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Dissertations / Theses on the topic 'Photomath'

Author: Grafiati

Published: 2 June 2025

Last updated: 31 July 2025

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1

McCallum, Martin. "Advanced photomask characterisation for microlithography." Thesis, University of Edinburgh, 2006. http://hdl.handle.net/1842/15319.

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This thesis addresses the characterisation of these advanced photomasks. There are many techniques published that produce advanced masks, but this work deals with two of the primary ones, advanced binary masks and alternating phase shift masks (altPSM). The work covered studies the methods of extracting the three dimensional structure of these masks and uses simulation to show what effect this has upon the waves propagating through them. The thesis deals with the way in which mask inspection systems image masks and the differences inherent between the way they observe defects and the way that

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2

Zanelli, Claudio, Dushyanth Giridhar, Manish Keswani, Nagaya Okada, Jyhwei Hsu, and Petrie Yam. "Acoustic characterization of two megasonic devices for photomask cleaning." SPIE-INT SOC OPTICAL ENGINEERING, 2016. http://hdl.handle.net/10150/622537.

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Wet photomask cleaning relies on megasonic agitation to enhance the process, but there are many challenges to reliably maximize particle removal efficiency (PRE) and minimize damage. With the shift to pellicle-free EUV masks, photomask processes are more vulnerable to contamination, increasing the urgency to improve the cleaning process. This difficulty is largely due to the unavailability of appropriate measurement of the acoustic field. Typically all that is known about the acoustic output is the driving frequency and the electric power delivered to a transducer, both global parameters that

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3

Kelley, Maureen. "Route Descriptions Using Maps, Photomaps, and Imagery: An Experimental Analysis." Thesis, University of Oregon, 2013. http://hdl.handle.net/1794/12999.

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Previous route description experiments conducted by psychologists show there are differences between males and females in the use of landmarks when describing routes. Previous research has shown that females used landmarks and egocentric forms of turn descriptors more often than males for route descriptions. This method is known as route knowledge in the spatial knowledge literature. Males, conversely, were seen to use fewer landmarks and more cardinal direction descriptions and standard distances when describing routes. Spatial knowledge literature terms this method survey knowledge. The

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4

Khoperia, T. N., and T. I. Zedginidze. "Competitive Nanotechnologies for Fabrication of Thin Films and Powderlike Nanomaterials." Thesis, Sumy State University, 2012. http://essuir.sumdu.edu.ua/handle/123456789/34812.

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The present paper contains new data on the nanotechnologies for fabrication of fine-grained powderlike particles, films, bulk materials, nanocomposites, nanochips and devices for microelectronics, nanoelectronics, photonics and photocatalysis. The technology providing the replacement of precious metals by nonprecious ones and the exclusion of the use of toxic substances is presented. The developed methods of metallization of various materials have been widely used at the enterprises of the NIS for production of quartz resonators and filters, monolithic piezoquartz filters, photomasks, pie

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5

Pieuchard, Marion. "La photographie et l'automatisme : histoire d'une utopie du Photomaton au procédé Polaroïd." Thesis, Paris 1, 2013. http://www.theses.fr/2013PA010746.

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La présence de productions photographiques issues d'appareils et de dispositifs populaires dans le domaine culturel, artistique et patrimonial se mesure aujourd'hui aux succès d'édition et d'exposition consacrées au photomaton, à la photographie trouvée et plus généralement aux amateurs, où l'on rencontre nombre de "Polaroïds" ou de "Photomatons". Il existe un goût pour ce "vintage" vernaculaire, en raison de la disparition ou bien de la profonde modification qui touche ces dispositifs avec le fameux passage au numérique. En se retournant sur l'histoire de ces machines, c'est bon seulement leu

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6

Palmer, Carl M. "A calibration study of a still video system and photomatic color separation program /." Online version of thesis, 1989. http://hdl.handle.net/1850/11538.

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7

Ribeiro, Cíntia França. "Crime de mão própria: o rastro autobiográfico em Photomaton & vox, de Herberto Helder." Universidade Federal de Minas Gerais, 2013. http://hdl.handle.net/1843/ECAP-94LKUH.

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The image of autobiographical crime in Photomaton & vox, by Portuguese poet Herberto Helder, calls for an approach involving a range of discourses, from literary theory to philosophy, including history and law. Through such an approach, this study aims to describe how it is that, within Helders work, an extremely singular poetic voice emerges, playing with features of the autobiographical genre. However, as deviating from the main theoretical frameworks traditionally concerning autobiography, the investigation pursues the connection between Giorgio Agambens philosophy and Helders literature, f

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8

Tsiamis, Andreas. "Electrical test structures and measurement techniques for the characterisation of advanced photomasks." Thesis, University of Edinburgh, 2010. http://hdl.handle.net/1842/4296.

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Existing photomask metrology is struggling to keep pace with the rapid reduction of IC dimensions as traditional measurement techniques are being stretched to their limits. This thesis examines the use of on-mask probable electrical test structures and measurement techniques to meet this challenge and to accurately characterise the imaging capabilities of advanced binary and phase-shifting chrome-on-quartz photomasks. On-mask, electrical and optical linewidth measurement techniques have highlighted that the use of more than one measurement method, complementing each other, can prove valuable w

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9

Sung, Jin Won. "A NEW HYBRID DIFFRACTIVE PHOTO-MASK TECHNOLOGY." Doctoral diss., University of Central Florida, 2005. http://digital.library.ucf.edu/cdm/ref/collection/ETD/id/2391.

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In the field of photolithography for micro-chip manufacturing, the photo-mask is used to print desired patterns on a proper photo-resist on wafer. The most common type of photo-mask is binary amplitude mask made an opaque layer of chrome. The principle and potential application of hybrid photo-mask with diffractive phase element and binary amplitude is presented in this dissertation paper from both numerical modeling and experimental research. The first important application is the characterization of aberration in the stepper system using hybrid diffractive photo-mask. By utilizing multiple d

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10

Patterson, Patrick Branch. "Creation of a Mechanical Gradient Peg-Collagen Scaffold by Photomasking Techniques." University of Akron / OhioLINK, 2013. http://rave.ohiolink.edu/etdc/view?acc_num=akron1384720879.

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11

Rathsack, Benjamen Michael. "Photoresist modeling for 365 nm and 257 nm laser photomask lithography and multi-analyte biosensors indexed through shape recognition." Access restricted to users with UT Austin EID, 2001. http://wwwlib.umi.com/cr/utexas/fullcit?p3035170.

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12

Guo, Yubing. "HIGH RESOLUTION AND HIGH THROUGHPUT PHOTOPATTERNING OF MOLECULAR ORIENTATIONS BY USING PLASMONIC METAMASKS." Kent State University / OhioLINK, 2017. http://rave.ohiolink.edu/etdc/view?acc_num=kent1505510348651872.

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13

Jeon, Ie-Rang. "Organisation par chimie de coordination de mol��cules-aimants : vers une nouvelle g��n��ration de mat��riaux magn��tiques et photomagn��tiques." Phd thesis, Universit�� Sciences et Technologies - Bordeaux I, 2012. http://tel.archives-ouvertes.fr/tel-00763331.

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Depuis leur d��couverte dans les ann��es 90, les mol��cules-aimants constituent une classe de mat��riaux magn��tiques qui a attir�� l'attention du fait de leur bistabilit�� magn��tique. Ces syst��mes donnent l'espoir formidable de pouvoir stocker un bit d'information �� l'��chelle mol��culaire. Ainsi, leur organisation dans des r��seaux est devenue un enjeu essentiel en vue de leur int��gration dans des dispositifs. Lors de cette th��se, l'organisation contr��l��e de ces mol��cules par chimie de coordination en utilisant diff��rents connecteurs s'est r��v��l��e ��tre une strat��gie de choix. L

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14

Kempe, Marcus, and Carl Åbjörnsson. "Navigation, Visualisation and Editing of Very Large 2D Graphics Scenes." Thesis, Linköping University, Department of Science and Technology, 2004. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-2684.

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<p>The project has been carried out at, and in association with, Micronic Laser Systems AB in Täby, Sweden. Micronic Laser Systems, manufacture laser pattern generators for the semiconductor and display markets. Laser pattern generators are used to create photomasks, which are a key component in the microlithographic process of manufacturing microchips and displays. </p><p>An essential problem to all modern semiconductor manufacturing is the constantly decreasing sizes of features and increasing use of resolution enhancement techniques (RET), leading to ever growing sizes of datasets describin

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15

Ekberg, Lars Peter. "Development of ultra-precision tools for metrology and lithography of large area photomasks and high definition displays." Doctoral thesis, KTH, Mätteknik och optik, 2013. http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-122264.

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Large area flat displays are nowadays considered being a commodity. After the era of bulky CRT TV technology, LCD and OLED have taken over as the most prevalent technologies for high quality image display devices. An important factor underlying the success of these technologies has been the development of high performance photomask writers in combination with a precise photomask process. Photomask manufacturing can be regarded as an art, highly dependent on qualified and skilled workers in a few companies located in Asia. The manufacturing yield in the photomask process depends to a great exte

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16

Ngoi, Kok Ann Bryan, K. Venkatakrishnan, P. Stanley, and L. E. N. Lim. "Femtosecond Pulsed Laser Direct Writing System for Photomask Fabrication." 2002. http://hdl.handle.net/1721.1/4029.

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Photomasks are the backbone of microfabrication industries. Currently they are fabricated by lithographic process, which is very expensive and time consuming since it is a several step process. These issues can be addressed by fabricating photomask by direct femtosecond laser writing, which is a single step process and comparatively cheaper and faster than lithography. In this paper we discuss about our investigations on the effect of two types of laser writing techniques, namely, front and rear side laser writing with regard to the feature size and the edge quality of the feature. It is prove

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17

蕭國基. "Performance evaluation of Taiwan's photomask suppliers in semiconductor industry." Thesis, 2008. http://ndltd.ncl.edu.tw/handle/98574069930283967825.

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18

Wei, Alexander C. "Localized resist heating due to electron-beam patterning during photomask fabrication." 2001. http://catalog.hathitrust.org/api/volumes/oclc/50083538.html.

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Thesis (M.S.)--University of Wisconsin--Madison, 2001.<br>Typescript. eContent provider-neutral record in process. Description based on print version record. Includes bibliographical references (leaves 59-61).

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19

LI, CHUAN-TENG, and 黎傳騰. "Economic Efficiency of Real-time Information Management-A Case Study of Photomask Corp." Thesis, 2010. http://ndltd.ncl.edu.tw/handle/66019543382261913494.

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碩士<br>逢甲大學<br>經營管理碩士在職專班<br>98<br>Real-time production information inquiry system is created that has combined the system with concepts as flow automation, enterprise application integration, and collaboration, using the flow process of each station as its center, not to mention its surveillance and prediction capability. As such, it has not only simplified manpower and time, but also enterprise competitiveness. The inquiry system has, on one had, resolve countless information problems of enterprise, it has, on the other hand, helped user to casually discovered the hub of problem. Most of all,

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20

Hao, Su Jun, and 蘇俊豪. "Optimizing parameters of Photomask Rapid Prototyping by using Taguchi method and Grey relational analysis." Thesis, 2009. http://ndltd.ncl.edu.tw/handle/37800980057219122254.

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碩士<br>國立臺灣科技大學<br>自動化及控制研究所<br>97<br>In the past, Rapid Prototyping focused on improvement of single quality characteristics, but different quality characteristics were always estimated in the process, the group of optimal parameters are usually determined by the engineering judgment, but it is not a objective method from the experimental results. Therefore, many researchers use the multiple quality characteristics analysis in recent years. This study select three quality characteristics (dimension accuracy, surface roughness, and making time) to estimate. We use Taguchi method design the ort

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21

Lin, Wei-Li, and 林偉立. "A study on the recovery of electronic grade sulfuric acid from a TFT-LCD photomask process." Thesis, 2010. http://ndltd.ncl.edu.tw/handle/87769889785485508519.

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碩士<br>國立中興大學<br>環境工程學系所<br>98<br>For the global market share on thin film transistor-liquid crystal display（TFT-LCD）, Taiwan has become one of the leaders mainly due to the aggressive expansion of Chimei Innolux Corporation and AU Optronics Corporation in recent years. In 2008, Taiwan’s production volume surpassed South Korea and optoelectronic related chemical market has also grown up to 230 billion New Taiwan dollars. Thus, the quantity of wet chemical consumption is enormous and used chemicals are usually treated as wastes. If these spent chemical cannot be reused or recycled, they definite

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22

曾振瑞. "The Research on Status and Management Strategy for Photomask Industry- A Case Study of Taiwan Mask Corporation." Thesis, 2012. http://ndltd.ncl.edu.tw/handle/78143535604680680858.

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碩士<br>國立清華大學<br>高階經營管理碩士在職專班<br>100<br>This research is introducing the status and development of semiconductor in Taiwan first, and analyses mask industry. Taiwan Mask Corporation (TMC) is an example to describe competitive advantage and strategy. Mask is one of the most critical tools used during IC manufacturing process. After ordering, the tooling engineer first integrates customer’s data known as the pattern using CAD software, followed by e-beam or laser beam writer that prints the circuits onto the photoresist-covered mask blank. After the process of developing, etching and Stripping, t

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23

Tsai, Ching-Han, and 蔡靜涵. "The Research on Competitive Strategy of Photomask Industry A Case Study of Operations Strategy for Taiwan Mask Corporation." Thesis, 2012. http://ndltd.ncl.edu.tw/handle/74224840086215025664.

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碩士<br>中華大學<br>企業管理學系碩士在職專班<br>100<br>This research is introducing the status and development of semiconductor in Taiwan first, and analyses mask industry. Taiwan Mask Corporation (TMC) is an example to describe competitive advantage and strategy. This research reveals that the case study of competitive strategy of Taiwan Mask Company and other localized mask compnay as supplemented. the analysis methodoloy is by using Michael E. Porter's five forces analysis to explore the competitiveness of Taiwan Mask Company. The Key findings are that the mask manufacturer on the bargaining power of buyers,

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24

Wu, Dien-Chi, and 吳典錡. "A Study of Photomask Correction Method and Physical Properties of Photopolymer Nano-Composites for area-forming rapid prototyping." Thesis, 2008. http://ndltd.ncl.edu.tw/handle/56242412644089020630.

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博士<br>國立臺灣科技大學<br>高分子系<br>97<br>Rapid Prototyping (RP) is a layer by layer fabrication process that is capable of converting a 3-dimensional (3D) computer-Aided-Design (CAD) model into a physical object. There generally are solid, powdery and liquid materials available for RP. The main research issues of previously RP systems stem from the desire to improve the product feature, quality, cost and time to market. Some different researches, such as the more accurate representation of CAD models, the better manufactured materials or the improvement of manufacturing processes, etc., were presented

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25

Chuang, Yi-Fen, and 莊怡芬. "Study of bottom anti-reflection coated and Fabry-Perot type anti-reflection coated on photomask for vacuum ultraviolet lithography." Thesis, 2002. http://ndltd.ncl.edu.tw/handle/55648599084481806528.

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碩士<br>國立中央大學<br>光電科學研究所<br>90<br>There are two major parts in this thesis. One is to establish the anti-reflection coating technique for using in vacuum ultraviolet photomask . The other is to investigate the bottom anti-reflection coating. In the development of the anti-reflection coating technique for photomask applications, we demonstrated an anti-reflection coating structure for vacuum ultraviolet binary mask , which is based on three layers Fabry-Perot structure . The anti-reflection coating structure is composed of Chrome (Cr) / Oxide (SiO2) / Chrome (Cr) stack. After adding differe

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26

HSU, CHIEN-KUI, and 許兼貴. "Study of Anti-Reflective Coatings for Deep Ultraviolet Photomask and Photoresists for Sub-100 nm Generation Electron Beam Direct Writing Applications." Thesis, 2001. http://ndltd.ncl.edu.tw/handle/01628748885775596799.

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碩士<br>國立清華大學<br>原子科學系<br>89<br>There are two major parts in this thesis. One is establishing the anti-reflective coatings technique for using in deep ultraviolet photomask. The other is to investigate the behavior of DUV photoresists for applying in electron beam direct writing system. In the development of the anti-reflective coating techniques for photomask applications, we demonstrated a novel anti-reflective coating structure for deep ultraviolet binary mask, which is based on three-layer Fabry-Perot structure. The anti-reflective coating structure is composed of the chrome / ox

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27

SLÁDEK, Jan. "Geodetické práce pro tvorbu fotoplánu fasády budovy." Master's thesis, 2009. http://www.nusl.cz/ntk/nusl-46227.

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This work has been aimed at establishing a geodetic base for photo plans of building site objects or scenes and the application to ``Photogrammetry`` studies. It will be used in teaching of Land Adjustment and Real Trade Estate study programme at the Department of Land Adjustment, Faculty of Agriculture, the University of South Bohemia in České Budějovice. The work should result in establishing the geodetic base of a building frontage using terrestrial and GPS methods.

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