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Books on the topic 'Sputtering thin films'

Author: Grafiati

Published: 3 June 2025

Last updated: 31 July 2025

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1

Posadowski, Witold Michał. Niekonwencjonalne układy magnetronowe do próżniowego nanoszenia cienkich warstw. Oficyna Wydawnicza Politechniki Wrocławskiej, 2001.

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2

J, Mirtich Michael, Curren Arthur N, and United States. National Aeronautics and Space Administration., eds. Ion beam treatment of potential space materials at the NASA Lewis Research Center. National Aeronautics and Space Administration, 1991.

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3

Rittner, Mindy N. Sputtering targets and sputtered films: Technology and markets. Business Communications Co., 2002.

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4

Wasa, Kiyotaka. Thin film materials technology: Sputtering of compound materials. William Andrew Pub., 2004.

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5

Centre, Bhabha Atomic Research, ed. Development of a state-of-the-art R.F. sputtering coating system for the fabrication of multilayer x-ray mirrors. Bhabha Atomic Research Centre, 2000.

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6

Wasa, Kiyotaka. Handbook of sputter deposition technology: Principles, technology, and applications. Noyes Publications, 1992.

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7

Wolf, Andrew Robert. The electrochemistry of amorphous iron bismuth oxide thin films prepared by sputtering. National Library of Canada, 1992.

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8

National Renewable Energy Laboratory (U.S.) and IEEE Photovoltaic Specialists Conference (2011 : Austin, Taxas), eds. Optical properties of Zn(O,S) thin films deposited by RF sputtering atomic layer deposition, and chemcial bath deposition: Preprint. National Renewable Energy Laboratory, 2012.

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9

Rittner, Mindy N. Sputtered targets and sputtered films: Technology and markets. Business Communications Company, 1999.

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10

United States. National Aeronautics and Space Administration., ed. Plasma-assisted physical vapor deposition surface treatments for tribological control. National Aeronautics and Space Administration, 1990.

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11

United States. National Aeronautics and Space Administration., ed. Plasma-assisted physical vapor deposition surface treatments for tribological control. National Aeronautics and Space Administration, 1990.

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12

United States. National Aeronautics and Space Administration., ed. Plasma-assisted physical vapor deposition surface treatments for tribological control. National Aeronautics and Space Administration, 1990.

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13

Talivaldis, Spalvins, Lewis Research Center, and United States. National Aeronautics and Space Administration. Scientific and Technical Information Division., eds. Influence of the deposition conditions on radiofrequency magnetron sputtered MoS2 films. National Aeronautics and Space Administration, Office of Management, Scientific and Technical Information Division, 1990.

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14

Seyffert, Martin. Erzeugung metastabiler Phasen durch Grenzflächenreaktionen weniger Monolagen in ionengesputterten Au-In-Vielfachschichten. Hartung-Gorre Verlag, 1992.

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15

International Colloquium on Plasmas and Sputtering (6th 1987 Antibes, France). Comptes rendus des travaux du CIP G87. Société française du vide, 1987.

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16

E, Harper James M., Colton Richard J, and Feldman Leonard C, eds. Thin film processing and characterization of high-temperature superconductors, Anaheim, CA, 1987. American Institute of Physics, 1988.

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17

Parry, Michael Andrew. An investigation of neodymium iron boron thin films produced by magnetron sputtering and pulsed laser ablation. University of Birmingham, 2001.

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18

Pringle, Steven Derek. A study of the formation of silicon oxide thin films using dual ion beam reactive sputtering. University of Salford, 1994.

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19

Rainer, Behrisch, and Eckstein Wolfgang, eds. Sputtering by particle bombardment: Experiments and computer calculations from threshold to MeV energies. Springer, 2007.

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20

(Stijn), Mahieu S., and SpringerLink (Online service), eds. Reactive Sputter Deposition. Springer-Verlag Berlin Heidelberg, 2008.

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21

Hüpkes, Jürgen. Untersuchung des reaktiven Sputterprozesses zur Herstellung von aluminiumdotierten Zinkoxide-Schichten für Silizium-Dünnschicht-solarzellen. Forschungszentrum Jülich, Zentralbibliothek, 2006.

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22

Karner, Christine. Thin film characterisation of polycrystalline II-VI display phosphor materials prepared bypulsed laser deposition and RF sputtering. The Author], 1997.

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23

98/1 Reactive sputtering. Institute of Physics Pub., 1998.

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24

Glocker, David A. Handbook of Thin Film Process Technology: 98/1 Reactive Sputtering. Taylor & Francis Group, 2018.

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25

Glocker, David A. Handbook of Thin Film Process Technology: 98/1 Reactive Sputtering. Taylor & Francis Group, 2018.

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26

Glocker, David A. Handbook of Thin Film Process Technology: 98/1 Reactive Sputtering. Taylor & Francis Group, 2018.

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27

Glocker, David A. Handbook of Thin Film Process Technology: 98/1 Reactive Sputtering. Taylor & Francis Group, 2018.

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28

Kitabatake, Makoto, Hideaki Adachi, and Kiyotaka Wasa. Thin Films Material Technology: Sputtering of Compound Materials. Springer Berlin / Heidelberg, 2013.

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29

Stuart, R. V. Vacuum Technology, Thin Films, and Sputtering: An Introduction. Elsevier Science & Technology Books, 2012.

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30

Depla, Diederik, and Stijn Mahieu. Reactive Sputter Deposition. Springer, 2010.

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31

Kitabatake, Makoto, Hideaki Adachi, and Kiyotaka Wasa. Thin Film Materials Technology: Sputtering of Compound Materials. Noyes Publications, 2003.

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32

Thin Films Material Technology: Sputtering of Compound Materials. Springer, 2004.

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33

Kitabatake, Makoto, Hideaki Adachi, and Kiyotaka Wasa. Thin Film Materials Technology: Sputtering of Compound Materials. Elsevier Science & Technology Books, 2004.

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34

(Editor), D. Glocker, S. Shah (Editor), and W. Westwood (Editor), eds. Handbook of Thin Film Process Technology 98/1 Reactive Sputtering. Taylor & Francis, 1998.

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35

Sputtered Thin Films: Theory and Fractal Descriptions. CRC Press LLC, 2023.

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36

Akinlabi, Esther Titilayo, Frederick Madaraka Mwema, and Oluseyi Philip Oladijo. Sputtered Thin Films: Theory and Fractal Descriptions. Taylor & Francis Group, 2021.

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37

Akinlabi, Esther Titilayo, Frederick Madaraka Mwema, and Oluseyi Philip Oladijo. Sputtered Thin Films: Theory and Fractal Descriptions. Taylor & Francis Group, 2021.

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38

Sputtered Thin Films: Theory and Fractal Descriptions. Taylor & Francis Group, 2021.

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39

Ion beam assisted film growth. Elsevier, 1989.

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40

Sputtering Materials For Vlsi And Thin Film Devices. William Andrew Publishing, 2012.

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41

Wasa, Kiyotaka. Handbook of Sputter Deposition Technology: Fundamentals and Applications for Functional Thin Films, Nano-Materials and MEMS. Elsevier Science & Technology Books, 2012.

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42

Wasa, Kiyotaka, and Shigeru Hayakawa. Handbook of Sputter Deposition Technology: Principles, Technology and Applications. Elsevier Science & Technology Books, 1992.

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43

Warrender, Theresa. Sol-gel and sputtering routes to lead zirconium titanate (PZT) thin films. 1995.

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44

Hall, Gareth William. Control of the properties of semiconducting thin films deposited using magnetron sputtering. 1993.

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45

Oechsner, Hans. Thin Film and Depth Profile Analysis. Springer, 2012.

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46

DC Magnetron Reactive Sputtering of Low Stress AlN Piezoelectric Thin Films for MEMS Application. Storming Media, 1999.

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47

Vaz, Filipe, Nicolas Martin, and Martin Fenker, eds. Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods: Process, Properties and Applications. BENTHAM SCIENCE PUBLISHERS, 2013. http://dx.doi.org/10.2174/97816080515641130101.

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48

Carreri, Felipe de Campos. Investigation of Industrially-Suited Processes for Deposition of Oxide Thin Films by High Power Impulse Magnetron Sputtering. Fraunhofer IRB Verlag, 2018.

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49

Lu, Toh-Ming, and Edward V. Barnat. Pulsed and Pulsed Bias Sputtering: Principles and Applications. Springer, 2011.

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50

Lu, Toh-Ming, and Edward V. Barnat. Pulsed and Pulsed Bias Sputtering: Principles and Applications. Springer, 2014.

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