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Dissertations / Theses on the topic 'Ion-plasma deposition'

Author: Grafiati

Published: 28 May 2022

Last updated: 30 July 2025

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1

Oates, Thomas William Henry. "Metal plasma immersion ion implantation and deposition using polymer substrates." Connect to full text, 2003. http://hdl.handle.net/2123/571.

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Thesis (Ph. D.)--University of Sydney, 2004.<br>Title from title screen (viewed 5 May 2008). Submitted in fulfilment of the requirements for the degree of Doctor of Philosophy to the School of Physics, Faculty of Science. Degree awarded 2004; thesis submitted 2003. Includes bibliographical references. Also available in print form.

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2

Oates, T. W. H. "Metal plasma immersion ion implantation and deposition using polymer substrates." Thesis, The University of Sydney, 2003. http://hdl.handle.net/2123/571.

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This thesis investigates the application of plasma immersion ion implantation (PIII) to polymers. PIII requires that a high negative potential be applied to the surface of the material while it is immersed in a plasma. This presents a problem for insulating materials such as polymers, since the implanting ions carry charge to the surface, resulting in a charge accumulation that effectively neutralises the applied potential. This causes the plasma sheath at the surface to collapse a short time after the potential is applied. Measurements of the sheath dynamics, including the collapsing shea

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3

Oates, T. W. H. "Metal plasma immersion ion implantation and deposition using polymer substrates." University of Sydney. Physics, 2003. http://hdl.handle.net/2123/571.

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This thesis investigates the application of plasma immersion ion implantation (PIII) to polymers. PIII requires that a high negative potential be applied to the surface of the material while it is immersed in a plasma. This presents a problem for insulating materials such as polymers, since the implanting ions carry charge to the surface, resulting in a charge accumulation that effectively neutralises the applied potential. This causes the plasma sheath at the surface to collapse a short time after the potential is applied. Measurements of the sheath dynamics, including the collapsing shea

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4

Fu, King Yu. "Plasma implantation and deposition for advanced materials surface modification /." access full-text access abstract and table of contents, 2005. http://libweb.cityu.edu.hk/cgi-bin/ezdb/thesis.pl?phd-ap-b19887310a.pdf.

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Thesis (Ph. D.)--City University of Hong Kong, 2005.<br>"Submitted to Department of Physics and Materials Sciences in partial fulfillment of the requirements for the degree of Philosophy of Doctor." Includes bibliographical references.

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5

Baranov, O. O. "Control of Ion Density Distribution by Use of Magnetic Traps for Plasma Electrons." Thesis, Sumy State University, 2012. http://essuir.sumdu.edu.ua/handle/123456789/35384.

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Method of ion current density control in the vacuum arc deposition setup has been investigated. The control unit consisted of two electromagnetic coils installed under substrate of 400 mm dia. exposed to the plasma flux. A planar probe was used to measure the ion current density distribution along the plasma flux cross-sections at different distances from the plasma duct exit. It was shown that configuration of the resulting magnetic field generated by the control coils and the guiding and focusing coils of the arc source, strongly affects the ion current density distribution. Broad range

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6

Gauter, Sven [Verfasser]. "Calorimetric investigation on plasma and ion beam sources used for thin film deposition / Sven Gauter." Kiel : Universitätsbibliothek Kiel, 2018. http://d-nb.info/1168229146/34.

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7

HE, PENG. "DEPOSITION OF EXTREMELY THIN FUNCTIONAL FILMS ON NANOPARTICLE/NANOTUBE SURFACES BY A PLASMA TREATMENT." University of Cincinnati / OhioLINK, 2003. http://rave.ohiolink.edu/etdc/view?acc_num=ucin1068676591.

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8

Davison, Andrew. "Plasma diagnostic studies of DC ion plating discharges : influence of discharge and vapour characteristics on coating deposition." Thesis, University of Hull, 2003. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.402723.

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9

Barutcu, Burcu. "The Design And Production Of Interference Edge Filters With Plasma Ion Assisted Deposition Technique For A Space Camera." Master's thesis, METU, 2012. http://etd.lib.metu.edu.tr/upload/12614574/index.pdf.

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Interference filters are multilayer thin film devices. They use interference effects between the incident and reflected radiation waves at each layer interface to select wavelengths. The production of interference filters depend on the precise deposition of thin material layers on substrates which have suitable optical properties. In this thesis, the main target is to design and produce two optical filters (short-pass filter and long-pass filter) for the CCDs that will be used in the electronics of a space camera. By means of these filters, it is possible to take image in different bands (RGB

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10

Uglov, V. V., M. M. Barkovskaya, V. V. Khodasevich, and V. A. Ukhov. "Influence of bias voltage on composition and tribological properties Ti-Cr-N coatings formed by ion-plasma deposition." Thesis, Видавництво СумДУ, 2011. http://essuir.sumdu.edu.ua/handle/123456789/20772.

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Ti-Cr-N coatings were formed on St3 steel by cathodic arc vapor deposition while combining titanium or chromium plasma flows in a residual nitrogen atmosphere. Elemental and phase composition of the coatings were studied using Auger electron spectroscopy (AES) and X-ray diffraction (XRD). Coatings are solid solution on the basis of chromium and titanium mononitrides. It is found that an increase in bias voltage leads to relative rise of titanium concentration and to decrease of chromium concentration. With the values of bias voltage less than 120 V coatings grow with (200) preferred orientati

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11

Hartl, Hugo M. "Modification of small-molecule organic thin films using energetic beams and plasma." Thesis, Queensland University of Technology, 2019. https://eprints.qut.edu.au/129526/9/Hugo%20Hartl%20Thesis.pdf.

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This project investigated directed energy techniques for modifying organic films. These techniques show great promise for creating materials with unique, tailored properties. In this work, ion and electron beams were used to fabricate spatially-defined polymer features in nanometre-scale film of small molecules. An alternative pathway to the direct on-surface fabrication of polymer surface coatings was also investigated and showed that a room temperature, atmospheric pressure plasma can facilitate coupling of small molecules at a catalytic surface. In all cases, it was possible to control the

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12

Kalinichenko, A. I., V. E. Strel'nitskij, and V. V. Vasyliev. "Characteristics of DLC Coating Prepared by Pulse Biasing: Analysis in Model of Thermoelastic Peak of Ion." Thesis, Sumy State University, 2012. http://essuir.sumdu.edu.ua/handle/123456789/35398.

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A mode of pulse biasing of DLC coating deposition is theoretically investigated. In this mode a deposited ion flow of plasma with energy of E0 (20 200) eV is modified by superimposing of pulse potential ~ 1000 V. It was shown that intrinsic stress in a DLC coating can be decreased in several times without of essential decrease of sp3-bonded carbon concentration compared with DLC made in stationary mode deposition at E0 ion energy. A method of optimization of pulse mode parameters is proposed which is based on analysis of location of thermoelastic peaks of ions on phase P, T-diagram of car

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13

Ozkol, Engin. "Production Of Boron Nitride." Master's thesis, METU, 2008. http://etd.lib.metu.edu.tr/upload/12609646/index.pdf.

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Boron nitride is found mainly in two crystal structures<br>in hexagonal structure (h-BN) which is very much like graphite and in cubic structure (c-BN) with properties very close to those of diamond. h-BN is a natural lubricant due to its layered structure. It is generally used in sliding parts of the moving elements such as rotating element beds in turbine shafts. Since c-BN is the hardest known material after diamond it is used in making hard metal covers. In addition to its possible microelectronics applications (can be used to make p-n junction), its resistance to high temperatures and it

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14

Wang, Junkang. "Novel Concepts in the PECVD Deposition of Silicon Thin Films : from Plasma Chemistry to Photovoltaic Device Applications." Thesis, Université Paris-Saclay (ComUE), 2017. http://www.theses.fr/2017SACLX079/document.

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Ce manuscrit présente l'étude de la fabrication de couches minces de silicium basée sur des différents types de dépôt chimique en phase vapeur assisté par plasma (PECVD) pour des applications dans le photovoltaïque. Tout d'abord, nous avons combiné une chimie du plasma halogéné en utilisant un mélange de SiF4/H2 et la technique plasmas distributés matriciellement à résonance cyclotronique électronique (MDECR) PECVD pour le dépôt de μc-Si:H à grande vitesse. Nous trouvons que les conditions d'énergie ionique modérée sont bénéfiques pour obtenir une diminution significative de la densité des nan

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15

Vargheese, K. Deenamma. "ECR Assisted Deposition of Tin And Si3N4 Thin Films For Microelectronic Applications." Thesis, Indian Institute of Science, 2000. https://etd.iisc.ac.in/handle/2005/202.

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The broad theme of the present research investigation is Ion Assisted Deposition of thin films and its effect on the properties of thin films. Though this activity has been of interest to researchers for more than a decade, the development of different types of ion sources with control over the ion flux and energy, makes it a current topic of interest. Ion assisted deposition was successful in depositing thin films of many material with desired qualities, however, there are certain class of materials whose deposition has been rather difficult. This has mainly been attributed to higher energies

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Vargheese, K. Deenamma. "ECR Assisted Deposition of Tin And Si3N4 Thin Films For Microelectronic Applications." Thesis, Indian Institute of Science, 2000. http://hdl.handle.net/2005/202.

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The broad theme of the present research investigation is Ion Assisted Deposition of thin films and its effect on the properties of thin films. Though this activity has been of interest to researchers for more than a decade, the development of different types of ion sources with control over the ion flux and energy, makes it a current topic of interest. Ion assisted deposition was successful in depositing thin films of many material with desired qualities, however, there are certain class of materials whose deposition has been rather difficult. This has mainly been attributed to higher energies

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17

Weckmann, Armin. "Material migration in tokamaks : Erosion-deposition patterns and transport processes." Doctoral thesis, KTH, Fusionsplasmafysik, 2017. http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-209758.

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Controlled thermonuclear fusion may become an attractive future electrical power source. The most promising of all fusion machine concepts is called a tokamak. The fuel, a plasma made of deuterium and tritium, must be confined to enable the fusion process. It is also necessary to protect the wall of tokamaks from erosion by the hot plasma. To increase wall lifetime, the high-Z metal tungsten is foreseen as wall material in future fusion devices due to its very high melting point. This thesis focuses on the following consequences of plasma impact on a high-Z wall: (i) erosion, transport and dep

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18

Korzhova, Elizaveta. "Influence de la modification de membranes commerciales par pulvérisation électrostatique et dépôt plasma de polymères chargés sur les performances de filtration." Thesis, Bourgogne Franche-Comté, 2020. http://www.theses.fr/2020UBFCD045.

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Bien que les procédés membranaires apparaissent comme une technologie pertinente pour traiter des solutions contaminées, les membranes commerciales d’ultrafiltration fine sont souvent inadaptées pour certaines applications spécifiques comme le traitement de cations métalliques. Leur charge de surface est généralement négative ce qui ne permet pas d’engendrer des rétentions importantes de cations par interactions électrostatiques. Dans ce contexte, nous avons étudié, lors de cette thèse, deux approches originales de déposition de polyélectrolytes sur la surface d’une membrane commerciale d’ultr

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19

Oudini, Noureddine. "Modélisation d'une source d'ions à effet Hall pour des applications de traitement de surface." Phd thesis, Toulouse 3, 2011. http://thesesups.ups-tlse.fr/1368/.

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Dans les sources d'ions de type EHIS " End-Hall Ion Source " un faisceau ionique est extrait d'un plasma magnétisé sans l'utilisation d'un système de grilles d'extraction. Les sources EHIS sont essentiellement utilisées dans des procédés de traitement de surface. Dans ce type de sources, le plasma est généré par l'application d'une tension entre les électrodes afin de créer une décharge DC. La présence, dans le plasma, d'un champ magnétique parallèle à une anode conique réduit la mobilité électronique dans la direction perpendiculaire aux lignes de champ magnétique. La chute de conductivité él

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20

Oudini, Noureddine. "Modélisation d'une source d'ions à effet Hall pour des applications de traitement de surface." Phd thesis, Université Paul Sabatier - Toulouse III, 2011. http://tel.archives-ouvertes.fr/tel-00641383.

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Dans les sources d'ions de type EHIS " End-Hall Ion Source " un faisceau ionique est extrait d'un plasma magnétisé sans l'utilisation d'un système de grilles d'extraction. Les sources EHIS sont essentiellement utilisées dans des procédés de traitement de surface. Dans ce type de sources, le plasma est généré par l'application d'une tension entre les électrodes afin de créer une décharge DC. La présence, dans le plasma, d'un champ magnétique parallèle à une anode conique réduit la mobilité électronique dans la direction perpendiculaire aux lignes de champ magnétique. La chute de conductivité él

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21

DE, GABRIEL OLIVIER. "Etude et mise au point d'un nouveau procede de depot de vapeurs et d'ions metalliques." Université Joseph Fourier (Grenoble), 1989. http://www.theses.fr/1989GRE10008.

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Les procedes de traitement de surface par depot, qui permettent de modifier les proprietes de surface sans modifier celles du volume, connaissent un grand essor industriel. La description de ces procedes amene a considerer le role et l'importance que les plasma y jouent. La nouvelle source de plasma que nous avons mis au point a ete l'objet d'une etude experimentale qui est exposee. Cette source de plasma est la base du procede de depot que nous avons developpe (depot de vapeur et d'ions metalliques). La description et les resultats preliminaires permettent de comparer ce procede avec ceux exi

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22

Kandah, Munther. "Particles emission control at graphite cathode in arc ion plating deposition." Thesis, McGill University, 1997. http://digitool.Library.McGill.CA:80/R/?func=dbin-jump-full&object_id=35434.

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In this work, the dependence of the vacuum arc spot velocity on physical and electrical properties of different graphite cathode materials is investigated in the presence of a variable magnetic field. A pulsed arc system is used to perform preliminary experiments on the arc mobility for the different types of graphite for the selection of proper material morphology and the design of a continuous vacuum arc system. The characteristics of arc mobility, erosion rate, and carbon ion flux emitted from the continuous carbon source are then evaluated in view of particle-free diamond-like protective c

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23

Forhan, Neisy Amparo Escobar. "Fabricação de novas heteroestruturas a partir de estruturas SOI obtidas pela técnica \'smart-cut\'." Universidade de São Paulo, 2006. http://www.teses.usp.br/teses/disponiveis/3/3140/tde-02042008-112321/.

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Esta pesquisa engloba o estudo e desenvolvimento de novas heteroestruturas semicondutoras, tomando como base as estruturas SOI (Silicon-On-Insulator - silício sobre isolante) obtidas pela técnica Smart Cut, estudadas nestes últimos anos no Departamento de Engenharia de Sistemas Eletrônicos da Escola Politécnica da Universidade de São Paulo (EPUSP). Esta técnica combina a solda direta para a união de lâminas e a implantação iônica (I/I) de íons leves para a separação de camadas especificadas. São essenciais na preparação destas estruturas SOI, processos de I/I, limpeza e ativação das superfície

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24

Piot, Adrien. "Etude de la fabrication et de la transduction d'un microgyromètre piézoélectrique tri-axial en GaAs." Thesis, Université Paris-Saclay (ComUE), 2018. http://www.theses.fr/2018SACLS059/document.

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Un microgyromètre 3 axes permet avec une structure unique de mesurer la vitesse de rotation d’un objet autour des trois axes de l’espace. Les micro-gyromètres 3 axes existants sont peu nombreux et typiquement résonants, fabriqués en technologie silicium par micro-usinage de surface, à transductions électro-statiques, et conçus pour des applications de fort volume ou la taille et le coût sont des critères majeurs. Dans cette thèse nous avons étudié la transduction et le procédé de fabrication d’un gyromètre résonant 3 axes à actionnement et détection piézoélectriques, fabriqué par micro-usinage

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25

Ramachandran, Niraj. "Corona Ion Deposition: A Novel Non-Contact Method for Drug and Gene Delivery to Living Systems." [Tampa, Fla] : University of South Florida, 2008. http://purl.fcla.edu/usf/dc/et/SFE0002474.

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26

Kuo, chien-cheng, and 郭倩丞. "Bandpass filiter deposited with plasma ion-assisted deposition." Thesis, 1998. http://ndltd.ncl.edu.tw/handle/80213245956263952334.

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27

Yeh, Chien-hsuan, and 葉建弦. "Deposition of Yttria-Stabilized Zirconia Film Using Cathodic Arc Plasma Ion Plating." Thesis, 2004. http://ndltd.ncl.edu.tw/handle/23832370439881588772.

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碩士<br>逢甲大學<br>材料科學所<br>92<br>Zirconia ceramic exhibits excellent fracture toughness, high ion conductivity, low electron conductivity, and low thermal conductivity properties. Therefore, YSZ films have been widely applied to be the solid electrolyte of fuel cell, oxygen sensor, wear protective coatings and the thermal barrier coatings of high temperature power-generator components. Cathodic arc plasma ion plating (CAP) process is a promising coating technology which has high deposition rate, high atomic ionization and excellent film adhesion. In this study, the CAP process with Zr84Y16 cat

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28

Chao, Chia-Liang, and 趙家樑. "Deposition of Diamond-Like Carbon Nanocomposite films by Plasma Chemical Vapor ion Plating Method." Thesis, 2004. http://ndltd.ncl.edu.tw/handle/nk6c46.

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碩士<br>國立成功大學<br>化學工程學系碩博士班<br>92<br>In studying the diamond-like nanocomposite films, the major efforts have been concentrated on overcoming the problems of conventionaldiamond- like carbon (a-C:H or DLC) films, such as high residual stresses, poor adhesion, etc. DLC films have attracted widespread attention due to their great potentials in high tech tribological industries, optical device and biological materials, etc. 　　In this study, Ti-C-O organometallic precursor (TTIP) mixed with O2 was employed to deposit TiO2-containing the diamond-like carbon films. XRD and X-ray photoemission spectro

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29

Jhang, Jyun-Rong, and 張峻榮. "Deposition of super-hard abrasion-resistance films by plasma chemical vapor ion plating method." Thesis, 2003. http://ndltd.ncl.edu.tw/handle/27265034359029033407.

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碩士<br>國立成功大學<br>化學工程學系碩博士班<br>91<br>The technology of modified diamond-like carbon (DLC) films by plasma enhanced chemical vapor deposition has been developed in this study. Besides, a novel technology to deposit hydrogen-free DLC films by particle-free hollow cathode arc discharge is also attempted. Diamond-like carbon films were employed for a variety of industry applications owing to their unique properties including high hardness, high dielectric constant, scratch resistance, excellent thermal conductivity, oxidation and chemical resistance, etc. However, the high compressive stress and

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30

Xiao, Ming-Hong, and 蕭名宏. "Study on the Adjustable Stress of Plasma Enhanced Chemical Vapor Deposition Film by Ion Implantation." Thesis, 2010. http://ndltd.ncl.edu.tw/handle/58771777866216817116.

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碩士<br>國立高雄應用科技大學<br>光電與通訊研究所<br>98<br>The objective of this present work is to use ion implantation to adjust stress of plasma enhanced chemical vapor deposition (PECVD) film. The two-dimension suspended structure was design to observe the deformation of membrane. Furthermore, the two-dimension structures were modified with three-dimension structures to fabricate concave and convex structure. The membrane material includes PECVD silane oxide, PECVD TEOS oxide and PECVD nitride. The parameters of ion implantation were ion species, energy and dose. The experiment results show that the residual s

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31

Stout, Brian M. "Synthesis and characterization of diamond-like carbon coatings deposited by plasma source ion implantation and conventional ion beam assisted deposition processes." 1999. http://catalog.hathitrust.org/api/volumes/oclc/42013316.html.

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Thesis (M.S.)--University of Wisconsin--Madison, 1999.<br>Typescript. eContent provider-neutral record in process. Description based on print version record. Includes bibliographical references (leaves 42-44).

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32

Lin, Chia-Po, and 林嘉柏. "Study on silicon oxycarbide deposited by high density plasma chemical vapor deposition for hydrogen ion-sensitive membrane." Thesis, 2004. http://ndltd.ncl.edu.tw/handle/46369237852142939314.

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碩士<br>國立清華大學<br>材料科學工程學系<br>92<br>Abstract The ion sensitive field effect transistor (ISFET) is a microsensor consists of the theorem of electrochemistry and the characteristic of a field effect transistor. The principle of the MOSFET is be used for ISFET. The metalline gate of the MOSFET is substituted for reference electrode / electrolyte / insulator. Hence, ISFET is a device composed of a ion selective electrode and a MOSFET device. In this thesis the silicon oxycarbide ( SiOxCy ) membrane has been prepared by high density plasma chemical vapor deposition, HDPCVD, method as a novel pH-sens

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Liu, Chang, and 劉暢. "Rapid Nitrogen Doping and Carbon Deposition of ZnCo2O4 Lithium-ion Battery Anode via Atmospheric Pressure Plasma Jet." Thesis, 2016. http://ndltd.ncl.edu.tw/handle/02856700310599255680.

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碩士<br>國立清華大學<br>材料科學工程學系<br>104<br>The main objective of this dissertation is to improve the electrochemical performances of ZnCo2O4 (ZCO) Li-ion anode material by nitrogen-doping and carbon deposition. As for nitrogen doping, two rapid methods, including hydrothermal to treat powder and atmospheric pressure plasma jet (APPJ) to modify the electrode, were used to dope nitrogen in the ZCO anode material. Via hydrothermal method, nitrogen was doped in the ZCO spinel lattice, while APPJ mainly activated and modified the electrode surface binding with the dangling bond. N-doped compounds were form

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34

Lo, His-kai, and 羅熙凱. "Establishment of an Inductively-Couple-Plasma Ion Beam Sputter-Deposition System for the Fabrication of Microelectronic Thin Films." Thesis, 2006. http://ndltd.ncl.edu.tw/handle/14105547679209714503.

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碩士<br>逢甲大學<br>產業研發碩士班<br>94<br>Abstract The goal of this study was to build up an inductively coupled plasma ion beam sputtering deposition (ICP-IBS) system for the fabrication of microelectronic thin films. The ion source, COPRA DN250CF, 12-inch ion gun, was made by the CCR Corp. of Germany, and the cubic chamber was sealed by removable flanges, and thus could be flexibly modified. To fulfill the need of clean processing environment, the chamber was evacuated using a cryogenic pump backed by a dry-scroll pump, preventing back-streaming. After setting up the ion-gun sputtering system, a qualif

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35

Huang, Shih-Yun, and 黃詩耘. "Low Temperature Synthesis of Single-Walled Carbon Nanotubes by Plasma Enhanced Chemical Vapor Deposition - Effect of Ion Screen and Oxygen Additive." Thesis, 2009. http://ndltd.ncl.edu.tw/handle/15261509177422698753.

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36

Sung, Chung-Tai, and 宋長泰. "Effect of focused ion beam post-treatment on the diamond-like carbon films synthesized by RF plasma enhanced chemical vapor deposition." Thesis, 2008. http://ndltd.ncl.edu.tw/handle/11085208415412417896.

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碩士<br>大同大學<br>材料工程學系(所)<br>96<br>Diamond-like carbon (DLC) films were deposited on both ITO glass and Si substrates by RF plasma enhanced chemical vapor deposition and the effects of post-treatment of focused ion beam (FIB) on the structure and properties of DLC films were investigated. Before the deposition of DLC films, the substrate was pre-treatment with Ar or H2 plasma at different powers. For the FIB post-treatment, the effects of incidence energy, beam size, treatment time and incidence angle were studied. Surface roughness, morphology and structure of DLC films after various treatments

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