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Books on the topic 'Photomath'

Author: Grafiati
Published: 2 June 2025
Last updated: 31 July 2025

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1

Michel, Rouleau, ed. Photomaton: Roman. Éditions P. Tisseyre, 2007.

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2

1976-, Taschereau Marie-Stéfanie, ed. Collection Photomaton: Série Flash. Flic flac, 2011.

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3

Musée de l'Elysée (Lausanne, Switzerland), Centre culturel de la communauté française Wallonie-Bruxelles-Le Botanique. Musée, and Kunst Haus Wien, eds. Derrière le rideau: L'esthétique photomaton. Musée de l'Élysée, 2012.

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4

1819-1889, Disdéri André-Adolphe-Eugène, Frizot Michel, and Centre national de la photographie (France), eds. Identités: De Disdéri au photomaton. Centre national de la photographie, 1985.

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5

Muzzarelli, Federica. Formato tessera: Storia, arte e idee in photomatic. B. Mondadori, 2003.

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6

Helder, Herberto. Photomaton & vox ; Flash ; El cap entre les mans. Gregal Llibres, 1988.

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7

Poland) Miesiąc Fotografii w Krakowie (Exhibition) (12th 2014 Kraków. Miesiąc Fotografii w Krakowie 2014: Krakow Photomonth Festival 2014. Fundacja Sztuk Wizualnych, 2014.

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8

Yōichi, Takehana, and Hōga Morihisa, eds. Fotomasuku: Denshi buhin seizō no kikan gijutsu = Photomask technology. Tōkyō Denki Daigaku Shuppankyoku, 2011.

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9

Poland) Miesiąc Fotografii w Krakowie (Exhibition) (2013 Kraków. Miesiąc Fotografii w Krakowie 2013: Krakow Photomonth Festival 2013. Fundacja Sztuk Wizualnych, 2013.

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10

Naber, Robert J., and Hiroichi Kawahira. Photomask technology 2007: 18-21 September, 2007, Monterey, California, USA. SPIE, 2007.

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11

Symposium, on Photomask Technology (26th 2006 Monterey Calif ). Photomask technology 2006: 19-22 September, 2006, Monterey, California, USA. SPIE, 2005.

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12

J, Evans C., and National Institute of Standards and Technology (U.S.), eds. Interferometric metrology of photomask blanks: Approaches using 633 nm wavelength. U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology, 2000.

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13

M, Martin Patrick, Naber Robert J, BACUS (Technical group), and Society of Photo-optical Instrumentation Engineers., eds. Photomask technology 2006: 19-22 September, 2006, Monterey, California, USA. SPIE, 2006.

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14

Symposium on Photomask Technology (28th 2008 Monterey, Calif.). Photomask technology 2008: 7-10 October 2008, Monterey, California, USA. Edited by Kawahira Hiroichi, Zurbrick Larry S, BACUS (Technical group), and SPIE (Society). SPIE, 2008.

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15

Maurer, Wilhelm, and M. Warren Montgomery. Photomask technology 2010: 13-16 September 2010, Monterey, California, United States. Society of Photo-optical Instrumentation Engineers, 2010.

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16

Symposium, on Photomask Technology (29th 2009 Monterey Calif ). Photomask technology 2009: 14-17 September 2009, Monterey, California, United States. SPIE, 2009.

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17

Maurer, Wilhelm, and Frank E. Abboud. Photomask technology 2011: 19-22 September 2011, Monterey, California, United States. Edited by BACUS (Technical group) and SPIE (Society). SPIE, 2011.

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18

Konishi, Toshio. Photomask and next-generation lithography mask technology XVIII: 13-15 April 2011. SPIE, 2011.

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19

E, Abboud Frank, Grenon Brian J, BACUS (Technical group), and Society of Photo-optical Instrumentation Engineers., eds. 19th Annual Symposium on Photomask Technology: 15-17 September 1999, Monterey, California. SPIE, 1999.

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20

Hideo, Yoshihara, Society of Photo-optical Instrumentation Engineers. Japan Chapter., and BACUS (Technical group), eds. Photomask and X-ray mask technology: 22 April 1994, Kawasaki City, Kanagawa, Japan. SPIE, 1994.

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21

Naoaki, Aizaki, Photomask Japan, BACUS (Technical group), and Society of Photo-optical Instrumentation Engineers., eds. Photomask and X-ray mask technology V: 9-10 April, 1998, Kawasaki, Japan. SPIE, 1998.

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22

Naoaki, Aizaki, Photomask Japan, BACUS (Technical group), Ōyō Butsuri Gakkai, and Society of Photo-optical Instrumentation Engineers. Japan Chapter., eds. Photomask and X-ray mask technology IV: 17-18 April, 1997, Kawasaki, Japan. SPIE, 1997.

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23

Hiraoki, Morimoto, Photomask Japan, BACUS (Technical group), and Ōyō Butsuri Gakkai, eds. Photomask and X-ray mask technology VI: 13-14 April, 1999, Yokohama, Japan. SPIE, 1999.

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24

group), BACUS (Technical, ed. 11th annual Symposium on Photomask Technology: Proceedings : September 25-27, 1991, Sunnyvale, California. SPIE--the International Society for Optical Engineering, 1992.

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25

Hosono, Kunihiro. Photomask and next-generation lithography mask technology XVII: 13-15 April 2010, Yokohama, Japan. SPIE, 2010.

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26

Hiroichi, Kawahira, Photomask Japan, BACUS (Technical group), Ōyō Butsuri Gakkai, Semiconductor Equipment and Materials International (Japan), and Society of Photo-optical Instrumentation Engineers., eds. Photomask and next-generation lithography mask technology IX: 23-25 April, 2002, Yokohama, Japan. SPIE, 2002.

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27

Hosono, Kunihiro. Photomask and next-generation lithography mask technology XVI: 8-10 April 2009, Yokohama, Japan. Edited by Photomask Japan, BACUS (Technical group), and SPIE (Society). SPIE, 2009.

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28

Hosono, Kunihiro. Photomask and next-generation lithography mask technology XVII: 13-15 April 2010, Yokohama, Japan. Edited by SPIE (Society) and Photomask Japan. SPIE, 2010.

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29

Hidehiro, Watanabe, Photomask Japan, BACUS (Technical group), and Society of Photo-optical Instrumentation Engineers., eds. Photomask and next-generation lithography mask technology XIV: 17-19 April 2007, Yokohama, Japan. SPIE, 2007.

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30

Morihisa, Hoga, Photomask Japan, BACUS (Technical group), Ōyō Butsuri Gakkai, and Society of Photo-optical Instrumentation Engineers., eds. Photomask and next-generation lithography mask technology XIII: 18-20 April, 2006, Yokohama, Japan. SPIE, 2006.

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31

Wolfgang, Staud, Weed J. Tracy, BACUS (Technical group), and Society of Photo-optical Instrumentation Engineers., eds. 24th Annual BACUS Symposium on Photomask Technology: 14-17 September, 2004, Monterey, California, USA. SPIE, 2004.

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32

Hiroichi, Kawahira, Photomask Japan, BACUS (Technical group), Ōyō Butsuri Gakkai, and Society of Photo-optical Instrumentation Engineers., eds. Photomask and next-generation lithography mask technology VIII: 25-27 April 2001, Yokohama, Japan. SPIE, 2001.

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33

Hiroyoshi, Tanabe, Photomask Japan, BACUS (Technical group), Ōyō Butsuri Gakkai, Semiconductor Equipment and Materials International (Japan), and Society of Photo-optical Instrumentation Engineers., eds. Photomask and next-generation lithography mask technology X: 16-18 April, 2003, Yokohama, Japan. SPIE, 2003.

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34

Hiraoki, Morimoto, Photomask Japan, BACUS (Technical group), et al., eds. Photomask and next-generation lithography mask technology VII: 12-13 April 2000, Yokohama, Japan. SPIE, 2000.

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35

J, Grenon Brian, Dao Giang T, BACUS (Technical group), and Society of Photo-optical Instrumentation Engineers., eds. 20th Annual BACUS Symposium on Photomask Technology: 13-15 September, 2000, Monterey, [California] USA. SPIE, 2001.

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36

J, Grenon Brian, Kimmel Kurt R, BACUS (Technical group), and Society of Photo-optical Instrumentation Engineers., eds. 22nd Annual BACUS Symposium on Photomask Technology: 1-4 October, 2002, Monterey, California, USA. SPIE, 2002.

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37

T, Dao Giang, Grenon Brian J, BACUS (Technical group), and Society of Photo-optical Instrumentation Engineers., eds. 21st Annual BACUS Symposium on Photomask Technology: 3-5 October 2001, Monterey, [California] USA. SPIE, 2002.

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38

Rudolf, Kimmel Kurt, Staud Wolfgang, BACUS (Technical group), and Society of Photo-optical Instrumentation Engineers., eds. 23rd Annual BACUS Symposium on Photomask Technology: 9-12 September, 2003, Monterey, California, USA. SPIE, 2003.

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39

Japan, Photomask, BACUS (Technical group), Institute of Electrical and Electronics Engineers. Japan Section., Semiconductor Equipment and Materials International (Japan), and Society of Photo-optical Instrumentation Engineers., eds. Photomask and next-generation lithography mask technology XI: 14-16 April, 2004, Yokohama, Japan. SPIE, 2004.

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40

Symposium on Photomask Technology and Management (15th 1995 Santa Clara, Calif.). 15th Annual Symposium on Photomask Technology and Management: 20-22 September 1995, Santa Clara, California. Edited by Shelden Gilbert V and Wiley James N. SPIE, 1996.

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41

Hideo, Yoshihara, Photomask Japan, BACUS (Technical group), and Society of Photo-optical Instrumentation Engineers. Japan Chapter., eds. Photomask and X-ray mask technology III: 18-19 April, 1996, Kawasaki City, Kanagawa, Japan. SPIE, 1996.

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42

group), BACUS (Technical, ed. 12th Annual Symposium on Photomask Technology and Management: Proceedings : 23-24 September 1992, Sunnyvale, California. SPIE--the International Society for Optical Engineering, 1992.

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43

Hideo, Yoshihara, Photomask Japan, BACUS (Technical group), and Society of Photo-optical Instrumentation Engineers., eds. Photomask and X-ray mask technology II: 20-21 April 1995, Kawasaki City, Kanagawa, Japan. SPIE, 1995.

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44

1930-, Reynolds James A., Grenon Brian J, BACUS (Technical group), and Society of Photo-optical Instrumentation Engineers., eds. 17th Annual Symposium on Photomask Technology and Management: [proceedings] : 17-19 September, 1997, Redwood City, California. SPIE, 1998.

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45

J, Grenon Brian, Abboud Frank E, BACUS (Technical group), and Society of Photo-optical Instrumentation Engineers., eds. 18th Annual Symposium on Photomask Technology and Management: [proceedings] : 16-18 September, 1998, Redwood City, California. SPIE, 1998.

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46

group), BACUS (Technical, ed. 13th Annual Symposium on Photomask Technology and Management: Proceedings : 22-23 September 1993, Santa Clara, California. SPIE--the International Society for Optical Engineering, 1994.

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47

L, Brodsky William, Shelden Gilbert V, and BACUS (Technical group), eds. 14th annual Symposium on Photomask Technology and Management: Proceedings : 14-16 September 1994, Santa Clara, California. SPIE, 1994.

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48

United States. National Aeronautics and Space Administration., ed. Geological-morphological description of the Lakshmi planum (photomap of the Venusian surface sheet B-4). National Aeronautics and Space Administration, 1987.

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49

Pronin, Anatoliĭ Andreevich. Geological-morphological description of the Lakshmi planum (photomap of the Venusian surface sheet B-4). National Aeronautics and Space Administration, 1987.

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50

Pronin, Anatoliĭ Andreevich. Geological-morphological description of the Lakshmi planum (photomap of the Venusian surface sheet B-4). National Aeronautics and Space Administration, 1987.

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