Relevant bibliographies by topics / Silica films

Contents

  1. Journal articles
  2. Dissertations / Theses
  3. Books
  4. Book chapters
  5. Conference papers
  6. Reports

Academic literature on the topic 'Silica films'

Author: Grafiati
Published: 8 June 2024
Last updated: 31 July 2025

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Journal articles on the topic "Silica films"

1

Chien, Wen Chen, Yang Yen Yu, and Shih Yu Chen. "Synthesis and Characterization of Photopolymerized Poly(acrylic)/Monodispersed Colloidal Silica Hybrid Thin Films." Advanced Materials Research 47-50 (June 2008): 662–65. http://dx.doi.org/10.4028/www.scientific.net/amr.47-50.662.

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In this study, poly(acrylic)/silica hybrid thin films were prepared from various acrylic monomers and monodispersed colloidal silica with a coupling agent MSMA. The silica content in the hybrid thin films was varied from 0 to 50 wt%. The experimental results showed that the coverage area of silica particle by the MSMA decreased with increasing silica content and resulted in the aggregation of silica particle in the hybrid films. Thus, the silica domain in the hybrid films was varied from 20 to 35 nm by the different mole ratios of MSMA to silica. The results of SEM, TEM, and EA supported the a
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Maier, Wilhelm F., Michael Wiedorn, and Herbert O. Schramm. "Microporous Silica Films." Angewandte Chemie International Edition in English 30, no. 11 (1991): 1509–10. http://dx.doi.org/10.1002/anie.199115091.

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Li, Yu, Yi He Zhang, Bo Shen, and Feng Zhu Lv. "Preparation and Dielectric Properties of Polyimide Nanocomposite Films Based on Hollow Silica." Advanced Materials Research 217-218 (March 2011): 647–51. http://dx.doi.org/10.4028/www.scientific.net/amr.217-218.647.

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The hollow silica was fabricated by using monodispersed polystyrene microspheres as core template and tetraethyl orthosilicate as silica source, and polyimide nanocomposite films with different hollow silica concentration were successfully prepared via in situ polymerization. The hollow silica and nanocomposite films were characterized. The results indicated that the diameter of the hollow silica is around 30nm and the dielectric constant of the nanocomposite films enhance with the increase of the concentration of the hollow silica.
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Deschanels, X., S. Dourdain, C. Rey, et al. "Radiation damages on mesoporous silica thin films and bulk materials." MRS Proceedings 1514 (2013): 69–74. http://dx.doi.org/10.1557/opl.2013.386.

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ABSTRACTMesoporous silicas are highly potential materials for applications in the nuclear field like separation, recycling or nuclear wastes confinement. In this work, the effects of the radiation damage on the mesoporous network were investigated by XRR (X-Rays Reflectivity) and nitrogen adsorption isotherm on respectively mesoporous organized thin films (SBA) and disordered bulk mesoporous materials (Vycor glass). The article attempts to answer the question of the existence of a relationship between the rigidity of the mesoporous silica network, and the behavior of silica materials under irr
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Yu, Yang Yen, Wen Chen Chien, and Tsung Wei Tsai. "Microstructure and Properties of Polyimide /Monodispersed Colloidal Silica Hybrid Films Prepared by Sol–Gel Process." Advanced Materials Research 47-50 (June 2008): 650–53. http://dx.doi.org/10.4028/www.scientific.net/amr.47-50.650.

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In this study, the polyimide-silica hybrid thin films, 6FDA-6FpDA-4ABA/SiO2 (FS0-FS50) were prepared from the 12nm colloidal silica and polyimide bearing acid endgroups. During the preparation, without any additional coupling agents or chelating ligands were used. The strong interactions between carboxylic acid coordinating with silica were believed to prevent the macrophase separation. TGA analysis showed that the thermal decomposition temperatures (Td) incresased with increasing the silica content. UV-VIS spectra showed that the cutoff wavelength of prepared hybrid films could be tunable thr
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Loughlani, Rayane-Ichrak, Alonso Gamero-Quijano, and Francisco Montilla. "Electroassisted Incorporation of Ferrocene within Sol–Gel Silica Films to Enhance Electron Transfer." Molecules 28, no. 19 (2023): 6845. http://dx.doi.org/10.3390/molecules28196845.

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The sol–gel method is a straightforward technique that allows electrode modification with silica thin films. Furthermore, the silica pores could be functionalized to enhance the electrical conductivity and reactivity of the silica films. In this context, silica thin films were functionalized with ferrocene species. This functionalization was performed by electroassisted accumulation, generating a micro-structured composite electrode (Fc@SiO2 electrode). These modified electrodes were characterized by electrochemical and spectroelectrochemical methods, pointing out that ferrocene species were c
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Horikawa, Hajime, Takashi Ogihara, Akio Shimomura, and Junko Shimomura. "Preparation and Characterization of Silica Film on PBT Substrate by Sol-Gel Method Using Perhydropolysilazane." Key Engineering Materials 421-422 (December 2009): 161–64. http://dx.doi.org/10.4028/www.scientific.net/kem.421-422.161.

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Silica, silica/polymethylmethacrylate (PMMA) hybrid, and silica-particle blend silica films were successfully prepared on polybutylene terephtalate (PBT) substrate by dip coating using perhydropolysilazane (PHPS) as a silica source. The effect of thermal treatment on conversion from PHPS to silica was investigated in detail by scanning electron microscopy and Fourier transform infrared spectroscopy. Mechanical properties of silica and silica/PMMA hybrid thin films also were examined by the pencil scratch hardness tests.
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Zhang, Yi He, Qing Song Su, Li Yu, et al. "Study on the Dielectric Properties of Hybrid and Porous Polyimide-Silica Films." Advanced Materials Research 47-50 (June 2008): 973–76. http://dx.doi.org/10.4028/www.scientific.net/amr.47-50.973.

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A sol-gel process was used to prepare polyimide-silica hybrid films from the polyimide precursors and TEOS in N,N- dimethyl acetamide, then the hybrid film was treated with hydrofluoric acid to remove the dispersed silica particles, leaving pores with diameters between 80nm to 1µm, depending on the size of silica particles. The structure and dielectric constant of the hybrid and porous films were characterized by FTIR,SEM. The porous films displayed relatively low dielectric constant compared to the hybrid polyimide-silica films.
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Kubo, Tomoko, Eisuke Tadaoka, and Hiromitsu Kozuka. "Formation of silica coating films from spin-on polysilazane at room temperature and their stability in hot water." Journal of Materials Research 19, no. 2 (2004): 635–42. http://dx.doi.org/10.1557/jmr.2004.19.2.635.

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Spin-coating was conducted on single-crystal silicon substrates using a xylene solution of perhydropolysilazane (PHPS) to obtain 0.14-μm-thick PHPS films. The PHPS films obtained were suspended over various acidic and basic solutions at room temperature so that they were exposed to the vapors from the solutions. PHPS-to-silica film conversion was studied by infrared absorption spectroscopy, and the stability of the exposed films in hot water was examined by soaking the films in 80 °C water. The as-deposited PHPS films were found to be dissolved in water. When the PHPS films were suspended over
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Bi, Wen Yue, Li Wang, Xin Gang Yu, Xing Dong Zhang, Hong Quan Bao, and Hui Feng Zhao. "Effect of Heat Treatment on Coloration of Ag Doped TiO2-SiO2 Films." Key Engineering Materials 336-338 (April 2007): 1793–95. http://dx.doi.org/10.4028/www.scientific.net/kem.336-338.1793.

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Silver doped titania-silica films were fabricated by two-step route of sol-gel method using Ti(OC4H9)4, Si(OC2H5)4 and AgNO3 as the precursor materials. The films were annealed at temperature from 350°C to 560°C for a period of time ranging from 15min to 90 min. Optical properties of the films were characterized by UV-visible spectroscopy and the state of silver in the titania-silica films was investigated by XRD patterns. It was found that the annealing temperature and time have considerably influenced the coloration of the films, and with the increase of annealing temperature the [111] orien
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Dissertations / Theses on the topic "Silica films"

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Campbell-Rance, Debbie. "Electrodeposited Silica Thin Films." VCU Scholars Compass, 2010. http://scholarscompass.vcu.edu/etd/2123.

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Sol-gel derived silica thin film synthesis has gained prominence because of the mild processing conditions and widespread understanding of the chemistry of the process. Traditionally, silicate films are prepared by spin- and dip-coating but these materials lack the desired porosity for sensing, separations and catalysis applications. Electrochemical deposition was proposed to improve the porosity of silicate films. The main aims of this work were threefold. First we wanted to elucidate what parameters influenced film formation during electrodeposition. Then we wanted to understand how th
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Spaargaren, Susan Marianne Rosemary. "Radiation effects on silica based waveguides." Thesis, Imperial College London, 1997. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.267942.

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Klichko, Yaroslav Vladimirovich. "Functional mesoporous silica films for nanosystems applications." Diss., Restricted to subscribing institutions, 2009. http://proquest.umi.com/pqdweb?did=1998520791&sid=1&Fmt=2&clientId=1564&RQT=309&VName=PQD.

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Kokan, Julie Runyan. "Processing of low permittivity silica thin films." Thesis, Georgia Institute of Technology, 1994. http://hdl.handle.net/1853/20032.

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Geite, Patrik. "Medical Implant Applications of Mesoporous Silica Films." Thesis, Linköpings universitet, Nanostrukturerade material, 2019. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-154463.

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A literature review of medical implant applications of mesoporous silica films was written, highlighting the advantages and limitations of different film synthesis methods. Both films synthesized through the EISA sol-gel method and particulate films, including those synthesized through the direct growth method, were reviewed and discussed. All films were found to have their strengths and weaknesses, however, the films synthesized through the direct growth method was found to be the most promising type for coating implants. In addition to the literature review, copper-doped mesoporous silica fi
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Wooten, Mary K. "NANOFILTRATION MEMBRANES FROM ORIENTED MESOPOROUS SILICA THIN FILMS." UKnowledge, 2014. http://uknowledge.uky.edu/cme_etds/28.

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The synthesis of mesoporous silica thin films using surfactant templating typically leads to an inaccessible pore orientation, making these films not suitable for membrane applications. Recent advances in thin film synthesis provide for the alignment of hexagonal pores in a direction orthogonal to the surface when templated on chemically neutral surfaces. In this work, orthogonal thin film silica membranes are synthesized on alumina supports using block copolymer poly(ethylene glycol)-block-poly(propylene glycol)-block-poly(ethylene glycol) (P123) as the template. The orthogonal pore structure
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Bragg, Donald. "Photocatalytic Oxidation of Carbon Monoxide Using Sputter Deposited Molybdenum Oxide Thin Films on a Silicon Dioxide Substrate." Fogler Library, University of Maine, 2007. http://www.library.umaine.edu/theses/pdf/BraggD2007.pdf.

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Basnig, Deomila. "Élaboration de films minces de silice pour des applications en chimie analytique." Electronic Thesis or Diss., Université de Lorraine, 2021. http://www.theses.fr/2021LORR0102.

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Un film orienté à base de silice mésoporeuse sur une électrode FTO a été préparé par une approche d'auto-assemblage assistée par électrochimie (EASA). Un potentiel de -1,5 V a été appliqué à l'électrode FTO contenant un précurseur de silice préhydrolysée (par exemple, l'orthosilicate de tétraéthyle), en présence d'un modèle (par exemple, le bromure de cétrimonium) et d'un électrolyte. Cette approche permet de générer des nanocanaux de silice alignés verticalement avec des tailles de pores ajustables entre 2 et 3 nm, selon le modèle. Ce travail a montré le comportement voltammétrique et la séle
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CHAKRAVARTY, SRINIVAS L. N. "DEVELOPMENT OF SCRATCH RESISTANT PECVD SILICA-LIKE FILMS." University of Cincinnati / OhioLINK, 2000. http://rave.ohiolink.edu/etdc/view?acc_num=ucin973542599.

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Moskowitz, Steven. "Atomic force miscroscopy [sic] study of SiO₂/Si(111)--(7x7) grown via atomic oxygen plasma /." Thesis, Connect to this title online; UW restricted, 2005. http://hdl.handle.net/1773/11556.

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Books on the topic "Silica films"

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Innocenzi, Plinio. Mesoporous Ordered Silica Films. Springer International Publishing, 2022. http://dx.doi.org/10.1007/978-3-030-89536-5.

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Center, Lewis Research, ed. Mechanical protection of DLC films on fused silica slides. Lewis Research Center, 1985.

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Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (8th 2005 Québec, Québec). Silicon nitride, silicon dioxide thin insulating films, and other emerging diele[c]trics VIII: Proceedings of the international symposium. Edited by Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division, and Electrochemical Society Meeting. Electrochemical Society, 2005.

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Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (8th 2005 Québec, Québec). Silicon nitride, silicon dioxide thin insulating films, and other emerging diele[c]trics VIII: Proceedings of the international symposium. Edited by Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division, and Electrochemical Society Meeting. Electrochemical Society, 2005.

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Symposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Emerging Dielectrics (9th 2007 Chicago, Ill.). Silicon nitride, silicon dioxide, and emerging dielectrics 9. Edited by Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., and Electrochemical Society Meeting. Electrochemical Society, 2007.

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Symposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Emerging Dielectrics (9th 2007 Chicago, Ill.). Silicon nitride, silicon dioxide, and emerging dielectrics 9. Edited by Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., and Electrochemical Society Meeting. Electrochemical Society, 2007.

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Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (5th 1999 Seattle, Wash.). Silicon nitride and silicon dioxide thin insulating films: Proceedings of the fifth international symposium. Electrochemical Society), 1999.

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Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (7th 2003 Paris, France). Silicon nitride and silicon dioxide thin insulating films VII: Proceedings of the international symposium. Edited by Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division, and Electrochemical Society Meeting. Electrochemical Society, 2003.

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Angeles, CA) International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface (5th 2005 Los. The physics and chemistry of SiO₂ and the Si-SiO₂ interface--5. Electrochemical Society, 2005.

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International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface (3rd 1996 Los Angeles, Calif.). The physics and chemistry of SiO₂ and the Si-SiO₂ interface-3, 1996: Proceedings of the Third International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface. Edited by Massoud Hisham Z, Poindexter Edward H, and Helms C. Robert. Electrochemical Society, 1996.

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Book chapters on the topic "Silica films"

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Gonçalves, M. Clara, and George S. Attard. "Nanostructured Mesoporous Silica Films." In Nanostructured Materials and Coatings for Biomedical and Sensor Applications. Springer Netherlands, 2003. http://dx.doi.org/10.1007/978-94-010-0157-1_16.

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Shaikhutdinov, Shamil. "Water Adsorption on Silica Films." In Introduction to Ultrathin Silica Films Silicatene and Others. Jenny Stanford Publishing, 2022. http://dx.doi.org/10.1201/9781003088622-8.

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Shaikhutdinov, Shamil. "Ultrathin Silica Films on Metals." In Introduction to Ultrathin Silica Films Silicatene and Others. Jenny Stanford Publishing, 2022. http://dx.doi.org/10.1201/9781003088622-4.

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Shaikhutdinov, Shamil. "Silica and Silicates." In Introduction to Ultrathin Silica Films Silicatene and Others. Jenny Stanford Publishing, 2022. http://dx.doi.org/10.1201/9781003088622-1.

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Alexander, John Callum. "TiO2 Thin Films on Fused Silica." In Springer Theses. Springer International Publishing, 2016. http://dx.doi.org/10.1007/978-3-319-34229-0_7.

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Bersuker, Gennadi, Keith McKenna, and Alexander Shluger. "Silica and High-k Dielectric Thin Films in Microelectronics." In Oxide Ultrathin Films. Wiley-VCH Verlag GmbH & Co. KGaA, 2012. http://dx.doi.org/10.1002/9783527640171.ch5.

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Holt, S. A., K. J. Edler, and C. Fernandez-Martin. "Formation of surfactant–silica mesophase films at a silica interface." In Surface and Colloid Science. Springer Berlin Heidelberg, 2004. http://dx.doi.org/10.1007/b97126.

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Khabibullin, Amir, and Ilya Zharov. "Responsive Nanoporous Silica Colloidal Films and Membranes." In Intelligent Stimuli-Responsive Materials. John Wiley & Sons, Inc., 2013. http://dx.doi.org/10.1002/9781118680469.ch8.

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Shaikhutdinov, Shamil. "Defects in Ultrathin Silica Films on Metals." In Introduction to Ultrathin Silica Films Silicatene and Others. Jenny Stanford Publishing, 2022. http://dx.doi.org/10.1201/9781003088622-5.

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Shaikhutdinov, Shamil. "Thin Silica Films on Si and SIC." In Introduction to Ultrathin Silica Films Silicatene and Others. Jenny Stanford Publishing, 2022. http://dx.doi.org/10.1201/9781003088622-3.

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Conference papers on the topic "Silica films"

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McNallan, Michael. "High Temperature Corrosion of Silicon Based Ceramics in Environments Containing Halogens and Alkali Halides." In CORROSION 1999. NACE International, 1999. https://doi.org/10.5006/c1999-99275.

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Abstract Silicon carbide and other silicon-based ceramics obtain their oxidation resistance by the formation of protective silica films in oxygen containing environments. In the presence of chlorine or alkali chlorides, this film may not form, or may be unprotective, so that accelerated oxidation occurs. Chlorine and alkali halides may contribute to accelerated oxidation via three possible mechanisms. Active oxidation occurs at relatively low temperatures and high ratios of chlorine to oxygen, and is characterized by simultaneous formation of silicon chlorides and non-protective oxides. Silica
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Lin, Phyo, and Joseph J. Talghader. "Fabrication and Characterizations of an Aerogel All-silica Mirror." In Optical Interference Coatings. Optica Publishing Group, 2025. https://doi.org/10.1364/oic.2025.wd.2.

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Two different techniques to fabricate all-silica mirrors using dense silica and silica aerogel films were investigated. An all-silica mirror with near 100% reflectivity was built with 23 layers of PECVD dense silica and silica aerogel.
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Suzuki, Ryoko. "Fabrication of the Film with Low-refractive Index and Low-scattering for Anti-reflective Coating." In Optical Interference Coatings. Optica Publishing Group, 2025. https://doi.org/10.1364/oic.2025.tha.6.

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Porous silica thin film bearing low refractive index was successfully prepared using the sol-gel method. By careful selection of raw materials, thin films with both a low refractive index and low scattering can be fabricated.
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Hur, Soojung C., Laurent Pilon, Adam Christensen, and Samuel Graham. "Thermal Conductivity of Cubic Mesoporous Silica Thin Films." In ASME 2007 International Mechanical Engineering Congress and Exposition. ASMEDC, 2007. http://dx.doi.org/10.1115/imece2007-43016.

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This paper reports, for the first time, the cross-plane thermal conductivity of highly ordered cubic mesoporous silica thin films with porosity of 31% and thickness ranging between 200 and 500 nm. The mesoporous thin films are synthesized based on evaporation induced self-assembly process. The pores are spherical with average inter-pore spacing and pore diameter equal to 5.95 nm and 5 nm, respectively. The thermal conductivity is measured at room temperature using the 3ω method. The experimental setup and the associated analysis are validated by comparing the thermal conductivity measurements
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Coquil, Thomas, Neal Hutchinson, Laurent Pilon, Erik Richman, and Sarah Tolbert. "Thermal Conductivity of Cubic and Hexagonal Mesoporous Silica Thin Films." In ASME 2009 Heat Transfer Summer Conference collocated with the InterPACK09 and 3rd Energy Sustainability Conferences. ASMEDC, 2009. http://dx.doi.org/10.1115/ht2009-88256.

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This paper reports the cross-plane thermal conductivity of highly ordered cubic and hexagonal templated mesoporous amorphous silica thin films synthesized by evaporation-induced self-assembly process. Cubic and hexagonal films featured spherical and cylindrical pores and average porosity of 25% and 45%, respectively. The pore diameter ranged from 3 to 18 nm and film thickness from 80 to 540 nm while the average wall thickness varied from 3 to 12 nm. The thermal conductivity was measured at room temperature using the 3ω method. The experimental setup and the associated analysis were validated b
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Poulsen, Christian V., Mikael Svalgaard, and Ove Poulsen. "Photosensitivity in germania-doped silica films." In The European Conference on Lasers and Electro-Optics. Optica Publishing Group, 1994. http://dx.doi.org/10.1364/cleo_europe.1994.cmm5.

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Integrated optics is believed to be the key technology for future integrated optical systems. One standard method for processing planar waveguides is a combination of plasma enhanced chemical vapor deposition (PECVD) for growing glass layers and photolithography/reactive ion etch (RIE) for creating the waveguides2 (Fig. la). We present an investigation of the photosensitivity of germania-doped silica films. The results may lead to an alternate method for creating the guiding structure in planar waveguides that requires much fewer process steps. Instead of using a combination of photolithograph
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Kobavashi, Junva, Tohru Maruno, Yasuhiro Hida, Tohru Matsuura, and Shigekuni Sasaki. "Thermooptic switches using fluorinated polyimide waveguides." In Organic Thin Films for Photonic Applications. Optica Publishing Group, 1997. http://dx.doi.org/10.1364/otfa.1997.fa.4.

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Thermooptic (TO) switches using polymer optical waveguides have attracted much attention because the TO effect of polymers is ten times that of silica. Therefore, using polymers instead of silica [1-2] significantly reduces the required switching power. Moreover, fabricating polymer optical waveguides is easier than fabricating silica-based ones, so large optical devices can be made more easily.
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Melninkaitis, Andrius, Algirdas Selskis, Rytis Buzelis, et al. "New generation all-silica based optical elements for high power laser systems." In Nanostructured Thin Films X, edited by Tom G. Mackay, Akhlesh Lakhtakia, and Yi-Jun Jen. SPIE, 2017. http://dx.doi.org/10.1117/12.2272952.

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Grineviciute, Lina, Lukas Ramalis, Rytis Buzelis, and Tomas Tolenis. "Highly resistant all-silica polarizers for normal incidence applications." In Advances in Optical Thin Films VII, edited by Michel Lequime and Detlev Ristau. SPIE, 2021. http://dx.doi.org/10.1117/12.2597136.

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Kao, Chih-cheng, B. Gallas, and J. Rivory. "Study of Erbium Doped Silica Films Containing Silicon Nanograins." In 2007 IEEE Conference on Electron Devices and Solid-State Circuits. IEEE, 2007. http://dx.doi.org/10.1109/edssc.2007.4450187.

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Reports on the topic "Silica films"

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Smith, W. L., T. A. Michalske, and R. R. Rye. The deposition of boron nitride and carbon films on silica glass fibers. Office of Scientific and Technical Information (OSTI), 1993. http://dx.doi.org/10.2172/10110580.

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Saiwan, Chintana. Mesostructural ultra thin silica film formation through admicellar technique. Chulalongkorn University, 2003. https://doi.org/10.58837/chula.res.2003.78.

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Thin silica film formation from adsolubilization of inorganic silica precursors, letra-n-butoxysilane (TBOS) and tetraethyl orthosilicate (TBOS) in admicellar polymerization were studies. Cetyltrimethylammonium bromide (CTAB) at 700 uM and octyl phenol ethoxylate or Triton X-100 at 200 uM were used as surfactant templates for adsolubilizates TBOS and TBOS respectively. For the TBOS/CTAB system, the atomic force microscopy (AFM) topographic images showed fibers, hemispheres and flat layers existing along with increase of surface coverge on the mica surface as the TBOS feed concentration was inc
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Kalnitsky, A., S. P. Tay, J. P. Ellul, J. W. Andrews, E. A. Irene, and S. Chongsawagvirod. Measurements and Modelling of Thin Silicon Dioxide Films on Silicon. Defense Technical Information Center, 1989. http://dx.doi.org/10.21236/ada207853.

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Mecholsky, Jr, Tsai J. J., Drawl Y. L., and W. R. Fracture Studies of Diamond Films on Silicon. Defense Technical Information Center, 1991. http://dx.doi.org/10.21236/ada240978.

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Martin U. Pralle and James E. Carey. Black Silicon Enhanced Thin Film Silicon Photovoltaic Devices. Office of Scientific and Technical Information (OSTI), 2010. http://dx.doi.org/10.2172/984305.

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Irene, Eugene A. Silicon Oxidation Studies on Thin Film Silicon Oxidation Formation. Defense Technical Information Center, 1989. http://dx.doi.org/10.21236/ada206835.

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Franke, J., M. O. Liedke, P. Dahmen, et al. Influence of coating structure of an SiOx barrier coating on a PET substrate on water vapor permeation activation energy. Universidad de los Andes, 2024. https://doi.org/10.51573/andes.pps39.gs.nn.1.

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Abstract:
The application of plasma polymerized silicon-based coatings on plastic substrates is an effective way to adjust the permeability of the substrate. However, the permeation mechanisms are yet not fully understood. Here, the activation energy of permeation can offer valuable insights. In order to understand how the activation energy of permeation depends on the coating structure, five silicon-based coatings with varying oxygen content were analyzed, which led to property modifications ranging from silicon-oxidic to silicon-organic. Positron annihilation spectroscopy was employed to characterize
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Berman, G. P., G. D. Doolen, R. Mainieri, D. K. Campbell, and V. A. Luchnikov. Molecular dynamics simulations of grain boundaries in thin nanocrystalline silicon films. Office of Scientific and Technical Information (OSTI), 1997. http://dx.doi.org/10.2172/292865.

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Gallagher, A., D. Doughty, and J. Doyle. Diagnostics of glow discharges used to produce hydrogenated amorphous silicon films. Office of Scientific and Technical Information (OSTI), 1990. http://dx.doi.org/10.2172/6910198.

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10

Keyes, Brian. National solar technology roadmap: Film-silicon PV. Office of Scientific and Technical Information (OSTI), 2007. http://dx.doi.org/10.2172/1217298.

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