Relevant bibliographies by topics / Plasma-based ion deposition

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  1. Journal articles
  2. Dissertations / Theses
  3. Book chapters
  4. Conference papers

Academic literature on the topic 'Plasma-based ion deposition'

Author: Grafiati
Published: 28 May 2022
Last updated: 31 July 2025

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Journal articles on the topic "Plasma-based ion deposition"

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Rossnagel, S. M., and J. J. Cuomo. "Ion-Beam-Assisted Deposition and Synthesis." MRS Bulletin 12, no. 2 (1987): 40–51. http://dx.doi.org/10.1557/s0883769400068391.

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Concurrent energetic particle bombardment during film deposition can strongly modify the structural and chemical properties of the resulting thin film. The interest in this technique, ion-assisted deposition, comes about because it can be used to produce thin films with properties not achievable by conventional deposition. Bombardment by low energy ions occurs during almost all plasma-based thin film deposition techniques. Bombardment of a growing film, particularly by accelerated ions, can also be combined with non-plasma-based deposition techniques, such as evaporation, to simulate some of t
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Rossnagel, S. M., and J. J. Cuomo. "Ion Beam Deposition, Film Modification and Synthesis." MRS Bulletin 13, no. 12 (1988): 40–45. http://dx.doi.org/10.1557/s0883769400063685.

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Ion beam processing for thin film deposition is rapidly overtaking some of the more conventional plasma-based thin film processing techniques. This is due to strong improvements in the types and reliabilities of the sources available as well as a growing understanding of the advantages and capabilities of using ion beams.An ion beam process can be differentiated from a plasma-based process in that the plasma in an ion beam is generated away from the sample and a beam of ions is directed at the sample. In a plasma-based process, the sample is usually immersed in the plasma. This highlights the
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Béchu, S., O. Maulat, Y. Arnal, D. Vempaire, A. Lacoste, and J. Pelletier. "Multi-dipolar plasmas for plasma-based ion implantation and plasma-based ion implantation and deposition." Surface and Coatings Technology 186, no. 1-2 (2004): 170–76. http://dx.doi.org/10.1016/j.surfcoat.2004.04.036.

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Ryabchikov, Alexander, Denis Sivin, and Igor Stepanov. "Development of New Ion and Plasma Surface Modification Methods." Advanced Materials Research 1084 (January 2015): 221–24. http://dx.doi.org/10.4028/www.scientific.net/amr.1084.221.

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The review is devoted to the analysis of the present state-of-the-art and development trends of the new methods and equipment being developed in Tomsk Polytechnic University (TPU), for DC vacuum arc-based ion and plasma materials processing. The features and advantages are demonstrated for the method of high-concentration implantation with compensation of surface ion sputtering by metal plasma deposition, the method of metal plasma deposition under repetitively – pulsed ion mixing with ion beams and plasma flow formed in the «Raduga-5» source, and the method of coating deposition and ion impla
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Ikehata, T., R. Sasaki, T. Tanaka, and K. Yukimura. "Positive-plasma-bias method for plasma-based ion implantation and deposition." Surface and Coatings Technology 204, no. 18-19 (2010): 2881–91. http://dx.doi.org/10.1016/j.surfcoat.2010.03.004.

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Mathad, G. S., D. W. Hess, and M. Meyyappan. "Plasma Processing for Silicon-Based Integrated Circuits." Electrochemical Society Interface 8, no. 2 (1999): 34–40. http://dx.doi.org/10.1149/2.f07992if.

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During the last quarter century or so, plasma processing has become a critical industrial technology for the development and manufacture of semiconductor devices. Gaseous plasmas have been used for sputter and chemical vapor deposition of thin films, pattern transfer in mask fabrication, etching of thin films, resist stripping, surface modification and as an ion source in ion implantation. It is the most pervasive technology in the manufacture of silicon-based integrated circuits.
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Misiruk, Ivan O., Oleksandr I. Timoshenko, Valeriy S. Taran, and Igor E. Garkusha. "Non-self-sustained discharge with hollow anode for plasma-based surface treatment." Nukleonika 61, no. 2 (2016): 195–99. http://dx.doi.org/10.1515/nuka-2016-0033.

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Abstract The paper discusses plasma methods for surface modification using the non-self-sustained glow discharge with a hollow anode. This discharge is characterised by low voltage and high values of electron and ion currents. It can be easily excited in vacuum-arc installations that are widely used for coatings deposition. It is shown that such type of discharge may be effectively used for ion pumping, film deposition, ion etching, diffusion saturation of metallic materials, fusion and brazing of metals, and for combined application of above mentioned technologies in a single vacuum cycle.
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Meyyappan, M., and T. R. Govindan. "Plasma Process Modeling for Integrated Circuits Manufacturing." VLSI Design 6, no. 1-4 (1998): 409–12. http://dx.doi.org/10.1155/1998/27636.

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A reactor model for plasma-based deposition and etching is presented. Two-dimensional results are discussed in terms of plasma density, ion flux, and ion energy. Approaches to develop rapid CAD-type models are discussed.
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Yukimura, Ken, Xinxin Ma, and Takashi Ikehata. "TiN deposition and ion current distribution for trench target by plasma-based ion implantation and deposition." Surface and Coatings Technology 193, no. 1-3 (2005): 17–21. http://dx.doi.org/10.1016/j.surfcoat.2004.08.133.

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Dostanko, A. P., S. I. Madveyko, E. V. Telesh, S. N. Melnikov, S. M. Zavadski, and D. A. Golosov. "Plasma Systems in Thin Film Technology." Doklady BGUIR 22, no. 2 (2024): 20–31. http://dx.doi.org/10.35596/1729-7648-2024-22-2-20-31.

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The article discusses the current trends in the development of ion-plasma systems for ion processing and thin film deposition. Application of pulsed reactive magnetron sputtering for deposition of vanadium oxide films and dependence of process parameters on power supply frequency characteristics, peculiarities and application of direct ion-beam deposition for formation of coatings based on SiO2 for optical coatings, SiO2, CH, CN, CHF for orientation coatings of LCD displays, wear-resistant coatings of diamond-like carbon (α-C) and carbon nitride (CNx) are considered. The advantages of continuo
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Dissertations / Theses on the topic "Plasma-based ion deposition"

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Kalinichenko, A. I., V. E. Strel'nitskij, and V. V. Vasyliev. "Characteristics of DLC Coating Prepared by Pulse Biasing: Analysis in Model of Thermoelastic Peak of Ion." Thesis, Sumy State University, 2012. http://essuir.sumdu.edu.ua/handle/123456789/35398.

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A mode of pulse biasing of DLC coating deposition is theoretically investigated. In this mode a deposited ion flow of plasma with energy of E0 (20 200) eV is modified by superimposing of pulse potential ~ 1000 V. It was shown that intrinsic stress in a DLC coating can be decreased in several times without of essential decrease of sp3-bonded carbon concentration compared with DLC made in stationary mode deposition at E0 ion energy. A method of optimization of pulse mode parameters is proposed which is based on analysis of location of thermoelastic peaks of ions on phase P, T-diagram of car
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Book chapters on the topic "Plasma-based ion deposition"

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Uzumaki, E. T., C. S. Lambert, W. D. Belangero, and Cecília A. C. Zavaglia. "Biocompatibility of Titanium Based Implants with Diamond-Like Carbon Coatings Produced by Plasma Immersion Ion Implantation and Deposition." In Bioceramics 20. Trans Tech Publications Ltd., 2007. http://dx.doi.org/10.4028/0-87849-457-x.677.

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Kim, Byungwhan, and Seongjin Choi. "Adaptive Network-Based Fuzzy Inference Model of Plasma Enhanced Chemical Vapor Deposition Process." In Advances in Neural Networks – ISNN 2007. Springer Berlin Heidelberg, 2007. http://dx.doi.org/10.1007/978-3-540-72383-7_71.

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Kumar, Pravin, Neelesh Kumar Jain, and Abhay Tiwari. "Sustainable Polishing of Directed Energy Deposition–Based Cladding Using Micro-Plasma Transferred Arc." In Advances in Sustainable Machining and Manufacturing Processes. CRC Press, 2022. http://dx.doi.org/10.1201/9781003284574-20.

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Addabbo, Tommaso, Andrea Baldi, Mara Bruzzi, Ada Fort, Marco Mugnaini, and Valerio Vignoli. "QCM Sensors Based on In2O3 Nano-films Obtained by a Pulsed Plasma Deposition Technique." In Lecture Notes in Electrical Engineering. Springer International Publishing, 2017. http://dx.doi.org/10.1007/978-3-319-66802-4_10.

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Pinchuk, Nataliia, and Oleksandr Terletskyi. "NANOSTRUCTURED COATINGS ZRN, OBTAINED BY VACUUM-ARC DEPOSITION METHOD." In Modernization of research area: national prospects and European practices. Publishing House “Baltija Publishing”, 2022. http://dx.doi.org/10.30525/978-9934-26-221-0-1.

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Nowadays increased interest is shown in ZrN coatings, which have high erosion resistance, strength in combination with a fairly high hardness. Among the various ion-plasma techniques, vacuum-arc is one of the most versa-tile processes due to the high degree of ionization of the flow of film-forming particles and good adhesion properties of coatings to the substrate. The purpose of the paper is problem of structural engineering of vacuum-arc ZrN coatings is acute in order to predictably obtain the necessary functional physical and mechanical characteristics. Methodology. The study of the struct
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Adak, Deepanjana, and Raghunath Bhattacharyya. "Plasma Based Approaches to Achieve Self-Cleaning Surfaces." In Nature-Inspired Self-Cleaning Surfaces in Nanotechnology Era [Working Title]. IntechOpen, 2023. http://dx.doi.org/10.5772/intechopen.112378.

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The role of gaseous plasma has proven to be very beneficial in creating self-cleaning of various surfaces. Few references are there, in the published literature, on plasma enhanced hydrophilicity/hydrophobicity behavior of surfaces. A range of atmospheric pressure plasma spray systems are gaining popularity for creating self-cleaning surfaces, with some unique features, as also to fabricate new types of self-cleaning materials. In this chapter a brief introduction to essentials of plasma processing will be first presented, followed by examples of plasma assisted surface modification. This will
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Batista da Silva, Escarlet, Márcia Giardinieri Azevedo, Lioudmila Aleksandrovna Matlakhova, Bárbara Ferreira de Oliveira, and Luciano José de Oliveira. "Spark Plasma Sintering of NiCrSiBC Alloys." In New Advances in Powder Technology [Working Title]. IntechOpen, 2022. http://dx.doi.org/10.5772/intechopen.108597.

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Nickel-based alloys of the NiCrSiBC system (colmonoy alloys) are normally deposited on stainless-steel substrates for coating applications, once they present high resistance to wear and corrosion at high temperatures. Typically, deposition occurs through welding processes, such as PTA (plasma transferred arc) or laser cladding. This study mainly aims to evaluate the effectiveness of the spark plasma sintering (SPS) process through the evaluation of the sintered body density, and structural and microstructural analysis of the Colmonoy-5. SPS sintering occurred at 900°C under 50 MPa for 15 minut
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Menshakov, Andrey, Yuliya Bruhanova, and Polina Skorynina. "Investigation of a New Hybrid PVD+PECVD Method for Obtaining Promising Polymer Derived Ceramic SiAlCN Coatings." In Advances in Transdisciplinary Engineering. IOS Press, 2024. http://dx.doi.org/10.3233/atde240629.

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The vacuum-plasma method based on the thermal evaporation of aluminum and activation of a silicon-containing organic precursor in a low-pressure arc discharge using a self-heating hollow cathode (SHHC) was used for synthesis of ceramic SiAlCN coatings. The spectrum of plasma containing Al vapors and decomposition products of hexamethyldisilazane (HMDS) in an Ar+N2 medium was analyzed by optical emission spectroscopy, which showed the effective activation of different components of the vapor-gas mixture and the presence of all necessary elements for the formation of SiAlCN coatings. The SEM ana
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Advincula, Rigoberto C. "Graphene Based Nanomaterials for Biomedical Coatings." In Advances in Biomedical Corrosion: Trends, Challenges, and Solutions. AMPP, Association for Materials Protection and Performance15835 Park Ten Place, Houston, TX 77084, 2024. https://doi.org/10.5006/37688-graphene.

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Nanotechnology involves scale, function, and composition that enable macroscopic properties with improved performance and high-value adding for any industry including the biomedical industry. The use of graphene-based nanomaterials is of high interest for electronic applications and the solid-state display industry. However, it is not as well known in the biomedical and bio-implant field. The graphene and the oxidized graphene oxide GO nanomaterials can be prepared by plasma, vacuum deposition, solid state catalytic methods, and also by solution exfoliation methods. This paper highlights work
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Chaudhri, Vishwas, Laxmi Devi, Sidhant Yadav, Anirban Das, and Rashmi Pundeer. "CARBON NANOTUBES: SYNTHETIC METHODS, FUNCTIONALIZATION AND EMERGING APPLICATIONS." In Futuristic Trends in Chemical Material Sciences & Nano Technology Volume 3 Book 22. Iterative International Publishers, Selfypage Developers Pvt Ltd, 2024. http://dx.doi.org/10.58532/v3becs22p2ch1.

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Carbon nanotubes possess many remarkable and attractive properties in context to weight, strength, conductivity, sensitivity and surface area. This chapter will review the important synthetic aspects of carbon nanotube (CNT) chemistry starting from the old plasma-based methods. Synthesis of CNT utilizing electric arc discharge method will be discussed with or without catalyst. For the synthesis of highly pure and better quality single walled carbon nanotubes, the laser ablation method is economically high as it uses highly purified graphite rods and laser powers. Other important synthetic meth
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Conference papers on the topic "Plasma-based ion deposition"

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Zöller, A. "Temperature stability of optical coatings produced by plasma and ion assisted evaporation processes." In Optical Interference Coatings. Optica Publishing Group, 1997. http://dx.doi.org/10.1364/oic.1998.ma.1.

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The benefits of ion based deposition processes such as ion assisted deposition (IAD), plasma ion-assisted deposition (PIAD), reactive ion plating (RIP), magnetron sputtering and ion beam sputtering have been described in the literature for two decades. One important paper was given by Martin and Netterfield in 1986 [1]. The ability to produce oxide films with high packing density is common for these deposition techniques. The temperature stability of optical coatings, defined by the temperature dependence of the optical performance, depends strongly on the packing density of the individual lay
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Zarrabian, S., C. Lee, and K. H. Guenther. "Emission Spectroscopy of Reactive Low Voltage Ion Plating for the Deposition of Metal-Oxide Thin Films." In Optical Interference Coatings. Optica Publishing Group, 1992. http://dx.doi.org/10.1364/oic.1992.othb6.

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Reactive Low-Voltage Ion Plating (RLVIP) is increasingly used as the method of choice for the production of dense, environmentally stable optical coatings.1 The operational details of this process, including system geometry, plasma voltages and currents have been published elsewhere.2,3 As with other plasma based methods, understanding the exact physics and chemistry of this complex process requires a very thorough and detailed analysis. One of the most important questions in the application of this process for the deposition of refractory oxide coatings is the nature and the role of the main
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Arens, W., and D. Ristau. "Online Monitoring of Ion Beam Sputter Processes by Plasma Analysis." In Optical Interference Coatings. Optica Publishing Group, 1997. http://dx.doi.org/10.1364/oic.1998.mc.5.

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During the last decade, the rapid development and implementation of new concepts in precision laser metrology generated an increased demand for high quality optical component. A special requirement in this field is the production of coatings with lowest losses which is mainly achieved by adapted ion beam sputter processes in the present state of optical thin film technology. For the optimization of an existing ion beam sputter process, a new method of online process monitoring has been installed: In general, ion beam sputter processes are based on high energetic (about 1000eV) inert gas ions w
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Zimmermann, Burkhard, Fred Fietzke, Heidrun Klostermann, Frans Munnik, Wolfhard Möller, and Jan Lehmann. "High rate PECVD of a-C:H coatings in a hollow cathode arc plasma." In 13th International Conference on Plasma Surface Engineering September 10 - 14, 2012, in Garmisch-Partenkirchen, Germany. Linköping University Electronic Press, 2013. http://dx.doi.org/10.3384/wcc2.392-394.

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Amorphous carbon films deposited by plasma-based processes are of increasing importance for tribologi-cal applications, e. g. as protective coatings on components or in order to reduce their friction. However, most plasma-activated CVD and PVD techniques suffer from their poor deposition rate and low economic efficiency. At Fraunhofer FEP, a hollow cathode-based plasma source has been established as a versatile, reliable, and highly efficient tool for plasma pretreatment, plasma-enhanced PVD processes, and reactive gas activation in large volumes. As a further application field, this plasma so
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Harhausen, Jens, Ralf-Peter Brinkmann, Rüdiger Foest, Sergey Gorchakov, A. Ohl, and Benjamin Schröder. "Interpretation of optical emission in a strongly inhomogeneous PIAD environment." In 13th International Conference on Plasma Surface Engineering September 10 - 14, 2012, in Garmisch-Partenkirchen, Germany. Linköping University Electronic Press, 2013. http://dx.doi.org/10.3384/wcc2.153-156.

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A variety of methods exists for the production of high quality optical coatings. These are for instance magnetron or ion beam sputtering, or thermal evaporation assisted by ion or plasma ion beam sources. The choice of a particular technique is due to the specific demands for tailoring the thin film properties such as homogeneity, refractive index, absorption, mechanical stress, porosity (optical shift), etc.. To allow for economic production of complex multilayer designs, the issue of reproducibility at the highest deposition rate possible has to be faced.The plasma ion assisted deposition (P
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Kalisz, M., and R. Mroczynski. "Ultra-shallow fluorine implantation from r.f. plasma as a method for improvement of electro-physical properties of MIS structures with PECVD gate dielectric layers." In 13th International Conference on Plasma Surface Engineering September 10 - 14, 2012, in Garmisch-Partenkirchen, Germany. Linköping University Electronic Press, 2013. http://dx.doi.org/10.3384/wcc2.467-470.

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In this work a comprehensive analysis of changes in electrical and reliability parameters, which are introduced by the presence of a fluorine-rich layer in the gate structure based on MOS (Al/SiO2/Si) and MIS (Al/SiOxNy/Si) system, has been carried out. The surface of silicon substrates prior to the test structure execution was subjected to the processes of ultra-shallow ion implantation from CF4 plasma, different, than those usually found in the literature. To this end, the conventional plasma reactors were utilized to carry out a plasma enhanced chemical vapour deposition process PECVD and r
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Sperka, Jirí, Lenka Zajícková, Ondrej Jasek, et al. "Growth of Carbon Materials on Gold Substrate by Plasma Enhanced CVD." In 13th International Conference on Plasma Surface Engineering September 10 - 14, 2012, in Garmisch-Partenkirchen, Germany. Linköping University Electronic Press, 2013. http://dx.doi.org/10.3384/wcc2.395-398.

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Carbon is a versatile building element of many interesting materials that have already find practical applications in the form of thin films (diamond, DLC) or potential applications in the form of nanostructures (fullerenes, carbon nanotubes, graphene). For electronics or sensors, it is important to provide a very good contact to the functional structures. Gold is the best choice taking into account its inertness, i. e. oxidation resistance. From this point of view the investigation of the growth of carbon materials on gold is important. The carbon-gold interaction plays an important role in d
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White, Richard L., Bing K. Yen, Jan-Ulrich Thiele, Hans-Herman Schneider, James H. Rogers, and Bernd Jacoby. "Comparison of Energetic Carbon Deposition Processes for Use As Ultra-Thin Disk Overcoats." In STLE/ASME 2001 International Joint Tribology Conference. American Society of Mechanical Engineers, 2001. http://dx.doi.org/10.1115/trib-nano2001-109.

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Abstract Three different processes, Plasma Enhanced CVD (PECVD), Ion Beam (IB), and Cathodic Arc (CA) have been used to deposit highly energetic carbon films in the 2–10 nm thickness range in commercial, high throughput disk manufacturing tools. The deposition conditions used are typical of those required for disk manufacturing. Raman spectroscopy, I-V measurements, nanoindentation, and AFM based scratch testing have been used to characterize the structural, electrical, and mechanical properties of the films. The measured maximum hardness for the PECVD and IBD films are 28 and 25 GPa, respecti
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Swminathan, V. P., Ronghua Wei, and David W. Gandy. "Erosion Resistant Nano Technology Coatings for Gas Turbine Components." In ASME Turbo Expo 2007: Power for Land, Sea, and Air. ASMEDC, 2007. http://dx.doi.org/10.1115/gt2007-27027.

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Solid particle and liquid particle erosion in the compressor section of gas turbines and steam turbine vanes and blades lead to significant reduction in turbine efficiency over time. This results in increased downtime and operating cost of the power plants. Some of the conventional coatings and erosion protection shields used by the currently available commercial processes have limitations in their temperature and erosion protection capabilities. Under a project funded by the Electric Power Research Institute (EPRI), nano coatings with thickness within 40 microns (about 1.5 mils) have been pro
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Moskal, G., R. Swadźba, R. Białecki, T. Kruczek, and W. Adamczyk. "S/TEM and TEM Investigations of Thermal Barrier Coatings Based on Gd2Zr2O7 Zirconate." In ITSC2017, edited by A. Agarwal, G. Bolelli, A. Concustell, et al. DVS Media GmbH, 2017. http://dx.doi.org/10.31399/asm.cp.itsc2017p0784.

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Abstract Detailed investigations of thermally grown oxides (TGO) zone and areas adjoining to it were presented in this article. The thermal barrier coating (TBC) based on gadolinium zirconate (Gd2Zr2O7, GZ) and deposited by air plasma spraying (APS) on AMS 5599 superalloy with NiCrAlY type of bond-coat was the analysed material. Analyses were made on TBC system after spraying process and after time to 500 hours of oxidation at temperature 1100°C in atmosphere of laboratory air. Ultrahigh resolution scanning-transmission (S/TEM) electron microscope TITAN 80-300 was used to conduct the tests. Qu
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