Relevant bibliographies by topics / Sputtering thin films

Contents

  1. Journal articles
  2. Dissertations / Theses
  3. Books
  4. Book chapters
  5. Conference papers
  6. Reports

Academic literature on the topic 'Sputtering thin films'

Author: Grafiati
Published: 3 June 2025
Last updated: 31 July 2025

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Journal articles on the topic "Sputtering thin films"

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Leong, Marcus Chiang Mun, Fabian Chiang Mun Chun, Jae Lee Kai Wei, et al. "Investigating the Thermoelectric and Structural Properties of Bismuth Telluride Thin Films for Harvesting Energy from Waste Heat." Solid State Phenomena 185 (February 2012): 77–80. http://dx.doi.org/10.4028/www.scientific.net/ssp.185.77.

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Recently, thermoelectric thin films have been gaining attention as potential thermoelectric generators that can be used to power external devices. Such films can recover electrical energy from waste heat and are environmentally friendly. Micro fabrication of thin films is achieved by sputtering on silicon films. In this study, the sputtering of Bismuth Telluride (N-type, P-type) films was investigated. Research has verified the efficiency of Bismuth Telluride films, but little is known about how the sputtering process affects the film's quality. Thus, the focus of this study explores how sputt
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Ji, Xiao Lin, Hai Dong Ju, Tao Yu Zou, et al. "Effects of Sputtering Pressure on Cu3N Thin Films by Reactive Radio Frequency Magnetron Sputtering." Advanced Materials Research 1105 (May 2015): 74–77. http://dx.doi.org/10.4028/www.scientific.net/amr.1105.74.

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Copper nitride thin films were prepared by reactive radio frequency magnetron sputtering at different sputtering pressures with fixed nitrogen to argon ratio. The influences of sputtering pressure on the structure, optical band gap, and surface morphology of films were investigated. The results show that the preferential orientation of polycrystalline Cu3N thin films changes from [111] to [100] when the sputtering pressure increases. Meanwhile, the optical band gap (Eg) of Cu3N thin films increases with the sputtering pressure. The surface morphology of Cu3N thin film deposited at high sputter
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Zi, Xing Fa, Rui Ming Liu, Qing Ye, and Xin Zhu Shu. "Structure and Optical Property of Cu2O:N Thin Film Deposited by Reactive Pulse Magnetron Sputtering." Advanced Materials Research 951 (May 2014): 104–8. http://dx.doi.org/10.4028/www.scientific.net/amr.951.104.

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N-doped Cu2O (Cu2O:N) thin films were deposited on glass substrate by reactive pulse magnetron sputtering method using Cu target. Crystalline phases of thin films were controlled by adjusting N2/ O2flow rate ratio and sputtering power precisely during the sputtering process, and the single phase of Cu2O(111) thin films were obtained at room temperature. The thin films deposited at different sputtering powers were characteristics of 2D growth and the root mean square (RMS) of surface roughness of thin films gradually increased with the increasing of sputtering power. The optical band gap (Eg) o
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Lu, Xiao Juan, and Duo Wang Fan. "Study of ITO Thin Film Deposited by RF Magnetron Sputter at Low Temperature." Advanced Materials Research 160-162 (November 2010): 1193–98. http://dx.doi.org/10.4028/www.scientific.net/amr.160-162.1193.

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ITO thin films used in PTCDA/Si detector should be made at low temperature for low temperature resistance of substrate. ITO thin films were deposited at low temperature by RF magnetron sputtering. Properties of ITO thin films such as conductivity and transmission measured by 4 point probe and UV spectral photometry respectively. The results show that the sputtering pressure is an important parameter in the deposition of indium tin oxide（ITO） thin films, which affects the properties of ITO films. The optimized parameter for preparation of ITO thin films at low temperature are sputtering pressur
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Jouan, Pierre Yves, Arnaud Tricoteaux, and Nicolas Horny. "Elaboration of nitride thin films by reactive sputtering." Rem: Revista Escola de Minas 59, no. 2 (2006): 225–32. http://dx.doi.org/10.1590/s0370-44672006000200013.

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The aim of this paper is first a better understanding of DC reactive magnetron sputtering and its implications, such as the hysteresis effect and the process instability. In a second part, this article is devoted to an example of specific application: Aluminium Nitride. AlN thin films have been deposited by reactive triode sputtering. We have studied the effect of the nitrogen contents in the discharge and the RF bias voltage on the growth of AlN films on Si(100) deposited by triode sputtering. Stoichiometry and crystal orientation of AlN films have been characterized by means of Fourier-trans
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Li, Ya Dan, Zhuang Hao Zheng, Ping Fan, Jing Ting Luo, Guang Xing Liang, and Bao Xiu Huang. "Thermoelectric Characterization of Ti and In Double-Doped Cobalt Antimony Thin Films." Materials Science Forum 847 (March 2016): 143–47. http://dx.doi.org/10.4028/www.scientific.net/msf.847.143.

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CoSb3 thermoelectric thin films were prepared on polyimide flexible substrate by radio frequency (RF) magnetron sputtering technology using a cobalt antimony alloy target. Ti and In were added into CoSb3 thin films by co-sputtering. The influence of Ti and In on the thermoelectric properties of CoSb3 thin films was investigated. X-ray diffraction result shows that the major diffraction peaks of all the thin films match the standard peaks related to the CoSb3 phase. The sample has best thermoelectric properties when the Ti sputtering time was 1min and In sputtering time was 30 seconds.
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Meng, Ling Ling, Xin Min Huang, and Qu Fu Wei. "Characteristics of Silver Films Deposited on the Surface of PET Fabric." Advanced Materials Research 239-242 (May 2011): 2356–60. http://dx.doi.org/10.4028/www.scientific.net/amr.239-242.2356.

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PET(polyester) plain woven fabric deposited with nano-structured silver thin film was prepared by RF (radio frequency) magnetron sputtering at room temperature. The effect of different sputtering technical parameters on the morphology and particle diameters of the nano-structured silver thin film was characterized by AFM(atomic force microscope)and the conductivities of silver thin films were also analyzed under different sputtering technical parameters. The results indicated that the nanoparticles size of sliver thin films increased with higher sputtering power, the conductivity of sliver thi
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Mihill, EG. "Thin films sputtering and evaporation." Vacuum 38, no. 8-10 (1988): 962. http://dx.doi.org/10.1016/0042-207x(88)90550-7.

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Birkholz, M., D. Lichtenberger, C. Höpfner, and S. Fiechter. "Sputtering of thin pyrite films." Solar Energy Materials and Solar Cells 27, no. 3 (1992): 243–51. http://dx.doi.org/10.1016/0927-0248(92)90086-5.

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Kim, Sara, Yong-Seok Lee, and Nam-Hoon Kim. "Homogeneity- and Stoichiometry-Induced Electrical and Optical Properties of Cu-Se Thin Films by RF Sputtering Power." Materials 16, no. 18 (2023): 6087. http://dx.doi.org/10.3390/ma16186087.

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P-type Cu-Se thin films were deposited on glass substrates at room temperature using radio frequency magnetron sputtering by a single multi-component CuSe2 target. When using a multi-component target, the impact of the sputtering power on the homogeneity and stoichiometry within the thin films should be investigated in the depth direction to demonstrate a secondary effect on the electrical and optical properties of the thin films. Systematic characterization of the Cu-Se thin films, including the morphology, microstructure, chemical composition, and depth-directional chemical bonding state and
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Dissertations / Theses on the topic "Sputtering thin films"

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Niu, Feng. "Functional nanocomposite thin-films by co-sputtering." Thesis, University of Oxford, 1998. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.390504.

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Han, Sanggil. "Cu2O thin films for p-type metal oxide thin film transistors." Thesis, University of Cambridge, 2018. https://www.repository.cam.ac.uk/handle/1810/285099.

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The rapid progress of n-type metal oxide thin film transistors (TFTs) has motivated research on p-type metal oxide TFTs in order to realise metal oxide-based CMOS circuits which enable low power consumption large-area electronics. Cuprous oxide (Cu2O) has previously been proposed as a suitable active layer for p-type metal oxide TFTs. The two most significant challenges for achieving good quality Cu2O TFTs are to overcome the low field-effect mobility and an unacceptably high off-state current that are a feature of devices that have been reported to date. This dissertation focuses on improving
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Strauß, Florian, Janek Binzen, Erwin Hüger, Paul Heitjans, and Harald Schmidt. "Thin LixSi Films Produced by Ion Beam Sputtering." Diffusion fundamentals 21 (2014) 11, S.1, 2014. https://ul.qucosa.de/id/qucosa%3A32405.

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Lin, Keng-Yu. "Thin films for thermoeletric applications." Thesis, Linköpings universitet, Tunnfilmsfysik, 2014. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-109106.

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Global warming and developments of alternative energy technologies have become important issues nowadays. Subsequently, the concept of energy harvesting is rising because of its ability of transferring waste energy into usable energy. Thermoelectric devices play a role in this field since there is tremendous waste heat existing in our lives, such as heat from engines, generators, stoves, computers, etc. Thermoelectric devices can extract the waste heat and turn them into electricity. Moreover, the reverse thermoelectric phenomenon has the function of cooling which can be applied to refrigerato
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Trinh, David Huy. "Nanocrystalline Alumina-Zirconia Thin Films Grown by Magnetron Sputtering." Doctoral thesis, Linköping : Department of Physics, Chemistry and Biology, Linköpings universitet, 2008. http://www.bibl.liu.se/liupubl/disp/disp2008/tek1153s.pdf.

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Shi, Xu. "Some properties of ultra thin metal films and multilayers." Thesis, University of Reading, 1990. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.279681.

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Bellingham, James Robert. "Studies of amorphous oxide films prepared by ion beam sputtering." Thesis, University of Cambridge, 1989. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.316684.

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Book, Martin. "Magnetron sputtering of highly transparent p-conductive NiO thin films." Thesis, Uppsala universitet, Solcellsteknik, 2020. http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-423322.

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P-type transparent conductors are needed for a wide range of applicationssuch as solar cells and electrochromic smart windows. Solar power is animportant form of energy in today’s society as the threat of global warmingpushes the world towards fossil free energy. Hence a lot of solar cell typeshave been developed, among them tandem cells which are to different typesof solar cells stacked on top of each other. If one of the cells is based ona perovskite, a transparent p-type thin film electrode is needed as a holeconductor and electron blocking layer between the two cells. Nickel oxide(NiO) is
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Lorenzzi, Jean Carlos da Conceição. "Boron nitride thin films deposited by magnetron sputtering on Si3N4." Master's thesis, Universidade de Aveiro, 2007. http://hdl.handle.net/10773/2307.

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Mestrado em Ciência e Engenharia de Materiais<br>O Nitreto de boro é um material polimorfo, sendo as fases hexagonal (h-BN) ecúbicas (c-BN) as predominantes. A fase hexagonal do nitreto de boro apresenta uma estrutura em camadas sp2, semelhante a grafite, enquanto que a fase cúbica do nitreto de boro tem forte ligações sp3, como o diamante. O h- BN apresenta boas propriedades dieléctricas, é um material refractário, resistente a corrosão, é conhecido por ser um lubrificante sólido que tem aplicações na protecção de moldes de injecção e em outros processos mecânicos de elevadas temperaturas ou
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Jones, Timothy Russell. "Manufacturing Gallium Doped ZnO Thin Films Suitable for Use in Thin Film Transistors Using Unbalanced Magnetron Sputtering." OpenSIUC, 2013. https://opensiuc.lib.siu.edu/theses/1117.

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Gallium doped zinc oxide (GZO) thin films were deposited onto Si (100) substrates. Depositions were performed at relatively low temperatures suitable for use in manufacturing thin films on plastic substrates. Substrates were thermally oxidized, and then thin films were deposited via radio frequency (RF) unbalanced magnetron sputtering. ZnO thin films were also sputtered in order to act as a seed layer for growing nanostructures by the hydrothermal method. Sputtering parameters evaluated independently include pressure, gas composition, power, temperature and the presence of an external magnetic
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Books on the topic "Sputtering thin films"

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Posadowski, Witold Michał. Niekonwencjonalne układy magnetronowe do próżniowego nanoszenia cienkich warstw. Oficyna Wydawnicza Politechniki Wrocławskiej, 2001.

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J, Mirtich Michael, Curren Arthur N, and United States. National Aeronautics and Space Administration., eds. Ion beam treatment of potential space materials at the NASA Lewis Research Center. National Aeronautics and Space Administration, 1991.

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Rittner, Mindy N. Sputtering targets and sputtered films: Technology and markets. Business Communications Co., 2002.

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Wasa, Kiyotaka. Thin film materials technology: Sputtering of compound materials. William Andrew Pub., 2004.

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Centre, Bhabha Atomic Research, ed. Development of a state-of-the-art R.F. sputtering coating system for the fabrication of multilayer x-ray mirrors. Bhabha Atomic Research Centre, 2000.

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Wasa, Kiyotaka. Handbook of sputter deposition technology: Principles, technology, and applications. Noyes Publications, 1992.

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Wolf, Andrew Robert. The electrochemistry of amorphous iron bismuth oxide thin films prepared by sputtering. National Library of Canada, 1992.

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National Renewable Energy Laboratory (U.S.) and IEEE Photovoltaic Specialists Conference (2011 : Austin, Taxas), eds. Optical properties of Zn(O,S) thin films deposited by RF sputtering atomic layer deposition, and chemcial bath deposition: Preprint. National Renewable Energy Laboratory, 2012.

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Rittner, Mindy N. Sputtered targets and sputtered films: Technology and markets. Business Communications Company, 1999.

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United States. National Aeronautics and Space Administration., ed. Plasma-assisted physical vapor deposition surface treatments for tribological control. National Aeronautics and Space Administration, 1990.

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Book chapters on the topic "Sputtering thin films"

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Mwema, Fredrick Madaraka, Esther Titilayo Akinlabi, and Oluseyi Philip Oladijo. "Multifractal Characterization of Structure Evolution with Sputtering Parameters of Thin Films." In Sputtered Thin Films. CRC Press, 2021. http://dx.doi.org/10.1201/9781003053507-8.

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Gulbiński, W. "Deposition of Thin Films by Sputtering." In Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies. Springer Netherlands, 2002. http://dx.doi.org/10.1007/978-94-010-0353-7_13.

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Yang, Weiqing. "Nanostructures and Thin Films Deposited with Sputtering." In Advanced Nano Deposition Methods. Wiley-VCH Verlag GmbH & Co. KGaA, 2016. http://dx.doi.org/10.1002/9783527696406.ch3.

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Adachi, Masatoshi. "Rhombohedral PZT Thin Films Prepared by Sputtering." In Topics in Applied Physics. Springer Berlin Heidelberg, 2005. http://dx.doi.org/10.1007/978-3-540-31479-0_5.

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Hu, Zhiyu, and Zhenhua Wu. "Preparation of Sb2Te3/Bi2Te3 Thin Films by Magnetron Sputtering." In Nanostructured Thermoelectric Films. Springer Singapore, 2020. http://dx.doi.org/10.1007/978-981-15-6518-2_5.

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Pauleau, Y., E. Mounier, and P. Juliet. "Amorphous Carbon Solid Lubricant Films Deposited by Conventional and Unbalanced Magnetron Sputtering." In Protective Coatings and Thin Films. Springer Netherlands, 1997. http://dx.doi.org/10.1007/978-94-011-5644-8_16.

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Wang, Xingwu, James P. Parry, Hrishikesh Kamat, Ruikun Pan, and Hao Zeng. "Iron-Copper Nitride Thin Films Fabricated by Sputtering." In Developments in Strategic Ceramic Materials. John Wiley & Sons, Inc., 2015. http://dx.doi.org/10.1002/9781119211747.ch19.

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Lu, D. X., E. M. W. Wong, E. Y. B. Pun, P. S. Chung, and G. C. Jia. "PZT Thin Films by Radio Frequency Magnetron Sputtering." In Applications of Photonic Technology 2. Springer US, 1997. http://dx.doi.org/10.1007/978-1-4757-9250-8_9.

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Naoe, Hiroyuki, Satoru Kishida, Fumihiko Toda, Yuzuru Mitani, and Heizo Tokutaka. "Ba0.6Rb0.4 BiO Thin Films by RF Magnetron Sputtering." In Advances in Superconductivity X. Springer Japan, 1998. http://dx.doi.org/10.1007/978-4-431-66879-4_239.

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Eisenmenger-Sittner, C., H. Bangert, A. Bergauer, and W. Bauer. "Co-Deposition by Magnetron Sputtering as Promising Method to Produce Wear Reducing Multi Component Coatings." In Protective Coatings and Thin Films. Springer Netherlands, 1997. http://dx.doi.org/10.1007/978-94-011-5644-8_4.

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Conference papers on the topic "Sputtering thin films"

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Jones, John G., Peter R. Stevenson, Maggie E. Lankford, et al. "Automated nanoscale multi-layer optical materials growth with reactive magnetron sputtering and in situ ellipsometry." In Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XXI, edited by Wounjhang Park, André-Jean Attias, and Balaji Panchapakesan. SPIE, 2024. http://dx.doi.org/10.1117/12.3025638.

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Tangkijtari, Chanatpol, Yingyot Infahsaeng, Chantana Aiempanakit, Montri Aiempanakit, and Kamon Aiempanakit. "Effect of sputtering power on TiO2 nanorod structures for dye-sensitized solar cells." In International Workshop on Thin Films for Electronics, Electro-Optics, Energy, and Sensors, edited by Partha P. Banerjee, Prathan Buranasiri, Surawut Wicharn, Guru Subramanyam, Suwan Plaipichit, and Mati Horprathum. SPIE, 2025. https://doi.org/10.1117/12.3068766.

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Bitinaitis, Ignas, Alexandr Belosludtsev, Gunnar Suchaneck, Sitao Wang, Gerald Gerlach, and Nikolai A. Sobolev. "Reactive multitarget magnetron sputtering of Sr2FeMoO6 films." In Advances in Optical Thin Films VIII, edited by Michel Lequime and Detlev Ristau. SPIE, 2024. http://dx.doi.org/10.1117/12.3029571.

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Mende, Mathias, and Wolfgang Ebert. "Glancing angle ion beam sputtering of optical thin films." In Advances in Optical Thin Films VI, edited by Michel Lequime, H. Angus Macleod, and Detlev Ristau. SPIE, 2018. http://dx.doi.org/10.1117/12.2307477.

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Arie, Y., and J. R. Matey. "Reactive sputtering of superconducting thin films." In Topical conference on high tc superconducting thin films, devices, and applications. AIP, 1989. http://dx.doi.org/10.1063/1.37970.

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Ribeaud, Alex, Jürgen Pistner, Isabel Vela-Perez, et al. "Accurate measurement and reduction of losses in ion beam sputtering coatings." In Advances in Optical Thin Films VIII, edited by Michel Lequime and Detlev Ristau. SPIE, 2024. http://dx.doi.org/10.1117/12.3023035.

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Mende, Mathias, Konrad Schrader, Wolfgang Ebert, James A. Folta, and Christopher J. Stolz. "Ion beam sputtering of large scale dichroic mirror for fifth-harmonic separation." In Advances in Optical Thin Films VII, edited by Michel Lequime and Detlev Ristau. SPIE, 2021. http://dx.doi.org/10.1117/12.2597747.

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Middendorff, Raoul, Felix Weiß, Cassian Bergmann, Marco Jupé, Andreas Wienke, and Kai Starke. "Functional optical coatings with quantum nanolaminates prepared by ion beam sputtering technology." In Advances in Optical Thin Films VIII, edited by Michel Lequime and Detlev Ristau. SPIE, 2024. http://dx.doi.org/10.1117/12.3022820.

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Malobabic, Sina, and Maximilian Machate. "Anti-reflection coatings based on quantized nanolaminates manufactured by ion beam sputtering." In Advances in Optical Thin Films VIII, edited by Michel Lequime and Detlev Ristau. SPIE, 2024. http://dx.doi.org/10.1117/12.3022805.

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Aubard, Océane, Marine Chorel, Eric G. Lavastre, Bruno Bousquet, and Corinne Marcel. "Development of dielectric mirrors by magnetron sputtering for high power laser facilities." In Advances in Optical Thin Films VIII, edited by Michel Lequime and Detlev Ristau. SPIE, 2024. http://dx.doi.org/10.1117/12.3017557.

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Reports on the topic "Sputtering thin films"

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Neurgaonkar, R. R. Research on Sputtering of Ferroelectric Thin Films. Defense Technical Information Center, 1990. http://dx.doi.org/10.21236/ada221792.

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Prater, W. Microstructural Comparisons of Ultra-Thin Cu Films Deposited by Ion-Beam and dc-Magnetron Sputtering. Office of Scientific and Technical Information (OSTI), 2004. http://dx.doi.org/10.2172/839624.

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Snow, G. Characterization of dc magnetron sputtering systems for the deposition of tantalum nitride, titanium, and palladium thin films for HMC (hybrid microcircuit) applications. Office of Scientific and Technical Information (OSTI), 1989. http://dx.doi.org/10.2172/5884585.

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Bongsebandhu-phubhakdi, Saknan, and Anan Srikiatkhachorn. On-media axon branching and adhesion investigation of neurons as stimulated by modulated potentials on micro-patterned gold substrate. Faculty of Medicine, Chulalongkorn University, 2016. https://doi.org/10.58837/chula.res.2016.22.

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The main focus of this research paper is on-media axon branching and adhesion investigation of neurons as stimulated by modulated potentials on micro-patterned gold substrate. Due to the prolonged and inefficient procedures of nerve repair, it is essential that we effectively incorporate different parameters and techniques as well as investigate cell-cell and cell-substrate interactions to explore new boundaries. This could lead to more operational options for nerve regeneration. Initially, the behavior of cell growth is first observed. 3T3 and Neuro2A cells are grown according to specific pro
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Foster, C. M., R. Csencsits, P. M. Baldo, et al. Epitaxial Pb(Zr{sub x}Ti{sub 1{minus}x})O{sub 3}/SrRuO{sub 3} (x = 0, 0.35, 0.65) multilayer thin films on SrTiO{sub 3}(100) and MgO(100) prepared by MOCVD and RF sputtering. Office of Scientific and Technical Information (OSTI), 1995. http://dx.doi.org/10.2172/52818.

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Mortazawi, Amir, and Victor Lee. Magnetron Sputtering System for Novel Intrinsically Switchable Thin Film Ferroelectric Resonators and Filters. Defense Technical Information Center, 2012. http://dx.doi.org/10.21236/ada580741.

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