results of research carried out as MERIWA Project No. E161 in the School of Mathematical and Physical Sciences, Murdoch University. Minerals and Energy Research Institute of Western Australia, 1993.

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Angeles, CA) International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface (5th 2005 Los. The physics and chemistry of SiO₂ and the Si-SiO₂ interface--5. Electrochemical Society, 2005.

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Book chapters on the topic "Films de silice"

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Eisele, I., J. Schulze, and E. Kasper. "Films by Molecular-Beam Epitaxy." In Silicon. Springer Berlin Heidelberg, 2004. http://dx.doi.org/10.1007/978-3-662-09897-4_6.

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Gonçalves, M. Clara, and George S. Attard. "Nanostructured Mesoporous Silica Films." In Nanostructured Materials and Coatings for Biomedical and Sensor Applications. Springer Netherlands, 2003. http://dx.doi.org/10.1007/978-94-010-0157-1_16.

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Krimmel, Eberhard F., Rudolf Hezel, Uwe Nohl, and Rainer Bohrer. "Insulating Silicon Nitride Films." In Si Silicon. Springer Berlin Heidelberg, 1991. http://dx.doi.org/10.1007/978-3-662-09901-8_4.

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Slaoui, A., and P. Siffert. "Polycrystalline Silicon Films for Electronic Devices." In Silicon. Springer Berlin Heidelberg, 2004. http://dx.doi.org/10.1007/978-3-662-09897-4_4.

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Ali, Atif Mossad, and Takao Inokuma. "Nanocrystalline silicon thin films." In Silicon Nanomaterials Sourcebook. CRC Press, 2017. http://dx.doi.org/10.4324/9781315153544-5.

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Abedrabbo, S., B. Lahlouh, S. Shet, A. T. Fiory, and N. M. Ravindra. "Spin-Coated Erbium-Doped Silica Sol-Gel Films on Silicon." In Supplemental Proceedings. John Wiley & Sons, Inc., 2012. http://dx.doi.org/10.1002/9781118356074.ch86.

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Shaikhutdinov, Shamil. "Water Adsorption on Silica Films." In Introduction to Ultrathin Silica Films Silicatene and Others. Jenny Stanford Publishing, 2022. http://dx.doi.org/10.1201/9781003088622-8.

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Shaikhutdinov, Shamil. "Ultrathin Silica Films on Metals." In Introduction to Ultrathin Silica Films Silicatene and Others. Jenny Stanford Publishing, 2022. http://dx.doi.org/10.1201/9781003088622-4.

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Morita, Mizuho. "Native Oxide Films and Chemical Oxide Films." In Ultraclean Surface Processing of Silicon Wafers. Springer Berlin Heidelberg, 1998. http://dx.doi.org/10.1007/978-3-662-03535-1_42.

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Krimmel, Eberhard F., Rudolf Hezel, Uwe Nohl, and Rainer Bohrer. "Specific Applications of Silicon Nitride Films." In Si Silicon. Springer Berlin Heidelberg, 1991. http://dx.doi.org/10.1007/978-3-662-09901-8_31.

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Conference papers on the topic "Films de silice"

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McNallan, Michael. "High Temperature Corrosion of Silicon Based Ceramics in Environments Containing Halogens and Alkali Halides." In CORROSION 1999. NACE International, 1999. https://doi.org/10.5006/c1999-99275.

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Abstract Silicon carbide and other silicon-based ceramics obtain their oxidation resistance by the formation of protective silica films in oxygen containing environments. In the presence of chlorine or alkali chlorides, this film may not form, or may be unprotective, so that accelerated oxidation occurs. Chlorine and alkali halides may contribute to accelerated oxidation via three possible mechanisms. Active oxidation occurs at relatively low temperatures and high ratios of chlorine to oxygen, and is characterized by simultaneous formation of silicon chlorides and non-protective oxides. Silica
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Suzuki, Ryoko. "Fabrication of the Film with Low-refractive Index and Low-scattering for Anti-reflective Coating." In Optical Interference Coatings. Optica Publishing Group, 2025. https://doi.org/10.1364/oic.2025.tha.6.

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Porous silica thin film bearing low refractive index was successfully prepared using the sol-gel method. By careful selection of raw materials, thin films with both a low refractive index and low scattering can be fabricated.
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Little, J. A. "Applied Surface Coatings for High Temperature Corrosion Resistance." In CORROSION 1989. NACE International, 1989. https://doi.org/10.5006/c1989-89143.

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Abstract Surface coatings are a viable option in the protection of engineering alloys from high temperature corrosion, when their own oxide films either cannot provide barrier layers or fail via cracking or spalling. This paper reviews such coatings as composed of inorganic salts deposited from nitrate melts, from silica layers, from borate treatments and inorganic zinc silicate coatings.
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Poulsen, Christian V., Mikael Svalgaard, and Ove Poulsen. "Photosensitivity in germania-doped silica films." In The European Conference on Lasers and Electro-Optics. Optica Publishing Group, 1994. http://dx.doi.org/10.1364/cleo_europe.1994.cmm5.

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Integrated optics is believed to be the key technology for future integrated optical systems. One standard method for processing planar waveguides is a combination of plasma enhanced chemical vapor deposition (PECVD) for growing glass layers and photolithography/reactive ion etch (RIE) for creating the waveguides2 (Fig. la). We present an investigation of the photosensitivity of germania-doped silica films. The results may lead to an alternate method for creating the guiding structure in planar waveguides that requires much fewer process steps. Instead of using a combination of photolithograph
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Coquil, Thomas, Neal Hutchinson, Laurent Pilon, Erik Richman, and Sarah Tolbert. "Thermal Conductivity of Cubic and Hexagonal Mesoporous Silica Thin Films." In ASME 2009 Heat Transfer Summer Conference collocated with the InterPACK09 and 3rd Energy Sustainability Conferences. ASMEDC, 2009. http://dx.doi.org/10.1115/ht2009-88256.

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This paper reports the cross-plane thermal conductivity of highly ordered cubic and hexagonal templated mesoporous amorphous silica thin films synthesized by evaporation-induced self-assembly process. Cubic and hexagonal films featured spherical and cylindrical pores and average porosity of 25% and 45%, respectively. The pore diameter ranged from 3 to 18 nm and film thickness from 80 to 540 nm while the average wall thickness varied from 3 to 12 nm. The thermal conductivity was measured at room temperature using the 3ω method. The experimental setup and the associated analysis were validated b
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Fang, Jin, Laurent Pilon, Chris B. Kang, and Sarah H. Tolbert. "Thermal Conductivity of Ordered Mesoporous Silicon Thin Films Made From Magnesium Reduction of Polymer Templated Silica." In ASME 2011 International Mechanical Engineering Congress and Exposition. ASMEDC, 2011. http://dx.doi.org/10.1115/imece2011-64784.

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This paper reports the cross-plane thermal conductivity of ordered polycrystalline mesoporous silicon thin films between 30 and 320 K. The films were produced by a combination of evaporation induced self-assembly (EISA) of mesoporous silica followed by magnesium reduction. The periodic ordering of pores in mesoporous silicon was characterized by a combination of 1D X-ray diffraction, 2D small angle X-ray scattering, and direct SEM imaging. The average crystallite size, porosity, and film thickness were about 13–18 nm, 25–35%, and 140–260 nm, respectively. The pores were arranged in a face-cent
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Hur, Soojung C., Laurent Pilon, Adam Christensen, and Samuel Graham. "Thermal Conductivity of Cubic Mesoporous Silica Thin Films." In ASME 2007 International Mechanical Engineering Congress and Exposition. ASMEDC, 2007. http://dx.doi.org/10.1115/imece2007-43016.

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This paper reports, for the first time, the cross-plane thermal conductivity of highly ordered cubic mesoporous silica thin films with porosity of 31% and thickness ranging between 200 and 500 nm. The mesoporous thin films are synthesized based on evaporation induced self-assembly process. The pores are spherical with average inter-pore spacing and pore diameter equal to 5.95 nm and 5 nm, respectively. The thermal conductivity is measured at room temperature using the 3ω method. The experimental setup and the associated analysis are validated by comparing the thermal conductivity measurements
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Dahle, Sebastian, Lienhard Wegewitz, Fei Qi, Alfred P. Weber, and Wolfgang Maus-Friedrichs. "Silicon dioxide coating of titanium dioxide nano particles from dielectric barrier discharge in a gaseous mixture of silan and nitrogen." In 13th International Conference on Plasma Surface Engineering September 10 - 14, 2012, in Garmisch-Partenkirchen, Germany. Linköping University Electronic Press, 2013. http://dx.doi.org/10.3384/wcc2.116-117.

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Titanium dioxide nanoparticles are used commonly in various applications due to their high catalytic activity. Many of these applications require subsequent treatments after the deposition of the TiO2 particles. Some of these include thermal processing at high temperatures, e.g. roof tiles. For all of these applications, the crystal structures as well as the microscopic properties are essential. Thus, sintering severely affects the catalytic activity in most of the cases. During thermal processing, the nanoparticles transform from the catalytical highly active anatas structure to the substanti
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Cao, Zhiqiang, Tong-Yi Zhang, and Xin Zhang. "A Nanoindentation-Based Microbridge Testing Method for Mechanical Characterization of Thin Films for MEMS Applications." In ASME 2005 International Mechanical Engineering Congress and Exposition. ASMEDC, 2005. http://dx.doi.org/10.1115/imece2005-80288.

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Plasma-enhanced chemical vapor deposited (PECVD) silane-based oxides (SiOx) have been widely used in both microelectronics and MEMS (MicroElectroMechanical Systems) to form electrical and/or mechanical components. In this paper, a novel nanoindentation-based microbridge testing method is developed to measure both the residual stresses and Young’s modulus of PECVD SiOx films on silicon wafers. Theoretically, we considered both the substrate deformation and residual stress in the thin film and derived a closed formula of deflection versus load. The formula fitted the experimental curves almost p
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Allen, Thomas H. "Optical materials deposited using ion beam sputtering." In OSA Annual Meeting. Optica Publishing Group, 1985. http://dx.doi.org/10.1364/oam.1985.fl4.

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Selected optical materials were deposited using combined ion beam sputter and ion-assisted deposition techniques. The influence of ion energy and current density on the properties of a growing film is discussed. Measured properties include optical constants, mechanical properties, microstructure, and stoichiometry. Optical materials include zirconia, titania, silica, aluminum nitride, and silicon nitride. Recent roughness measurements on ion sputter deposited over coated aluminum films are discussed.
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Reports on the topic "Films de silice"

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Saiwan, Chintana. Mesostructural ultra thin silica film formation through admicellar technique. Chulalongkorn University, 2003. https://doi.org/10.58837/chula.res.2003.78.

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Thin silica film formation from adsolubilization of inorganic silica precursors, letra-n-butoxysilane (TBOS) and tetraethyl orthosilicate (TBOS) in admicellar polymerization were studies. Cetyltrimethylammonium bromide (CTAB) at 700 uM and octyl phenol ethoxylate or Triton X-100 at 200 uM were used as surfactant templates for adsolubilizates TBOS and TBOS respectively. For the TBOS/CTAB system, the atomic force microscopy (AFM) topographic images showed fibers, hemispheres and flat layers existing along with increase of surface coverge on the mica surface as the TBOS feed concentration was inc
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Silcox, J., and E. J. Kirkland. Uhv-stem studies on nucleation and growth of thin metal silicide films on silicon. Office of Scientific and Technical Information (OSTI), 1992. http://dx.doi.org/10.2172/6207328.

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Kalnitsky, A., S. P. Tay, J. P. Ellul, J. W. Andrews, E. A. Irene, and S. Chongsawagvirod. Measurements and Modelling of Thin Silicon Dioxide Films on Silicon. Defense Technical Information Center, 1989. http://dx.doi.org/10.21236/ada207853.

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Mecholsky, Jr, Tsai J. J., Drawl Y. L., and W. R. Fracture Studies of Diamond Films on Silicon. Defense Technical Information Center, 1991. http://dx.doi.org/10.21236/ada240978.

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Martin U. Pralle and James E. Carey. Black Silicon Enhanced Thin Film Silicon Photovoltaic Devices. Office of Scientific and Technical Information (OSTI), 2010. http://dx.doi.org/10.2172/984305.

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Filip, Grażyna. SEMANTIC OF QUIET AND SILENCE BASED ON POLISH HUMAN SCIENCE. Ivan Franko National University of Lviv, 2021. http://dx.doi.org/10.30970/vjo.2021.50.11103.

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The article is an introduction to an individual research subject called The Communicational Potential of Silence, planned – and partially already realised since 2020 – as a cycle of publications based on diversified example material. In print are already two texts: G. Filip, The Communicational Potential of Silence. Film Reviews (University of Rzeszów Publishing House) and G. Filip, The Communicational Potential of Silence. Automotive Brand Press Maria Curie-Skłodowska University of Lublin Publishing House). The presented here English-language article serves for popularization Poland-wide and
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Smith, W. L., T. A. Michalske, and R. R. Rye. The deposition of boron nitride and carbon films on silica glass fibers. Office of Scientific and Technical Information (OSTI), 1993. http://dx.doi.org/10.2172/10110580.

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Irene, Eugene A. Silicon Oxidation Studies on Thin Film Silicon Oxidation Formation. Defense Technical Information Center, 1989. http://dx.doi.org/10.21236/ada206835.

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Franke, J., M. O. Liedke, P. Dahmen, et al. Influence of coating structure of an SiOx barrier coating on a PET substrate on water vapor permeation activation energy. Universidad de los Andes, 2024. https://doi.org/10.51573/andes.pps39.gs.nn.1.

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The application of plasma polymerized silicon-based coatings on plastic substrates is an effective way to adjust the permeability of the substrate. However, the permeation mechanisms are yet not fully understood. Here, the activation energy of permeation can offer valuable insights. In order to understand how the activation energy of permeation depends on the coating structure, five silicon-based coatings with varying oxygen content were analyzed, which led to property modifications ranging from silicon-oxidic to silicon-organic. Positron annihilation spectroscopy was employed to characterize
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Berman, G. P., G. D. Doolen, R. Mainieri, D. K. Campbell, and V. A. Luchnikov. Molecular dynamics simulations of grain boundaries in thin nanocrystalline silicon films. Office of Scientific and Technical Information (OSTI), 1997. http://dx.doi.org/10.2172/292865.

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