Relevant bibliographies by topics / R-HiPIMS

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Academic literature on the topic 'R-HiPIMS'

Author: Grafiati
Published: 8 June 2024
Last updated: 31 July 2025

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Journal articles on the topic "R-HiPIMS"

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Hubička, Zdenek, Martin Zlámal, Jiri Olejníček, Drahoslav Tvarog, Martin Čada, and Josef Krýsa. "Semiconducting p-Type Copper Iron Oxide Thin Films Deposited by Hybrid Reactive-HiPIMS + ECWR and Reactive-HiPIMS Magnetron Plasma System." Coatings 10, no. 3 (2020): 232. http://dx.doi.org/10.3390/coatings10030232.

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A reactive high-power impulse magnetron sputtering (r-HiPIMS) and a reactive high-power impulse magnetron sputtering combined with electron cyclotron wave resonance plasma source (r-HiPIMS + ECWR) were used for the deposition of p-type CuFexOy thin films on glass with SnO2F conductive layer (FTO). The aim of this work was to deposit CuFexOy films with different atomic ratio of Cu and Fe atoms contained in the films by these two reactive sputtering methods and find deposition conditions that lead to growth of films with maximum amount of delafossite phase CuFeO2. Deposited copper iron oxide fil
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Anders, André. "Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)." Journal of Applied Physics 121, no. 17 (2017): 171101. http://dx.doi.org/10.1063/1.4978350.

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Vargas, S., D. S. Galeano-Osorio, and C. E. Castano. "Controlling preferential growth of chromium – Nitrogen R-HiPIMS and R-DCMS films by substrate magnetic biasing." Applied Surface Science 569 (December 2021): 151113. http://dx.doi.org/10.1016/j.apsusc.2021.151113.

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SHIMIZU, Tetsuhide, Michelle VILLAMAYOR, Julien KERAUDY, Daniel LUNDIN, and Ulf HELMERSSON. "Transition Mode Control in Reactive High-Power Impulse Magnetron Sputtering (R-HiPIMS)." Journal of the Vacuum Society of Japan 60, no. 9 (2017): 346–51. http://dx.doi.org/10.3131/jvsj2.60.346.

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Strijckmans, K., F. Moens, and D. Depla. "Perspective: Is there a hysteresis during reactive High Power Impulse Magnetron Sputtering (R-HiPIMS)?" Journal of Applied Physics 121, no. 8 (2017): 080901. http://dx.doi.org/10.1063/1.4976717.

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Castro, José D., Beatriz Pinto, Fábio Ferreira, R. Serra, and S. Carvalho. "Wettability and corrosion resistance of zirconium nitride films obtained via reactive high-power impulse magnetron sputtering." Journal of Vacuum Science & Technology A 41, no. 2 (2023): 023106. http://dx.doi.org/10.1116/6.0002341.

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One of the main problems in ships is corrosion, which reduces the lifetime usage of ship parts and increases maintenance costs. Ceramic coatings can contribute to solving this situation. Zirconium nitrides obtained by reactive unbalanced magnetron sputtering technology are largely reported as coatings with high corrosion resistance. The present study used high-power impulse magnetron sputtering in a reactive atmosphere (R-HiPIMS), varying the nitrogen amount. SEM, EDS, XRD, AFM, and contact angle measurements were used to assess the obtained coatings’ performance. Corrosion resistance was eval
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RATCHAYOTEE, Pornthip, Artit CHINGSUNGNOEN, and Phitsanu POOLCHARUANSIN. "Controlling titanium incorporation in hydrogenated amorphous carbon films via closed-loop feedback in reactive high power impulse magnetron sputtering." Journal of Metals, Materials and Minerals 34, no. 4 (2024): 2114. http://dx.doi.org/10.55713/jmmm.v34i4.2114.

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A closed-loop feedback approach has been developed to control titanium incorporation in hydrogenated amorphous carbon (a-C:H) films during reactive high-power impulse magnetron sputtering (R-HiPIMS). The average discharge current measured at the magnetron target is used as the primary feedback signal to regulate the target coverage state. Hence, the titanium concentration in the films can be controlled. Significant changes were observed in the film microstructure and properties as the target state evolved with increasing target coverage. This causes the film transition from metallic titanium t
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Tang, Chien Jen, Wei Hsuan Hsu, and Ching Tang Li. "Thermochromic Properties of Vanadium Oxide Films Prepared by R-HIPIMS Using Closed-Loop Controlled with Plasma Emission Monitoring." Materials Science Forum 940 (December 2018): 114–19. http://dx.doi.org/10.4028/www.scientific.net/msf.940.114.

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The vanadium dioxide films were deposited by reactive high-power impulse magnetron sputtering for different plasma emission intensity at the substrate temperature of 310 °C. The setpoint of plasma emission intensity was controlled by a PID controller with plasma-emission-monitoring. The vanadium dioxide films characteristics were measured by optical spectrophotometer, X-ray diffraction and electrical source meter.
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Hubička, Z., M. Čada, A. Kapran, et al. "Plasma Diagnostics in Reactive High-Power Impulse Magnetron Sputtering System Working in Ar + H2S Gas Mixture." Coatings 10, no. 3 (2020): 246. http://dx.doi.org/10.3390/coatings10030246.

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A reactive high-power impulse magnetron sputtering system (HiPIMS) working in Ar + H2S gas mixture was investigated as a source for the deposition of iron sulfide thin films. As a sputtering material, a pure Fe target was used. Plasma parameters in this system were investigated by a time-resolved Langmuir probe, radio-frequency (RF) ion flux probe, quartz crystal monitor modified for measurement of the ionized fraction of depositing particles, and by optical emission spectroscopy. A wide range of mass flow rates of reactive gas H2S was used for the investigation of the deposition process. It w
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Boivin, D., A. Najah, R. Jean-Marie-Désirée, et al. "Towards control of TiO2 thickness film in R-HiPIMS process with a coupled optical and electrical monitoring of plasma." Surface and Coatings Technology 433 (March 2022): 128073. http://dx.doi.org/10.1016/j.surfcoat.2021.128073.

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Dissertations / Theses on the topic "R-HiPIMS"

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Boivin, Dimitri. "Étude et mise au point d’une méthode de contrôle de l'épaisseur des couches minces de type TiO₂ déposées en procédé R-HiPIMS, en couplant la spectroscopie optique d’émission et la mesure du courant de décharge." Electronic Thesis or Diss., Université de Lorraine, 2022. http://www.theses.fr/2022LORR0013.

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Cette thèse s’inscrit dans la problématique du dépôt de couches minces en procédé réactif de pulvérisation cathodique magnétron pulsée haute puissance (R-HiPIMS_reactive high power impulse magnetron sputtering). Pour pouvoir implémenter ce procédé sur des systèmes industriels, sa complexité nécessite d’être capable de le contrôler au cours du temps de manières simple et efficace car, entre autres, le profil de la piste de pulvérisation de la cible (Ti) change inévitablement durant son utilisation. L’objectif principal de cette thèse est donc de proposer une méthode de contrôle de l’épaisseur d
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Books on the topic "R-HiPIMS"

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Wissenstransfer Zerspanung 2019. VDI Verlag, 2019. http://dx.doi.org/10.51202/9783181023624.

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Dieser VDI-Bericht ist ausschließlich als PDF-Dokument erschienen! Inhalt Prozessauslegung und Überwachung Integrierte CAD/CAM Software für Industrie 4.0 1 R. Keiser, SolidCAM, Hörstel Werkzeuge und Verfahren für die wirtschaftliche und innovative Zerspanung VHM-Fräswerkzeuge zum Dynamischen Fräsen – Voraussetzungen und Besonderheiten 11 P. Binder, Walter AG, Tübingen Innovative Konzeptentwicklung für eine effiziente Bohrbearbeitung – Wendeschneidplattenbohrkonzept für Bohrtiefen bis zu 7xD 15 I. Terwey, Sandvik Tooling Deutschland GmbH, Düsseldorf Schneidplatten – geht’s noch kleiner und schn
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Journal articles
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