Relevant bibliographies by topics / Ion-plasma deposition

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  1. Journal articles
  2. Dissertations / Theses
  3. Books
  4. Book chapters
  5. Conference papers
  6. Reports

Academic literature on the topic 'Ion-plasma deposition'

Author: Grafiati
Published: 28 May 2022
Last updated: 30 July 2025

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Journal articles on the topic "Ion-plasma deposition"

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Rossnagel, S. M., and J. J. Cuomo. "Ion-Beam-Assisted Deposition and Synthesis." MRS Bulletin 12, no. 2 (1987): 40–51. http://dx.doi.org/10.1557/s0883769400068391.

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Concurrent energetic particle bombardment during film deposition can strongly modify the structural and chemical properties of the resulting thin film. The interest in this technique, ion-assisted deposition, comes about because it can be used to produce thin films with properties not achievable by conventional deposition. Bombardment by low energy ions occurs during almost all plasma-based thin film deposition techniques. Bombardment of a growing film, particularly by accelerated ions, can also be combined with non-plasma-based deposition techniques, such as evaporation, to simulate some of t
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JangJian, Shiu-Ko, and Ying-Lang Wang. "Substrate Effect on Plasma Clean Efficiency in Plasma Enhanced Chemical Vapor Deposition System." Active and Passive Electronic Components 2007 (2007): 1–5. http://dx.doi.org/10.1155/2007/15754.

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The plasma clean in a plasma-enhanced chemical vapor deposition (PECVD) system plays an important role to ensure the same chamber condition after numerous film depositions. The periodic and applicable plasma clean in deposition chamber also increases wafer yield due to less defect produced during the deposition process. In this study, the plasma clean rate (PCR) of silicon oxide is investigated after the silicon nitride deposited on Cu and silicon oxide substrates by remote plasma system (RPS), respectively. The experimental results show that the PCR drastically decreases with Cu substrate com
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Petrikowski, Kerstin, Martin Fenker, and Holger Kaßner. "Influence of process parameters including the confining magnetic field of a plasma beam source on the deposition of N‐doped hydrogenated carbon films." Journal of Technological and Space Plasmas 4, no. 1 (2023): 140–50. http://dx.doi.org/10.31281/jtsp.v4i1.29.

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Electrically conductive nitrogen‐doped hydrogenated carbon films (a‐C:H:N) were deposited using a nitrogenacetylene gas mixture by plasma‐assisted chemical vapor deposition (PACVD). A capacitively coupled plasma beam source was used for the depositions. The plasma is excited by a radio‐frequency (RF) discharge and confined by Helmholtz magnetic coils, resulting in an increase in plasma density. The ion energy, as well as the deposition rate, can be controlled by the choice of the size of the coupling electrode, i.e. the ratio of cathode-to‐anode area, the electric current at the Helmholtz magn
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Ryabchikov, Alexander, Denis Sivin, and Igor Stepanov. "Development of New Ion and Plasma Surface Modification Methods." Advanced Materials Research 1084 (January 2015): 221–24. http://dx.doi.org/10.4028/www.scientific.net/amr.1084.221.

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The review is devoted to the analysis of the present state-of-the-art and development trends of the new methods and equipment being developed in Tomsk Polytechnic University (TPU), for DC vacuum arc-based ion and plasma materials processing. The features and advantages are demonstrated for the method of high-concentration implantation with compensation of surface ion sputtering by metal plasma deposition, the method of metal plasma deposition under repetitively – pulsed ion mixing with ion beams and plasma flow formed in the «Raduga-5» source, and the method of coating deposition and ion impla
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Rossnagel, S. M., and J. J. Cuomo. "Ion Beam Deposition, Film Modification and Synthesis." MRS Bulletin 13, no. 12 (1988): 40–45. http://dx.doi.org/10.1557/s0883769400063685.

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Ion beam processing for thin film deposition is rapidly overtaking some of the more conventional plasma-based thin film processing techniques. This is due to strong improvements in the types and reliabilities of the sources available as well as a growing understanding of the advantages and capabilities of using ion beams.An ion beam process can be differentiated from a plasma-based process in that the plasma in an ion beam is generated away from the sample and a beam of ions is directed at the sample. In a plasma-based process, the sample is usually immersed in the plasma. This highlights the
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Kim, Kwang Pyo, Wan Soo Song, Min Kyu Park, and Sang Jeen Hong. "Surface Analysis of Amorphous Carbon Thin Film for Etch Hard Mask." Journal of Nanoscience and Nanotechnology 21, no. 3 (2021): 2032–38. http://dx.doi.org/10.1166/jnn.2021.18919.

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When the aspect ratio of a high aspect ratio (HAR) etching process is greatly increased, an amorphous carbon layer (ACL) hard mask is required for dynamic random-access memory (DRAM). To improve the durability of an etch hard mask, an understanding of the plasma deposition mechanisms and the deposited film properties associated with the plasma conditions and atomic structure, respectively, is required. We performed a series of plasma depositions, material characterizations and dry-etching to investigate the effect of the deposition process condition on the surface characteristics of an ACL fil
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Shiono, T., T. Shibuya, Y. Harano, E. Yabe, and K. Takayama. "Ion source with plasma cathode for ion assisted deposition." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 37-38 (February 1989): 166–68. http://dx.doi.org/10.1016/0168-583x(89)90160-2.

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Gosar, Žiga, Janez Kovač, Miran Mozetič, Gregor Primc, Alenka Vesel, and Rok Zaplotnik. "Deposition of SiOxCyHz Protective Coatings on Polymer Substrates in an Industrial-Scale PECVD Reactor." Coatings 9, no. 4 (2019): 234. http://dx.doi.org/10.3390/coatings9040234.

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The deposition of protective coatings on aluminised polymer substrates by a plasma enhanced chemical vapour deposition PECVD technique in a plasma reactor with a volume of 5 m3 was studied. HMDSO was used as a precursor. Plasma was sustained in a capacitively coupled radiofrequency (RF) discharge powered by an RF generator operating at 40 kHz and having an adjustable output power up to 8 kW. Gaseous plasma was characterised by residual gas mass spectrometry and optical emission spectroscopy. Polymer samples with an average roughness of approximately 5 nm were mounted into the plasma reactor an
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Xiaojun Yin, Shuaifeng Zhao, Shuguo Fei, et al. "Plasma ion-assisted deposition in UV filters." Chinese Optics Letters 8, S1 (2010): 59–61. http://dx.doi.org/10.3788/col201008s1.0059.

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Li, Guoqing, Cui Liu, Jianfeng Li, Chengwu Zhang, Zongxin Mu, and Zhenhu Long. "Plasma-ion beam source enhanced deposition system." Surface and Coatings Technology 193, no. 1-3 (2005): 112–16. http://dx.doi.org/10.1016/j.surfcoat.2004.07.040.

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Dissertations / Theses on the topic "Ion-plasma deposition"

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Oates, Thomas William Henry. "Metal plasma immersion ion implantation and deposition using polymer substrates." Connect to full text, 2003. http://hdl.handle.net/2123/571.

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Thesis (Ph. D.)--University of Sydney, 2004.<br>Title from title screen (viewed 5 May 2008). Submitted in fulfilment of the requirements for the degree of Doctor of Philosophy to the School of Physics, Faculty of Science. Degree awarded 2004; thesis submitted 2003. Includes bibliographical references. Also available in print form.
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Oates, T. W. H. "Metal plasma immersion ion implantation and deposition using polymer substrates." Thesis, The University of Sydney, 2003. http://hdl.handle.net/2123/571.

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This thesis investigates the application of plasma immersion ion implantation (PIII) to polymers. PIII requires that a high negative potential be applied to the surface of the material while it is immersed in a plasma. This presents a problem for insulating materials such as polymers, since the implanting ions carry charge to the surface, resulting in a charge accumulation that effectively neutralises the applied potential. This causes the plasma sheath at the surface to collapse a short time after the potential is applied. Measurements of the sheath dynamics, including the collapsing shea
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Oates, T. W. H. "Metal plasma immersion ion implantation and deposition using polymer substrates." University of Sydney. Physics, 2003. http://hdl.handle.net/2123/571.

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This thesis investigates the application of plasma immersion ion implantation (PIII) to polymers. PIII requires that a high negative potential be applied to the surface of the material while it is immersed in a plasma. This presents a problem for insulating materials such as polymers, since the implanting ions carry charge to the surface, resulting in a charge accumulation that effectively neutralises the applied potential. This causes the plasma sheath at the surface to collapse a short time after the potential is applied. Measurements of the sheath dynamics, including the collapsing shea
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Fu, King Yu. "Plasma implantation and deposition for advanced materials surface modification /." access full-text access abstract and table of contents, 2005. http://libweb.cityu.edu.hk/cgi-bin/ezdb/thesis.pl?phd-ap-b19887310a.pdf.

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Thesis (Ph. D.)--City University of Hong Kong, 2005.<br>"Submitted to Department of Physics and Materials Sciences in partial fulfillment of the requirements for the degree of Philosophy of Doctor." Includes bibliographical references.
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Baranov, O. O. "Control of Ion Density Distribution by Use of Magnetic Traps for Plasma Electrons." Thesis, Sumy State University, 2012. http://essuir.sumdu.edu.ua/handle/123456789/35384.

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Method of ion current density control in the vacuum arc deposition setup has been investigated. The control unit consisted of two electromagnetic coils installed under substrate of 400 mm dia. exposed to the plasma flux. A planar probe was used to measure the ion current density distribution along the plasma flux cross-sections at different distances from the plasma duct exit. It was shown that configuration of the resulting magnetic field generated by the control coils and the guiding and focusing coils of the arc source, strongly affects the ion current density distribution. Broad range
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Gauter, Sven [Verfasser]. "Calorimetric investigation on plasma and ion beam sources used for thin film deposition / Sven Gauter." Kiel : Universitätsbibliothek Kiel, 2018. http://d-nb.info/1168229146/34.

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HE, PENG. "DEPOSITION OF EXTREMELY THIN FUNCTIONAL FILMS ON NANOPARTICLE/NANOTUBE SURFACES BY A PLASMA TREATMENT." University of Cincinnati / OhioLINK, 2003. http://rave.ohiolink.edu/etdc/view?acc_num=ucin1068676591.

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Davison, Andrew. "Plasma diagnostic studies of DC ion plating discharges : influence of discharge and vapour characteristics on coating deposition." Thesis, University of Hull, 2003. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.402723.

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Barutcu, Burcu. "The Design And Production Of Interference Edge Filters With Plasma Ion Assisted Deposition Technique For A Space Camera." Master's thesis, METU, 2012. http://etd.lib.metu.edu.tr/upload/12614574/index.pdf.

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Interference filters are multilayer thin film devices. They use interference effects between the incident and reflected radiation waves at each layer interface to select wavelengths. The production of interference filters depend on the precise deposition of thin material layers on substrates which have suitable optical properties. In this thesis, the main target is to design and produce two optical filters (short-pass filter and long-pass filter) for the CCDs that will be used in the electronics of a space camera. By means of these filters, it is possible to take image in different bands (RGB
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Uglov, V. V., M. M. Barkovskaya, V. V. Khodasevich, and V. A. Ukhov. "Influence of bias voltage on composition and tribological properties Ti-Cr-N coatings formed by ion-plasma deposition." Thesis, Видавництво СумДУ, 2011. http://essuir.sumdu.edu.ua/handle/123456789/20772.

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Ti-Cr-N coatings were formed on St3 steel by cathodic arc vapor deposition while combining titanium or chromium plasma flows in a residual nitrogen atmosphere. Elemental and phase composition of the coatings were studied using Auger electron spectroscopy (AES) and X-ray diffraction (XRD). Coatings are solid solution on the basis of chromium and titanium mononitrides. It is found that an increase in bias voltage leads to relative rise of titanium concentration and to decrease of chromium concentration. With the values of bias voltage less than 120 V coatings grow with (200) preferred orientati
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Books on the topic "Ion-plasma deposition"

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André, Anders, ed. Handbook of plasma immersion ion implantation and deposition. Wiley, 2000.

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Prani͡avichi͡us, L. Coating technology : ion beam deposition. Satas & Associates, 1993.

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Robert, Moran. Thin layer deposition: Highlighting implantation and epitaxy, plasma, thermal, and ion. Business Communications Co., 1996.

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Symposium C on Ion Beam, Plasma, Laser, and Thermally-Stimulated Deposition Processes (1993 Strasbourg, France). Stimulated deposition processes and materials aspects of ion beam synthesis: Proceedings of Symposium C on Ion Beam, Plasma, Laser, and Thermally-Stimulated Deposition Processes and Symposium G on Materials Aspects of Ion Beam Synthesis: Phase Formation and Modification of the 1993 E-MRS Spring Conference, Strasbourg, France, May 4-7, 1993. North-Holland, 1994.

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United States. National Aeronautics and Space Administration., ed. Plasma-assisted physical vapor deposition surface treatments for tribological control. National Aeronautics and Space Administration, 1990.

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United States. National Aeronautics and Space Administration., ed. Plasma-assisted physical vapor deposition surface treatments for tribological control. National Aeronautics and Space Administration, 1990.

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United States. National Aeronautics and Space Administration., ed. Plasma-assisted physical vapor deposition surface treatments for tribological control. National Aeronautics and Space Administration, 1990.

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Anders, André. Handbook of Plasma Immersion Ion Implantation and Deposition. Wiley-Interscience, 2000.

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Freller, H. Stimulated Deposition Processes and Materials Aspects of Ion Beam Synthesis: Proceedings of Symposium C on Ion Beam, Plasma, Laser, and Thermally-St (European ... Research Society Symposia Proceedings). North-Holland, 1994.

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Segal, David. The Preparation of Materials. Oxford University Press, 2017. http://dx.doi.org/10.1093/oso/9780198804079.003.0008.

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Chapter 8 covers aspects of materials preparation. It stresses that the availability of high-purity silicon was essential for the semiconductor industry as were high-purity thin films. Availability of critical materials is mentioned. Specific techniques that are mentioned include the polymerase chain reaction, ion implantation, chemical vapour deposition, plasma spraying and sol-gel processing. Polymer synthesis is also described.
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Book chapters on the topic "Ion-plasma deposition"

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Lee, Jung H., Dong S. Kim, and Young H. Lee. "Deposition of Plasma-Polymerized Styrene under Ion Bombardment." In ACS Symposium Series. American Chemical Society, 1996. http://dx.doi.org/10.1021/bk-1996-0620.ch012.

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Mladenov, G., K. Vutova, G. Djanovski, E. Koleva, V. Vassileva, and D. Mollov. "Electron Beam Deposition of High Temperature Superconducting Thin Films." In Emerging Applications of Vacuum-Arc-Produced Plasma, Ion and Electron Beams. Springer Netherlands, 2002. http://dx.doi.org/10.1007/978-94-010-0277-6_15.

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Rigsbee, J. M. "Plasma- and Ion-Beam Assisted Physical Vapor Deposition: Processes and Materials." In Structure-Property Relationships in Surface-Modified Ceramics. Springer Netherlands, 1989. http://dx.doi.org/10.1007/978-94-009-0983-0_27.

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Demchyshyn, A. V., Yu A. Kurapov, V. A. Michenko, Ye G. Kostin, A. A. Goncharov, and Ye G. Ternovoi. "Linear Vacuum ARC Evaporators for Deposition of Functional Multi-Purpose Coatings." In Emerging Applications of Vacuum-Arc-Produced Plasma, Ion and Electron Beams. Springer Netherlands, 2002. http://dx.doi.org/10.1007/978-94-010-0277-6_13.

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Bilek, M. M. M., D. R. McKenzie, T. W. H. Oates, J. Pigott, P. Denniss, and J. Vlcek. "Deposition of Nanoscale Multilayered Structures Using Filtered Cathodic Vacuum Arc Plasma Beams." In Emerging Applications of Vacuum-Arc-Produced Plasma, Ion and Electron Beams. Springer Netherlands, 2002. http://dx.doi.org/10.1007/978-94-010-0277-6_16.

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Kirkopulo, Kateryna, Volodymyr Tonkonogyi, Vladimir Litvinov, Alla Toropenko, and Predrag Dasic. "Design of an Operator Interface for Controlling the Installation of Ion-Plasma Deposition." In Advanced Manufacturing Processes V. Springer Nature Switzerland, 2023. http://dx.doi.org/10.1007/978-3-031-42778-7_4.

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Kharchenko, Vasyl O., and Alina V. Dvornichenko. "Modeling Self-organization of Adsorbate at Chemical Vapor Deposition in Accumulative Ion Plasma Devices." In Springer Proceedings in Physics. Springer International Publishing, 2020. http://dx.doi.org/10.1007/978-3-030-52268-1_8.

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Pakpum, C., N. Pasaja, P. Suanpoot, et al. "Diamond-Like Carbon Formed by Plasma Immersion Ion Implantation and Deposition Technique on 304 Stainless Steel." In Solid State Phenomena. Trans Tech Publications Ltd., 2005. http://dx.doi.org/10.4028/3-908451-12-4.129.

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Uzumaki, E. T., C. S. Lambert, W. D. Belangero, and Cecília A. C. Zavaglia. "Biocompatibility of Titanium Based Implants with Diamond-Like Carbon Coatings Produced by Plasma Immersion Ion Implantation and Deposition." In Bioceramics 20. Trans Tech Publications Ltd., 2007. http://dx.doi.org/10.4028/0-87849-457-x.677.

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Liu, Hongxi, Rong Zhou, Yehua Jiang, and Baoyin Tang. "Friction and Wear Behaviors and Rolling Contact Fatigue Life of TiN Film on Bearing Steel by Plasma Immersion Ion Implantation and Deposition Technique." In Advanced Tribology. Springer Berlin Heidelberg, 2009. http://dx.doi.org/10.1007/978-3-642-03653-8_241.

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Conference papers on the topic "Ion-plasma deposition"

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Wei, Ronghua, Marta A. Jakab, Kent Coulter, and A. M. Abd El-Rahman. "Plasma Surface Engineering of Materials for Corrosion Protection." In CORROSION 2010. NACE International, 2010. https://doi.org/10.5006/c2010-10261.

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Abstract The surface of a component is very critical to maintain the proper functions when it is directly exposed to a very harsh environment. Various commercial treatments are available to enhance the surface properties including heat treatment and painting. For over a half of a century, plasmas have been studied for enhancing the surface properties of materials, and in some areas plasma surface engineering is applied to industrial components. In this paper, we will discuss the latest research in this area and various technologies with the emphasis on materials corrosion protection. SwRI has
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“Swami” Swaminathan, V. P., Ronghua Wei, and David W. Gandy. "Nano-Structured Erosion Resistant Coatings for Gas and Steam Turbines." In AM-EPRI 2007, edited by R. Viswanathan, D. Gandy, and K. Coleman. ASM International, 2007. https://doi.org/10.31399/asm.cp.am-epri-2007p0447.

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Abstract Erosion from solid and liquid particles in gas turbine and steam turbine compressors degrades efficiency, increasing downtime and operating costs. Conventional erosion-resistant coatings have temperature and durability limitations. Under an Electric Power Research Institute (EPRI) project, ultra-hard nano-coatings (~40 microns thick) were developed using Plasma Enhanced Magnetron Sputtering (PEMS). In Phase I, various coatings—including TiSiCN nanocomposites, stellite variants, TiN monolayers, and multi-layered Ti-TiN and Ti-TiSiCN—were deposited on turbine alloys (Ti-6Al-4V, 17-4 PH,
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Taylor, T. James, and Peter Elliott. "Aspects of Vanadic Corrosion on Silicon-Coated Nickel Chromium Alloys." In CORROSION 1987. NACE International, 1987. https://doi.org/10.5006/c1987-87476.

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Abstract This paper considers material performance in contact with molten vanadium-rich deposits after exposure at 900 C (1650 F) in flowing oxygen for periods typically of 100 hours. Small test coupons were contacted with a 80-20% mixture of vanadium pentoxide and sodium sulfate as corrodant. Silicon coatings were applied to Ni 20Cr, Ni 50Cr, NIMONIC 115 (Ni 15Co 15Cr 5Al 3.9Ti 3.5Mo) and IN 939 (Ni 19Co 22.5Cr 3.7Ti 2W 1.9Al 1.4Ta 1Nb). The major tests were done with Ni 20Cr. Performance was compared with uncoated alloys. Coatings were applied by pack, vapor deposition, plasma spraying and i
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Hagedorn, H., M. Klosch, H. Reus, and A. Zoeller. "Plasma ion-assisted deposition with radio frequency powered plasma sources." In Optical Systems Design, edited by Norbert Kaiser, Michel Lequime, and H. Angus Macleod. SPIE, 2008. http://dx.doi.org/10.1117/12.797818.

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Zoeller, Alfons, Rainer Goetzelmann, and K. Matl. "Plasma-ion-assisted deposition: investigation of film stress." In Optical Instrumentation & Systems Design. SPIE, 1996. http://dx.doi.org/10.1117/12.246816.

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Goetzelmann, Rainer, Harro Hagedorn, and Alfons Zoeller. "UV coatings produced with plasma-ion-assisted deposition." In Optical Systems Design and Production, edited by Claude Amra and H. Angus Macleod. SPIE, 1999. http://dx.doi.org/10.1117/12.360126.

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Kostryukov, D. A. "Ion-plasma deposition of protective coatings and thin films." In Наука, технологии и техника. Профессиональная наука, 2022. http://dx.doi.org/10.54092/9781471638893_21.

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Pulker, H. K., M. Buhler, R. Hora, and K. H. Guenther. "Reactive ion plating deposition for sui generis optical coatings." In OSA Annual Meeting. Optica Publishing Group, 1987. http://dx.doi.org/10.1364/oam.1987.ths2.

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Edge filter double-halfwave narrowband transmission filters and broadband antireflection coatings have been deposited employing a reactive ion plating process. Reactive ion plating is distinctly different from other ion-assisted deposition techniques in that a high-current low-voltage plasma arc burns into the vapor source rather than a low-current medium-to-high energy ion beam irradiating the substrate and growing film surface. The vapor sources are melts of metals or suboxides produced by a modified standard electron-beam gun. The optical substrates when coated by reactive ion plating are i
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Woo, Seouk Hoon, Chang Kwon Hwangbo, Young Bae Son, Il Choon Moon, and Geon Mo Kang. "Plasma ion-assisted deposition of TiO_2 and MgF_2 thin films." In Optical Interference Coatings. OSA, 2004. http://dx.doi.org/10.1364/oic.2004.mb8.

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Schulz, Ulrike, Peter Munzert, and Norbert Kaiser. "Plasma-ion assisted deposition of optical coatings on thermoplastics polymers." In Optical Interference Coatings. OSA, 2004. http://dx.doi.org/10.1364/oic.2004.wa1.

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Reports on the topic "Ion-plasma deposition"

1

Stefan, Ionel. High Throughput Source-less Plasma Deposition of Structured Silicon Anodes for Lithium-Ion Batteries. Office of Scientific and Technical Information (OSTI), 2024. http://dx.doi.org/10.2172/2377454.

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