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Relevant bibliographies by topics / Filtered vacuum arc deposition

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Academic literature on the topic 'Filtered vacuum arc deposition'

Author: Grafiati

Published: 28 May 2022

Last updated: 30 July 2025

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Journal articles on the topic "Filtered vacuum arc deposition"

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Benti, Hailu Gemechu, Abraham Debebe Woldeyohannes, and Belete Sirahbizu Yigezu. "Improving the Efficiency of Cutting Tools through Application of Filtered Cathodic Vacuum Arc Deposition Coating Techniques: A Review." Advances in Materials Science and Engineering 2022 (May 28, 2022): 1–17. http://dx.doi.org/10.1155/2022/1450805.

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The challenge of enhancing cutting tool life has been dealt with by many research studies. However, this challenge seems endless with growing technological advancement which brings about incremental improvement in tool life. The objective of this review paper is focused at assessing filtered cathodic vacuum arc deposition techniques applied on cutting tools and their effect on tool efficiency. The paper particularly picks filtered cathodic vacuum arc deposition (FCVAD) among other well-identified methods of coating like the Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD). F

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TAKIKAWA, Hirofumi, and Takahiro BANDO. "Vacuum Arc Deposition: Steered and Filtered Methods." Journal of The Surface Finishing Society of Japan 75, no. 7 (2024): 310–13. https://doi.org/10.4139/sfj.75.310.

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Boxman, R. L., V. Zhitomirsky, B. Alterkop, et al. "Recent progress in filtered vacuum arc deposition." Surface and Coatings Technology 86-87 (December 1996): 243–53. http://dx.doi.org/10.1016/s0257-8972(96)03023-x.

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Верещака, Алексей, and Aleksey Vereshchaka. "Development process of assisted filtered cathodic-vacuum-arc deposition (AFCVAD)." Bulletin of Bryansk state technical university 2014, no. 3 (2014): 10–13. http://dx.doi.org/10.12737/23189.

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Developed a process of assisted filtered cathodic-vacuum-arc deposition (AFCVAD). We used a special emitter (implantor) to generate Cr, Mo ions with high energy. Such key parameters of coatings as composition, structure, a thickness, hardness, adhesion in relation to a substrate obtained at various energy of chrome ions have been studied. A phenomenological (physical) model of assisted filtered cathodic-vacuum-arc deposition (AFCVAD), allows to predict the properties of the coatings formed on the basis of binary compounds as a function of the relationship Ra, characterizing parameters of ion i

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Maksimov, Y. V., A. S. Vereschaka, A. A. Vereschaka, et al. "Development and research of multilayer composite coatings with nano-dispersed structure which are deposited on cutting tools using assistance cathode-vacuum-arc processes." Izvestiya MGTU MAMI 7, no. 1-2 (2013): 73–82. http://dx.doi.org/10.17816/2074-0530-68031.

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The authors considered the problem of synthesis of multilayer coatings with nano-dispersed structure using the process of assistance filtered cathode-vacuum-arc deposition. The effect of high-energy assisting ions, generated by a special device (implanter), which the ВИТ-3 vacuum-arc setting was equipped with, is analyzed in the paper. The mechanisms of modifying the properties of the deposited coatings and cutting properties of carbide inserts with coatings obtained in assisting cathode-vacuum-arc deposition with filtration of ion-vapor flow are analyzed as well.

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Boxman, R. L., S. Goldsmith, A. Ben-Shalom, et al. "Filtered vacuum arc deposition of semiconductor thin films." IEEE Transactions on Plasma Science 23, no. 6 (1995): 939–44. http://dx.doi.org/10.1109/27.476479.

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Chen, Y. M., H. Q. Zhang, Z. W. Li, W. Cao, B. Liao, and X. Zhang. "Deposition of ZrNxOyfilms by filtered cathodic vacuum arc." Surface Engineering 29, no. 8 (2013): 567–71. http://dx.doi.org/10.1179/1743294413y.0000000163.

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Vereschaka, Alexey A., Anatoly S. Vereschaka, Andre DL Batako, Boris J. Mokritskii, Anatoliy Y. Aksenenko, and Nikolay N. Sitnikov. "Improvement of structure and quality of nanoscale multilayered composite coatings, deposited by filtered cathodic vacuum arc deposition method." Nanomaterials and Nanotechnology 7 (January 17, 2016): 184798041668080. http://dx.doi.org/10.1177/1847980416680805.

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This article studies the specific features of cathode vacuum arc deposition of coatings used in the production of cutting tools. The detailed analysis of the major drawbacks of arc-Physical Vapour Deposition (PVD) methods has contributed to the development of the processes of filtered cathodic vacuum arc deposition to form nanoscale multilayered composite coatings of increased efficiency. This is achieved through the formation of nanostructure, increase in strength of adhesion of coating to substrate up to 20%, and reduction of such dangerous coating surface defects as macro- and microdroplets

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Stepanov, Igor, Alexander Ryabchikov, and Denis Sivin. "Very Broad Metal Ion Beam Source for Ion Implantation and Coating Deposition Technologies." Advanced Materials Research 880 (January 2014): 288–91. http://dx.doi.org/10.4028/www.scientific.net/amr.880.288.

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The paper describes high broad metal ion source based on dc macroparticle filtered vacuum arc plasma generation with the dc ion-beam extraction. The possibility of formation of pseudo ribbon beam of metal ions with the parameters: ion beam length 0.6 m, ion current up to 0.2 A, accelerating voltage 40 kV, and ion energy up to 160 kV has been demonstrated. The pseudo ribbon ion beam is formed from dc driven vacuum arc plasma. The results of investigation of the vacuum arc evaporator ion-emission properties are presented. The influence of magnetic field strength near the cathode surface on the a

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Brzezinka, Tomasz L., Jeff Rao, Jose M. Paiva, et al. "Facilitating TiB2 for Filtered Vacuum Cathodic Arc Evaporation." Coatings 10, no. 3 (2020): 244. http://dx.doi.org/10.3390/coatings10030244.

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TiB2 is well established as a superhard coating with a high melting point and a low coefficient of friction. The brittle nature of borides means they cannot be utilised with arc evaporation, which is commonly used for the synthesis of hard coatings as it provides a high deposition rate, fully ionised plasma and good adhesion. In this work, TiB2 conical cathodes with non-standard sintering additives (carbon and TiSi2) were produced, and the properties of the base material, such as grain structure, hardness, electrical resistivity and composition, were compared to those of monolithic TiB2. The d

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Dissertations / Theses on the topic "Filtered vacuum arc deposition"

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Veerasamy, Vijayen S. "Tetrahedral amorphous carbon : deposition, characterisation and electronic properties." Thesis, University of Cambridge, 1994. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.337824.

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Minault, Christophe S. "Filtered vacuum arc deposition of diamond like carbon films on sharp edged samples." Thesis, University of Reading, 1999. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.298488.

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Elzwawi, Salim Ahmed Ali. "Cathodic Arc Zinc Oxide for Active Electronic Devices." Thesis, University of Canterbury. Electrical and Computer Engineering, 2015. http://hdl.handle.net/10092/10852.

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The filtered cathodic vacuum arc (FCVA) technique is a well established deposition method for wear resistant mechanical coatings. More recently, this method has attracted attention for growing ZnO based transparent conducting films. However, the potential of FCVA deposition to prepare ZnO layers for electronic devices is largely unexplored. This thesis addresses the use of FCVA deposition for the fabrication of active ZnO based electronic devices. The structural, electrical and optical characteristics of unintentionally doped ZnO films grown on different sapphire substrates were systematically

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Vasyliev, V. V., A. A. Luchaninov, E. N. Reshetnyak, and V. E. Strelnitskij. "Comparative Characteristics of Stress and Structure of TiN and Ti0.5-xAl0.5YxN Coatings Prepared by Filtered Vacuum-Arc PIIID Method." Thesis, Sumy State University, 2012. http://essuir.sumdu.edu.ua/handle/123456789/34913.

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A comparative study of the structure and stress state of Ti0.5-xAl0.5YxN and TiN coatings deposited under identical conditions from the filtered vacuum-arc plasma under high voltage pulsed bias potential on the substrate was carried out. It was found that for Ti0.5Al0.5N coatings the dependence of the residual stress on the amplitude of the pulsed voltage potential is non-monotonic with a minimum when the amplitude is of 1 kV. As for TiN films, a monotonic decrease in the level of residual stresses takes place when the amplitude of the potential is increased in the range 0-2.5 kV. Non-mon

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Kuhakan, J., M. Medhisuwakul, and L. D. Yu. "Filtered Cathodic Vacuum Arc Deposition of Porous and Nanostructured Carbon and Hybrid C-Mo Thin Films for Fuel Cell Membranes." Thesis, Sumy State University, 2012. http://essuir.sumdu.edu.ua/handle/123456789/34867.

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In our proton exchange membrane (PEM) fuel cells, the electrolyte is a catalyst platinum (Pt) coated nafion membrane. In order to increase the electrochemically active catalyst area to enhance the cell performance but without sacrificing the electrical conductivity of the membrane, carbon thin films were deposited onto the membrane by using the filtered cathodic vacuum arc deposition (FCVAD) technique. With varying the deposition conditions, it was possible to form porous carbon films and nanoisland and nanorod structure surface which increased the catalyst area when a higher He working g

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Akkaya, S. S., V. V. Vasyliev, K. Kazmanl, et al. "Mechanical and Tribological Properties of TiN Coatings Produced by PIII&D Technique." Thesis, Sumy State University, 2013. http://essuir.sumdu.edu.ua/handle/123456789/35187.

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The structure, mechanical and tribological properties TiN coatings рroduced with PIII&D by using rectilinear filtered vacuum arc plasma system are present. The results of scratch testing and wear reciprocating testing clearly revealed the positive effect of pulse bias (0.5÷2.5 kV) application on tribological behavior of the TiN coatings in comparison the coatings deposited with DC bias (150 V). Application of pulsed bias potential leads to a significant reduction in the friction coefficient and increasing of coatings wear resistance due to a change in their structure. The orientation of c

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Mustapha, Nazir Mohamad. "Reactive filtered arc evaporation." Thesis, Loughborough University, 1993. https://dspace.lboro.ac.uk/2134/26797.

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Conventional physical vapour deposition (PVD) techniques usually result in films of lower quality than the corresponding bulk material. A major problem with PVD films is the presence of columns and voids throughout the thickness of the film. The films may have a low packing density, low micro-hardness and in many cases poor adhesion to the substrate. Many of these problems are a direct consequence of the low energy of the depositing atoms arriving at the substrate during film growth. The resulting film porosity gives rise to a reduction in mechanical strength, and in the case of dielectric opt

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Belous, V. A., S. A. Firstov, V. F. Gorban, et al. "Properties of Coatings Deposited from Filtered Vacuum Arc Plasma with HEA Cathode." Thesis, Sumy State University, 2013. http://essuir.sumdu.edu.ua/handle/123456789/35323.

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Ti-V-Zr-Nb-Hf metallic and nitride films were deposited by filtered vacuum arc plasma from a single equiatomic HEA cathode. The composition, microstructure, mechanical properties, thermal stability and corrosion properties were investigated. The deposited metallic film has a two-phase structure with bcc and hcp-lattice. The nitride films were found to have only an fcc structure. All coatings have nano-grained structures, with grain sizes 5 nm for metallic and 36 nm for nitride. The nitride coatings have a compressive stress of around – 12,5 GPa, high hardness ~ 40 GPa and elastic modulus

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Kandah, Munther. "Droplets generation mechanisms by graphite cathodes in the vacuum arc deposition technique." Thesis, McGill University, 1993. http://digitool.Library.McGill.CA:80/R/?func=dbin-jump-full&object_id=69702.

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The most severe problem for the vacuum arc deposition (VAD) technique is the formation of micron-size particles on the films. These particles degrade the films' properties. The present work studied the generation mechanisms and characteristics of the droplets that are produced in the carbon films deposited by vacuum arc technique. To achieve a better control of the generation mechanism of these droplets, the effect of the arc current, arc duration time, cathode spot temperature and distance between cathode and substrate on the size and population of the micro-droplets are studied.<br>The micro

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Beresnev, V. M., O. V. Sobol’, Олександр Дмитрович Погребняк, et al. "About Peculiarities of the Influence of the Negative Bias Potential Applied to the Substrate During the Deposition Process on the Structural State and Properties of the Multilayer system MoN-CrN." Thesis, Sumy State University, 2015. http://essuir.sumdu.edu.ua/handle/123456789/42799.

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Applying transition metal nitrides of Mo and Cr, which are characterized by a relatively low heat of formation, as the components of the multilayer coating, the possibilities of elemental and structural engineering of vacuum-arc coatings under the influence of the bias potential Us and the reaction gas pressure PN are revealed. It was found that at a relatively small thickness of the layers of nanometer range, which provides superhard state of the coatings, the supply of Us with the value of above the critical leads to a drop in hardness, which can be explained by mixing of layers at the inter

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Book chapters on the topic "Filtered vacuum arc deposition"

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Bilek, M. M. M., D. R. McKenzie, T. W. H. Oates, J. Pigott, P. Denniss, and J. Vlcek. "Deposition of Nanoscale Multilayered Structures Using Filtered Cathodic Vacuum Arc Plasma Beams." In Emerging Applications of Vacuum-Arc-Produced Plasma, Ion and Electron Beams. Springer Netherlands, 2002. http://dx.doi.org/10.1007/978-94-010-0277-6_16.

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Zhang, Xu, Hui Xing Zhang, Xiang Ying Wu, and Tong He Zhang. "Low Stress Tetrahedral Amorphous Carbon Films Prepared by Filtered Vacuum Arc Deposition." In Materials Science Forum. Trans Tech Publications Ltd., 2005. http://dx.doi.org/10.4028/0-87849-960-1.3623.

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Beilis, Isak. "Vacuum Arc Plasma Sources. Thin Film Deposition." In Plasma and Spot Phenomena in Electrical Arcs. Springer International Publishing, 2020. http://dx.doi.org/10.1007/978-3-030-44747-2_22.

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Panwar, O. S., Ajay Kesarwani, Atul Bisht, et al. "Synthesis of Multilayer Graphene by Filtered Cathodic Vacuum Arc Technique." In Physics of Semiconductor Devices. Springer International Publishing, 2014. http://dx.doi.org/10.1007/978-3-319-03002-9_166.

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Schultrich, Bernd. "Methods of Vacuum Arc Deposition of ta-C Films." In Tetrahedrally Bonded Amorphous Carbon Films I. Springer Berlin Heidelberg, 2018. http://dx.doi.org/10.1007/978-3-662-55927-7_10.

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Zhitomirsky, V. N., I. Grimberg, M. C. Joseph, et al. "Vacuum arc plasma deposition of wear resistant coatings on polymer substrates." In Polymer Surface Modification: Relevance to Adhesion, Volume 2. CRC Press, 2023. http://dx.doi.org/10.1201/9780429070419-33.

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Demchyshyn, A. V., Yu A. Kurapov, V. A. Michenko, Ye G. Kostin, A. A. Goncharov, and Ye G. Ternovoi. "Linear Vacuum ARC Evaporators for Deposition of Functional Multi-Purpose Coatings." In Emerging Applications of Vacuum-Arc-Produced Plasma, Ion and Electron Beams. Springer Netherlands, 2002. http://dx.doi.org/10.1007/978-94-010-0277-6_13.

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Mladenov, G., K. Vutova, G. Djanovski, E. Koleva, V. Vassileva, and D. Mollov. "Electron Beam Deposition of High Temperature Superconducting Thin Films." In Emerging Applications of Vacuum-Arc-Produced Plasma, Ion and Electron Beams. Springer Netherlands, 2002. http://dx.doi.org/10.1007/978-94-010-0277-6_15.

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Tripathi, R. K., O. S. Panwar, Ajay Kumar Kesarwani, and Sreekumar Chockalingam. "Phosphorous Doped Hydrogenated Amorphous Silicon Carbide Films Deposited by Filtered Cathodic Vacuum Arc Technique." In Physics of Semiconductor Devices. Springer International Publishing, 2014. http://dx.doi.org/10.1007/978-3-319-03002-9_96.

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Kesarwani, Ajay, O. S. Panwar, R. K. Tripathi, and Sreekumar Chockalingam. "Synthesis and Characterization of Phosphorus Doped Hydrogenated Silicon Films by Filtered Cathodic Vacuum Arc Technique." In Physics of Semiconductor Devices. Springer International Publishing, 2014. http://dx.doi.org/10.1007/978-3-319-03002-9_137.

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Conference papers on the topic "Filtered vacuum arc deposition"

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Boxman, Raymond, Samuel Goldsmith, Amir Ben-Shalom, et al. "Filtered vacuum arc deposition of semiconductor thin films." In XVI International Symposium on Discharges and Electrical Insulation in Vacuum, edited by Gennady A. Mesyats. SPIE, 1994. http://dx.doi.org/10.1117/12.174615.

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Aksenov, I. I., D. S. Aksyonov, V. V. Vasilyev, A. A. Luchaninov, E. N. Reshetnyak, and V. E. Strel'nitskij. "Filtered vacuum-arc plasma source for composite coatings deposition." In 2008 XXIII International Symposium on Discharges and Electrical Insulation in Vacuum (ISDEIV 2008). IEEE, 2008. http://dx.doi.org/10.1109/deiv.2008.4676857.

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Fulton, Michael L., R. S. Dummer, and M. Zimmerman. "Advanced Deposition Technology for Astronomical and Space Applications, Part II: Ion-Assisted Filtered Cathodic Arc Deposition (IFCAD)." In Society of Vacuum Coaters Annual Technical Conference. Society of Vacuum Coaters, 2015. http://dx.doi.org/10.14332/svc15.proc.1923.

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Guillén, E., I. Heras, G. Rincón Llorente, F. Lungwitz, M. Alcon-Camas, and R. Escobar-Galindo. "Room temperature deposition of highly dense TiO2thin films by filtered cathodic vacuum arc." In SPIE Nanoscience + Engineering, edited by Akhlesh Lakhtakia, Tom G. Mackay, and Motofumi Suzuki. SPIE, 2015. http://dx.doi.org/10.1117/12.2189503.

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"Stability of Field Emission Current for Tetrahedral Amorphous Carbon Films Prepared by Filtered Vacuum Arc Deposition." In 10th International Conference on Vacuum Microelectronics. IEEE, 1997. http://dx.doi.org/10.1109/ivmc.1997.627623.

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Goldenberg, Eda, L. Burstein, Ines Chayun-Zucker, Rudi Avni, and Raymond L. Boxman. "The Effect of Nitrogen Partial Pressure and Substrate Temperature on the Characteristics of Photocatalytic N:TiO2 Thin Films deposited by Filtered Vacuum Arc Deposition." In 13th International Conference on Plasma Surface Engineering September 10 - 14, 2012, in Garmisch-Partenkirchen, Germany. Linköping University Electronic Press, 2013. http://dx.doi.org/10.3384/wcc2.88-91.

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Nitrogen doped Titanium Oxide (N:TiO2) thin films were deposited using filtered vacuum arc deposition, and their structure, composition and morphology were studied as functions of the total pressure, N2/O2 gas ratio and the substrate temperature. The film structure, surface morphology, and composition were determined by XRD, AFM and XPS. The optical characterization of the films was determined with spectrophotomery and ex-situ variable angle spectroscopic ellipsometry (VASE). In addition to the effects of other deposition conditions such as arc current, total deposition pressure, and post-depo

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Hikosaka, H., Y. Iwasaki, H. Tanoue, H. Takikawa, T. Sakakibara, and H. Hasegawa. "Development of X-Shape Filtered Arc Deposition (X-FAD) Apparatus and DLC/Cr Film Preparation." In 2006 International Symposium on Discharges and Electrical Insulation in Vacuum. IEEE, 2006. http://dx.doi.org/10.1109/deiv.2006.357378.

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Takikawa, H., S. Minamisawa, G. C. Xu, N. Miyakawa, T. Sakakibara, and Y. Shiina. "Cathode erosion and carbon-nanotubed droplet in t-shape filtered arc deposition with various carbon cathodes." In 2004 XXIst International Symposium on Discharges and Electrical Insulation in Vacuum. IEEE, 2004. http://dx.doi.org/10.1109/deiv.2004.1422652.

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"Optical and Mechanical Properties of Diamond-Like Carbon Coatings Deposited by Filtered Cathodic Vacuum Arc Deposition." In 2015 The 5th International Workshop on Computer Science and Engineering-Information Processing and Control Engineering. WCSE, 2015. http://dx.doi.org/10.18178/wcse.2015.04.049.

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Press-Yekymov, M., E. Goldenberg, and R. L. Boxman. "Characterization of Aluminum Doped Zinc Oxide Thin Films Fabricated by Rectangular Filtered Vacuum Arc Deposition on Large Flat Glass Substrates." In Society of Vacuum Coaters Annual Technical Conference. Society of Vacuum Coaters, 2014. http://dx.doi.org/10.14332/svc14.proc.1885.

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Reports on the topic "Filtered vacuum arc deposition"

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Bhattacharya, Rabi S. LARGE AREA FILTERED ARC DEPOSITION OF CARBON AND BORON BASED HARD COATINGS. Office of Scientific and Technical Information (OSTI), 2003. http://dx.doi.org/10.2172/820006.

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